| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 05/11/2006 | WO2006049330A1 Exposure equipment |
| 05/11/2006 | WO2006049274A1 Exposure equipment and exposure method |
| 05/11/2006 | WO2006049246A1 Method for producing resist composition and resist composition |
| 05/11/2006 | WO2006049134A1 Exposure apparatus and device producing method |
| 05/11/2006 | WO2006049049A1 Photosensitive resin composition and photosensitive dry film by the use thereof |
| 05/11/2006 | WO2006049046A1 Lower layer film-forming composition for lithography containing cyclodextrin compound |
| 05/11/2006 | WO2006049045A1 Sulfonic-ester-containing composition for formation of antireflection film for lithography |
| 05/11/2006 | WO2006049037A1 Exposure condition correcting method, substrate processing equipment and computer program |
| 05/11/2006 | WO2006048445A1 Photopolymerizable composition |
| 05/11/2006 | WO2006048443A2 Photopolymerizable composition |
| 05/11/2006 | WO2006030239A3 Novel resist material and method for forming a patterned resist layer on a substrate |
| 05/11/2006 | WO2006021540A3 Optical system, i.e. lens or illumination device of a microlithographic projection exposure apparatus |
| 05/11/2006 | WO2006009852A3 Optical elements with protective undercoating |
| 05/11/2006 | WO2005119368A3 System for measuring the image quality of an optical imaging system |
| 05/11/2006 | US20060100301 Curable compositions and rapid prototyping process using the same |
| 05/11/2006 | US20060100298 Storage stability of photoinitiators |
| 05/11/2006 | US20060099754 Light guiding device |
| 05/11/2006 | US20060099538 Pulsing a tantalum pi complex, a dope, and a plasma gas intoa reaction chamber containing a substrate to form a metal carbide or carbonitride layer having a graded concentration by controlling the plasma pulses in consecutive process cycles; thin barrier/adhesive layer for miniaturized integrated circuit |
| 05/11/2006 | US20060099536 Patterned structures of high refractive index materials |
| 05/11/2006 | US20060099535 Pattern forming method and pattern forming apparatus |
| 05/11/2006 | US20060099534 Large regions of the photoresist are exposed optically and interferometrically to define three-dimensional periodic structures, and smaller regions constituting component features may be defined using electron beam exposure; high dielectric contrast |
| 05/11/2006 | US20060099522 Mask used in manufacturing highly-integrated circuit device, method of creating layout thereof, manufacturing method thereof, and manufacturing method for highly-integrated circuit device using the same |
| 05/11/2006 | US20060099452 Substrate for pattern formation |
| 05/11/2006 | US20060099396 Nanoporous coatings |
| 05/11/2006 | US20060099347 Method for reducing pattern dimension in photoresist layer |
| 05/11/2006 | US20060098566 Method for generating a circular periodic structure on a basic support material |
| 05/11/2006 | US20060098550 Electron beam irradiation apparatus, electron beam irradiation method, and apparatus for and method of manufacturing disc-shaped object |
| 05/11/2006 | US20060098269 Ultraviolet laser apparatus and exposure apparatus using same |
| 05/11/2006 | US20060098195 Optical measurements of patterned structures |
| 05/11/2006 | US20060098185 Mask holder for irradiating UV-rays |
| 05/11/2006 | US20060098184 Stage apparatus, fixation method, exposure apparatus, exposure method, and device-producing method |
| 05/11/2006 | US20060098183 Exposure system, test mask for monitoring polarization, and method for monitoring polarization |
| 05/11/2006 | US20060098181 Advanced exposure techniques for programmable lithography |
| 05/11/2006 | US20060098180 Lithographic apparatus and device manufacturing method |
| 05/11/2006 | US20060098179 Exposure method, exposure apparatus, and method for producing device |
| 05/11/2006 | US20060098178 Exposure apparatus, exposure method, and method for producing device |
| 05/11/2006 | US20060098177 Exposure method, exposure apparatus, and exposure method for producing device |
| 05/11/2006 | US20060097202 Collector having unused region for illumination systems using a wavelength <193 nm |
| 05/11/2006 | US20060096480 Device for heat-treating a coating of flat-bed offset printing plates |
| 05/11/2006 | US20060096479 Flexographic printing |
| 05/11/2006 | DE10255667B4 Strahlungsempfindliche Elemente mit ausgezeichneter Lagerbeständigkeit Radiation-sensitive elements with excellent storage stability |
| 05/11/2006 | DE102005052509A1 Druckplatte und Verfahren zum Herstellen derselben Printing plate and method for manufacturing the same |
| 05/11/2006 | DE102004053832A1 Erasable printing plate comprises an imaging layer containing magnetic or magnetizable nanoparticles |
| 05/11/2006 | DE102004053458A1 Strukturierte polymere Träger für die Massenspektrometrie und Verfahren zu deren Herstellung Structured polymeric carrier for mass spectrometry and processes for their preparation |
| 05/11/2006 | DE102004052995A1 Vorrichtung zur Strukturierung eines Partikelstrahls A device for structuring a particle beam |
| 05/11/2006 | DE102004046257B3 Process to form interlocking assembly profile in multilayered semiconductor component |
| 05/11/2006 | DE10116058B4 Verfahren zum Herstellen digitaler Hologramme in einem Speichermedium und Lithograph zum Herstellen digitaler Hologramme in einem Speichermedium A method of producing digital holograms in a storage medium and lithographer for producing digital holograms in a storage medium |
| 05/10/2006 | EP1655777A1 In-print method and in-print device |
| 05/10/2006 | EP1655770A1 Plasma processing device and ashing method |
| 05/10/2006 | EP1655765A1 Exposure method and exposure apparatus, stage unit, and device manufacturing method |
| 05/10/2006 | EP1655317A1 Thermally reactive infrared absorption polymers and their use in a heat sensitive lithographic printing plate |
| 05/10/2006 | EP1655315A1 Resin for resist, positive resist composition, and method of forming resist pattern |
| 05/10/2006 | EP1655313A1 Fluorine-containing compound, fluorine-containing polymer, method for producing same and resist composition containing same |
| 05/10/2006 | EP1655132A2 Positive photosensitive lithographic printing plate |
| 05/10/2006 | EP1655098A2 Method and apparatus for generating a printing form and printing form |
| 05/10/2006 | EP1654605A1 Lorentz motor control system for a payload |
| 05/10/2006 | EP1654593A2 Method and apparatus for monitoring and controlling imaging in immersion lithography systems |
| 05/10/2006 | EP1654592A2 Measuring the effect of flare on line width |
| 05/10/2006 | EP1654591A2 Method for determining optimal resist thickness |
| 05/10/2006 | EP1654577A1 Projection objectives including a plurality of curved mirrors with lenses ahead of the last but one mirror |
| 05/10/2006 | EP1654118A1 Heat-sensitive positive working lithogaphic printing plate precursor |
| 05/10/2006 | EP1332330A4 Determination of center of focus by diffraction signature analysis |
| 05/10/2006 | EP1169670B1 Photolithography method |
| 05/10/2006 | EP1131676B1 Aqueous dispersions with ionic dispersants |
| 05/10/2006 | EP1099140A4 Maskless photolithography system |
| 05/10/2006 | CN2779464Y High-precision sampling resistor |
| 05/10/2006 | CN1771466A Substrate adhesion improver for photosensitive resin composition and photosensitive resin composition containing the same |
| 05/10/2006 | CN1771465A Photosensitive resin composition, photosensitive layer therefrom and photosensitive resin printing original plate |
| 05/10/2006 | CN1771464A Determination of center of focus by parameter variability analysis |
| 05/10/2006 | CN1771463A Run-off path to collect liquid for an immersion lithography apparatus |
| 05/10/2006 | CN1771269A Adhesive film functionalizing color compensation and near infrared ray (nir) blocking and plasma display panel filter using the same |
| 05/10/2006 | CN1771072A Collector for EUV light source |
| 05/10/2006 | CN1770419A Detection apparatus and method for exposure device |
| 05/10/2006 | CN1770396A Silicon rich dielectric antireflective coating |
| 05/10/2006 | CN1770395A Method of processing substrate and chemical used in the same |
| 05/10/2006 | CN1770394A Method for verifying optical mask |
| 05/10/2006 | CN1770389A Method of processing substrate and chemical used in the same |
| 05/10/2006 | CN1770019A H2O plasma for simultaneous resist removal and charge releasing |
| 05/10/2006 | CN1770018A Lithographic apparatus and device manufacturing |
| 05/10/2006 | CN1770017A Thin film etching method and method of fabricating liquid crystal display device using the same |
| 05/10/2006 | CN1770016A Optical mask management method and bar code identification apparatus |
| 05/10/2006 | CN1770015A Coloured sensing device and manufacturing method thereof |
| 05/10/2006 | CN1770014A Method for making period different holographic gratings on a semiconductor chip |
| 05/10/2006 | CN1770013A Photosensitive composition for shading-film forming and black matrix formed therefrom |
| 05/10/2006 | CN1770012A Staining light-sensitive resin composition |
| 05/10/2006 | CN1770011A Radiation curable compositions |
| 05/10/2006 | CN1770010A Lithographic apparatus |
| 05/10/2006 | CN1770009A Pattern forming method and a semiconductor device manufacturing method |
| 05/10/2006 | CN1770008A Method and apparatus for correction of defects in lithography masks |
| 05/10/2006 | CN1769929A Lenticular lens sheet and manufacturing method thereof |
| 05/10/2006 | CN1769073A Laser direct writing anti-counterfeit label |
| 05/10/2006 | CN1769050A Fluid jetting device and its production process |
| 05/10/2006 | CN1255857C A method for forming plat structure |
| 05/10/2006 | CN1255779C Method for forming very tip in reader head of data converter, and reader/writer head |
| 05/10/2006 | CN1255704C Method for correcting mask distribution pattern |
| 05/10/2006 | CN1255489C Liquid state photo sensitive insulating ink used for cascade circuit board |
| 05/10/2006 | CN1255467C Protective film composition for cylindrical shock insulator of liquid crystal display element |
| 05/10/2006 | CN1255277C Screen printing making technology |
| 05/09/2006 | US7043327 Lithography apparatus and method employing non-environmental variable correction |
| 05/09/2006 | US7043121 Method and apparatus for writing apodized patterns |