| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 04/25/2006 | US7033722 For recording images by infrared scanning exposure based on digital signals; improved on-machine development quality, photosensitivity, and high printing durability |
| 04/25/2006 | US7033711 Aperture ratio or resolution of an OLED device by limiting the edge taper region |
| 04/25/2006 | US7033710 first material is nonlinear and has a refractive index that changes at high intensities but has a constant refractive index equal to the second material that has a constant refractive index, regardless of intensity; a coating phase shifts exiting filtered light; deep ultraviolet lithography |
| 04/25/2006 | US7033709 masking; selectively coding the spaced regions to define a masked read only memory (ROM) structure that causes optical interference; illumination; development; improved circuit density and reliability; miniaturization; integrated circuits |
| 04/25/2006 | US7033708 Image focus monitor for alternating phase shift masks |
| 04/25/2006 | US7033160 Convection cooling techniques in selective deposition modeling |
| 04/25/2006 | US7033089 Method of developing a resist film and a resist development processor |
| 04/25/2006 | US7032793 Ticket dispensing device, installation and displays |
| 04/25/2006 | US7032516 Printing process employing development-on-press type printing plate material |
| 04/25/2006 | US7032514 Planographic printing method, original printing plate and printing press |
| 04/25/2006 | US7032512 Reduce or eliminate ridges at the edges of printing plate, by reducing UV exposure to the edges, spraying masking material, automatic control the spray movement by computer, materials handling |
| 04/25/2006 | CA2127203C Epoxy acrylates |
| 04/20/2006 | WO2006041645A2 Lithography processes using phase change compositions |
| 04/20/2006 | WO2006041208A1 Tracing method and apparatus |
| 04/20/2006 | WO2006041201A1 Tracing method and apparatus |
| 04/20/2006 | WO2006041106A1 Resist composition containing organic solvent soluble dye and color filter using the same |
| 04/20/2006 | WO2006041100A1 Exposure apparatus and device manufacturing method |
| 04/20/2006 | WO2006041091A1 Exposure apparatus maintenance method, exposure apparatus, device manufacturing method and liquid recovering member for immersion exposure apparatus maintenance |
| 04/20/2006 | WO2006041086A1 Exposure device, exposure method, and device manufacturing method |
| 04/20/2006 | WO2006041083A1 Exposure apparatus, exposure method and device manufacturing method |
| 04/20/2006 | WO2006041028A1 Treatment liquid supply device |
| 04/20/2006 | WO2006040956A1 Composition for forming bottom coating for lithography containing metal oxide |
| 04/20/2006 | WO2006040949A1 Positive resist composition for immersion exposure and method of forming resist pattern |
| 04/20/2006 | WO2006040922A1 Composition for forming bottom anti-reflective coating containing aromatic sulfonic acid ester compound and light photoacid-generating agent |
| 04/20/2006 | WO2006040921A1 Sulfur-atom-containing composition for forming of lithographic antireflection film |
| 04/20/2006 | WO2006040918A1 Composition for forming of lithographic antireflection film, containing nitrogenous aromatic ring structure |
| 04/20/2006 | WO2006040890A1 Exposure device and device manufacturing method |
| 04/20/2006 | WO2006040347A1 Calibration of optical line shortening measurements |
| 04/20/2006 | WO2006040344A1 Method for producing microcavities by hybrid organic-inorganic imprint lithography technology |
| 04/20/2006 | WO2006040184A2 Illumination system for a microlithographic projection exposure apparatus |
| 04/20/2006 | WO2006039810A1 Photoactive compositions and preparation thereof |
| 04/20/2006 | WO2005109096A3 Roller chain for applying pressure |
| 04/20/2006 | WO2005062130A3 Utilities transfer system in a lithography system |
| 04/20/2006 | WO2005049681A3 Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
| 04/20/2006 | WO2005026837A3 Imprint lithographic method, and device and stamp for use in imprint lithography |
| 04/20/2006 | WO2004073379A3 Optical lithography using both photomask surfaces |
| 04/20/2006 | US20060084013 Developing solution composition and process for forming image using the composition |
| 04/20/2006 | US20060084012 Decal transfer lithography |
| 04/20/2006 | US20060084011 Printed wiring board manufacturing method |
| 04/20/2006 | US20060084010 Lithographic process |
| 04/20/2006 | US20060084008 Chemically fused printing plate eliminates the need for an adhesive to secure the compressible layer to the back; production of newspapers and decorative printing of packaging media; photopolymerization of urethane acrylates; microspheres |
| 04/20/2006 | US20060083993 Process for the production of photomasks for structuring semiconductor substrates by optical lithography |
| 04/20/2006 | US20060082792 Overlay targets with isolated, critical-dimension features and apparatus to measure overlay |
| 04/20/2006 | US20060082775 Mark position detecting apparatus |
| 04/20/2006 | US20060082755 Stage system, exposure apparatus, and device manufacturing method |
| 04/20/2006 | US20060082750 Compensation of reflective mask effects in lithography systems |
| 04/20/2006 | US20060082744 Exposure method, exposure apparatus, and method for producing device |
| 04/20/2006 | US20060082743 Apparatus and method for removing contaminant on original, method of manufacturing device, and original |
| 04/20/2006 | US20060082379 Parallel, individually addressable probes for nanolithography |
| 04/20/2006 | US20060082225 Linear motor, moving stage system, exposure apparatus, and device manufacturing method |
| 04/20/2006 | US20060081792 Alignment systems and methods for lithographic systems |
| 04/20/2006 | US20060081791 Alignment systems and methods for lithographic systems |
| 04/20/2006 | US20060081790 Alignment systems and methods for lithographic systems |
| 04/20/2006 | US20060081674 Ticket dispensing device, installation and displays |
| 04/20/2006 | US20060081142 System for thermal development of flexographic printing plates |
| 04/20/2006 | DE10312003B4 Verfahren zur Herstellung eines transmissiven doppelbrechend wirkenden optischen Elements sowie transmissives doppelbrechend wirkendes optisches Element A method for producing a transmissive birefringent acting optical element and a transmissive birefringent optical element acting |
| 04/20/2006 | DE102005048652A1 Producing a miniaturized component by photolithography comprises attenuating the light with a position-dependent attenuation distribution which is determined as a function of a wavefront measurement |
| 04/20/2006 | DE102005025398A1 Maskenrohling, Herstellungsverfahren für eine Phasenänderungsmaske und Herstellungsverfahren für eine Form Mask blank manufacturing method of a phase change mask and fabrication method of a mold |
| 04/20/2006 | DE102005004392A1 Resistmuster-Verdickungsmaterial und Verfahren zum Ausbilden von Resistmustern, und Halbleitervorrichtung und Prozess zur Herstellung derselben Resist pattern thickening material and process for forming resist patterns, and semiconductor device and process for producing the same |
| 04/20/2006 | DE102004051662B3 Verfahren zur Herstellung von Submikronstrukturen A process for the production of submicron structures |
| 04/20/2006 | DE102004050868A1 Niedrigviskose, strahlungshärtbare Formulierung zur Herstellung von Ohrpassstücken Low viscosity, radiation-curable formulation for the production of earpieces |
| 04/20/2006 | DE102004047661A1 Samples projecting method for use during integrated circuit manufacturing, involves structuring wafer layers with samples, and transferring correction parameters that are calculated as function of overlap values to wafer scanner and stepper |
| 04/20/2006 | DE102004047624A1 Semiconductor wafer overlapping accuracy correction method for production of integrated circuit, involves computing deflection of wafer from measuring values determined from alignment marks and correcting parameters based on deflection |
| 04/20/2006 | DE102004022016B4 Forming a pattern on a semiconductor substrate layer comprises applying a photosensitive resist to the substrate, exposing the resist and heating |
| 04/20/2006 | DE102004005242B4 Verfahren und Vorrichtung zur plasmabasierten Erzeugung intensiver kurzwelliger Strahlung Method and apparatus for plasma-based production of intense short-wave radiation |
| 04/19/2006 | EP1648005A1 Electric double layer capacitor |
| 04/19/2006 | EP1647866A1 Lithographic apparatus and device manufacturing method |
| 04/19/2006 | EP1647865A1 Lithographic apparatus and device manufacturing method |
| 04/19/2006 | EP1647864A1 Lithographic apparatus and device manufacturing method |
| 04/19/2006 | EP1647863A2 Lithographic apparatus, device manufacturing method |
| 04/19/2006 | EP1647862A1 Lithographic apparatus and device manufacturing method |
| 04/19/2006 | EP1647861A1 Lithographic apparatus and device manufacturing method |
| 04/19/2006 | EP1647860A1 Adhesion improver for photosensitive resin composition and photosensitive resin composition containing same |
| 04/19/2006 | EP1647053A2 Method for producing an anisotropic conductive film |
| 04/19/2006 | EP1646915A2 Lithographic projection apparatus, purge gas supply system and gas purging method |
| 04/19/2006 | EP1646914A2 Dissolution inhibitors in photoresist compositions for microlithography |
| 04/19/2006 | EP1646913A2 Methods and systems for inspection of wafers and reticles using designer intent data |
| 04/19/2006 | EP1646912A2 High resolution, dynamic positioning mechanism for specimen inspection and processing |
| 04/19/2006 | EP1646493A2 Viscosity reducible radiation curable resin composition |
| 04/19/2006 | EP1646485A2 A method of manufacturing a mould for producing an optical surface, a method of producing a contact lens and a device for use with these methods |
| 04/19/2006 | EP1444552B1 Method for reuse of loaded developer |
| 04/19/2006 | EP1257881B1 Laser imaged printing plates comprising a multi-layer slip film |
| 04/19/2006 | EP1192421A4 A non-invasive system and method for diagnosing potential malfunctions of semiconductor equipment components |
| 04/19/2006 | EP1171800B1 Stamp for use in a lithographic process, method of manufacturing a stamp, and method of manufacturing a patterned layer on a substrate |
| 04/19/2006 | EP1107859A4 Method for making optical masters using incoherent light |
| 04/19/2006 | EP1084452A4 Process for producing purified solutions of blocked polyhydroxystyrene resins |
| 04/19/2006 | EP0950923B1 Photosensitive resin composition and flexographic resin plate |
| 04/19/2006 | CN1761915A Photoresist composition for the formation of thick films |
| 04/19/2006 | CN1761913A Method of manufacturing mask blank |
| 04/19/2006 | CN1761907A Optical element, optical system, laser device, exposure device, mask testing device and high polymer crystal processing device |
| 04/19/2006 | CN1761549A System and method for cutting using a variable astigmatic focal beam spot |
| 04/19/2006 | CN1761036A Method for fabricating semiconductor device using tungsten as sacrificial hard mask |
| 04/19/2006 | CN1760765A Method for adjusting compositions of developing solution, and toning system |
| 04/19/2006 | CN1760764A Lithographic apparatus and device manufacturing method |
| 04/19/2006 | CN1760763A Lithographic apparatus, device manufacturing method |
| 04/19/2006 | CN1760762A Lithographic apparatus and device manufacturing method |
| 04/19/2006 | CN1760761A System and method in use for determining half-and-half folded compensating parameter |
| 04/19/2006 | CN1760760A Accurate magnetic suspension worktable for photo etching under extra ultraviolet |
| 04/19/2006 | CN1760759A Bi-directional butt jointed exposure method for grating ruler |
| 04/19/2006 | CN1760758A Radioactivity sensitive resin composition |