| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/19/2006 | CN1760757A Radioactivity sensitive resin composition |
| 04/19/2006 | CN1760756A Radioactivity sensitive resin composition |
| 04/19/2006 | CN1760755A Apparatus for exposing a substrate, photomask and modified illuminating system of the apparatus, and method of forming a pattern on a substrate using the apparatus |
| 04/19/2006 | CN1760754A Methods for aligning patterns on a substrate based on optical properties of a mask layer and related devices |
| 04/19/2006 | CN1760743A Etching composition of thin-film transistor LCD |
| 04/19/2006 | CN1760742A Etching composition of thin-film transistor LCD |
| 04/19/2006 | CN1252800C Method for mfg. semiconductor |
| 04/19/2006 | CN1252798C Nozzle cleaning device and substrate processing device with the nozzle cleaning device |
| 04/19/2006 | CN1252544C Proximity effect correction method of electronic beam exposure and use thereof |
| 04/19/2006 | CN1252543C Monitoring and etching method |
| 04/19/2006 | CN1252542C Ultra-precise silicon wafer positioning system with balance weight damping apparatus |
| 04/19/2006 | CN1252541C Photoresist composition containing cycloolefine polymer and hydrophobic-non-stero superfatted cyclic additive |
| 04/19/2006 | CN1252540C Negative pressure fully automatic upper/lower sheet device of laser plotter |
| 04/19/2006 | CN1252539C Reflector utilizing microimage to make exposure and its production method |
| 04/19/2006 | CN1252538C Lithographic apparatus and device manufacturing method |
| 04/19/2006 | CN1252530C Method for producing light interference display unit |
| 04/19/2006 | CN1252529C Method of increasing the conductivity of a transparent conductive layer |
| 04/19/2006 | CN1252514C Videograph processing devices |
| 04/19/2006 | CN1252504C Correction component, holding device exposure device and equipment manufacturing method |
| 04/19/2006 | CN1252501C Severeness type Mach-Zehnder interference structure and fabricating method thereof |
| 04/19/2006 | CN1252042C Oximate light initiator |
| 04/19/2006 | CN1251961C Soft lithography and tearing technology for colloid crystal microprocessing of pattern |
| 04/19/2006 | CN1251864C Lithographic printing plate front body and method for producing lithographic printing plate |
| 04/18/2006 | US7032209 Mask pattern and method for forming resist pattern using mask pattern thereof |
| 04/18/2006 | US7031848 Real time analysis of periodic structures on semiconductors |
| 04/18/2006 | US7031796 Radiation damage reduction |
| 04/18/2006 | US7031082 Retainer, exposure apparatus, and device fabrication method |
| 04/18/2006 | US7031077 Optical reduction method with elimination of reticle diffraction induced bias |
| 04/18/2006 | US7031069 Microlithographic illumination method and a projection lens for carrying out the method |
| 04/18/2006 | US7030998 Phase measurement apparatus for measuring characterization of optical thin films |
| 04/18/2006 | US7030997 Characterizing aberrations in an imaging lens and applications to visual testing and integrated circuit mask analysis |
| 04/18/2006 | US7030994 Method and apparatus to measure fiber optic pickup errors in interferometry systems |
| 04/18/2006 | US7030993 Athermal zero-shear interferometer |
| 04/18/2006 | US7030984 Fast wafer positioning method for optical metrology |
| 04/18/2006 | US7030967 Lithographic apparatus, device manufacturing method and substrate holder |
| 04/18/2006 | US7030966 Lithographic apparatus and method for optimizing an illumination source using photolithographic simulations |
| 04/18/2006 | US7030965 Catadioptric system and exposure device having this system |
| 04/18/2006 | US7030964 Stage system, exposure apparatus, and device manufacturing method |
| 04/18/2006 | US7030963 Lithographic apparatus and device manufacturing method |
| 04/18/2006 | US7030962 Projection exposure mask, projection exposure apparatus, and projection exposure method |
| 04/18/2006 | US7030961 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 04/18/2006 | US7030960 Exposure apparatus and purging method for the same |
| 04/18/2006 | US7030958 Optical attenuator device, radiation system and lithographic apparatus therewith and device manufacturing method |
| 04/18/2006 | US7030957 Monitoring apparatus and method particularly useful in photolithographically processing substrates |
| 04/18/2006 | US7030506 Mask and method for using the mask in lithographic processing |
| 04/18/2006 | US7030467 Method of deforming a pattern and semiconductor device formed by utilizing deformed pattern |
| 04/18/2006 | US7030201 of a polymer containing units of an imide-substituted acrylate type monomer and a crosslinking agent; making the monomer by reacting glycidyl methacrylate and succinimide for example; useful in making semiconductor devices by photolithographic techniques, improved etch-rate |
| 04/18/2006 | US7030170 Photosensitive resin composition, dry film, and workpiece using the same |
| 04/18/2006 | US7030169 Arylsulfinate salts in initiator systems for polymeric reactions |
| 04/18/2006 | US7030040 Selectively growing a polymeric material on a semiconductor substrate |
| 04/18/2006 | US7030039 Method of uniformly coating a substrate |
| 04/18/2006 | US7029996 Methods for producing uniform large-grained and grain boundary location manipulated polycrystalline thin film semiconductors using sequential lateral solidification |
| 04/18/2006 | US7029992 Low oxygen content photoresist stripping process for low dielectric constant materials |
| 04/18/2006 | US7029954 Tape stiffener, semiconductor device component assemblies including same, and stereolithographic methods for fabricating same |
| 04/18/2006 | US7029832 Patterning substrate of photoresist; removal immersion layer; development |
| 04/18/2006 | US7029830 1-10 micrometer thick crystaline membrane surrounded by a frame of a bulk type crystalline material |
| 04/18/2006 | US7029827 After forming a resist film from a positive chemically amplified resist material, performing insolubilization treatment for making the surface of resist film insoluble in developer, pattern exposing, then developing the film |
| 04/18/2006 | US7029826 Contacting silica dielectric film with plasma comprising at least one surface modification agent, at a concentration, and for a time period, effective to render the silica dielectric film hydrophobic |
| 04/18/2006 | US7029825 Uniformity in thickness and high dimensional precision, but also enables easy laser engraving without suffering problems caused by the generation of debris |
| 04/18/2006 | US7029824 Color proofing films and photoresists produced with aluminum or polyester substrates |
| 04/18/2006 | US7029823 Resist composition |
| 04/18/2006 | US7029822 Photoresists; non-aromatic cyclic olefin (homo or co )polymer |
| 04/18/2006 | US7029821 Porosity filter; microelectronics ; filtration using polyamide filter; reduction of defects |
| 04/18/2006 | US7029820 Support for lithographic printing plate and presensitized plate and method of producing lithographic printing plate |
| 04/18/2006 | US7029808 Photosensitive coating material for a substrate and process for exposing the coated substrate |
| 04/18/2006 | US7029805 Imageable element with masking layer comprising betaine-containing co-polymers |
| 04/18/2006 | US7029802 Embedded bi-layer structure for attenuated phase shifting mask |
| 04/18/2006 | US7029799 Dividing pattern into zones; drawing |
| 04/18/2006 | US7029526 shearing/salt-kneading a halogenated phthalocyanine pigment with a yellow pigment of the disazo condensation, barbituric acid or azoquinolone series |
| 04/13/2006 | WO2006039204A2 A method and apparatus for polarizing electromagnetic radiation |
| 04/13/2006 | WO2006039161A2 Method and system for contamination detection and monitoring in a lithographic exposure tool and operating method for the same under controlled atmospheric conditions |
| 04/13/2006 | WO2006038723A1 Matte agent for infrared-sensitive planographic printing plate and use thereof |
| 04/13/2006 | WO2006038635A1 Positive resist composition and method of forming resist pattern |
| 04/13/2006 | WO2006038563A1 Linear motor, stage apparatus and exposure apparatus |
| 04/13/2006 | WO2006038477A1 Polymer compound, positive resist composition and method for forming resist pattern |
| 04/13/2006 | WO2006038387A1 Polymer, positive resist composition, and method of forming resist pattern |
| 04/13/2006 | WO2006037651A1 Optical projection system |
| 04/13/2006 | WO2006037494A2 Device for adjusting the temperature of elements |
| 04/13/2006 | WO2006019581A3 Apparatus and method for thermally developing flexographic printing elements |
| 04/13/2006 | WO2006008251A3 Process for the photoactivation and use of a catalyst by an inverted two-stage procedure |
| 04/13/2006 | WO2006008250A3 Oxime derivatives and the use therof as latent acids |
| 04/13/2006 | WO2005124456A3 Photopolymerisable composition |
| 04/13/2006 | WO2005114328A3 Quartz glass blank and method for producing said blank |
| 04/13/2006 | WO2005106593A3 Method and apparatus for measurement of exit pupil transmittance |
| 04/13/2006 | WO2005093517A3 Information management and tracking system (imts) |
| 04/13/2006 | WO2005091075A3 Method for producing a base material for screen printing, and base material of this type |
| 04/13/2006 | WO2005083517A3 Illumination system for a microlithography projection exposure installation |
| 04/13/2006 | WO2005083512A3 Illumination system for a microlithography projection exposure installation |
| 04/13/2006 | WO2005054948A3 Device and method for large area lithography |
| 04/13/2006 | WO2005029178A8 A system and method for the direct imaging of color filters |
| 04/13/2006 | WO2005007747A3 Photosensitive silsesquioxane resin |
| 04/13/2006 | US20060079985 Inline connection setting method and device and substrate processing devices and substrate processing system |
| 04/13/2006 | US20060079628 Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent |
| 04/13/2006 | US20060079593 Hexaarylbiimidazole compounds and photopolymerization initiator compositions containing the same |
| 04/13/2006 | US20060079592 Photo-curable coating composition for hard protective coat and coated article |
| 04/13/2006 | US20060079096 Substrate processing method and substrate processing apparatus |
| 04/13/2006 | US20060079091 Mask, method of producing the same, and method of producing semiconductor device |
| 04/13/2006 | US20060079067 Methods for aligning patterns on a substrate based on optical properties of a mask layer and related devices |
| 04/13/2006 | US20060078831 Multiphoton curing to provide encapsulated optical elements |
| 04/13/2006 | US20060078829 surface of the resist-material layer is modified, and then the thick-film-paste-material layer is formed thereon, so that there can be reliably avoided the problem that the resist-material layer is dissolved by the thick-film-paste-material layer |