Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
04/2014
04/22/2014US8703407 Pattern formation method
04/22/2014US8703406 Method of forming large-area masters for replication of transfer lithography templates
04/22/2014US8703405 Methods of generating three-dimensional process window qualification
04/22/2014US8703404 Patterning process
04/22/2014US8703403 Method and apparatus for drying a wafer
04/22/2014US8703402 Resist pattern forming method and developer
04/22/2014US8703401 Method for forming pattern and developer
04/22/2014US8703400 Substrate treatment method, coating treatment apparatus, and substrate treatment system
04/22/2014US8703399 Method of manufacturing display apparatus
04/22/2014US8703397 Method for providing side shields for a magnetic recording transducer
04/22/2014US8703396 Methods of forming patterns
04/22/2014US8703395 Pattern-forming method
04/22/2014US8703394 Method for forming thin film pattern and flat display device having the same
04/22/2014US8703393 Method for fabricating a circuit
04/22/2014US8703392 Method and apparatus for developing process
04/22/2014US8703391 Polymeric matrix materials for infrared metamaterials
04/22/2014US8703390 Method of making a flexographic printing sleeve forme
04/22/2014US8703389 Method and system for forming patterns with charged particle beam lithography
04/22/2014US8703387 Resist composition, method of forming resist pattern, novel compound, and acid generator
04/22/2014US8703386 Metal peroxo compounds with organic co-ligands for electron beam, deep UV and extreme UV photoresist applications
04/22/2014US8703385 Photoresist composition
04/22/2014US8703384 Positive resist composition and patterning process
04/22/2014US8703383 Photosensitive copolymer and photoresist composition
04/22/2014US8703382 Photosensitive resin composition for flexographic printing having excellent solvent resistance
04/22/2014US8703381 Lithographic printing plate precursors for on-press development
04/22/2014US8703369 Method of determining focus and dose of an apparatus of optical micro-lithography
04/22/2014US8703367 Positive photosensitive resin composition
04/22/2014US8703366 Compound, polymerizable composition, color filter, and method of producing the same, solid-state imaging device, and planographic printing plate precursor
04/22/2014US8703363 Reflection hologram storage method
04/22/2014US8702901 Method for manufacturing reflective mask and apparatus for manufacturing reflective mask
04/17/2014WO2014058061A1 Light-degradable material, substrate and method for patterning same
04/17/2014WO2014058018A1 Coating liquid for forming inorganic oxide coating film, inorganic oxide coating film, and display device
04/17/2014WO2014057926A1 Exposure device, exposure method, device production method, program, and recording medium
04/17/2014WO2014057386A1 Positioning device, control device and control method
04/17/2014WO2014057246A1 Registration system for phototools
04/17/2014WO2014056513A1 Illumination system of a microlithographic projection exposure apparatus
04/17/2014WO2014056512A1 Method of operating a microlithographic apparatus
04/17/2014WO2014012660A3 Method for operating a microlithographic projection exposure apparatus
04/17/2014WO2013166348A3 Surface modification of pigments and compositions comprising the same
04/17/2014WO2013100203A3 Apparatus for loading a flexible substrate and a lithography apparatus
04/17/2014US20140106281 Substrate processing method
04/17/2014US20140106280 Lithography methods, methods for forming patterning tools and patterning tools
04/17/2014US20140106278 Dry film resist sheet and method of manufacturing the same
04/17/2014US20140106267 Method of forming an image having multiple phases
04/17/2014US20140106264 Photolithography mask, photolithography mask arrangement, and method for exposing a wafer
04/17/2014US20140106263 Euv mask set and methods of manufacturing euv masks and integrated circuits
04/17/2014US20140106134 Methods of fabricating transparent and nanomaterial-based conductive film
04/17/2014US20140104672 Electrowetting display device
04/17/2014US20140104614 Active Spectral Control During Spectrum Synthesis
04/17/2014US20140104590 Exposure apparatus and method of manufacturing device
04/17/2014US20140104589 Facet mirror device
04/17/2014US20140104588 Projection objective for microlithography
04/17/2014US20140104587 Projection arrangement
04/17/2014US20140104586 Substrate processing method
04/17/2014US20140103270 Radiation-sensitive composition, method for forming pattern, color filter and method of producing the same, and solid-state image sensor
04/17/2014US20140103251 Compositions for use in semiconductor devices
04/17/2014US20140103010 Plasma mediated ashing processes that include formation of a protective layer before and/or during the plasma mediated ashing process
04/17/2014US20140102355 Producing polarization-modulating optical element for microlithography system
04/17/2014DE102013204419A1 Three-dimensional optical single mirror facet for projection exposure system of EUV lighting system, has optical active area attached at support structure, where facet is attached at support structure by attachment element and support part
04/16/2014EP2720285A1 Method of fabricating patterned substrate
04/16/2014EP2720253A1 Illumination optical assembly, exposure device, and device manufacture method
04/16/2014EP2720086A1 Methods of fabricating transparent and nanomaterial-based conductive film
04/16/2014EP2720085A1 Photocurable composition and encapsulated apparatus including barrier layer formed of the same
04/16/2014EP2718767A1 Composition of solutions and conditions for use enabling the stripping and complete dissolution of photoresists
04/16/2014EP2718766A1 Photoresists containing polymer-tethered nanoparticles
04/16/2014EP2718753A1 Color filter, ccd sensor, cmos sensor, organic cmos sensor, and solid-state image sensor
04/16/2014CN203553154U Measurement mark
04/16/2014CN203551947U Wafer roasting device and automatic developing machine with same
04/16/2014CN203551946U Big-table-board LED exposure machine
04/16/2014CN203551945U Collimating mirror adjusting mechanism of exposure machine
04/16/2014CN203551944U Automatic door mechanism of exposure machine
04/16/2014CN103733138A Method for correcting alignment of substrate to be exposed, and exposure device
04/16/2014CN103733137A Resist stripping agent
04/16/2014CN103733136A Underlayer film-forming material for lithography, underlayer film for lithography, and pattern formation method
04/16/2014CN103733135A Resist composition, resist pattern formation method, polyphenol compound used therein, and alcohol compound capable of being derived therefrom
04/16/2014CN103733134A Developable bottom antireflective coating compositions for negative resists
04/16/2014CN103732573A Method for producing tetraalkylammonium salt solution
04/16/2014CN103732410A Single-motor-driven gravure cylinder chuck mechanism
04/16/2014CN103732001A Solder resist layer and printed wiring board
04/16/2014CN103730339A Methods for manufacturing micro/nano scale pattern stamping die
04/16/2014CN103728848A Position detection apparatus, exposure apparatus, and exposure method
04/16/2014CN103728847A Anti-corrosion agent stripping liquid mixing method and device
04/16/2014CN103728846A Photoresist removing liquid recycling system
04/16/2014CN103728845A Developer composition for flat panel display
04/16/2014CN103728844A Rotary screen developer
04/16/2014CN103728843A Electronic shutter for ultraviolet LED (Light Emitting Diode) exposure machine
04/16/2014CN103728842A Adjusting and supporting mechanism of illuminating lens unit of photoetching machine illuminating system
04/16/2014CN103728841A Light converging pattern formation member, exposure method, and device manufacturing method
04/16/2014CN103728840A Coating compositions for photolithography
04/16/2014CN103728839A Photosensitive resin composition for color filter and color filter using the same
04/16/2014CN103728838A Preparation device and preparation method of photoresist
04/16/2014CN103728837A Photosensitive resin combination and method of preparing quantum dot pattern from photosensitive resin combination
04/16/2014CN103728836A Acid generator compounds and photoresists comprising same
04/16/2014CN103728835A Photoacid generator and resist composition comprising same
04/16/2014CN103728834A Photoacid generator and resist composition comprising same
04/16/2014CN103728833A Photosensitive resin composition, protective film and element containing the protective film
04/16/2014CN103721427A Resist stripper regeneration methods and devices
04/16/2014CN103210349B Positive-type photoresist composition
04/16/2014CN102998740B Device and method for simultaneously inscribing multi-wavelength array gratings in ribbon fiber
04/16/2014CN102778813B Photosensitive resin composition
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