| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/27/2006 | US20060087738 High-efficiency spectral purity filter for euv lithography |
| 04/27/2006 | US20060087726 Catoptric projection optical system |
| 04/27/2006 | US20060087659 Low walk-off interferometer |
| 04/27/2006 | US20060087639 System and method for using a two part cover for and a box for protecting a reticle |
| 04/27/2006 | US20060087638 Substrate conveyor apparatus, substrate conveyance method and exposure apparatus |
| 04/27/2006 | US20060087633 Projection optical system, exposure apparatus, and exposure method |
| 04/27/2006 | US20060086910 Alignment systems and methods for lithographic systems |
| 04/27/2006 | US20060086372 Composition for the removing of sidewall residues |
| 04/27/2006 | US20060086371 Particle remover, exposure apparatus having the same, and device manufacturing method |
| 04/27/2006 | US20060086273 Lithographic printing plate comprising a porous non-anodic layer |
| 04/27/2006 | DE19721693B4 Photoresists mit Photoresist Vinyl-4-Tetrahydropyranyloxybenzal-Vinyl-4-Hydroxybenzal-Vinyltetrahydropyranylether-Vinylacetat-Copolymer und mit Vinyl-4-Tetrahydropyranyloxybenzal-Vinyltetrahydropyranylether-Vinylacetat-Copolymer and vinyl 4-Tetrahydropyranyloxybenzal-Vinyltetrahydropyranylether-vinyl acetate copolymer |
| 04/27/2006 | DE19706495B4 Verfahren zur Herstellung einer Halbleitervorrichtung unter Verwendung fein getrennter Resistmuster A method for manufacturing a semiconductor device using finely separated resist pattern |
| 04/27/2006 | DE10344777B4 Stempelvorrichtung für Softlithografie und Verfahren zu deren Herstellung A stamp device for soft lithography and methods for their preparation |
| 04/27/2006 | DE10344275B4 Verfahren zur gesteuerten Strukturierung einer ARC-Schicht in einer Halbleitereinrichtung A method of controlling the texture of an ARC layer in a semiconductor device |
| 04/27/2006 | DE102005049089A1 Image formation device, has light conductors directing part of light beams to receiving surfaces of photoelectric sensors such that sensors are connected with control device |
| 04/27/2006 | DE102005048262A1 Verfahren und Vorrichtung zum Verteilen von Photoresist beim Herstellen von Halbleitervorrichtungen oder dergleichen Method and apparatus for distributing photoresist in the manufacture of semiconductor devices or the like |
| 04/27/2006 | DE102005047475A1 Mehrbelichtungs-Halbleiterherstellungsmaskensätze und Verfahren zum Herstellen von solchen Mehrbelichtungsmaskensätzen More exposure semiconductor manufacturing mask sets and processes for preparing such multi-exposure mask sets |
| 04/27/2006 | DE102004050642A1 Verfahren zur Überwachung von Parametern eines Belichtungsgerätes für die Immersionslithographie und Belichtungsgerät für die Immersionslithographie A method for monitoring parameters of an exposure apparatus for immersion lithography exposure apparatus and for immersion lithography |
| 04/27/2006 | DE102004050277A1 Verfahren und Vorrichtung zur Herstellung von fotopolymerisierbaren, zylindrischen, endlos-nahtlosen Flexodruckelementen Method and apparatus for the production of photopolymerizable cylindrical, continuous seamless flexographic printing |
| 04/27/2006 | DE10119490B4 Verfahren und Vorrichtung zum Prozessieren von Substraten Method and apparatus for processing substrates |
| 04/27/2006 | CA2583739A1 High resistivity compositions |
| 04/26/2006 | EP1650787A1 Inspection method and inspection device for projection optical system, and production method for projection optical system |
| 04/26/2006 | EP1650786A1 Focusing optical system, light source unit, illumination optical apparatus, and exposure apparatus |
| 04/26/2006 | EP1650605A1 Developing solution for photosensitive composition and method for forming patterned resist film |
| 04/26/2006 | EP1650604A2 Apparatus and method for supporting and thermally conditioning a substrate, a support table, a chuck and a lithographic apparatus comprising said support table |
| 04/26/2006 | EP1650603A1 Lithographic apparatus and gas flow conditioner |
| 04/26/2006 | EP1650602A1 A system and a method for generating periodic and /or quasi-periodic pattern on a sample |
| 04/26/2006 | EP1650601A2 Photosensitive resin composition for optical waveguides, and optical waveguide and manufacturing method thereof |
| 04/26/2006 | EP1650250A1 Silicon-containing polymer, process for rpoducing the same, heat-resistant resin composition, and heat-resistant film |
| 04/26/2006 | EP1649926A1 Process for the recovery of surfactants |
| 04/26/2006 | EP1649503A2 Process sequence for photoresist stripping and/or cleaning of photomasks for integrated circuit manufacturing |
| 04/26/2006 | EP1649480A1 Master mold for duplicating fine structure and production method thereof |
| 04/26/2006 | EP1649325A2 Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system |
| 04/26/2006 | EP1649324A2 An illumination system for microlithography |
| 04/26/2006 | EP1649323A2 Method for correcting critical dimension variations in photomasks |
| 04/26/2006 | EP1649319A1 Method of manufacturing a reflector, and liquid crystal display device including such a reflector |
| 04/26/2006 | EP1499464A4 Method and apparatus for production of a cast component |
| 04/26/2006 | EP1325386A4 Silica-based light-weight euv lithography stages |
| 04/26/2006 | CN1765019A ARC layer for semiconductor device |
| 04/26/2006 | CN1764873A Method of controlling the differential dissolution rate of photoresist compositions |
| 04/26/2006 | CN1764872A Transparent, highly heat-resistant polyimide precursor and photosensitive polyimide composition thereof |
| 04/26/2006 | CN1764675A Auxiliary for forming fine pattern and process for producing the same |
| 04/26/2006 | CN1764350A Method for removing resin mask layer and method for manufacturing solder bumped substrate |
| 04/26/2006 | CN1763916A Substrate processing apparatus |
| 04/26/2006 | CN1763636A Lithographic apparatus and device manufacturing method |
| 04/26/2006 | CN1763635A Lithographic apparatus and device manufacturing method |
| 04/26/2006 | CN1763634A Supporting rack |
| 04/26/2006 | CN1763633A Pattern formation method and exposure system |
| 04/26/2006 | CN1763614A Exposure process |
| 04/26/2006 | CN1253871C Optical disk original disk exposure device and method, and pinhole mechanism |
| 04/26/2006 | CN1253759C Photoresists, polymers and process for microlithography |
| 04/26/2006 | CN1253485C Polymeric compositions and uses therefor |
| 04/26/2006 | CN1253249C Photoresist painting method |
| 04/25/2006 | US7036108 Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution era |
| 04/25/2006 | US7035759 Position detecting method and apparatus |
| 04/25/2006 | US7035516 Froming undercladding coating on substrate; overcoating with photosensitive polyimide; irradiation; forming patterns through mask;imidation a polyamic acids by heating |
| 04/25/2006 | US7035446 Quality measurement of an aerial image |
| 04/25/2006 | US7035306 Method of assaying fluorite sample and method of producing fluorite crystal |
| 04/25/2006 | US7035056 Piezoelectric actuator and a lithographic apparatus and a device manufacturing method |
| 04/25/2006 | US7035001 High NA system for multiple mode imaging |
| 04/25/2006 | US7034998 Method of connecting a multiplicity of optical elements to a basic body |
| 04/25/2006 | US7034986 Pattern generator mirror configurations |
| 04/25/2006 | US7034924 Lithographic apparatus and device manufacturing method |
| 04/25/2006 | US7034923 Optical element, lithographic apparatus comprising such optical element and device manufacturing method |
| 04/25/2006 | US7034922 Exposure apparatus and exposure method |
| 04/25/2006 | US7034921 Light receiving apparatus, mark detecting apparatus using light receiving apparatus, exposing apparatus, maintenance method of exposing apparatus, manufacturing method of semiconductor device using exposing apparatus and semiconductor manufacturing plant |
| 04/25/2006 | US7034920 Balanced positioning system for use in lithographic apparatus |
| 04/25/2006 | US7034919 Method and apparatus for providing lens aberration compensation by illumination source optimization |
| 04/25/2006 | US7034918 Exposure apparatus, maintenance method therefor, semiconductor device manufacturing method using the apparatus, and semiconductor manufacturing factory |
| 04/25/2006 | US7034917 Lithographic apparatus, device manufacturing method and device manufactured thereby |
| 04/25/2006 | US7034857 Light and thermal energy image-recording apparatus |
| 04/25/2006 | US7034854 Methods and apparatus for ink delivery to nanolithographic probe systems |
| 04/25/2006 | US7034409 Method of eliminating photoresist poisoning in damascene applications |
| 04/25/2006 | US7034332 Nanometer-scale memory device utilizing self-aligned rectifying elements and method of making |
| 04/25/2006 | US7034322 Fluid jet electric discharge source |
| 04/25/2006 | US7034321 Electron beam exposure apparatus and electron beam measurement module |
| 04/25/2006 | US7034320 Dual hemispherical collectors |
| 04/25/2006 | US7034318 Method of manufacturing semiconductor device, semiconductor manufacturing apparatus, and stencil mask |
| 04/25/2006 | US7034314 Projection apparatus for projecting a pattern formed on a mask onto a substrate and a control method for a projection apparatus |
| 04/25/2006 | US7034308 Radiation system, contamination barrier, lithographic apparatus, device manufacturing method and device manufactured thereby |
| 04/25/2006 | US7033952 Apparatus and method using a remote RF energized plasma for processing semiconductor wafers |
| 04/25/2006 | US7033951 Process for forming pattern and method for producing liquid crystal display apparatus |
| 04/25/2006 | US7033948 Method for reducing dimensions between patterns on a photoresist |
| 04/25/2006 | US7033925 Pattern transfer mask related to formation of dual damascene structure and method of forming dual damascene structure |
| 04/25/2006 | US7033903 Method and apparatus for forming patterned photoresist layer |
| 04/25/2006 | US7033847 Determining the maximum number of dies fitting on a semiconductor wafer |
| 04/25/2006 | US7033740 Photoresists with reaction anchors for chemical consolidation of resist structures for exposures at 157 nm |
| 04/25/2006 | US7033739 Active hardmask for lithographic patterning |
| 04/25/2006 | US7033738 Process of forming a micro-pattern of a metal or a metal oxide |
| 04/25/2006 | US7033735 Water soluble negative tone photoresist |
| 04/25/2006 | US7033734 Patterning semiconductor using system with aperture having two openings aligned in a first axis, a first mask, a second aperture having two openings aligned in a second perpendicular axis |
| 04/25/2006 | US7033733 Photosensitive resin composition for color filters |
| 04/25/2006 | US7033732 Method of preparing anti-reflective coating polymer and anti-reflecting coating composition comprising an anti-reflecting coating polymer |
| 04/25/2006 | US7033731 Multilayered body for photolithographic patterning |
| 04/25/2006 | US7033729 Light absorbent agent polymer for organic anti-reflective coating and preparation method and organic anti-reflective coating composition comprising the same |
| 04/25/2006 | US7033728 Photoresist composition |
| 04/25/2006 | US7033727 Photosensitive composition and acid generator |
| 04/25/2006 | US7033726 an acrylic ester copolymer with a monomer unit having a 2,6-dioxabicyclo[3.3.0]octane ring and two other monomers having different bridged bicyclic or tricyclic lactones and a photosensitive acid generator; semiconductors; dry etch resistance; well balanced solubility |
| 04/25/2006 | US7033725 Infrared-sensitive photosensitive composition |
| 04/25/2006 | US7033724 Method for producing organically developable, photopolymerizable flexographic printing elements on flexible metallic supports |