| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/30/2006 | US7053198 Functionated photoacid generator and functionated polymer system for biological microarray synthesis |
| 05/30/2006 | US7053030 Silicone hyper-branched polymer surfactant, method of preparing the same and method of rinsing using a rinsing solution comprising the same |
| 05/30/2006 | US7053017 Reduced striae extreme ultraviolet elements |
| 05/30/2006 | US7053008 Resist application method and device |
| 05/30/2006 | US7052988 Applications and methods of making nitrogen-free anti-reflective layers for semiconductor processing |
| 05/30/2006 | US7052986 Method of manufacturing a semiconductor device |
| 05/30/2006 | US7052826 diluting waste photoresist with solvent, measuring the solids content and thicknessses of the photoresists; monitoring and comparing them to target values to determine recyclabilty |
| 05/30/2006 | US7052825 Substrate having fine lines, method for manufacturing the same, electron-source substrate, and image display apparatus |
| 05/30/2006 | US7052824 Process for thick film circuit patterning |
| 05/30/2006 | US7052823 Method of manufacturing an electroconductive film, and method of manufacturing an image forming apparatus including the electroconductive film |
| 05/30/2006 | US7052822 Photosensitive composition |
| 05/30/2006 | US7052821 Sacrificial compositions, methods of use thereof, and methods of decomposition thereof |
| 05/30/2006 | US7052820 Silicon-containing resist for photolithography |
| 05/30/2006 | US7052810 exposing and developing a testing photoresist layer using a test photo mask to form hole patterns corresponding to first hole patterns; measuring photoresist critical dimensions (pCDs) of the second hole patterns on the test photoresist layer; determining correction of mask critical dimention (mCDs) |
| 05/30/2006 | US7052809 Membrane and reticle-pellicle apparatus with purged pellicle-to-reticle gap using same |
| 05/30/2006 | US7052808 Transmission mask with differential attenuation to improve ISO-dense proximity |
| 05/30/2006 | US7052806 Exposure controlling photomask and production method therefor |
| 05/30/2006 | US7052618 Nanostructures and methods of making the same |
| 05/30/2006 | US7052263 Apparatus for manufacturing a three-dimensional object |
| 05/30/2006 | US7052182 Hydrostatic gas bearing, hydrostatic gas bearing device for use in vacuum environment, and gas recovering method for the hydrostatic gas bearing device |
| 05/30/2006 | US7051742 Removing photoresists and etching residues; using solvents; water and chelate compound; heating; controlling temperature |
| 05/30/2006 | US7051741 Reduction/oxidation material removal method |
| 05/30/2006 | US7051653 Image recording material separating/removing device |
| 05/30/2006 | US7051652 Wet offset printing form |
| 05/26/2006 | WO2006055310A2 Article with patterned layer on surface |
| 05/26/2006 | WO2006055068A1 Method for thermally processing photosensitive printing sleeves |
| 05/26/2006 | WO2006055045A2 Edge cure prevention process |
| 05/26/2006 | WO2006054719A1 Maintenance method, exposure method, exposure apparatus, and device producing method |
| 05/26/2006 | WO2006054682A1 Position measurement method, position control method, measurement method, loading method, exposure method, exoposure apparatus, and device production method |
| 05/26/2006 | WO2006054544A1 Lighting apparatus, exposure apparatus and micro device manufacturing method |
| 05/26/2006 | WO2006054496A1 Synchronization accuracy detecting method and system, aberration detecting method and system, and computer program |
| 05/26/2006 | WO2006054459A1 Exposure condition setting method, substrate processing device, and computer program |
| 05/26/2006 | WO2006054432A1 Negative resist composition |
| 05/26/2006 | WO2006054209A1 Fluid ultraviolet lens |
| 05/26/2006 | WO2006054173A1 Photoresist composition for deep uv and process thereof |
| 05/26/2006 | WO2006054004A1 Device obtained by nanoprinting comprising metallic patterns and method for nanoprinting of metallic patterns |
| 05/26/2006 | WO2006053751A2 Projection lens system of a microlithographic projection exposure installation |
| 05/26/2006 | WO2006053689A1 Lithographic printing plate precursors with oligomeric or polymeric sensitizers |
| 05/26/2006 | WO2006053621A1 Highly shear-thinning polyvinyl acetals |
| 05/26/2006 | WO2006006635A3 Defect repair device and defect repair method |
| 05/26/2006 | WO2005118160A3 Droplet dispensing in imprint lithography |
| 05/26/2006 | WO2005078521A3 Method for providing a thin film having a chemical composition that is spatially structured on a micrometric or nanometric scale on a substrate |
| 05/26/2006 | WO2005071491A3 Exposure apparatus and measuring device for a projection lens |
| 05/26/2006 | WO2005045524A3 A method of forming a patterned layer on a substrate |
| 05/25/2006 | US20060111493 Photopolymerizable resin composition for sandblast resist |
| 05/25/2006 | US20060111463 Photopolymerization of unsaturated monomers in the presence of the photoinitiators wherein the composition is free of an additive that competitively absorbs actinic radiation. |
| 05/25/2006 | US20060111462 Arylsulfinate salts in initiator systems for polymeric reactions |
| 05/25/2006 | US20060111461 Photopolymerizing composition and photopolymerizing recording medium manufactured using the same and used to manufacture 3D optical memory having ultra-high information storage capacity |
| 05/25/2006 | US20060110694 Novel method and systems to print contact hole patterns |
| 05/25/2006 | US20060110693 Exposure method and apparatus, exposure mask, and device manufacturing method |
| 05/25/2006 | US20060110689 Immersion photolithography with megasonic rinse |
| 05/25/2006 | US20060110688 Etching process compatible with DUV lithography |
| 05/25/2006 | US20060110687 selectively irradiating photo resist film with an energy ray to form a desired latent image pattern, placing substrate on a spacer provided on a hot plate, heating and developing to form a photo resist pattern; setting relationship between distance/exposure amount; dimensional uniformity |
| 05/25/2006 | US20060110685 Apparatus and method to improve resist line roughness in semiconductor wafer processing |
| 05/25/2006 | US20060110683 Process of improved grayscale lithography |
| 05/25/2006 | US20060110682 polyvinylsilsesquioxane enhance etch resistance of antihalation composition and as binder; reducing the reflection of exposure radiation of photoresist overcoatings; increase adhesion between two layers by crosslinking between Novolak resin PHOTORESIST layer OVER THE ANTIREFLECTIVE LAYER |
| 05/25/2006 | US20060110681 Maximum sensitivity in 390 to 430 nm light region; laser responsive; computer direct drawing; image-exposing the photosensitive lithographic printing plate by means of a laser light; development of the image by an aqueous developer |
| 05/25/2006 | US20060110676 Resist material for liquid immersion lithography process and method for forming resist pattern using the resist material |
| 05/25/2006 | US20060110667 Method of fabrication of semiconductor integrated circuit device and mask fabrication method |
| 05/25/2006 | US20060110604 Synthetic quartz member, exposure apparatus, and method of manufacturing exposure apparatus |
| 05/25/2006 | US20060109533 Diffuser, wavefront source, wavefront sensor and projection exposure apparatus |
| 05/25/2006 | US20060109449 Reticle-carrying container |
| 05/25/2006 | US20060109445 Maskless lithography system and method |
| 05/25/2006 | US20060109443 Optical integrator, illumination optical device, exposure apparatus, and exposure method |
| 05/25/2006 | US20060109435 Lithographic apparatus and device manufacturing method |
| 05/25/2006 | US20060108542 Electron beam exposure method and electron beam exposure system |
| 05/25/2006 | US20060108541 Alignment method, alignment substrate, production method for alignment substrate, exposure method, exposure system and mask producing method |
| 05/25/2006 | US20060108524 Dimension measuring SEM system, method of evaluating shape of circuit pattern and a system for carrying out the method |
| 05/25/2006 | US20060108448 Edge remover having a gas sprayer to prevent a chemical solvent from splashing |
| 05/24/2006 | EP1659620A1 Liquid recovery apparatus, exposure apparatus, exposure method, and device production method |
| 05/24/2006 | EP1659452A1 Latent overlay metrology |
| 05/24/2006 | EP1659451A2 Lithographic apparatus, device manufacturing method, and a projection element for use in the lithographic apparatus |
| 05/24/2006 | EP1659450A1 Apparatus for the fabrication of microstructures |
| 05/24/2006 | EP1659449A2 Low-temperature curable photosensitive compositions |
| 05/24/2006 | EP1659438A1 Optical system with electronic spot size control and focus control optics |
| 05/24/2006 | EP1658622A2 Method and system for drying a substrate |
| 05/24/2006 | EP1658615A1 Oblique reflector normal incidence collector system for light sources, in particular for euv plasma discharge sources |
| 05/24/2006 | EP1658530A1 Method and arrangement for the production of a hologram |
| 05/24/2006 | EP1658313A1 Photopatterning conductive electrode layers with electrically-conductive polymer |
| 05/24/2006 | EP1247132B1 Microlithographic reduction projection catadioptric objective |
| 05/24/2006 | DE102005028489A1 Flat panel display fabrication method e.g. for LCD involves using etch-resist whose polarity is changed by light irradiation |
| 05/24/2006 | DE102004056476A1 Immersion lithographic lens used in the production of semiconductor components comprises a first optical element and a second optical element following the first optical element in the direction of a beam path through the lens |
| 05/24/2006 | DE102004055037A1 Semiconductor wafer`s alignment marks finding method for e.g. dynamic RAM, involves imaging marks and structures on photoresist of wafer by imaging device, and measuring real position of marks relative to reference system of device |
| 05/24/2006 | CN2783376Y Nano press-printing mask aligner |
| 05/24/2006 | CN1777842A Resist composition and organic solvent for removing resist |
| 05/24/2006 | CN1777841A Photolithographic process, stamper, use of said stamper and optical data storage medium |
| 05/24/2006 | CN1777624A Vinyl addition polycyclic olefin polymers prepared with non-olefinic chain transfer agents and uses thereof |
| 05/24/2006 | CN1776532A Composition for removal of residual material from substrate and method using the composition |
| 05/24/2006 | CN1776531A Method and apparatus for cleaning a semiconductor substrate in an immersion lithography system |
| 05/24/2006 | CN1776530A Auto focus system, auto focus method, and exposure apparatus using the same |
| 05/24/2006 | CN1776529A Method and apparatus for immersion lithography |
| 05/24/2006 | CN1776528A Method for manufacturing optronic circuit board |
| 05/24/2006 | CN1776527A Pneumatic method and apparatus for nano print lithography |
| 05/24/2006 | CN1776526A Warm-up flash two-purpose nano impression device |
| 05/24/2006 | CN1776523A Low cost simple method for making photo etched mask |
| 05/24/2006 | CN1776511A Semi-penetration, semi-reflective pixel structure and its manufacturing method |
| 05/24/2006 | CN1775658A Method for forming surface plasma micronano structure |
| 05/24/2006 | CN1775546A Nano marking press |
| 05/24/2006 | CN1257533C Wet etching apparatus |
| 05/24/2006 | CN1257532C Method for defining dielectric layer with low dielectric constant |