Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
04/2006
04/11/2006US7027127 Exposure apparatus, device manufacturing method, stage apparatus, and alignment method
04/11/2006US7027125 System and apparatus for photolithography
04/11/2006US7027079 Exposure apparatus including a read circuit for reading electrical signals from a plurality of photoelectric converters
04/11/2006US7026629 Lithographic apparatus and device manufacturing method
04/11/2006US7026614 Automatic methods for focus and astigmatism corrections in charged-particle beam instrument
04/11/2006US7026504 Contacting a alkyladamantyl halide with an alkali compound in the presence of a dissolving organic solvent and distilling
04/11/2006US7026497 Improved adhesive strength between a substrate and a photoresist film provided by a bis(photoacid)oxy-)2)amino-)silyl-)amine; no residue left on the substrate after cleaning; semiconductors; photolithography; accuracy; efficiency
04/11/2006US7026459 Azo dyes
04/11/2006US7026416 Fluoropolymer
04/11/2006US7026367 sulfur compounds that generate free radical upon exposure to actinic radiation, for use as activators for addition polymerization reactions; photopolymerization
04/11/2006US7026259 Liquid-filled balloons for immersion lithography
04/11/2006US7026251 Method of optimized stitching for digital micro-mirror device
04/11/2006US7026173 Method and apparatus for detecting end point
04/11/2006US7026106 Exposure method for the contact hole
04/11/2006US7026103 Multiphoton sensitizer capable of simultaneously absorbing at least two photons, an electron acceptor capable of transformation to a dye-activating species upon interaction with the sensitizer after photon absorption
04/11/2006US7026102 Plasma deposited selective wetting material
04/11/2006US7026101 Antireflective coating compositions
04/11/2006US7026099 Coating multilayer films comprising photoresists and radiation sensitive compounds on substrates, then exposing and developing; masking
04/11/2006US7026098 Accurate, uniform, high speed; micropatterns; entire disk surface; unidirectional rotation
04/11/2006US7026097 Planographic printing plate precursor and planographic printing method
04/11/2006US7026096 Electrochemical forming an aluminum oxide layer with porosity, on an aluminum supports, providing heat insulation, heat diffusion for thermography
04/11/2006US7026095 Photosensitive plate
04/11/2006US7026094 oxime sulfonates, e.g., 2-[Cyano-(5-n-propanesulfonyloxyimino-5H-thiophen-2-ylidene)-methyl]-benzoic acid methyl ester with high stability and good solubility in the field of chemically amplified photoresists.
04/11/2006US7026093 Mixtures of alkaline soluble terpolymers and acid generators used to form films for transfering images to substrates
04/11/2006US7026092 vinyl chloride/vinyl acetate copolymer image-receiving surface; hydroxy-terminated polyester having a Tg greater than 50 degrees C. and a molecular weight of 6,000 to 10,000 overlay; cross-linked acrylic subcoat between substrate and coating; good barrier properties & durability; highly transparent
04/11/2006US7026091 Positive photoresist composition and patterning process using the same
04/11/2006US7026082 Method for determining parameters for lithographic projection, a computer system and computer program therefor, a method of manufacturing a device and a device manufactured thereby
04/11/2006US7026080 Positive photosensitive polyimide resin composition
04/11/2006US7026017 Organometallic monoacylalkylphosphines
04/11/2006US7025865 Manufacturing metal masks using a manufacturing method for electroluminescence (EL) devices; dimensional control, precision
04/11/2006US7025646 Microcavity discharge device
04/11/2006US7025514 Development apparatus for manufacturing semiconductor device
04/11/2006US7025498 System and method of measuring thermal expansion
04/11/2006US7025288 Edge remover having a gas sprayer to prevent a chemical solvent from splashing
04/11/2006US7025280 Adaptive real time control of a reticle/mask system
04/11/2006US7024997 Lithography; developed on printing press; imagewise exposure; circulation, filtration ink, water for reuse
04/11/2006US7024996 Measuring electroconductivity; calibration; replacement of developer
04/06/2006WO2006036433A2 Imprint lithography apparatus and method employing an effective pressure
04/06/2006WO2006036253A2 Improved slip film compositions containing layered silicates
04/06/2006WO2006036019A2 Image recording device and image recording method
04/06/2006WO2006036017A1 Method of calibrating alignment section, image-drawing device with calibrated alignment section, and conveying device
04/06/2006WO2006035932A1 Application device and method of preventing application head clogging
04/06/2006WO2006035926A1 Positive photoresist composition for liquid crystal devices
04/06/2006WO2006035925A1 Measurement method, exposure method, and device manufacturing method
04/06/2006WO2006035908A1 Silver paste composition
04/06/2006WO2006035835A1 Magnetic field generation device, electromagnetic actuator, stage device, exposure device, and device manufacturing method
04/06/2006WO2006035807A1 Pattern formation material, pattern formation device, and pattern formation method
04/06/2006WO2006035790A1 Copolymer and upper film-forming composition
04/06/2006WO2006035748A1 Euv generator
04/06/2006WO2006034600A1 Archiving means for permanently storing optically recognisable information
04/06/2006WO2006019416A3 System and method for proximity effect correction in imaging systems
04/06/2006WO2005091069A3 Pressure development apparatus
04/06/2006WO2005083514A3 Method of extending the stability of a photoresist during direct writing of an image
04/06/2006WO2005073813A3 Condenser optic with sacrificial reflective surface
04/06/2006US20060074507 Information providing method and system
04/06/2006US20060074263 Cyclohexyl vinyl ether with acrylic esters and methacrylic esters in fluorine-containing copolymers dissolve in organic solvents and have high transparency; reists
04/06/2006US20060074262 Allowing a compound having a hydroxyl group to react with an alkenyl ether compound in presence of an acid catalyst; forming a protected hydroxy compound; chemical amplification type resist
04/06/2006US20060074209 Uv-cure adhesive composition for optical disk, cured material and goods
04/06/2006US20060074199 Curable resin composition
04/06/2006US20060074139 Acrylic copolymer and radiation-sensitive resin composition
04/06/2006US20060073654 Maintenance system, substrate processing device, remote operation device, and communication method
04/06/2006US20060073425 Pattern designing method, photomask manufacturing method, resist pattern forming method and semiconductor device manufacturing method
04/06/2006US20060073424 Optical coatings
04/06/2006US20060073423 Electronic device manufacture
04/06/2006US20060073420 Resist pattern thickening material, resist pattern and process for forming the same, and semiconductor device and process for manufacturing the same
04/06/2006US20060073418 Method of making a negative-working lithographic printing plate
04/06/2006US20060073417 Photopolymer plate and method for imaging the surface of a photopolymer plate
04/06/2006US20060073412 Positive type photosensitive paste composition for PDP electrode, PDP electrode prepared therefrom, and PDP comprising the PDP electrode
04/06/2006US20060073408 photoresist for use in lithography, exhibiting excellent transparency with respect to the light for use in exposure, having bonding strength to substrates and etch resistance
04/06/2006US20060073398 comprising carbon black, photoinitiator, a photopolymerizable monomer, a binder resin, a epoxy-based monomer containing fluorine, and a solvent; minimizes an ink bleed, improving color property of a liquid crystal display device
04/06/2006US20060073397 Masking arrangement and method for producing integrated circuit arrangements
04/06/2006US20060073396 Multi-exposure semiconductor fabrication mask sets and methods of fabricating such multi-exposure mask sets
04/06/2006US20060072807 Methods and systems for determining a presence of macro and micro defects on a specimen
04/06/2006US20060072225 Layer arrangement provided with a structure producing a diffractive optical effect and a lens-type effect
04/06/2006US20060072219 Mirror holding mechanism in exposure apparatus, and device manufacturing method
04/06/2006US20060072217 Apparatus for positioning an optical element in a structure
04/06/2006US20060072096 Lithography alignment
04/06/2006US20060072095 Exposure method and apparatus, and method for fabricating device
04/06/2006US20060072093 Lithographic projection apparatus and device manufacturing method utilizing two arrays of focusing elements
04/06/2006US20060071184 Gas supply unit, gas supply method and exposure system
04/06/2006US20060071183 Method of manufacturing semiconductor device, semiconductor manufacturing apparatus, and stencil mask
04/06/2006DE19964099B4 Verfahren zur Herstellung dreidimensional angeordneter Leit- und Verbindungsstrukturen für Volumen- und Energieströme A process for producing three-dimensionally arranged leading and connecting structures for volume and energy flows
04/06/2006DE102005044920A1 Preparation of three-dimensional material comprises applying aqueous layer of cold-hardenable duroplastic polymerizable resin on a target surface and irradiating, with polymerization initiator, a part of material to polymerize and harden
04/06/2006DE102005042680A1 Printing plate maker using individually controlled laser diodes has output regulator connected to photoelectric sensor for laser diode output with light incidence plane inclined to plane perpendicular to light incidence direction
04/06/2006DE102004047533A1 Vorrichtung zur Temperierung von Elementen Apparatus for controlling the temperature of elements
04/06/2006DE102004047273A1 Electrically conductive resist, for lithographic procedures for preparing photomasks, comprises polymer or copolymer (having one acid labile group) and a group with delocalized pi electron system (e.g. carbazol group)
04/06/2006DE102004047249A1 Lithographic structurization of photoresist layer, used for producing high-resolution structure, e.g. for microprocessor, memory module or photo-mask, uses relatively low temperature and/or short time for post exposure bake
04/06/2006DE102004046405A1 New electrically conductive polymer, comprising an acid cleavable group and a condensed aromatic group, useful in photo- and/or electron ray sensitive composition, which is useful for structuring a substrate using photo resisting layer
04/06/2006DE10153497B4 Verfahren zur Silylierung von Fotoresists im UV-Bereich Process for the silylation of the photoresist in the UV range
04/05/2006EP1643543A1 Linking unit, exposure apparatus and method for manufacturing device
04/05/2006EP1643542A1 Focus test mask, focus measureing method, and exposure device
04/05/2006EP1643310A1 Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus
04/05/2006EP1643309A1 Method and masks for reducing the impact of stray light in optical lithography
04/05/2006EP1643308A2 Lithographic printing plate comprising a porous non-anodic layer
04/05/2006EP1643307A1 Positive resist composition, resist laminates and process for the formation of resist patterns
04/05/2006EP1643306A1 Resist composition, multilayer body, and method for forming resist pattern
04/05/2006EP1643298A1 Method of manufacturing a liquid crystal display and a mask for use in same
04/05/2006EP1643276A1 Method of manufacturing color filters, method for manufacturing a display device and method for manufacturing an electronic device
04/05/2006EP1642715A1 Method and device for manufacturing relief printing plate terminal for seamless printing
04/05/2006EP1642174A2 Exposure method and apparatus, exposure mask, and device manufacturing method