| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/01/2006 | US20060116494 dropping polymerization of monomers such as 1-hydroxy-3-methacryloyloxyadamantane (HMA), 5-methacryloyloxy-2,6-norbornane carbolactone (MNBL), 2-methacryloyloxy-2-methyladamantane (2-MMA), solvent extraction, redissolving, desolventing; purification; metal-free |
| 06/01/2006 | US20060116493 pure copolymers having monomers such as 1-hydroxy-3-methacryloyloxyadamantane (HMA), 5-methacryloyloxy-2,6-norbornane carbolactone (MNBL), 2-methacryloyloxy-2-methyladamantane (2-MMA); sodium-free |
| 06/01/2006 | US20060116001 Patterning method |
| 06/01/2006 | US20060115997 Method for patterning thin film, method and apparatus for fabricating flat panel display |
| 06/01/2006 | US20060115924 Method of forming a deformed pattern over a substrate |
| 06/01/2006 | US20060115774 Method for reducing wafer charging during drying |
| 06/01/2006 | US20060115769 Correction solution and image correction process of planographic printing plate |
| 06/01/2006 | US20060115767 A cross-linking monomer having at least two ethylenic double bonds, a photopolymerization initiator, an organic solvent, and a mother-glass powder; improved adhesion to an inorganic material and an organic material; fineness |
| 06/01/2006 | US20060115751 Automated overlay metrology system |
| 06/01/2006 | US20060115745 Electron beam exposure mask, electron beam exposure method, and electron beam exposure system |
| 06/01/2006 | US20060115577 Photoresist supply apparatus and method of controlling the operation thereof |
| 06/01/2006 | US20060114546 Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography |
| 06/01/2006 | US20060114476 Exposure apparatus with interferometer |
| 06/01/2006 | US20060114445 Exposure apparatus, and device manufacturing method |
| 06/01/2006 | US20060114441 Lithographic apparatus and device manufacturing method |
| 06/01/2006 | US20060114438 Maskless lithography systems and methods utilizing spatial light modulator arrays |
| 06/01/2006 | US20060114435 Environmental system including vacuum scavenge for an immersion lithography apparatus |
| 06/01/2006 | US20060114434 Apparatus to easily measure reticle blind positioning with an exposure apparatus |
| 06/01/2006 | US20060113621 Methods for aligning semiconductor fabrication molds and semiconductor substrates |
| 06/01/2006 | US20060113291 Method for preparing ball grid array substrates via use of a laser |
| 06/01/2006 | US20060112974 Methods for cleaning a substrate |
| 06/01/2006 | US20060112844 Method for producing flexoprinting forms by means of laser engraving using photopolymer flexoprinting elements and photopolymerisable flexoprinting element |
| 06/01/2006 | US20060112843 Preparing process of printing plate and printing plate material |
| 06/01/2006 | DE19842902B4 Entwicklungssystem zur Herstellung von Halbleiterbauelementen und zugehöriges Steuerungsverfahren Development system for the production of semiconductor devices and related control methods |
| 06/01/2006 | DE19825039B4 Verfahren zum Strukturieren eines chemisch verstärkten Photoresists A method for patterning a chemically amplified photoresists |
| 06/01/2006 | DE102005055145A1 Eliminierung von systematischen Verlusten der Prozessausbeute durch präzise Justierung der Wafer-Platzierung Elimination of systematic loss of process yield by precise adjustment of the wafer placement |
| 06/01/2006 | DE102004058467A1 Wafer scanner used in microlithography comprises an illuminating system, a projection lens, a folding mirror, an optical axis, a concave mirror, a first sliding unit and a second sliding unit |
| 06/01/2006 | DE102004057293A1 Verfahren zur Herstellung von Flexodruckformen sowie dazu geeignetes Flexodruckelement Process for the production of flexographic printing plates and to appropriate flexographic printing |
| 06/01/2006 | DE102004055449A1 Verfahren und Vorrichtung zum thermischen Behandeln von Substraten Method and apparatus for thermal treatment of substrates |
| 06/01/2006 | DE102004055149A1 Vorrichtung und Verfahren zum Abbilden eines Mehrfach-Partikelstrahls auf ein Substrat Apparatus and method for imaging a multiple particle beam onto a substrate |
| 05/31/2006 | EP1662769A1 Composition for forming lower layer film for lithography comprising compound having protected carboxyl group |
| 05/31/2006 | EP1662554A1 Exposure apparatus, exposure method, and device producing method |
| 05/31/2006 | EP1662553A1 Illuminating optical system, exposure system and exposure method |
| 05/31/2006 | EP1662552A1 Pattern plotting device and pattern plotting method |
| 05/31/2006 | EP1662327A2 Substrate Table, Method of Measuring a Position of a Substrate and a Lithographic Apparatus |
| 05/31/2006 | EP1662326A1 Developer for positive photosensitive composition |
| 05/31/2006 | EP1662325A2 Projection optical system and exposure apparatus having the same |
| 05/31/2006 | EP1662324A2 Reticle-carrying container |
| 05/31/2006 | EP1662323A1 Material for forming resist-protecting film for immersion exposure process, resist-protecting film made of such material, and method for forming resist pattern using such resist-protecting film |
| 05/31/2006 | EP1662322A2 Positive type photo-sensitive siloxane composition, curing film formed by the composition and device with the curing film |
| 05/31/2006 | EP1662321A1 Photoresist compositions |
| 05/31/2006 | EP1662320A1 Photoresist compositions |
| 05/31/2006 | EP1662319A2 Photosensitive resin composition |
| 05/31/2006 | EP1662318A1 1,3-dihydro-1-oxo-2H-indene derivative |
| 05/31/2006 | EP1662317A2 Resist composition and method of pattern formation with the same |
| 05/31/2006 | EP1661930A1 Photo-curable resin composition and sealing agent for flat panel display using the same |
| 05/31/2006 | EP1661918A1 Method for producing compound having acid-labile group |
| 05/31/2006 | EP1661731A2 Process for removing residues from a semiconductor substrate |
| 05/31/2006 | EP1661162A2 Plasma ashing process |
| 05/31/2006 | EP1660948A2 Pattern recognition and metrology structure for an x-initiative layout design |
| 05/31/2006 | EP1660946A2 Method and device for lithography by extreme ultraviolet radiation |
| 05/31/2006 | EP1660945A2 Modulator circuitry |
| 05/31/2006 | EP1660944A2 Method of forming optical images, apparatus for carrying out said method and process for manufacturing a device using said method |
| 05/31/2006 | EP1660943A2 Optical image formation using a light valve array and a light converging array |
| 05/31/2006 | EP1660942A2 Method of forming optical images, a control circuit for use with this method, apparatus for carrying out said method and process for manufacturing a device using said method |
| 05/31/2006 | EP1660925A2 Apparatus and method for providing fluid for immersion lithography |
| 05/31/2006 | EP1660561A2 Photosensitive silsesquioxane resin |
| 05/31/2006 | EP1660240A2 Sub-micron-scale patterning method and system |
| 05/31/2006 | EP1497122B1 Stabilized infrared-sensitive polymerizable systems |
| 05/31/2006 | EP1383812B1 Polycyclic fluorine-containing polymers and photoresists for microlithography |
| 05/31/2006 | CN1781058A Photosensitive resin composition, ink-jet recording head using the composition, and production method for the same |
| 05/31/2006 | CN1781057A Negative resist composition for organic insulator of high aperture LCD |
| 05/31/2006 | CN1781049A Method and apparatus for determining the focal position during imaging of a sample |
| 05/31/2006 | CN1780813A Acid generators, sulfonic acids, sulfonyl halides, and radiation-sensitive resin compositions |
| 05/31/2006 | CN1780812A Adamantane derivative and process for producing the same |
| 05/31/2006 | CN1780529A Method for forming a pattern |
| 05/31/2006 | CN1779575A Plasma chamber system and method for cineration of photolithographic patterns thereby |
| 05/31/2006 | CN1779574A Multi-path control system of developer |
| 05/31/2006 | CN1779573A Immersion photolithographic method and instrument with megasonic rinse |
| 05/31/2006 | CN1779572A Aligning position determination by higher off-axis aligning signal |
| 05/31/2006 | CN1779571A Formation of graphic diaphragm layer and barrier |
| 05/31/2006 | CN1779570A Positive type photosensitive paste composition for PDP electrode, PDP electrode prepared therefrom, and PDP comprising the PDP electrode |
| 05/31/2006 | CN1779569A Fluorocycloolefen polymer and its use for bark ultraviolet photoetching glue |
| 05/31/2006 | CN1779568A Hardenable resin composition, hardened body thereof, and printed wiring board |
| 05/31/2006 | CN1778993A High-precision sculpturing method of thick aluminium by dry method |
| 05/31/2006 | CN1778505A Production of extremely profiled fine electrode for processing electric spark |
| 05/31/2006 | CN1258123C Apparatus and method for preventing back sputtering |
| 05/31/2006 | CN1258122C Preparation method of surface plasma resonance image analysis gold film spot array |
| 05/31/2006 | CN1258121C Chemical enlarging positive photoetching glue composition |
| 05/31/2006 | CN1258120C Lithographic template |
| 05/31/2006 | CN1258119C Photo-resist composition containing photo-alkali-generator and photo-acid-generator |
| 05/31/2006 | CN1258118C Method for correcting defect of and grey mask grey part in grey mask |
| 05/31/2006 | CN1258115C Liquid crystal display device and its manufacturing method |
| 05/30/2006 | US7055126 Renesting interaction map into design for efficient long range calculations |
| 05/30/2006 | US7054079 Optical element holder, exposure apparatus, and device fabricating method |
| 05/30/2006 | US7054007 Adjust pattern using optics; calibration adjustment substrate; forming semiconductors |
| 05/30/2006 | US7053990 System to increase throughput in a dual substrate stage double exposure lithography system |
| 05/30/2006 | US7053989 Exposure apparatus and exposure method |
| 05/30/2006 | US7053988 Optically polarizing retardation arrangement, and microlithography projection exposure machine |
| 05/30/2006 | US7053987 Methods and systems for controlling radiation beam characteristics for microlithographic processing |
| 05/30/2006 | US7053986 Projection optical system, exposure apparatus, and device manufacturing method |
| 05/30/2006 | US7053985 Printer and a method for recording a multi-level image |
| 05/30/2006 | US7053984 Method and systems for improving focus accuracy in a lithography system |
| 05/30/2006 | US7053983 Liquid immersion type exposure apparatus |
| 05/30/2006 | US7053982 Alignment apparatus and exposure apparatus |
| 05/30/2006 | US7053981 Lithographic apparatus and device manufacturing method |
| 05/30/2006 | US7053980 Lithographic alignment system |
| 05/30/2006 | US7053388 Dual-mode electron beam lithography machine |
| 05/30/2006 | US7053387 Pattern drawing method by scanning beam and pattern drawing apparatus |
| 05/30/2006 | US7053371 Scanning electron microscope with measurement function |