| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/23/2006 | US20060060843 Resistor structures to electrically measure unidirectional misalignment of stitched masks |
| 03/23/2006 | US20060060800 Variably shaped beam EB writing system |
| 03/23/2006 | US20060060799 Lithographic apparatus and device menufacturing method |
| 03/23/2006 | US20060060560 Process for forming pattern and method for producing liquid crystal display apparatus |
| 03/23/2006 | DE10357775B4 Verfahren zur Kennzeichnung einer Vielzahl von Halbleiterwafern mit Identifikationskennzeichen A method for marking a variety of semiconductor wafers with identification tag |
| 03/23/2006 | DE102005035144A1 Belichtungsmaskenherstellungsverfahren, Zeichnungsvorrichtung, Halbleitereinrichtungsherstellungsverfahren und Maskenrohlingsprodukt Exposure mask manufacturing process, drawing device, semiconductor device manufacturing method and mask blank product |
| 03/23/2006 | DE102005033141A1 Passivierung eines Mehrschichtspiegels für extreme Ultraviolettlithografie Passivation of a multilayer mirror for extreme ultraviolet lithography |
| 03/23/2006 | DE102004063522A1 Verfahren zur Korrektur von strukturgrößenabhängigen Platzierungsfehlern bei der photolithographischen Projektion mittels eines Belichtungsapparats und dessen Verwendung A process for correction of feature size dependent placement errors in the projection by means of a photolithographic exposure apparatus and the use thereof |
| 03/23/2006 | DE102004046542A1 Optical system image characteristics adjusting method, involves illuminating optical unit with form-changing and/or refractive index changing processing radiation, based on form-changing and/or refractive index change correction |
| 03/23/2006 | DE102004037527A1 Resist system, useful for lithographic procedures, e.g. for preparing semiconductor components, comprises polymer/copolymer with acid labile group and cyclic polysiloxane containing group and/or cross linked polysiloxane containing group |
| 03/22/2006 | EP1638138A1 Removing agent composition and removing/cleaning method using same |
| 03/22/2006 | EP1637931A1 Lithographic apparatus and device manufacturing method |
| 03/22/2006 | EP1637930A2 Method and apparatus for vibration detection and analysis, and lithographic apparatus equipped therewith |
| 03/22/2006 | EP1637929A1 Method and system for electronically generating exposure scale for laser imaging devices. |
| 03/22/2006 | EP1637928A2 Photoresist monomer having spiro cyclic ketal group, polymer thereof and photoresist composition including the same |
| 03/22/2006 | EP1637927A1 Positive resist composition and pattern forming method using the same |
| 03/22/2006 | EP1637926A2 Curable jettable liquid for the production of a flexographic printing plate |
| 03/22/2006 | EP1637915A1 Method and apparatus for multi-beam exposure |
| 03/22/2006 | EP1637273A2 Apparatus for engraving cells, depressions and recesses on printing plates by means of laser light |
| 03/22/2006 | EP1636835A1 System and method for integrating in-situ metrology within a wafer process |
| 03/22/2006 | EP1636828A2 Compositions and methods for high-efficiency cleaning/polishing of semiconductor wafers |
| 03/22/2006 | EP1636826A2 Compound used to form a self-assembled monolayer, layer structure, semiconductor component having a layer structure, and method for producing a layer structure |
| 03/22/2006 | EP1636654A2 Apparatus and method for providing a confined liquid for immersion lithography |
| 03/22/2006 | EP1636653A2 Adhesion method using gray-scale photolithography |
| 03/22/2006 | EP1636651A1 Low-viscous, radiation curable formulation, particularly for the stereolithographical production of earpieces |
| 03/22/2006 | EP1636649A2 Novel photosensitive resin compositions |
| 03/22/2006 | EP1636648A2 Novel positive photosensitive resin compositions |
| 03/22/2006 | EP1636274A1 Photocurable resin composition |
| 03/22/2006 | EP1563119A4 Apparatus and method for deposition of an electrophoretic emulsion |
| 03/22/2006 | EP1405110A4 Preferred crystal orientation optical elements from cubic materials |
| 03/22/2006 | EP1378037A4 Injection seeded f2 laser with line selection and discrimination |
| 03/22/2006 | EP1378035A4 Injection seeded f 2? laser with pre-injected filter |
| 03/22/2006 | EP1323216A4 Very narrow band, two chamber, high rep rate gas discharge laser system |
| 03/22/2006 | EP1242843B1 Projection lens comprising adjacent aspheric lens surfaces |
| 03/22/2006 | EP1242836B1 CALCIUM FLUORIDE (CaF2) STRESS PLATE AND METHOD OF MAKING THE SAME |
| 03/22/2006 | EP1240557A4 Imaging method using phase boundary masking with modified illumination |
| 03/22/2006 | EP1226634A4 Single chamber gas discharge laser with line narrowed seed beam |
| 03/22/2006 | EP1218985A4 High power gas discharge laser with line narrowing unit |
| 03/22/2006 | EP1218984A4 Laser chamber with fully integrated electrode feedthrough main insulator |
| 03/22/2006 | EP1218980A4 Very narrow band injection seeded f 2? lithography laser |
| 03/22/2006 | CN1751378A Detection method for optimum position detection formula, alignment method, exposure method, device production method, device, and measurement and/or inspection apparatus |
| 03/22/2006 | CN1751275A Water soluble resin composition, method of pattern formation and method of inspecting resist pattern |
| 03/22/2006 | CN1751274A Process for producing water development printing plate for relief printing |
| 03/22/2006 | CN1751273A Pattern generation methods |
| 03/22/2006 | CN1751272A Immersion exposure process-use resist protection film forming material, composite film, and resist pattern forming method |
| 03/22/2006 | CN1751271A Acrylic polymer-containing gap filler forming composition for lithography |
| 03/22/2006 | CN1751270A Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon |
| 03/22/2006 | CN1751269A Halogenated oxime derivatives and the use thereof as latent acids |
| 03/22/2006 | CN1750011A Variable deviation etching simulating method under sub wavelength light etching condition |
| 03/22/2006 | CN1749862A Method and apparatus for vibration detection and vibration analysis, and lithographic apparatus equipped such an apparatus |
| 03/22/2006 | CN1749861A Apparatus, method and program product for suppressing waviness of features to be printed using photolithographic systems |
| 03/22/2006 | CN1749860A Layout of a vertical pattern used in dipole exposure apparatus |
| 03/22/2006 | CN1749859A Coating device |
| 03/22/2006 | CN1749858A Method for manufacturing a flexographic printing master |
| 03/22/2006 | CN1749857A Chemical amplifying type positive light anti-etching agent composition |
| 03/22/2006 | CN1749856A Curable jettable liquid for flexography |
| 03/22/2006 | CN1749855A Light solidified barrier size for producing gas discharging display screen |
| 03/22/2006 | CN1749854A Hot melt |
| 03/22/2006 | CN1749852A Method for making chrome photo mask |
| 03/22/2006 | CN1749851A Mask plate supply system, method for producing mask plate and mask plate transparent substrate |
| 03/22/2006 | CN1749836A Black-white cholesterol liquid crystal display and its producing method |
| 03/22/2006 | CN1749829A Microlens array, method of fabricating microlens array, and liquid crystal display apparatus with microlens array |
| 03/22/2006 | CN1749814A Aluminum cemical mechanical polishing eat-back for liquid crystal device on silicon |
| 03/22/2006 | CN1749787A Sol-gel material derived adjustable light attenuator and its producing method |
| 03/22/2006 | CN1246888C Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process |
| 03/22/2006 | CN1246739C Liquid composition for removing residue of photo-corrosion-inhibitor |
| 03/22/2006 | CN1246738C Positive photosensitive resin precursor and process for producing the same |
| 03/22/2006 | CN1246732C Light interference type display unit structure and producing method |
| 03/22/2006 | CN1246709C Mfg. method of microlens array and microlens array |
| 03/22/2006 | CN1246389C Normal photosensitive resin precursor composition and display using it |
| 03/21/2006 | USRE39024 Exposure apparatus having catadioptric projection optical system |
| 03/21/2006 | US7016755 Information processing method and apparatus used in an exposure system and exposure apparatus |
| 03/21/2006 | US7016387 Windows, electrode masking segments; measurement adjustment pattern segments |
| 03/21/2006 | US7016126 Optical element holding system in projection optical system |
| 03/21/2006 | US7016054 Lithography line width monitor reflecting chip-wide average feature size |
| 03/21/2006 | US7016051 Reticle focus measurement system using multiple interferometric beams |
| 03/21/2006 | US7016049 Alignment apparatus, control method therefor, exposure apparatus, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method |
| 03/21/2006 | US7016041 Reticle overlay correction |
| 03/21/2006 | US7016029 Detection of lens anti-reflective coating decay by undesired residue detection |
| 03/21/2006 | US7016025 Method and apparatus for characterization of optical systems |
| 03/21/2006 | US7016019 Lithographic apparatus and device manufacturing method |
| 03/21/2006 | US7016017 Lithographic apparatus and method for optimizing an illumination source using isofocal compensation |
| 03/21/2006 | US7016015 Lithographic apparatus and device manufacturing method |
| 03/21/2006 | US7016014 Lithographic apparatus and device manufacturing method |
| 03/21/2006 | US7016013 Modulated lithographic beam to reduce sensitivity to fluctuating scanning speed |
| 03/21/2006 | US7016012 Exposure apparatus |
| 03/21/2006 | US7015529 Localized masking for semiconductor structure development |
| 03/21/2006 | US7015501 Substrate and organic electroluminescence device using the substrate |
| 03/21/2006 | US7015491 Lithographic apparatus, device manufacturing method and device manufactured thereby, control system |
| 03/21/2006 | US7015489 Collector having unused region for illumination systems using a wavelength less than or equal to 193 nm |
| 03/21/2006 | US7015488 Exposure head, exposure apparatus, and application thereof |
| 03/21/2006 | US7015487 Apparatus and method for exposing a radiation sensitive layer by means of charged particles as well as a mask for this purpose |
| 03/21/2006 | US7015482 Electron beam writing equipment using plural beams and method |
| 03/21/2006 | US7015456 Exposure apparatus that acquires information regarding a polarization state of light from a light source |
| 03/21/2006 | US7015363 Process for producing ether compound |
| 03/21/2006 | US7015291 Process for the production of high-molecular compounds for photoresist |
| 03/21/2006 | US7015256 Composition for forming photosensitive dielectric material, and transfer film, dielectric material and electronic parts using the same |
| 03/21/2006 | US7015183 Resist remover composition |
| 03/21/2006 | US7015136 Method for preventing formation of photoresist scum |
| 03/21/2006 | US7015134 Method for reducing anti-reflective coating layer removal during removal of photoresist |