| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/29/2006 | CN1248050C Base board for optical mask and its mfg. method, optical mask blank and optical mask |
| 03/29/2006 | CN1248048C Process for preparing light mask |
| 03/29/2006 | CN1248047C Colour changing composition and colouring polymeric articles made therefrom |
| 03/29/2006 | CN1247689C Ultraviolet-curable resin composition |
| 03/29/2006 | CN1247550C Triazine-based compound comprising functionalized alkylthio groups, and photo polymerization initiator |
| 03/29/2006 | CN1247387C Forming mark on gemstone or industrial diamond |
| 03/28/2006 | US7020348 Device for exposure of a strip-shaped workpiece with a meander correction device |
| 03/28/2006 | US7020321 Pattern data converting method and apparatus |
| 03/28/2006 | US7019908 Modulator circuitry |
| 03/28/2006 | US7019879 Angled strobe lines for high aspect ratio spatial light modulator |
| 03/28/2006 | US7019846 Method for determining wavefront aberrations |
| 03/28/2006 | US7019843 Method and apparatus for stage mirror mapping |
| 03/28/2006 | US7019842 Position measuring device |
| 03/28/2006 | US7019836 Position detection method and apparatus, and exposure method and apparatus |
| 03/28/2006 | US7019835 Method and system to measure characteristics of a film disposed on a substrate |
| 03/28/2006 | US7019824 Moire method and measuring system for measuring the distortion of an optical imaging system |
| 03/28/2006 | US7019820 Lithographic apparatus and device manufacturing method |
| 03/28/2006 | US7019819 Chucking system for modulating shapes of substrates |
| 03/28/2006 | US7019818 Apparatus for exposing substrate materials |
| 03/28/2006 | US7019816 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 03/28/2006 | US7019815 Off-axis leveling in lithographic projection apparatus |
| 03/28/2006 | US7019313 Methods and devices for evaluating beam blur in subfields projection-exposed by a charged-particle-beam microlithography apparatus |
| 03/28/2006 | US7019312 Adjustment in a MAPPER system |
| 03/28/2006 | US7019308 Thermal compensation in magnetic field influencing of an electron beam |
| 03/28/2006 | US7019268 comprises heater, heat distribution plate, substrate with gas bearing member, and rotatable actuator; lithography |
| 03/28/2006 | US7019093 Polymeric backbone, benzocyclobutene reactive groups, and photoswitchable pendant groups that form carboxylic acid groups upon exposure to activating wavelengths of radiation; CO2 emitted when polymer is cured by heating |
| 03/28/2006 | US7019092 Fluorinated copolymers for microlithography |
| 03/28/2006 | US7019045 Amino group containing phenol |
| 03/28/2006 | US7018943 Method of uniformly coating a substrate |
| 03/28/2006 | US7018936 Ion implant lithography method of processing a semiconductor substrate |
| 03/28/2006 | US7018932 Method for manufacturing a semiconductor device and apparatus for manufacturing a semiconductor device |
| 03/28/2006 | US7018930 Method for fabricating semiconductor device |
| 03/28/2006 | US7018785 Reducing the contact angle of photoresist film, by chemically amplifying a photoresist film, to improve the wetting properties while development, controlling film thickness, forming an accuracy pattern shapes |
| 03/28/2006 | US7018784 Applying amplified photoresists to substrate in solvent; film forming polymer; acid generator; reducing channel width |
| 03/28/2006 | US7018783 Fine structure and devices employing it |
| 03/28/2006 | US7018782 coating photoresist on substrate, exposing, developing, and etching |
| 03/28/2006 | US7018781 Method for fabricating a contact hole plane in a memory module |
| 03/28/2006 | US7018780 Methods for controlling and reducing profile variation in photoresist trimming |
| 03/28/2006 | US7018779 Eliminating amino group outgrowths; forming thin oxynitride film between silicon nitride layer and antireflective coating |
| 03/28/2006 | US7018778 Single polisilicon emitter bipolar junction transistor processing technique using cumulative photo resist application and patterning |
| 03/28/2006 | US7018777 Exposing the heat-sensitive plate to light, and developing with an alkaline solution comprising sulfactants and salts; improve image contrast, resist to scratch, dispersing the development sludge |
| 03/28/2006 | US7018776 comprises polyamic acids soluble in gamma-butyrolactone and aqueous tetramethyl ammonium hydroxide, and adhesion promoter; photoresists; for forming high temperature resistant relief images |
| 03/28/2006 | US7018774 Usable for the image-forming layer of a positive type lithographic printing plate precursor for the so-called direct platemaking that can be directly achieved with the aid of digital signals from computers and the like |
| 03/28/2006 | US7018773 Printing plate material and image formation method employing the same |
| 03/28/2006 | US7018771 Material transfer method and manufacturing method for substrate for plasma display |
| 03/28/2006 | US7018753 Variable mask field exposure |
| 03/28/2006 | US7018751 Radiation filter element and manufacturing processes therefore |
| 03/28/2006 | US7018744 Three-dimensional; moderating refractiv eindex; optical recording media containing photopolymer |
| 03/28/2006 | US7018717 Antireflective hard mask compositions |
| 03/28/2006 | US7018548 Conductive thin film pattern and method of forming the same, method of manufacturing thin film magnetic head, method of manufacturing thin film inductor, and method of manufacturing micro device |
| 03/28/2006 | US7018481 Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle |
| 03/28/2006 | US7018472 Photoresist applying device and applying method therefor |
| 03/28/2006 | US7017490 water and a nonionic surfactant which is the reaction product of epichlorohydrin or a trichloroalkyl with an alkoxylated alcohol; good wetting properties, low foaming |
| 03/23/2006 | WO2006031455A2 Lithography technique using silicone molds |
| 03/23/2006 | WO2006031411A2 A conductive lithographic polymer mixture and method of making devices using same |
| 03/23/2006 | WO2006031270A1 System and methods for surface cleaning |
| 03/23/2006 | WO2006030910A1 Substrate for exposure, exposure method and device manufacturing method |
| 03/23/2006 | WO2006030908A1 Substrate holding apparatus, exposure apparatus and device manufacturing method |
| 03/23/2006 | WO2006030902A1 Exposure apparatus, exposure method, and method for manufacturing device |
| 03/23/2006 | WO2006030775A1 Coating method and coating device |
| 03/23/2006 | WO2006030684A1 Projection optical system, production method for projection optical system, exposure system and exposure method |
| 03/23/2006 | WO2006030641A1 Composition for forming antireflective film and wiring forming method using same |
| 03/23/2006 | WO2006030609A1 Lactone compound, lactone-containing monomer, polymer of those, resist composition using same, method for forming pattern using same |
| 03/23/2006 | WO2006030604A1 Resist composition and method for forming resist pattern |
| 03/23/2006 | WO2006030320A2 Antireflective compositions for photoresists |
| 03/23/2006 | WO2006030240A2 Novel resist material |
| 03/23/2006 | WO2006030239A2 Novel resist material and method for forming a patterned resist layer on a substrate |
| 03/23/2006 | WO2006030234A2 Use of methanofullerene derivatives as resist materials and method for forming a resist layer |
| 03/23/2006 | WO2005119361A3 Apparatus for blanking a charged particle beam |
| 03/23/2006 | WO2005059652A3 Photoresist composition for deep uv and process thereof |
| 03/23/2006 | WO2005052016A3 Bottom antireflective coatings |
| 03/23/2006 | WO2005015312A3 Method for determining optimal resist thickness |
| 03/23/2006 | US20060063688 Photoresist stripping solution and method of treating substrate with the same |
| 03/23/2006 | US20060063672 Laser addressable thermal transfer imaging element with an interlayer |
| 03/23/2006 | US20060063393 Organosilicate resins as hardmasks for organic polymer dielectrics in fabrication of microelectronic devices |
| 03/23/2006 | US20060063384 Mask patterns for semiconductor device fabrication and related methods and structures |
| 03/23/2006 | US20060063111 Method of forming a structured surface using ablatable radiation sensitive material |
| 03/23/2006 | US20060063110 Process for preparing light-sensitive lithographic printing plate and method for processing the same |
| 03/23/2006 | US20060063109 polymeric binders of the slip film layer are selected from polyacetals, polyacrylics, polyamides, polyimides, polybutylenes, polycarbonates, polyesters, polyethylenes, cellulose, polyphenylene ethers; layered silicate is a phyllosilicate to improve release properties of flexographic printing plate |
| 03/23/2006 | US20060063107 Photoresist compositions comprising diamondoid derivatives |
| 03/23/2006 | US20060063106 a polyimide from a bis(aminophenyl)methane or sulfone and a diphenyl(methane or sulfone)-3,3'4,4'-tetracarboxylic acid; photolithographic dispersions; spin coatings for semiconductor wafers |
| 03/23/2006 | US20060063105 Negative-working photoimageable bottom antireflective coating |
| 03/23/2006 | US20060063103 Radiation-sensitive composition and method of fabricating a device using the radiation-sensitive composition |
| 03/23/2006 | US20060063102 Positive resist composition |
| 03/23/2006 | US20060063101 Radiation-sensitive elements |
| 03/23/2006 | US20060063100 Polvmerizable compositions polymer, resist, and lithography methods |
| 03/23/2006 | US20060063095 positive-working, aqueous base developable photosensitive polybenzoxazole (PBO) precursor compositions of polyamides where the hydroxyl groups of the dihydroxydiamine monomer unit may be sulfonated with a quinonediazide, a diazonaphthoquinone photoactive compound, and a solvent; relief images |
| 03/23/2006 | US20060063078 Exposure parameter obtaining method, exposure parameter evaluating method, semiconductor device manufacturing method, charged beam exposure apparatus, and method of the same |
| 03/23/2006 | US20060063077 Mask patterns including gel layers for semiconductor device fabrication and methods of forming the same |
| 03/23/2006 | US20060062523 Polymer micro-ring resonator device and fabrication method |
| 03/23/2006 | US20060062348 Multilayer film reflector and X-ray exposure system |
| 03/23/2006 | US20060061886 System for setting and maintaining a gas atmosphere in an optical system |
| 03/23/2006 | US20060061879 Projection optical system and projection exposure apparatus |
| 03/23/2006 | US20060061771 Compensation for effects of beam misalignments in interferometer metrology systems |
| 03/23/2006 | US20060061756 Exposure method for correcting a focal point, and a method for manufacturing a semiconductor device |
| 03/23/2006 | US20060061749 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 03/23/2006 | US20060061748 Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system |
| 03/23/2006 | US20060061747 Exposure apparatus and device manufacturing method |
| 03/23/2006 | US20060061741 Temperature adjusting system and expsoure apparatus incorporating the same |
| 03/23/2006 | US20060061042 Positioning apparatus |