| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/17/2006 | EP1656591A1 Filter for retaining a substance originating from a radiation source and method for the manufacture of the same |
| 05/17/2006 | EP1656590A2 Novel photosensitive bilayer composition |
| 05/17/2006 | EP1656589A2 Precursor paste and method of producing the same |
| 05/17/2006 | EP1656588A2 Phototool coating |
| 05/17/2006 | EP1656587A2 Reduction smith-talbot interferometer prism for micropatterning |
| 05/17/2006 | EP1656385A1 Perfluoropolyether amide-linked phosphonates, phosphates, and derivatives thereof |
| 05/17/2006 | EP1656242A2 Capillary imprinting technique |
| 05/17/2006 | EP1539492B1 High speed negative-working thermal printing plates |
| 05/17/2006 | EP1468335A4 A cleaning agent composition for a positive or a negative photoresist |
| 05/17/2006 | EP1061383B1 Color filter and method of manufacture thereof |
| 05/17/2006 | CN1774793A Resist stripping method and device |
| 05/17/2006 | CN1774675A Optical element for a lighting system |
| 05/17/2006 | CN1774674A Masking arrangement and method for producing integrated circuit arrangements |
| 05/17/2006 | CN1774673A Porous underlayer film and underlayer film forming composition used for forming the same |
| 05/17/2006 | CN1774672A Resin composition for mold used in forming micropattern, and method for fabricating organic mold therefrom |
| 05/17/2006 | CN1774671A Photosensitive resin composition |
| 05/17/2006 | CN1774670A Composition and method for printing a patterned resist layer |
| 05/17/2006 | CN1774668A Environmental system including a transport region for an immersion lithography apparatus |
| 05/17/2006 | CN1774667A Optical arrangement of autofocus elements for use with immersion lithography |
| 05/17/2006 | CN1773681A Process for removing etching residue polymer |
| 05/17/2006 | CN1773673A Substrate processing apparatus and substrate processing method |
| 05/17/2006 | CN1773672A Substrate processing apparatus and substrate processing method |
| 05/17/2006 | CN1773671A Substrate processing apparatus and substrate processing method |
| 05/17/2006 | CN1773650A Pattern forming method and pattern forming apparatus |
| 05/17/2006 | CN1773380A Driving device and exposure device |
| 05/17/2006 | CN1773379A Lithographic apparatus and device manufacturing method |
| 05/17/2006 | CN1773378A Real-time display system for electronic beam exposuring process |
| 05/17/2006 | CN1773377A Positive resist compositions and forming method |
| 05/17/2006 | CN1773376A Substrate processing apparatus and substrate processing method |
| 05/17/2006 | CN1773375A Glasses fittings with artistic pattern and surface processing technological method thereof |
| 05/17/2006 | CN1773374A Half tone mask, method for fabricating the same, and flat panel display using the same |
| 05/17/2006 | CN1773356A Liquid crystal display device and producing method thereof |
| 05/17/2006 | CN1773340A Method and apparatus for fabricating flat panel display |
| 05/17/2006 | CN1773314A Thin film patterning apparatus and method of fabricating color filter array substrate using the same |
| 05/17/2006 | CN1772947A Diamond cone and its making process |
| 05/17/2006 | CN1256753C Method of forming and testing phase shift mask |
| 05/17/2006 | CN1256629C Composition for removing etching resisting agent and byproducts and method for removing slushing compound with the same composition |
| 05/17/2006 | CN1256628C EUV-transparent interface structure |
| 05/17/2006 | CN1256627C Method of improving resolution ratio limit of exposure machine |
| 05/17/2006 | CN1256626C Adjustable polarized light reaction photoresist and microimage technology using said photoresist |
| 05/17/2006 | CN1256625C Positive chemically magnifying photoresist composition |
| 05/17/2006 | CN1256624C Negative picture recording material and cyanine dye |
| 05/17/2006 | CN1256623C Integrated etch removal cleaning machine table |
| 05/17/2006 | CN1256622C Active optical close correction method |
| 05/17/2006 | CN1256601C Optical hybrid module and manufacturing method thereof |
| 05/17/2006 | CN1256364C Macromolecule thioxanthone photo-initiator and its preparation method |
| 05/16/2006 | US7047516 Proximity effect correction apparatus, proximity effect correction method, storage medium, and computer program product |
| 05/16/2006 | US7046713 Discharge laser with porous layer covering anode discharge surface |
| 05/16/2006 | US7046613 Exposure apparatus of an optical disk master, method of exposing an optical disk master and pinhole mechanism |
| 05/16/2006 | US7046496 Adaptive gain adjustment for electromagnetic devices |
| 05/16/2006 | US7046413 System and method for dose control in a lithographic system |
| 05/16/2006 | US7046408 Method of hologram exposure, mask for hologram exposure, semiconductor device, and electronic equipment |
| 05/16/2006 | US7046376 Overlay targets with isolated, critical-dimension features and apparatus to measure overlay |
| 05/16/2006 | US7046375 Edge roughness measurement in optical metrology |
| 05/16/2006 | US7046370 Interferometer with reduced shear |
| 05/16/2006 | US7046367 Interferometric servo control system for stage metrology |
| 05/16/2006 | US7046342 Apparatus for characterization of photoresist resolution, and method of use |
| 05/16/2006 | US7046341 Method and apparatus for forming pattern on thin substrate or the like |
| 05/16/2006 | US7046340 Method and apparatus for controlling radiation beam intensity directed to microlithographic substrates |
| 05/16/2006 | US7046339 Optimized optical lithography illumination source for use during the manufacture of a semiconductor device |
| 05/16/2006 | US7046338 EUV condenser with non-imaging optics |
| 05/16/2006 | US7046337 Exposure apparatus and method |
| 05/16/2006 | US7046336 Scanning exposure apparatus |
| 05/16/2006 | US7046335 Exposure apparatus and device fabrication method |
| 05/16/2006 | US7046334 Displacement correction apparatus, exposure system, exposure method and a computer program product |
| 05/16/2006 | US7046333 Exposure method |
| 05/16/2006 | US7046332 Exposure system and method with group compensation |
| 05/16/2006 | US7046331 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 05/16/2006 | US7046330 Exposure apparatus |
| 05/16/2006 | US7046266 Scanner system |
| 05/16/2006 | US7045801 Charged beam exposure apparatus having blanking aperture and basic figure aperture |
| 05/16/2006 | US7045800 Electron beam drawing apparatus |
| 05/16/2006 | US7045780 Scanning probe microscopy inspection and modification system |
| 05/16/2006 | US7045771 Light beam scanning apparatus and image forming apparatus |
| 05/16/2006 | US7045647 Synergistic mixture of a nitroxyl compound with a quinone alkide having an electron withdrawing group at the 7-position; purification of unsaturated compounds; effective during steady state and after shutoff; storage stability |
| 05/16/2006 | US7045582 Film forming; microstructure pattern; addition polymer; storage stability; reducing defects |
| 05/16/2006 | US7045471 Method for forming resist pattern in reverse-tapered shape |
| 05/16/2006 | US7045462 Method for fabricating a pattern and method for manufacturing a semiconductor device |
| 05/16/2006 | US7045277 Semiconductor processing methods of transferring patterns from patterned photoresists to materials, and structures comprising silicon nitride |
| 05/16/2006 | US7045276 Capable of forming high-quality images with no stains in the non-image area thereof |
| 05/16/2006 | US7045274 Process for structuring a photoresist by UV at less than 160 NM and then aromatic and/or alicyclic amplification |
| 05/16/2006 | US7045273 Amplification of structured resists utilizes a reaction between a nucleophilic group and an isocyanate group or thiocyanate group to link an amplification agent to a polymer present in the photoresist. The isocyanate group or the |
| 05/16/2006 | US7045272 Capable of directly processed from the digital signals of computers; image quality |
| 05/16/2006 | US7045271 Polysiloxane copolymer; lithography printing plates |
| 05/16/2006 | US7045270 Lithographic printing plate precursor and production method of lithographic printing plate |
| 05/16/2006 | US7045269 Lithography printing plates; mixture of acid generator, crosslinking agent and binder; exposure to ultraviolet radiation, development |
| 05/16/2006 | US7045268 blends of polymer compositions having high UV transparency which are useful as base resins in resists and potentially in many other applications such as photoimaging |
| 05/16/2006 | US7045267 Resist composition comprising photosensitive polymer having lactone in its backbone |
| 05/16/2006 | US7045266 Lithographic printing plate |
| 05/16/2006 | US7045260 Post exposure modification of critical dimensions in mask fabrication |
| 05/16/2006 | US7045259 Post exposure modification of critical dimensions in mask fabrication |
| 05/16/2006 | US7045180 Thermosensitive transfer film and method of manufacturing display device |
| 05/16/2006 | US7045012 Jetting method of liquid, jetting apparatus of liquid, production method of substrate for electro-optical apparatus and production method of electro-optical apparatus |
| 05/16/2006 | US7044662 Developing photoresist with supercritical fluid and developer |
| 05/16/2006 | US7044055 System for thermal development of flexographic printing plates |
| 05/11/2006 | WO2006050018A1 Printing system for use with microencapsulated media |
| 05/11/2006 | WO2006049736A1 Etching method including photoresist plasma conditioning step with hydrogen flow rate ramping |
| 05/11/2006 | WO2006049720A1 Resist composition |
| 05/11/2006 | WO2006049666A2 Edge cure prevention composition and process for using the same |
| 05/11/2006 | WO2006049489A1 A lithographic apparatus having a contaminant trapping system, a contaminant trapping system, a device manufacturing method, and a method for trapping of contaminants in a lithographic apparatus |