| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/09/2006 | US7042828 Nanometer scale data storage device and associated positioning system |
| 05/09/2006 | US7042576 Positioning stage device |
| 05/09/2006 | US7042569 Overlay alignment metrology using diffraction gratings |
| 05/09/2006 | US7042554 Removable reticle window and support frame using magnetic force |
| 05/09/2006 | US7042551 Method of patterning process metrology based on the intrinsic focus offset |
| 05/09/2006 | US7042550 Device manufacturing method and computer program |
| 05/09/2006 | US7042091 Fluorinated hard mask for micropatterning of polymers |
| 05/09/2006 | US7042040 Semiconductor device and method for manufacturing the same |
| 05/09/2006 | US7041991 Variably shaped beam EB writing system |
| 05/09/2006 | US7041846 useful as monomers for polymerization to form base resins for use in micropatterning resist compositions; improved transparency, especially at the exposure wavelength of an excimer laser, and improved dry etching resistance |
| 05/09/2006 | US7041838 (Meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns |
| 05/09/2006 | US7041758 such as allyl palladium chloride 1,3-(bis(2,6-diisopropylphenyl)imidazole-2-ylidene; for polymerization of norbornene; injection molding; improved heat, oxygen, and moisture resistance |
| 05/09/2006 | US7041749 Dual cure reaction products of self-photoinitiating multifunction acrylates with cycloaliphatic epoxy compounds |
| 05/09/2006 | US7041748 Polysilsesquioxane has acid-sensitive imageable groups; acid generator or a crosslinking agent; crosslinkable after exposing to light; photoresists, ladder polymers; film stacks |
| 05/09/2006 | US7041711 Polymerizable composition and compound therefor |
| 05/09/2006 | US7041568 Method for the production of a self-adjusted structure on a semiconductor wafer |
| 05/09/2006 | US7041436 Method for the manufacture of micro structures |
| 05/09/2006 | US7041434 Technique for enhancing accuracy of critical dimensions of a gate electrode by using characteristics of an ARC layer |
| 05/09/2006 | US7041433 Flat coil and lithographic method for producing microcomponents |
| 05/09/2006 | US7041432 apparatus both exposes the element to actinic radiation and removes uncured photopolymer including means for softening or melting non-crosslinked photopolymer on the imaged and exposed surface and a roll that moves over the surface to remove the non-crosslinked photopolymer |
| 05/09/2006 | US7041431 Photosensitive lithographic printing plate and method for making a printing plate |
| 05/09/2006 | US7041429 Light sensitive composition and light sensitive planographic printing plate material |
| 05/09/2006 | US7041428 Exposure to light development a mixture of basic polymer and acid generator |
| 05/09/2006 | US7041427 Heat-sensitive lithographic printing plate precursor |
| 05/09/2006 | US7041426 Lithography; acid splitting of polymer |
| 05/09/2006 | US7041418 Window between pattern layout; projecting laser beams; determination, calibration reflection |
| 05/09/2006 | US7041417 Imaging process and products providing durable assemblages |
| 05/09/2006 | US7041416 Photopolymerization of unsaturated monomer; photoinitiator; liquid crystal display |
| 05/09/2006 | US7041389 Color-converting/filter substrate, multi-color organic EL display panel using the color-converting/filter substrate, and manufacturing methods thereof |
| 05/09/2006 | US7041229 Patterned product and its manufacturing method |
| 05/09/2006 | US7041228 Substrate for and a process in connection with the product of structures |
| 05/09/2006 | US7040338 Microfabricated elastomeric valve and pump systems |
| 05/09/2006 | US7040011 Wiring substrate manufacturing method |
| 05/04/2006 | WO2006047150A1 Solvent resistant imageable element |
| 05/04/2006 | WO2006047079A2 Polymeric conductor donor and transfer method |
| 05/04/2006 | WO2006046764A1 Exposure method and apparatus |
| 05/04/2006 | WO2006046736A1 Thiol compound and photosensitive composition using the same |
| 05/04/2006 | WO2006046687A1 Positive photosensitive insulating resin composition and cured product thereof |
| 05/04/2006 | WO2006046562A1 Substrate processing method, exposure apparatus and method for manufacturing device |
| 05/04/2006 | WO2006046529A1 Developer for thermal positive type photosensitive composition |
| 05/04/2006 | WO2006046488A1 Substrate transfer apparatus, substrate transfer method and exposure apparatus |
| 05/04/2006 | WO2006046475A1 High resolution pattern transfer method |
| 05/04/2006 | WO2006046430A1 Focal point detection device |
| 05/04/2006 | WO2006046429A1 Overlay inspection system |
| 05/04/2006 | WO2006046427A1 Overlay inspection system |
| 05/04/2006 | WO2006046398A1 Dye-containing resist compositions containing photoacid generators and color filters made by using the same |
| 05/04/2006 | WO2006046383A1 Resist composition, method for forming resist pattern, and compound |
| 05/04/2006 | WO2006046137A1 A composition for coating over a phtoresist pattern |
| 05/04/2006 | WO2006046101A1 A six degree of freedom (dof) actuator reaction mass |
| 05/04/2006 | WO2006046058A2 Optical microstructures and methods manufacturing the same |
| 05/04/2006 | WO2006045945A1 Imaging or insulation device, particularly for the creation of an electronic micro-circuit |
| 05/04/2006 | WO2006045748A2 Projection exposure apparatus for microlithography |
| 05/04/2006 | WO2006030320A3 Antireflective compositions for photoresists |
| 05/04/2006 | WO2006024908A3 Imprint lithographic apparatus, device manufacturing method and device manufactured thereby |
| 05/04/2006 | WO2005121892A3 Apparatus, system and method to vary dimensions of a substrate during nano-scale manufacturing |
| 05/04/2006 | WO2005110043A3 Method of making a photopolymer sleeve blank for flexographic printing |
| 05/04/2006 | WO2005106383A3 Interferometry systems and methods of using interferometry systems |
| 05/04/2006 | WO2005090447A3 Use of n-ethyl-2-pyrrolidone |
| 05/04/2006 | WO2005076074A3 Functionalized photoinitiators |
| 05/04/2006 | WO2005070993A3 Norbornene-type monomers and polymers containing pendent lactone or sultone groups |
| 05/04/2006 | US20060095227 Alignment method, alignment apparatus, exposure apparatus using the same, and device manufactured by using the same |
| 05/04/2006 | US20060094614 Non-corrosive cleaning composition for removing plasma etching residues |
| 05/04/2006 | US20060094144 Programmable mask and method for fabricating biomolecule array using the same |
| 05/04/2006 | US20060094040 Lithographic mask design and synthesis of diverse probes on a substrate |
| 05/04/2006 | US20060093972 Extrene ultraviolet radiation reaching the lower surface of a photoresist is redirected back into the photoresist material by reflecting and fluorescing the energy from a hardmask on the wafer surface back into the photoresist. |
| 05/04/2006 | US20060093971 transparent support glass with light attenuators, ultraviolet light exposure of photoresist layer is effectuated in predetermined patterns through exposure photomask having light-transmissive openings |
| 05/04/2006 | US20060093969 Heating/removing one of an alterated layer (formed by dry-etching or ashing) and deposited layer formed on organic film pattern, then fusing film for deformation; dielectrics; for semiconductors, liquid crystal displays |
| 05/04/2006 | US20060093968 Method of processing substrate and chemical used in the same |
| 05/04/2006 | US20060093967 Methods of making an integrated waveguide photodetector |
| 05/04/2006 | US20060093966 Semiconductor devices with sidewall conductive patterns methods of fabricating the same |
| 05/04/2006 | US20060093965 Multilayer integrated circuits on substrate; first pattern is imaged using exposure tool; masking; cycles |
| 05/04/2006 | US20060093964 Manufacturing method of microstructure, manufacturing method and manufacturing device of electronic device |
| 05/04/2006 | US20060093963 Manufacturing method of semiconductor device |
| 05/04/2006 | US20060093962 Edge cure prevention composition and process for using the same |
| 05/04/2006 | US20060093927 Pattern mask with features to minimize the effect of aberrations |
| 05/04/2006 | US20060093244 Hydrostatic gas bearing, hydrostatic gas bearing device for use in vacuum environment, and gas recovering method for hydrostatic gas bearing device |
| 05/04/2006 | US20060092533 Using isotopically specified fluids as optical elements |
| 05/04/2006 | US20060092394 Lithographic tool with dual isolation system and method for configuring the same |
| 05/04/2006 | US20060092392 Projection optical system, exposure apparatus and method using the same |
| 05/04/2006 | US20060092339 Programmable mask and method for fabricating biomolecule array using the same |
| 05/04/2006 | US20060091330 Alignment systems and methods for lithographic systems |
| 05/04/2006 | US20060091324 Optical component, optical system including such an optical component, lithographic apparatus, method of correcting apodization in an optical system, device manufacturing method, and device manufactured thereby |
| 05/04/2006 | US20060091108 Method and apparatus for controlling etch processes during fabrication of semiconductor devices |
| 05/04/2006 | US20060091051 Micro fluid device and process for producing the same |
| 05/04/2006 | DE112004001165T5 Durch aktinische Strahlung härtbare stereolithographische Harzzusammensetzung mit verbesserter Stabilität The actinic-radiation-curable stereolithographic resin composition with improved stability |
| 05/04/2006 | DE10255664B4 Für lithographische Druckplatten geeignete Photopolymerzusammensetzung For lithographic printing plates suitable photopolymer composition |
| 05/04/2006 | DE10255663B4 Strahlungsempfindliche Elemente A radiation-sensitive elements |
| 05/04/2006 | DE102004055733B3 Lithographie-Druckplattenvorläufer mit oligomeren oder polymeren Sensibilisatoren The lithographic printing plate precursor with oligomeric or polymeric sensitizers |
| 05/04/2006 | DE102004053646A1 Locally defined production of Si nanocrystals on an Si substrate with insulating layer useful in electronic switching technology with gas phase Ga deposition in holes in the insulated layer at which nanocrystals grow out from Ga-Si eutectic |
| 05/04/2006 | DE102004052994A1 Multistrahlmodulator für einen Partikelstrahl und Verwendung des Multistrahlmodulators zur maskenlosen Substratsstrukturierung Multibeam modulator for a particle beam and using the multibeam modulator for maskless patterning substrate |
| 05/04/2006 | DE10157244B4 Verfahren und Vorrichtung zur Defektanalyse von Wafern Method and apparatus for fault analysis of wafers |
| 05/03/2006 | EP1653501A1 Exposure apparatus, device producing method, and exposure apparatus controlling method |
| 05/03/2006 | EP1653288A1 Apparatus and method for optical position assessment |
| 05/03/2006 | EP1653287A1 Micropattern formation material and method of micropattern formation |
| 05/03/2006 | EP1653286A1 Material for forming fine pattern and method for forming fine pattern using the same |
| 05/03/2006 | EP1653285A2 Evaluation method of resist composition using immersion solvent |
| 05/03/2006 | EP1653284A2 Evaluation method of resist composition based on sensitivity |
| 05/03/2006 | EP1653283A2 Lithographic apparatus and device manufacturing method |
| 05/03/2006 | EP1653282A2 Method and apparatus for variable polarization control in a lithography system |
| 05/03/2006 | EP1653281A1 Negative photosensitive composition and negative photosensitive lithographic printing plate |