Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
04/2014
04/29/2014US8711328 Stage drive method and stage unit, exposure apparatus, and device manufacturing method
04/29/2014US8711326 Fluid handling structure, a lithographic apparatus and a device manufacturing method
04/29/2014US8711324 Exposure method, exposure apparatus, and method for producing device
04/29/2014US8711323 Lithographic apparatus and device manufacturing method
04/29/2014US8710463 Illuminating waveguide fabrication method
04/29/2014US8709706 Methods and apparatus for performing multiple photoresist layer development and etching processes
04/29/2014US8709705 Metal-containing compositions and method of making same
04/29/2014US8709704 Pattern forming method using developer containing organic solvent and rinsing solution for use in the pattern forming method
04/29/2014US8709703 Methods for forming patterned structures
04/29/2014US8709702 Methods to fabricate a photoactive substrate suitable for microfabrication
04/29/2014US8709701 Resist underlayer film forming composition for lithography, containing aromatic fused ring-containing resin
04/29/2014US8709700 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same
04/29/2014US8709699 Resist composition and method for producing resist pattern
04/29/2014US8709698 Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography
04/29/2014US8709552 Resin composition and display device using the same
04/24/2014WO2014062294A1 Loading/unloading system for printing plates
04/24/2014WO2014062244A1 Negative-working lithographic printing plate precursors
04/24/2014WO2014061760A1 Method for forming pattern and method for producing device
04/24/2014WO2014061710A1 Resist composition
04/24/2014WO2014061708A1 Resin composition for protective film formation, protective film, method for forming pattern, method for manufacturing electronic device, and electronic device
04/24/2014WO2014061674A1 Process for producing permanent film for optical material, cured film produced thereby, and organic el display device and liquid-crystal display device each obtained using said cured film
04/24/2014WO2014061463A1 Composition for lithographic printing plate and lithographic printing plate precursor
04/24/2014WO2014061063A1 Photo-acid generator, and resin composition for photolithography
04/24/2014WO2014061062A1 Sulfonium salt, photoacid generator, curable composition, and resist composition
04/24/2014WO2014060170A1 Actuation mechanism, optical apparatus, lithography apparatus and method of manufacturing devices
04/24/2014WO2014060169A1 Actuation mechanism, optical apparatus, lithography apparatus and method of manufacturing devices
04/24/2014WO2014060149A1 Sensor system for lithography
04/24/2014WO2014059811A1 Off-axis alignment system and alignment method
04/24/2014US20140113386 Systems and devices for moleucle sensing and method of manufacturing thereof
04/24/2014US20140113236 Solvent developable negative resist composition, resist pattern formation method, and method for forming pattern of layer including block copolymer
04/24/2014US20140113235 Supply apparatus which supplies radicals, lithography apparatus, and method of manufacturing article
04/24/2014US20140113233 Photopolymerizable Flexographic Printing Elements for Printing with UV Inks
04/24/2014US20140113232 Self-assemblable polymer and methods for use in lithography
04/24/2014US20140113231 Pigment dispersion, and resist composition for color filter and ink composition each using the pigment dispersion
04/24/2014US20140113230 Positive-type photosensitive resin composition and cured film prepared therefrom
04/24/2014US20140113223 Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device
04/24/2014US20140113220 Apparatus and Method for Lithography Patterning
04/24/2014US20140111862 Light diffusion member, method for producing same, and display device
04/24/2014US20140111786 Catadioptric Projection Objective With Intermediate Images
04/24/2014US20140111785 Illumination optical unit for projection lithography
04/24/2014US20140111783 Exposure apparatus, exposure method, and method for producing device
04/24/2014US20140111782 Lithography apparatus, method for lithography and stage system
04/24/2014US20140111781 Method and apparatus for ultraviolet (uv) patterning with reduced outgassing
04/24/2014US20140111780 Processing apparatus and article manufacturing method using same
04/24/2014US20140111779 Method of overlay prediction
04/24/2014US20140110888 Stabilization of vinyl ether materials
04/24/2014US20140109931 Cleaning Formulations
04/24/2014US20140109785 Lithography process
04/24/2014DE102013212467A1 Optical element for projection exposure system used for e.g. microlithography, has release layer that is provided between base portion and coating portion, so that separation of coating portion from base portion is enabled
04/24/2014DE102013206529A1 Micro actuator for shift of micro mirror of lighting system for projection exposure system, has lever arm extending in direction of actuation element and supported around pivotal axis
04/23/2014EP2722713A2 A printing form precursor having indicia and a method for preparing a printing form from the precursor
04/23/2014EP2722704A2 Projection optical system, and exposure apparatus and exposure method
04/23/2014EP2722703A2 Projection optical system, and exposure apparatus and exposure method
04/23/2014EP2722702A2 Projection optical system, and exposure apparatus and exposure method
04/23/2014EP2721447A2 Procedure of 2d and 3d optically assisted fountain pen nanolithography and aperture pen nanolithography
04/23/2014EP2721446A1 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern
04/23/2014CN203561824U Magnetic fluid protection device
04/23/2014CN203561823U Gluing machine chamber
04/23/2014CN203561765U Etching device for spiral fiber gratings
04/23/2014CN203560870U Light shading type constant-temperature xenon lamp house structure
04/23/2014CN103748969A Radiation source
04/23/2014CN103748968A Radiation source and lithographic apparatus
04/23/2014CN103748699A Optical substrate and semiconductor light-emitting element
04/23/2014CN103748519A Exposure apparatus and method of confining a liquid
04/23/2014CN103748518A Lithographic printing plate precursor and process for producing lithographic printing plate
04/23/2014CN103748517A Silicon-containing resist underlayer film-forming composition having sulfone structure
04/23/2014CN103748516A Photosensitive resin composition, photosensitive film, permanent resist and method for producing permanent resist
04/23/2014CN103748515A Metrology method and apparatus, and device manufacturing method
04/23/2014CN103748131A Resin composition for resists
04/23/2014CN103747870A Substrate surface structured with thermally stable metal alloy nanoparticles, method for preparing the same and uses thereof, in particular as catalyst
04/23/2014CN103745072A Method for automatically expanding defect pattern library
04/23/2014CN103744556A Touch display panel and manufacturing method thereof
04/23/2014CN103744271A Laser direct-writing system and photolithography method
04/23/2014CN103744270A In-situ detection method of odd aberration of photoetching objective
04/23/2014CN103744269A Detection method of wave aberration and optical imaging focal plane of photoetching projection objective
04/23/2014CN103744268A High-accuracy grating ruler motherboard photoetching device
04/23/2014CN103744267A Layout design photoetching technology friendliness detection method based on regular figure filtering
04/23/2014CN103744266A Sulfide semiconductor thermoresistance film for photoetching technique
04/23/2014CN103744214A Exposure method of glass substrate of LCD (Liquid Crystal Display)
04/23/2014CN103744137A Sparkle concave surface grating manufacturing device and manufacturing method
04/23/2014CN103739497A 3-hydroxyl-2-naphthoic acid (1,n-alkylene glycol) diester coupling agent and synthetic method thereof
04/23/2014CN103736606A Integrated outgoing flow channel structure process nozzle
04/23/2014CN102778814B Photo-sensitive composition containing ketoximes ester type photoinitiator and application thereof
04/23/2014CN102681338B Resist pattern improving material, method for forming resist pattern, method for producing semiconductor device, and semiconductor device
04/23/2014CN102472968B Photocurable resin composition
04/23/2014CN102231049B Large-area projection lithography system and alignment method thereof
04/23/2014CN102169226B Catadioptric projection objective
04/23/2014CN101887199B Liquid crystal display and manufacturing method thereof
04/23/2014CN101872122B Blue color composition containing dye, color filter and liquid crystal display device and organic el display provided with the color filter
04/22/2014US8706722 Systems and methods for adaptive scheduling of references to documents
04/22/2014US8705008 Substrate holding unit, exposure apparatus having same, exposure method, method for producing device, and liquid repellant plate
04/22/2014US8705002 Stage drive method and stage unit, exposure apparatus, and device manufacturing method
04/22/2014US8705001 Exposure apparatus, and device manufacturing method
04/22/2014US8704999 Exposure apparatus, exposure method, and method for producing device
04/22/2014US8704998 Lithographic apparatus and device manufacturing method involving a barrier to collect liquid
04/22/2014US8704997 Immersion lithographic apparatus and method for rinsing immersion space before exposure
04/22/2014US8704199 Alignment of collector device in lithographic apparatus
04/22/2014US8703901 Transparent, highly heat-resistant polyimide precursor and photosensitive polyimide composition thereof
04/22/2014US8703409 Method for forming a microstructure
04/22/2014US8703408 Patterning process
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