| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/13/2006 | US20060078828 on semiconductor wafer; contamination prevented; exposure intensities assigned to each shot area based on location on wafer; linewidth of features formed on partial edge die increased relative to value with exposure intensity at wafer center to compensate for line width reduction occurring at wafer edge |
| 04/13/2006 | US20060078827 Method to restore hydrophobicity in dielectric films and materials |
| 04/13/2006 | US20060078826 Method for manufacture of lithographic printing plate precursor no dampening water |
| 04/13/2006 | US20060078824 Photosensitive element, photosensitive element roll, process for the preparation of resist pattern using the same, resist pattern, resist pattern laminated substrate, process for the preparation of wiring pattern and wiring pattern |
| 04/13/2006 | US20060078820 Resist with reduced line edge roughness |
| 04/13/2006 | US20060078819 Photopolymer composition suitable for lithographic printing plates |
| 04/13/2006 | US20060078818 Near-field exposure photoresist and fine pattern forming method using the same |
| 04/13/2006 | US20060078407 System and method for reticle protection and transport |
| 04/13/2006 | US20060078012 Optical element, optical system, laser device, exposure device, mask testing device and high polymer crystal processing device |
| 04/13/2006 | US20060077506 Methods and systems for improved boundary contrast |
| 04/13/2006 | US20060077374 Step and repeat imprint lithography systems |
| 04/13/2006 | US20060077368 Exposure apparatus and device manufacturing method |
| 04/13/2006 | US20060077367 Exposure apparatus and method for producing device |
| 04/13/2006 | US20060077366 Catadioptric projection objective with geometric beam splitting |
| 04/13/2006 | US20060077365 Exposure method and apparatus |
| 04/13/2006 | US20060077363 Correcting device, exposure apparatus, device production method, and device produced by the device production method |
| 04/13/2006 | US20060077362 Exposure apparatus and device manufacturing method |
| 04/13/2006 | US20060076688 Semiconductor device having improved contact hole structure and method for fabricating the same |
| 04/13/2006 | US20060076591 Solid state image pickup element and method of manufacturing solid state image pickup element |
| 04/13/2006 | US20060076516 Reflective optical element, optical system and EUV lithography device |
| 04/13/2006 | US20060075579 Two-stage laser system for aligners |
| 04/13/2006 | DE19957034B4 Verfahren zur Behandlung von Oberflächen von Substraten und Vorrichtung A process for the surface treatment of substrates and device |
| 04/13/2006 | DE19637425B4 Neue N-Vinyllactam-Derivate und deren Polymere New N-vinyl lactam derivatives and their polymers |
| 04/13/2006 | DE19525745B4 Verfahren zur Bildung eines Abdeckungsmusters A method for forming a resist pattern |
| 04/13/2006 | DE10314152B4 Herstellung von dielektrischen Zwischenschichtfilmen mit einem niedrigen K-Wert unter Verwendung von Si-haltigen Resists Production of interlayer dielectric films with a low K value using Si-containing resist |
| 04/13/2006 | DE102005034991A1 System for radial redistribution of light intensities in an illumination system of a microlithographic projection system has a zoom objective either side of conversion elements |
| 04/13/2006 | DE102004044039A1 Rapid development or production of semiconductor chips with an acid scavenger present is effected using lithographic simulation test runs to determine production parameters and product properties |
| 04/13/2006 | DE102004040534A1 Diffraktives polarisationstrennendes Element für unpolarisierte elektromagnetische Strahlung im UV-Bereich, System mit zwei solchen Elementen und Verfahren zur Herstellung eines solchen Elementes Diffractive polarization-separating element for unpolarized electromagnetic radiation in the UV region, the system having two such elements and methods for manufacturing such element |
| 04/13/2006 | DE10036867B4 Substrat-Bearbeitungsverfahren und -vorrichtung Substrate processing method and apparatus |
| 04/12/2006 | EP1646075A1 Exposure apparatus and method for manufacturing device |
| 04/12/2006 | EP1646074A1 Exposure apparatus and method for manufacturing device |
| 04/12/2006 | EP1646073A1 Illuminating method, exposing method, and device for therefor |
| 04/12/2006 | EP1645912A2 Lithographic printing method |
| 04/12/2006 | EP1645911A1 Lithographic apparatus and device manufacturing method |
| 04/12/2006 | EP1645910A1 Lithographic apparatus and position measuring method |
| 04/12/2006 | EP1645909A2 Photo-curable resin composition comprising a polyimide, a process for forming a pattern therewith, and a substrate protecting film |
| 04/12/2006 | EP1645908A1 Positive resist composition and pattern-forming method using the same |
| 04/12/2006 | EP1645903A1 Wire grid polarizer and fabrication method thereof |
| 04/12/2006 | EP1644778A1 Method for evaluating reproduced images of wafers |
| 04/12/2006 | EP1644777A2 Resist composition |
| 04/12/2006 | EP1644776A2 Methods of removing photoresist from substrates |
| 04/12/2006 | EP1644775A2 Method for analysing objects in microlithography |
| 04/12/2006 | EP1644427A2 Positive photoresist composition and method of forming resist pattern |
| 04/12/2006 | EP1644426A1 Positive photoresist composition and method of forming resist pattern |
| 04/12/2006 | EP1502335A4 Automatic gas control system for a gas discharge laser |
| 04/12/2006 | EP1478516B1 Ir-sensitive composition and on-press developable ir-sensitive printing plates |
| 04/12/2006 | EP1430360A4 Screen printing process |
| 04/12/2006 | EP1391017A4 FOUR KHz GAS DISCHARGE LASER SYSTEM |
| 04/12/2006 | EP1285221B1 In-situ mirror characterization |
| 04/12/2006 | EP1123520A4 Wavelength tuning of photo-induced gratings |
| 04/12/2006 | EP1046958B1 Use of a composition for bottom reflection preventive film |
| 04/12/2006 | CN1759467A Extreme ultraviolet light source and target for extreme ultraviolet light source |
| 04/12/2006 | CN1759348A Chemical amplification type positive resist composition |
| 04/12/2006 | CN1759314A Micro fluid device and process for producing the same |
| 04/12/2006 | CN1759088A Alicyclic unsaturated compound, polymer, chemically amplified resist composition and method for forming pattern using said composition |
| 04/12/2006 | CN1758818A Donor substrate for laser induced thermal imaging and method of fabricating organic light emitting display using the same substrate |
| 04/12/2006 | CN1758144A Photorresist stripping liquid composite |
| 04/12/2006 | CN1758143A Lithographic apparatus and device manufacturing method |
| 04/12/2006 | CN1758142A Decompression dry device and method |
| 04/12/2006 | CN1758141A Coating compositions for use with an overcoated photoresist |
| 04/12/2006 | CN1758140A Lithographic apparatus and position measuring method |
| 04/12/2006 | CN1758139A A method of performing resist process calibration and optimisation diffractive optical element (DOE) |
| 04/12/2006 | CN1758138A Multi-exposure semiconductor fabrication mask sets and methods of fabricating such multi-exposure mask sets |
| 04/12/2006 | CN1758121A Method for improving assembling deviation of liquid crystal display panel and manufacturing technology of liquid crystal panel |
| 04/12/2006 | CN1758073A Micro mirror and method of manufacturing the same |
| 04/12/2006 | CN1758014A Interferometer systems for measuring displacement and exposure systems using the same |
| 04/12/2006 | CN1757622A 2-hydroxy-3-alkoxypropyl sulfides, sulfones, and sulfoxides: new surface active agents |
| 04/12/2006 | CN1757439A Substrate processing device and method |
| 04/12/2006 | CN1251309C Inorganic anti-reflection film SiON surface treating method for photo-etching |
| 04/12/2006 | CN1251305C Offset printing equipment, device producing method and produced device thereby |
| 04/12/2006 | CN1251304C Manufacturing process of integrated aligning mark and channel component element |
| 04/12/2006 | CN1251303C Method for producing integrated circuit |
| 04/12/2006 | CN1251030C Photoresist developer compositions |
| 04/12/2006 | CN1251029C Photo-etching equipment and device making process |
| 04/12/2006 | CN1251028C Lighting device and method for producing exposure device using same and device thereof |
| 04/12/2006 | CN1251027C Concave spherical photo-etching rose engine |
| 04/12/2006 | CN1251026C Offset printing projection device |
| 04/12/2006 | CN1251025C Pattern plotter method and mfg. method of pattern plotter body |
| 04/12/2006 | CN1251024C Method for making micro-structure unit |
| 04/12/2006 | CN1251023C Lithographic printing fore-body |
| 04/12/2006 | CN1251022C Photoresist and associated processes for microlithography |
| 04/12/2006 | CN1251021C Photoresist compositions comprising polycyclic polymers with acid labile pendant groups |
| 04/12/2006 | CN1251020C Light mask and making method thereof |
| 04/12/2006 | CN1250962C Preparing method of integrated capillary electrophoresis electrochemical luminescence detecting chip |
| 04/12/2006 | CN1250574C Free-radical polymerised compound |
| 04/11/2006 | US7028285 Standard cell design incorporating phase information |
| 04/11/2006 | US7027888 Semiconductor manufacturing apparatus |
| 04/11/2006 | US7027381 Laser drawing apparatus, laser drawing method, a master for manufacturing hologram, and manufacturing method thereof |
| 04/11/2006 | US7027237 Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method |
| 04/11/2006 | US7027235 Optical system for providing a useful light beam influenced by polarization |
| 04/11/2006 | US7027227 Three-dimensional structure forming method |
| 04/11/2006 | US7027226 Diffractive optical element for extreme ultraviolet wavefront control |
| 04/11/2006 | US7027206 Spatial light modulator, spatial light modulator array, and image formation apparatus |
| 04/11/2006 | US7027164 Speckle reduction method and system for EUV interferometry |
| 04/11/2006 | US7027156 patterned layer is formed by curing an activating light curable liquid disposed on a substrate in the presence of a patterned template; particularly useful for micro- and nano-imprint lithography processes |
| 04/11/2006 | US7027132 Lithographic apparatus and device manufacturing method |
| 04/11/2006 | US7027131 Exposure apparatus |
| 04/11/2006 | US7027130 Device and method for determining an illumination intensity profile of an illuminator for a lithography system |
| 04/11/2006 | US7027129 System for laser beam expansion without expanding spatial coherence |
| 04/11/2006 | US7027128 Exposure apparatus, maintenance method therefor, semiconductor device manufacturing method, and semiconductor manufacturing factory |