Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
04/2006
04/05/2006EP1642173A1 Facet mirrors and a method for producing mirror facets
04/05/2006EP1642172A2 Compositions comprising photoacid generators
04/05/2006EP1642171A1 Exposure mask, method of designing and manufacturing the same, exposure method and apparatus, pattern forming method, and device manufacturing method
04/05/2006EP1642170A2 Systems for magnification and distortion correction for imprint lithography processes
04/05/2006EP1642169A1 Exposure station for film webs
04/05/2006EP1641908A1 Cleaning composition, method of cleaning semiconductor substrate, and method of forming wiring on semiconductor substrate
04/05/2006EP1641849A1 Photoresist polymers and compositions having acrylic- or methacrylic-based polymeric resin prepared by a living free radical process
04/05/2006EP1641848A1 Photoresist polymer compositions
04/05/2006EP1641750A2 Photoactive compounds
04/05/2006EP1558654A4 Novel copolymer, photoresist compositions thereof and deep uv bilayer system thereof
04/05/2006EP1502288A4 Lithography laser with beam delivery and beam pointing control
04/05/2006EP1417538B1 Photosensitive, flexo printing element and method for the production of newspaper flexo printing plates
04/05/2006EP1410436A4 Parallel, individually addressable probes for nanolithography
04/05/2006CN1757096A Immersion liquid for immersion exposure process and resist pattern forming method using such immersion liquid
04/05/2006CN1757095A Inline connection setting method and device and substrate processing devices and substrate processing system
04/05/2006CN1756995A Photosensitive resin composition and coating film cured product thereof
04/05/2006CN1756994A Resist material for liquid immersion exposure process and method of forming resist pattern with the resist material
04/05/2006CN1756993A Photosensitive resin composition and curing product thereof
04/05/2006CN1755528A Alignment method of exposure mask and manufacturing method of thin film element substrate
04/05/2006CN1755527A Method for aligning exposure mask and method for manufacturing thin film device substrate
04/05/2006CN1755526A Base plate processing system
04/05/2006CN1755525A Removing apparatus, protective film forming apparatus, substrate processing system and removing method
04/05/2006CN1755524A Phototonus thermosetting resin composition and printing plug board coating with resist and its manufacturing method
04/05/2006CN1755523A Chemically amplified resist composition
04/05/2006CN1755522A Method for forming photosensitive polyimide pattern and electronic devices having the pattern
04/05/2006CN1755521A Ink jet recording sheet for plate-making mask film, and process for producing flexographic printing plate
04/05/2006CN1755519A Mask blank substrate, mask blank, exposure mask, mask blank substrate manufacturing method, and semiconductor manufacturing method
04/05/2006CN1755472A Method of manufacturing a liquid crystal display and a mask for use in same
04/05/2006CN1754696A Metal mesh fabric for screen process printing
04/05/2006CN1250054C Metod and device for generation of far ultraviolet or soft X-ray radiation
04/05/2006CN1249790C Ray sensitive compasition for preparing insulation film and display
04/05/2006CN1249782C Method for reducing conductor pattern interval and structure formed thereby
04/05/2006CN1249781C Litho process applying to mask ROM coding layout
04/05/2006CN1249704C Blank disk and direct die press and its manufacture method
04/05/2006CN1249530C Alkoxyl N-hydroxy alkyl acylamine used as corrosion inhibitor remover
04/05/2006CN1249529C Alkaline solution manufacturing method, alkaline solution and its application, solution applying apparatus and its application
04/05/2006CN1249528C Multiplex laser-light source and exposure system
04/05/2006CN1249527C Method and apparatus for exposure
04/05/2006CN1249526C Lithographic apparatus, apparatus cleaning method, device manufacturing method and device manufactured thereby
04/05/2006CN1249525C Negative-acting aqueous photoresist composition
04/05/2006CN1249524C Photoresist composition for etch-resistant agent flowing process and method for forming contact hole using the same
04/05/2006CN1249523C Process for forming pattern and method for making LCD apparatus using the process
04/05/2006CN1249522C Method for heating wafer and baking photoetch-resist film on wafer and its equipment
04/05/2006CN1249521C Mask and method for mfg. same, and method for manufacturing electric light emitting apparatus
04/05/2006CN1249499C Fine component, its mfg. method and product using same
04/05/2006CN1249492C Substrate processing devices
04/05/2006CN1249468C Optical fibre beam, light source apparatus using optical fibre beam and method for producing light source apparatus
04/05/2006CN1249126C Polysiloxane, process for production thereof and radiation-sensitive resin composition
04/05/2006CN1249119C Hydrogenated ring-opening metathesis copolymer and process for producing the same
04/05/2006CN1249009C Novel difunctional photoinitiators
04/05/2006CN1248868C Method for mfg. support body for lithographic plate printing plate
04/05/2006CN1248850C Stone plate printing original plate
04/04/2006US7024655 Mixed-mode optical proximity correction
04/04/2006US7024638 Method for creating patterns for producing integrated circuits
04/04/2006US7024440 Method and system for processing a discrete time input signal where the clock rate of a discrete time output signal is a multiple of the clock rate of input signal samples
04/04/2006US7024267 Automobile gauge faces made of stainless steel and other metals
04/04/2006US7024266 Substrate processing apparatus, method of controlling substrate, and exposure apparatus
04/04/2006US7024093 Methods of forming waveguides and waveguides formed therefrom
04/04/2006US7023953 Illumination system and exposure apparatus and method
04/04/2006US7023627 Lithographic objective having a first lens group including only lenses having a positive refractive power
04/04/2006US7023610 Ultraviolet laser apparatus and exposure apparatus using same
04/04/2006US7023561 Exposure apparatus with interferometer
04/04/2006US7023530 Dual source lithography for direct write application
04/04/2006US7023528 Hybrid electronic mask
04/04/2006US7023527 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
04/04/2006US7023526 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap without an explicit attenuation
04/04/2006US7023525 Imaging apparatus
04/04/2006US7023524 Lithographic apparatus and device manufacturing method
04/04/2006US7023523 Exposure system and exposure method
04/04/2006US7023522 Multiple exposure method
04/04/2006US7023521 Exposure apparatus, exposure method and process for producing device
04/04/2006US7023462 Multibeam exposure device
04/04/2006US7023425 Data input device power management including beacon state
04/04/2006US7023017 Thin film transistor substrate of horizontal electric field type liquid crystal display device and fabricating method thereof
04/04/2006US7023002 Surface treating device and surface treating method
04/04/2006US7022823 A benzothiazole ring containing compound with at least one diazonium salt
04/04/2006US7022790 Cyclic nonaromatic olefin copolymers, used dielectric coatings with photocatalysts, to form films for electrical and electronic apparatus
04/04/2006US7022607 Mask and its manufacturing method, and method for manufacturing semiconductor device
04/04/2006US7022556 Exposure device, exposure method and method of manufacturing semiconductor device
04/04/2006US7022466 Performing pattern exposure by selectively irradiating resist film with extreme UV of a wavelength of a 1 nm through 30 nm band at exposure energy of 5 mJ/cm2 or less; forming a resist pattern by developing resist film after pattern exposure
04/04/2006US7022465 Method in connection with the production of a template and the template thus produced
04/04/2006US7022464 forming circuit patterns on surfaces of clad metals, then applying photoresists, exposing, conditioning, stripping and plating with dielectrics, to form multilayer printed circuit with expandable electrical resistance; stability
04/04/2006US7022463 Near-field exposure photoresist and fine pattern forming method using the same
04/04/2006US7022462 Photosensitive resin composition, photosensitive element using the same, process for producing resist pattern, and process for producing printed wiring board
04/04/2006US7022461 lithographic printing plates comprising aluminum or polyester supports having layers of thermosensitive compounds and light to heat conversion dyes; thermal printing
04/04/2006US7022459 Photosensitive composition
04/04/2006US7022458 Improves line edge roughness; copolymer containing units of 5-(2-hydroxy-2,2-bis(trifluoromethyl)ethyl)norborn-2-ene, maleic anhydride, a methacrylate containing acid labile group such as 2-methyl-2-adamanthyl methacrylate , and optionally a norbornene monomer
04/04/2006US7022457 Photoresists with hydroxylated, photoacid-cleavable groups
04/04/2006US7022456 For producing semiconductor integrated- circuit elements, masks for integrated circuit production, printed wiring boards, liquid-crystal panels
04/04/2006US7022455 Photoacid-labile polymers and photoresists comprising same
04/04/2006US7022454 Binders; resolution of relief image
04/04/2006US7022453 Image- receiving sheet comprising a support and an image-receiving layer; and at least four (yellow, magenta, cyan, black and the like) thermal transfer sheets each comprising a support, a light-to-heat converting layer and an
04/04/2006US7022452 Contrast enhanced photolithography
04/04/2006US7022443 Determining an optical effect caused by a reflective mask in a lithographic system; introducing an aberration in a reflective surface in an optical path including the reflective mask, said aberration operative to produce an optical effect
04/04/2006US7022440 Plurality of non-straight lines that are inwardly arched and are formed from plural segments of plural ellipses that are arranged to surround the pattern; for forming a storage electrode of a capacitor of a semiconductor device
04/04/2006US7022437 for use in a photolithographic apparatus includes a blank layer, a layer of patterned opaque material on a surface of the blank layer and a pellicle of perfluoropolyether (PFPE) liquid that covers the surface
04/04/2006US7022436 alternating and attenuating phase shift masks that provide improved resolution of a photolithographic projection apparatus
04/04/2006US7022435 Method for the manufacture of phase shifting masks for EUV lithography
04/04/2006US7022386 Method of forming glossy image
04/04/2006US7022190 Substrate coating unit and substrate coating method