| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 05/03/2006 | EP1653280A1 Pattern exposing system and pattern exposing method |
| 05/03/2006 | EP1652972A1 Artificail crystal member, exposure system, and producton method for exposure system |
| 05/03/2006 | EP1652866A1 Acrylic polymers and radiation-sensitive resin compositions |
| 05/03/2006 | EP1652846A1 Polymerizable fluorinated compound, making method, polymer, resist composition and patterning process |
| 05/03/2006 | EP1652844A2 Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process |
| 05/03/2006 | EP1652009A2 $m(c)method for producing inclined flank patterns by photolithography |
| 05/03/2006 | EP1652008A2 Method for monitoring and controlling imaging in immersion lithography systems |
| 05/03/2006 | EP1652007A1 Further method to pattern a substrate |
| 05/03/2006 | EP1652006A1 Psm alignment method and device |
| 05/03/2006 | EP1652005A2 Method of cleaning a surface of an optical device |
| 05/03/2006 | EP1652003A2 Wafer table for immersion lithography |
| 05/03/2006 | EP1651991A2 Inspection system using small catadioptric objective |
| 05/03/2006 | EP1651695A1 Photocrosslinkable polyurethanes |
| 05/03/2006 | EP1651581A2 Coating system for glass surfaces, method for the production and use thereof |
| 05/03/2006 | EP1546811A4 Lithographic printing members and a method and a system for preparation of lithographic printing members |
| 05/03/2006 | EP1330834B1 Parallel plate development with the application of a differential voltage |
| 05/03/2006 | EP1325513A4 Fluid pressure imprint lithography |
| 05/03/2006 | EP1210650A4 Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same |
| 05/03/2006 | EP1057079B9 Apparatus used for extreme ultraviolet lithography comprising a filter for suppressing undesired atomic and microscopic particles from a radiation source and filter used in such an apparatus |
| 05/03/2006 | CN2777600Y Chromium-free film layer phase shift light shade |
| 05/03/2006 | CN1768418A Organosilicate resin formulation for use in microelectronic devices |
| 05/03/2006 | CN1768415A Methods and apparatus for processing semiconductor wafers with plasma processing chambers in a wafer track environment |
| 05/03/2006 | CN1768392A Supporting unit, and moving table device and linear-motion guiding device using the supporting unit |
| 05/03/2006 | CN1768381A Multi-layer structure and method of drawing microscopic structure therein |
| 05/03/2006 | CN1768306A Composition for formation of underlayer film for lithography containing epoxy compound and carboxylic acid compound |
| 05/03/2006 | CN1768305A Resist composition for liquid immersion exposure process and method of forming resist pattern therewith |
| 05/03/2006 | CN1768304A Photosensitive resin film and cured film made therefrom |
| 05/03/2006 | CN1768303A Photoresist compositions |
| 05/03/2006 | CN1768302A Photoresist compositions |
| 05/03/2006 | CN1767956A Lithographic printing plate original form and plate making method |
| 05/03/2006 | CN1766739A Lithographic apparatus and device manufacturing method |
| 05/03/2006 | CN1766738A Method and apparatus for recording images on deformed image-recordable object |
| 05/03/2006 | CN1766737A Lithographic apparatus and device manufacturing method |
| 05/03/2006 | CN1766736A Photolithography method and apparatus |
| 05/03/2006 | CN1766735A Wafer bonding method |
| 05/03/2006 | CN1766734A Method of and apparatus for dispensing photoresist in manufacturing semiconductor devices or the like |
| 05/03/2006 | CN1766733A Phototonus resin composition, spacer for display panel and display panel |
| 05/03/2006 | CN1766732A Photosensitive resin composition for photoresist |
| 05/03/2006 | CN1766731A Method for the removal of deposition, method for the protection of an optical element, device manufacturing method and lithographic apparatus |
| 05/03/2006 | CN1766723A Method of manufacturing liquid crystal display device |
| 05/03/2006 | CN1766719A Photosensitive resin composition for photoresist |
| 05/03/2006 | CN1766712A Integrated micro-optical backlight lighting system apparatus and making method thereof |
| 05/03/2006 | CN1766609A Method for inspecting mask |
| 05/03/2006 | CN1765948A Side chain unsaturated polymer, radiation sensitive resin composition and spacer for liquid crystal display element |
| 05/03/2006 | CN1254862C Non-lead solder lug and its manufacturing method |
| 05/03/2006 | CN1254848C Manufacturing method of photo mask and semiconductor device |
| 05/03/2006 | CN1254715C Method for improving contact hole patterning |
| 05/03/2006 | CN1254702C Colored light sensitive resin composition |
| 05/03/2006 | CN1254510C 聚酰胺酸树脂组合物 Polyamic acid resin composition |
| 05/02/2006 | USRE39083 Projection exposure apparatus |
| 05/02/2006 | US7039487 Exposure apparatus and exposure method |
| 05/02/2006 | US7038992 Mask pattern forming method and device, and method of producing optical disk |
| 05/02/2006 | US7038763 Kit of parts for assembling an optical element, method of assembling an optical element, optical element, lithographic apparatus, and device manufacturing method |
| 05/02/2006 | US7038762 Method and apparatus for irradiating a microlithographic substrate |
| 05/02/2006 | US7038761 Projection exposure apparatus |
| 05/02/2006 | US7038760 Lithographic apparatus and device manufacturing method |
| 05/02/2006 | US7038759 Exposure apparatus |
| 05/02/2006 | US7038328 Anti-reflective compositions comprising triazine compounds |
| 05/02/2006 | US7038226 Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method |
| 05/02/2006 | US7038204 Method for reducing proximity effects in electron beam lithography |
| 05/02/2006 | US7038004 Process for preparing poly(arylene ethers) with pendant crosslinkable groups |
| 05/02/2006 | US7037995 Tertiary (meth)acrylates having lactone structure, polymers, resist compositions and patterning process |
| 05/02/2006 | US7037994 Acenaphthylene derivative, polymer, and antireflection film-forming composition |
| 05/02/2006 | US7037953 Aqueous solution of alpha, beta unsaturated actinic radiation; when applied to a surface and cured a film is formed wherein greater than 50 ppb of uncured residue is extractable |
| 05/02/2006 | US7037852 For removing a photoresist pattern from an underlying layer; for manufacturing a semiconductor device |
| 05/02/2006 | US7037639 Methods of manufacturing a lithography template |
| 05/02/2006 | US7037638 Solvent dev elopment, high resolution electron beam lithography patterns; glycoluril crosslinker and acid catalyst; negative tone images |
| 05/02/2006 | US7037637 100 parts of a polyamic acid from a tetracarboxylic acid dianhydride and a diamine, .01-5 parts of a 1,4-dihydro-pyridine derivative and 5-50 parts of a glycol ether |
| 05/02/2006 | US7037636 Presensitized plate for preparing lithographic printing plate |
| 05/02/2006 | US7037635 Aluminum plate overcoated with photosensitivity layer; aging resistance; lithography printing plates |
| 05/02/2006 | US7037627 Photomask defect testing method, photomask manufacturing method and semiconductor integrated circuit manufacturing method |
| 05/02/2006 | US7037626 an assembly of lithographic sub-masks together forming a fictitious design mask for configuring a device pattern in a layer of a substrate |
| 05/02/2006 | US7036980 Apparatus and method for forming pattern |
| 05/02/2006 | US7036389 System for determining characteristics of substrates employing fluid geometries |
| 05/02/2006 | CA2236577C Light-sensitive resist which can be developed in an aqueous-alkali manner and operates negatively |
| 04/27/2006 | WO2006044985A1 Slitting of micro-encapsulated media |
| 04/27/2006 | WO2006044676A2 High resistivity compositions |
| 04/27/2006 | WO2006044338A1 Aqueous developable benzocyclobutene-based polymer composition and method of use of such compositions |
| 04/27/2006 | WO2006044337A1 Benzocyclobutene based polymer formulations and methods for processing such formulations in oxidative environments |
| 04/27/2006 | WO2006044243A2 Holographic storage medium |
| 04/27/2006 | WO2006044093A2 Compressible flexographic printing plate construction |
| 04/27/2006 | WO2006043638A1 Photosensitive composition, image-forming base material, image-forming material, and image-forming method |
| 04/27/2006 | WO2006043597A1 Radiation-sensitive resin composition |
| 04/27/2006 | WO2006043442A1 Resist composition containing cobalt dye and color filter using same |
| 04/27/2006 | WO2006043244A1 Roller micro-contact printer with pressure control |
| 04/27/2006 | WO2006043049A1 Mandrels for electroforming printing screens, and electroforming apparatus |
| 04/27/2006 | WO2006043009A1 Rigidification of structures to be deployed by inflating, particularly for use in space |
| 04/27/2006 | WO2006042676A1 Method and device for the production of photopolymerisable cylindrical jointless flexographic printing elements |
| 04/27/2006 | WO2005104189A3 System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques |
| 04/27/2006 | WO2005091077A3 Projection lens of a microlithographic projection exposure system |
| 04/27/2006 | WO2005089355A3 Environmentally friendly photoacid generators (pags) with no perfluorooctyl sulfonates (pfos) |
| 04/27/2006 | WO2005076075A3 Adaptive real time control of a reticle/mask system |
| 04/27/2006 | US20060089741 Computer-implemented method and carrier medium configured to generate a set of process parameters and/or a list of potential causes of deviations for a lithography process |
| 04/27/2006 | US20060089007 In situ deposition of a low K dielectric layer, barrier layer, etch stop, and anti-reflective coating for damascene application |
| 04/27/2006 | US20060088982 System method and apparatus for dry-in, dry-out, low defect laser dicing using proximity technology |
| 04/27/2006 | US20060088792 Pattern forming method, semiconductor device manufacturing method and exposure mask set |
| 04/27/2006 | US20060088790 performing an overlapping partitioned exposure process in one or two processes selected from a mask process of forming a gate line, a mask process of forming an active layer, a mask process of forming a source/drain electrode and a mask process of forming a contact hole on a passivation layer |
| 04/27/2006 | US20060088789 For creating two and three dimensional patterns in a rapid prototyping environment; patterned light generator uses a micromirror array to direct pattern light on a target; photochemical vapor deposition |
| 04/27/2006 | US20060088773 Optical element with an opaque chrome coating having an aperture and method of making same |
| 04/27/2006 | US20060088770 Method and apparatus for contact hole unit cell formation |