| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/04/2006 | US7021213 Printing method |
| 04/04/2006 | US7021119 Liquid flow proximity sensor for use in immersion lithography |
| 04/04/2006 | CA2236669C A process for the stereolithographic preparation of a mould and use thereof |
| 04/04/2006 | CA2036951C Using a conventional flat drawing or a flat mosaic style paste-up of a design to produce open faced casting molds or vaccuum forming molds |
| 03/30/2006 | WO2006033470A2 Patterning and film-forming process, electroluminescence device and manufacturing process therefor, and electroluminescence display apparatus |
| 03/30/2006 | WO2006033467A1 Polymer, method for producing the polymer, optical film, and image display device |
| 03/30/2006 | WO2006033455A1 Antistatic treatment agent, and antistatic film, coated article and pattern forming method using the agent |
| 03/30/2006 | WO2006033442A1 Reflective mask, reflective mask manufacturing method and exposure apparatus |
| 03/30/2006 | WO2006033359A1 Adamantane derivative, process for producing the same, and photosensitive material for photoresist |
| 03/30/2006 | WO2006003373A3 Immersion photolithography system |
| 03/30/2006 | WO2006001534A3 Method for manufacturing minute structure, method for manufacturing liquid discharge head, and liquid discharge head |
| 03/30/2006 | WO2005121894A3 Photoactive compounds |
| 03/30/2006 | WO2005096099A3 Removal of particles generated by a radiation source |
| 03/30/2006 | WO2005067048A3 Contactless flash memory array |
| 03/30/2006 | WO2005064399A3 Lithography system using a programmable electro-wetting mask |
| 03/30/2006 | WO2005059646A3 Photosensitive composition remover |
| 03/30/2006 | WO2005047976A3 Varying feature size in resist |
| 03/30/2006 | WO2005031748A8 Oblique reflector normal incidence collector system for light sources, in particular for euv plasma discharge sources |
| 03/30/2006 | WO2004020704A8 Apparatus and method for deposition of an electrophoretic emulsion |
| 03/30/2006 | US20060069176 Polymer derived ceramic materials |
| 03/30/2006 | US20060068526 Acrylic polymer-containing gap filler forming composition for lithography |
| 03/30/2006 | US20060068447 Functionally organized, spatially patterned assembly polymer-microparticle composites including alternating current electric field-mediated assembly; systemic synthetic process to translate sequence of synthetic instructions into sequence of operations performed in homogenous fluid phase to form films |
| 03/30/2006 | US20060068335 Coating compositions for use with an overcoated photoresist |
| 03/30/2006 | US20060068332 Method for fabricating carrier structure integrated with semiconductor element |
| 03/30/2006 | US20060068331 Exposure method |
| 03/30/2006 | US20060068328 Negative-working excellent in preservation stability and exhibits high sensitivity and good printing durability; hydrophilic support; and a photosensitive layer containing a polymerization initiator, a chain transfer agent, a compound having an ethylenically unsaturated double bond and a polymer binder |
| 03/30/2006 | US20060068325 Oxime derivatives and the use thereof as latent acids |
| 03/30/2006 | US20060068305 Method for aligning exposure mask and method for manufacturing thin film device substrate |
| 03/30/2006 | US20060068304 Reduces an area necessary for alignment marks of an object while maintaining the minimum allowable gap among alignment marks on the same exposure mask |
| 03/30/2006 | US20060068301 Pattern decision method and system, mask manufacturing method, image-forming performance adjusting method, exposure method and apparatus, program, and information recording medium |
| 03/30/2006 | US20060068298 Transfer mask blank, transfer mask, and transfer method using the transfer mask |
| 03/30/2006 | US20060068093 Coating device and coating film forming method |
| 03/30/2006 | US20060066962 Arrangement of optical elements in a microlithographic projection exposure apparatus |
| 03/30/2006 | US20060066940 Reflective optical element and EUV lithography appliance |
| 03/30/2006 | US20060066841 Method and system for reconstructing aberrated image profiles through simulation |
| 03/30/2006 | US20060066764 Optical system and photolithography tool comprising same |
| 03/30/2006 | US20060066006 Fabrication of 3d photopolymeric devices |
| 03/30/2006 | US20060065625 Periodic patterns and technique to control misalignment between two layers |
| 03/30/2006 | US20060065185 Crystallization apparatus, crystallization method, and phase shifter |
| 03/30/2006 | DE19649447B4 Vinyl-4-t-butoxycarbonyloxybenzal-vinylalkohol-vinylacetat-Copolymer, Vinyl-4-t-butoxycarbonyloxybenzal-vinyl-4- hydroxybenzal-vinylalkohol-vinylacetat und deren Herstellungsverfahren Vinyl 4-t-butoxycarbonyloxybenzal-vinyl alcohol-vinyl acetate copolymer, vinyl 4-t-butoxycarbonyloxybenzal-vinyl-4-hydroxybenzal-vinyl alcohol-vinyl acetate and their method of preparation |
| 03/30/2006 | DE10345471B4 Justiermarke zur Grobjustage und Feinjustage eines Halbleiterwafers in einem Belichtungsgerät Alignment marks for coarse adjustment and fine tuning of a semiconductor wafer in an exposure apparatus |
| 03/30/2006 | DE102005046188A1 Mask for irradiating with electron beams in a lithographic process for producing semiconductor components has opening sections for correcting a proximity effect |
| 03/30/2006 | DE102005034890A1 Optische Systeme, die optische Wellenfront-Korrekturflächen einschließen Include optical systems, the optical wavefront correction surfaces |
| 03/30/2006 | DE102004047263A1 Verfahren zum Erzeugen eines Abbildungsfehler vermeidenden Maskenlayouts für eine Maske A method for generating a mapping error-avoiding mask layout for a mask |
| 03/30/2006 | DE102004044669A1 Verfahren zur Überwachung des Lichtdosiergeräts eines Photolithographie-Systems Method for monitoring the Lichtdosiergeräts a photolithography system |
| 03/30/2006 | DE102004044083A1 Verfahren zur Strukturierung eines Substrats und Vorrichtung hierzu A process for patterning a substrate and device for this purpose |
| 03/30/2006 | DE102004043908A1 Oberflächenstrukturierte polymere Substrate und ihre Herstellung Structured surface polymeric substrates and their preparation |
| 03/30/2006 | DE102004042300A1 High resolution photoresist process especially for the production of semiconductors using radiant heating of the resist layer |
| 03/30/2006 | DE102004041942B3 Verfahren zur Herstellung einer Lithographie-Druckplatte A method for preparing a lithographic printing plate |
| 03/30/2006 | DE102004041921A1 Phase-shift mask for projecting a pattern of structural elements onto a semiconductor wafer comprises a mask substrate, structural elements and a boundary line arranged between surfaces of the mask substrate |
| 03/30/2006 | DE10118409B4 Verfahren zur Strukturierung eines Resists Method for structuring a resist |
| 03/29/2006 | EP1641028A1 Exposure method, substrate stage, exposure apparatus and method for manufacturing device |
| 03/29/2006 | EP1640806A2 Composition for stripping photoresist and method for manufacturing thin film transistor array panel using the same |
| 03/29/2006 | EP1640805A1 Lithographic printing plate precursor |
| 03/29/2006 | EP1640804A2 Positive-tone radiation-sensitive resin composition |
| 03/29/2006 | EP1640803A2 Photosensitive lithographic printing plate |
| 03/29/2006 | EP1640802A2 Photosensitive lithographic printing plate |
| 03/29/2006 | EP1640363A1 Process for production of monosulfonium salts, cationic polymerization initiators, curable compositions, and products of curing |
| 03/29/2006 | EP1640159A2 Device for heat treating the coating of flat offset printing plates |
| 03/29/2006 | EP1639631A1 Method and apparatus for removing a residual organic layer from a substrate using reactive gases |
| 03/29/2006 | EP1639412A2 Developer composition for resists and method for formation of resist pattern |
| 03/29/2006 | EP1639411A1 A nano impression lithographic process which involves the use of a die having a region able to generate heat |
| 03/29/2006 | EP1639393A1 Corrective device for compensating disturbances of polarization distribution, and microlithographic projection lens |
| 03/29/2006 | EP1639391A2 Using isotopically specified fluids as optical elements |
| 03/29/2006 | EP1438772A4 Line selected f 2? two chamber laser system |
| 03/29/2006 | EP1386377A4 Gas discharge laser with improved beam path |
| 03/29/2006 | EP1151211B1 Method and device for vibration control |
| 03/29/2006 | EP1015931B1 Projection light facility for microlithography |
| 03/29/2006 | CN1754250A Exposure apparatus, exposure method, and method for producing device |
| 03/29/2006 | CN1754249A Neutral particle beam lithography |
| 03/29/2006 | CN1754247A Methods and apparatus for dispensing semiconductor processing solutions with multi-syringe fluid delivery systems |
| 03/29/2006 | CN1754245A An extractor for an microcolumn, an alignment method for an extractor aperture and an electon emitter |
| 03/29/2006 | CN1754131A Multiple exposure method for circuit performance improvement |
| 03/29/2006 | CN1754130A Slm direct writer |
| 03/29/2006 | CN1754129A Exposure apparatus for liquid crystal panel and exposure apparatus |
| 03/29/2006 | CN1754128A Method for producing resist substrates |
| 03/29/2006 | CN1754127A 光敏组合物及其用途 Photosensitive composition and use thereof |
| 03/29/2006 | CN1754126A Coating fluid for forming wettable pattern and method for producing article having pattern formed thereon |
| 03/29/2006 | CN1754125A Photoresist composition and method of forming resist pattern |
| 03/29/2006 | CN1753947A Curable composition |
| 03/29/2006 | CN1752852A Composition for stripping photoresist and method for manufacturing thin film transistor array panel using the same |
| 03/29/2006 | CN1752851A Lithographic apparatus and device manufacturing method |
| 03/29/2006 | CN1752850A Image interference photoetching method using five times exposure |
| 03/29/2006 | CN1752849A Five times exposure image interference photoetching method using trapezoidal glass prism and its system |
| 03/29/2006 | CN1752848A Image interference photoetching method using circular grating and gated optical shutter and its system |
| 03/29/2006 | CN1752847A Image interference photoetching method using end acousto-optical deflector and its system |
| 03/29/2006 | CN1752846A Mask patterns including gel layers for semiconductor device fabrication and methods of forming the same |
| 03/29/2006 | CN1752845A Ray sensitive resin composition for forming interlayer insulation film and interlayer insulation film |
| 03/29/2006 | CN1752844A Mask patterns for semiconductor device fabrication and related methods and structures |
| 03/29/2006 | CN1752141A Light crosslinking resin and its synthesis method |
| 03/29/2006 | CN1752117A Vinyl polymer and light sensitivity lithographic plate containing said polymer |
| 03/29/2006 | CN1248556C Underlying pattern forming material for electrode and wiring material absorption and application thereof |
| 03/29/2006 | CN1248058C Position measuring device |
| 03/29/2006 | CN1248057C Resist remover compsn. |
| 03/29/2006 | CN1248056C Photoresist stripper and method of stripping |
| 03/29/2006 | CN1248055C Alkyl aminoalkyl piperazine surfactant and its application in photoresist developer |
| 03/29/2006 | CN1248054C Exposure device, substrate processing unit and photoetching system and device manufacture method |
| 03/29/2006 | CN1248053C Water- and solvent-resistant diazo screen printing platemaking photoresist |
| 03/29/2006 | CN1248052C Light sensitive resin compsn. for black matrix |
| 03/29/2006 | CN1248051C Alkali processing liquor, method and device for preparing processing liquor, and method and device for supply thereof |