| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/24/2006 | CN1257474C Substrate processing method and processor |
| 05/24/2006 | CN1257438C Apparatus for preventing liquid spitting back |
| 05/24/2006 | CN1257437C Exposure device and method for transfering photomask and workpiece |
| 05/24/2006 | CN1257436C 图形发生器 Graphics Generator |
| 05/24/2006 | CN1257435C Composition for forming antireflection film for lithography |
| 05/24/2006 | CN1257434C 感光性树脂组合物 The photosensitive resin composition |
| 05/24/2006 | CN1257060C Method for producing liquid jet nozzle |
| 05/24/2006 | CN1257059C Micro-structural body making method, liqiuid spraying head making method and liquid spraying head |
| 05/23/2006 | USRE39106 Improve photospeed of epoxy resins; a cationical polymerizable blends for free radical polymerization, comprising at least two epoxy resins, monoacrylic monomers, free radical initiator and photo-generating acid precursor; control of polymerization reaction; use in solid imaging, accuracy, clarity |
| 05/23/2006 | USRE39105 Methine dyes infrared absorbing material able to light-to-heat conversion, photosensitivity, especially sensitive to semiconductor lasers; low-melting or high-melting crystals; chemical intermediates |
| 05/23/2006 | US7051314 Method of computer-assisted design of integrated circuit chips, and library of delay time values for computer-assisted design of such chips |
| 05/23/2006 | US7050716 Exposure device |
| 05/23/2006 | US7050247 Optical unit, exposure unit and optical devices |
| 05/23/2006 | US7050237 High-efficiency spectral purity filter for EUV lithography |
| 05/23/2006 | US7050156 Method to increase throughput in a dual substrate stage double exposure lithography system |
| 05/23/2006 | US7050155 Advanced exposure techniques for programmable lithography |
| 05/23/2006 | US7050154 Illumination optical system in exposure apparatus |
| 05/23/2006 | US7050153 Exposure apparatus |
| 05/23/2006 | US7050152 Exposure apparatus |
| 05/23/2006 | US7050151 Exposure apparatus, exposure method, and device manufacturing method |
| 05/23/2006 | US7050150 Exposure apparatus |
| 05/23/2006 | US7050149 Exposure apparatus and exposure method |
| 05/23/2006 | US7050148 Optical unit, exposure apparatus, and device manufacturing method |
| 05/23/2006 | US7050146 Lithographic apparatus and device manufacturing method |
| 05/23/2006 | US7050144 Light exposure; multilayer, radiation transparent substrates, shade with masking patterns; controlling width of apertures |
| 05/23/2006 | US7049617 Thickness measurement in an exposure device for exposure of a film with a hologram mask, exposure method and semiconductor device manufacturing method |
| 05/23/2006 | US7049614 Electrode in a discharge produced plasma extreme ultraviolet source |
| 05/23/2006 | US7049611 Charged-particle beam lithographic system |
| 05/23/2006 | US7049610 Charged particle beam exposure method, charged particle beam exposure apparatus, and device manufacturing method |
| 05/23/2006 | US7049608 Position detection apparatus, position detection method, electronic part carrying apparatus, and electronic beam exposure apparatus |
| 05/23/2006 | US7049607 Electron beam writing equipment and electron beam writing method |
| 05/23/2006 | US7049592 Lithographic apparatus and device manufacturing method |
| 05/23/2006 | US7049275 Photoresist stripping composition and cleaning composition |
| 05/23/2006 | US7049235 Method of manufacturing semiconductor device |
| 05/23/2006 | US7049169 Method of fabricating a semiconductor device |
| 05/23/2006 | US7049053 Supercritical carbon dioxide to reduce line edge roughness |
| 05/23/2006 | US7049052 Method providing an improved bi-layer photoresist pattern |
| 05/23/2006 | US7049050 wafer is placed on the surface of a hot plate, the hot plate is then positioned under an angle with a horizontal direction and may be turned such that the active surface of the wafer, over which a photoresist mask has been formed, faces downwards; changing Critical Dimension in a layer of photoresist |
| 05/23/2006 | US7049049 For creating microsensors and fluidic networks, molecular imprinted arrays, plastic circuits, and thin film devices |
| 05/23/2006 | US7049048 aluminum or aluminum alloy substrate support and an interlayer comprising a copolymer of (meth)acrylic acid and/or vinylphosphonic acid, and an ethenically unsaturated trialkoxy- or triphenoxy-silane monomer; lithographic printing plate precursors |
| 05/23/2006 | US7049047 that absorbs both infrared and ultraviolet radiation; masking layer may be imaged and developed to form an integral photomask; those with a photosensitive layer are useful as flexographic printing plate precursors |
| 05/23/2006 | US7049046 Infrared absorbing compounds and their use in imageable elements |
| 05/23/2006 | US7049045 Multilayer imageable elements |
| 05/23/2006 | US7049044 Resist copolymer of a styrenic monomer such as tetrahydropyranyloxystyrene or p-hydroxystyrene and a photoacid generating sulfonium methacrylate monomer, and optionally with a polyhedral oligomeric silsesquioxane monomer; high resolution |
| 05/23/2006 | US7049043 Photosensitive composition |
| 05/23/2006 | US7049036 Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern, resist pattern and substrate having the resist pattern laminated thereon |
| 05/23/2006 | US7048801 Chemical pump and method of discharging chemical solution |
| 05/23/2006 | US7048528 Exposure head, exposure apparatus, and application thereof |
| 05/23/2006 | US7047984 Device and method for cleaning articles used in the production of semiconductor components |
| 05/23/2006 | US7047882 Planographic plate producing method including adjusting moisture content of coating film layer |
| 05/18/2006 | WO2006052380A1 Derivatized polyhydroxystryrene (dphs)with a novolak type structure and blocked dphs (bdphs) and processes for preparing the same |
| 05/18/2006 | WO2006052223A1 Cell culture device |
| 05/18/2006 | WO2006051909A1 Exposure method, device manufacturing method, and substrate |
| 05/18/2006 | WO2006051889A1 Printed circuit board production method and equipment |
| 05/18/2006 | WO2006051863A1 Photosensitive resin composition for flexographic printing |
| 05/18/2006 | WO2006051769A1 Method for forming resist pattern |
| 05/18/2006 | WO2006051761A1 Composition for pattern formation and pattern forming material, and pattern forming apparatus and pattern forming method |
| 05/18/2006 | WO2006051689A1 Projection optical system, exposure equipment and exposure method |
| 05/18/2006 | WO2006051448A2 Array of spatial light modulators and method of production of a spatial light modulator device |
| 05/18/2006 | WO2006050937A1 Thermally reactive infrared absorption polymers and their use in a heat sensitive lithographic printing plate |
| 05/18/2006 | WO2006050891A2 A high-precision optical surface prepared by sagging from a masterpiece |
| 05/18/2006 | WO2006050853A1 Less shear-thinning polyvinyl acetals |
| 05/18/2006 | WO2006050609A1 New hexafluoroalcohol-based monomers and processes of preparation thereof |
| 05/18/2006 | WO2006033470A3 Patterning and film-forming process, electroluminescence device and manufacturing process therefor, and electroluminescence display apparatus |
| 05/18/2006 | WO2006007581A3 Imaging a violet sensitive printing plate |
| 05/18/2006 | WO2005083525A3 Determining image blur in an imaging system |
| 05/18/2006 | WO2005083519A3 Methods of patterning a surface using single and multilayer molecular films |
| 05/18/2006 | WO2005059655A3 A process for the fabrication of optical microstructures |
| 05/18/2006 | US20060106566 Position detecting method and apparatus |
| 05/18/2006 | US20060105476 Photoresist pattern, method of fabricating the same, and method of assuring the quality thereof |
| 05/18/2006 | US20060105275 depositing a layer of a nitride material on a silicon substrate; patterning the nitride layer with photoresist; reactive ion etching; stripping photoresist; anistropically etching the silicon substrate; forming metal traces; forming reservoir caps |
| 05/18/2006 | US20060105273 Method for producing electronic device |
| 05/18/2006 | US20060105272 applying on a substrate a photoresist layer, applying above the photoresist layer an organic barrier layer of e.g. polysilicate, in a single step, thermally treating photoresist and barrier layer composition to remove solvent from the photoresist, immersion exposing photoresist to activation radiation |
| 05/18/2006 | US20060105271 Edge cure prevention process |
| 05/18/2006 | US20060105249 Exposure mask and method of manufacturing the same |
| 05/18/2006 | US20060105247 Microstructure comprising an adhesive layer and method of fabrication of said microstructure |
| 05/18/2006 | US20060105181 Patternable low dielectric constant materials and their use in ULSI interconnection |
| 05/18/2006 | US20060104413 Mask repeater and mask manufacturing method |
| 05/18/2006 | US20060103944 Coupling apparatus, exposure apparatus, and device fabricating method |
| 05/18/2006 | US20060103914 Pattern generator |
| 05/18/2006 | US20060103833 Aligning apparatus and its control method, and exposure apparatus |
| 05/18/2006 | US20060103832 Wafer table for immersion lithography |
| 05/18/2006 | US20060103825 Focus test mask, focus measurement method and exposure apparatus |
| 05/18/2006 | US20060103821 Lithographic apparatus and device manufacturing method |
| 05/18/2006 | US20060103818 Method and apparatus for cleaning a semiconductor substrate in an immersion lithography system |
| 05/18/2006 | US20060102614 Apparatus for processing substrate and method of processing the same |
| 05/18/2006 | US20060102051 excellent photosensitivity to actinic energy rays which can draw a fine image responsible to high functions of a present print wiring board; flexibility suitable to a solder mask ink of high insulation excelling in adherence and resistances of gold plating, electroless gold plating and tin plating |
| 05/18/2006 | DE4340107B4 Verfahren zur Herstellung eines Teils mit einer fein strukturierten konkaven Oberfläche Method for manufacturing a part with a finely textured surface concave |
| 05/18/2006 | DE19746932B4 Neues Photoresist-Copolymer und Photoresistzusammensetzung New photoresist copolymer and photoresist composition |
| 05/18/2006 | DE102005048380A1 Vorrichtung zum Belichten eines Substrats, Photomaske und modifiziertes Beleuchtungssystem der Vorrichtung und Verfahren zum Bilden eines Musters an einem Substrat unter Verwendung der Vorrichtung An apparatus for exposing a substrate, photomask and modified illumination system of the apparatus and method for forming a pattern on a substrate using the apparatus |
| 05/18/2006 | DE102005030338A1 Thin film etching for liquid crystal display device comprises forming layer on substrate, aligning mask having pattern above layer, and removing portion of layer by irradiating substrate with femtosecond laser through mask |
| 05/18/2006 | DE102004043385B3 Verfahren und Einrichtung zur Replikation fein strukturierter Flachoptiken und optischen Masken mit derartigen strukturierten Optiken Method and device for replication finely textured flat optics and optical masks with such structured optics |
| 05/18/2006 | CA2586864A1 New hexafluoroalcohol-based monomers and processes of preparation thereof |
| 05/18/2006 | CA2586400A1 Cell culture device |
| 05/18/2006 | CA2585304A1 Thermally reactive infrared absorption polymers and their use in a heat sensitive lithographic printing plate |
| 05/17/2006 | EP1657594A1 Hydrophilization process for a screen printing carrier, process and liquid for removing screen material from the carrier |
| 05/17/2006 | EP1657593A2 An apparatus and process for forming a printing form having a cylindrical support |
| 05/17/2006 | EP1657264A1 Fluorocopolymer, process for producing the same, and resist composition containing the same |
| 05/17/2006 | EP1657074A1 Method for making a thermal transfer donor element |
| 05/17/2006 | EP1657070A1 A stamp for soft lithography, in particular micro contact printing and a method of preparing the same |