| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/07/2006 | EP1444552B8 Method for reuse of loaded developer |
| 06/07/2006 | EP1392508A4 Anti-reflective coating composition with improved spin bowl compatibility |
| 06/07/2006 | EP1373983B1 Lithograph with a trigger mask, method of production of digital holograms in a storage medium and microscope |
| 06/07/2006 | EP1317498B1 Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization |
| 06/07/2006 | EP1171803B1 Photo-curable polymer composition and flexographic printing plates containing the same |
| 06/07/2006 | EP1151211B8 Method and device for vibration control |
| 06/07/2006 | CN1784766A Method for improving surface roughness of processed film of substrate and apparatus for processing substrate |
| 06/07/2006 | CN1784633A Photosensitive resin composition and dry film resist using the same |
| 06/07/2006 | CN1784623A Projection optical system,exposure apparatus and exposure method |
| 06/07/2006 | CN1784487A Non-aqueous, non-corrosive microelectronic cleaning compositions |
| 06/07/2006 | CN1784429A Novel trifunctional photoinitiators |
| 06/07/2006 | CN1783458A Method for manufacturing a display device and method for forming a pattern |
| 06/07/2006 | CN1783422A Pattern control system |
| 06/07/2006 | CN1783366A Electronic device having organic material based insulating layer and method for fabricating the same |
| 06/07/2006 | CN1782887A Developing device for column spray developing and fog spray developing optionally |
| 06/07/2006 | CN1782886A Lithographic apparatus and device manufacturing method |
| 06/07/2006 | CN1782885A Light source unit for scanning type exposure |
| 06/07/2006 | CN1782884A Substrate table, method of measuring a position of a substrate and a lithographic apparatus |
| 06/07/2006 | CN1782883A Lithographic apparatus, device manufacturing method, and a projection element for use in the lithographic apparatus |
| 06/07/2006 | CN1782882A Apparatus and method for marking an identifying code by using laser beam |
| 06/07/2006 | CN1782881A Method and apparatus for variable polarization control in a lithography system |
| 06/07/2006 | CN1782880A Scanner system |
| 06/07/2006 | CN1782879A Method for producing nano T-shape grid by single nano impression |
| 06/07/2006 | CN1782878A Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film |
| 06/07/2006 | CN1782877A Anti-corrosion agent composition |
| 06/07/2006 | CN1782876A Fluorinated photoresist materials with improved etch resistant properties |
| 06/07/2006 | CN1782875A Photosensitive resin composition |
| 06/07/2006 | CN1782874A Photosensitive composition for forming light shading film, black bottom formed from said light shading film for photosensitive composition |
| 06/07/2006 | CN1782873A Photosensitive resin composition and method for preparing the same and photosensitive film comprising the same |
| 06/07/2006 | CN1782872A Composition for forming antireflection coating |
| 06/07/2006 | CN1782869A Thermal detector of contracted photolithographic mask |
| 06/07/2006 | CN1782868A Photo mask and method for manufacturing patterns using the same |
| 06/07/2006 | CN1782867A Reticle and method of fabricating semiconductor device |
| 06/07/2006 | CN1782866A UV-absorbing support layers and flexographic printing elements comprising same |
| 06/07/2006 | CN1782838A Liquid crystal display device and fabricating method thereof |
| 06/07/2006 | CN1782831A Liquid crystal display and its producing method |
| 06/07/2006 | CN1782829A Liquid crystal display and its producing method |
| 06/07/2006 | CN1781826A Reticle-carrying container |
| 06/07/2006 | CN1781723A Qptic micro switch printer |
| 06/07/2006 | CN1781716A Method of manufacturing liquid discharge head, and liquid discharge head |
| 06/07/2006 | CN1258696C Anti-corrosion pattern, its producing method and its use |
| 06/07/2006 | CN1258695C Correction for optical proximity effect of contact holes, mask and manufacturing method for semiconductor device |
| 06/07/2006 | CN1258694C Pattern recording apparatus and method |
| 06/06/2006 | US7058923 Optical proximity effect correcting method and mask data forming method in semiconductor manufacturing process, which can sufficiently correct optical proximity effect, even under various situations with regard to size and shape of design pattern, and space width and position relation between design patterns |
| 06/06/2006 | US7058627 Reticle management system |
| 06/06/2006 | US7058109 Image amplification for laser systems |
| 06/06/2006 | US7058107 Line selected F2 two chamber laser system |
| 06/06/2006 | US7057832 Microlens for projection lithography and method of preparation thereof |
| 06/06/2006 | US7057820 Projection optical system |
| 06/06/2006 | US7057739 Separated beam multiple degree of freedom interferometer |
| 06/06/2006 | US7057736 Cyclic error reduction in average interferometric position measurements |
| 06/06/2006 | US7057715 Lithography tool test patterns and method |
| 06/06/2006 | US7057711 Lithography tool having a vacuum reticle library coupled to a vacuum chamber |
| 06/06/2006 | US7057710 Stage system including fine-motion cable unit, exposure apparatus, and method of manufacturing device |
| 06/06/2006 | US7057709 Printing a mask with maximum possible process window through adjustment of the source distribution |
| 06/06/2006 | US7057708 Projection optical system, exposure apparatus and device fabrication method |
| 06/06/2006 | US7057706 Exposure device |
| 06/06/2006 | US7057705 Lithographic apparatus, device manufacturing method, performance measuring method, calibration method and computer program |
| 06/06/2006 | US7057703 Exposure apparatus |
| 06/06/2006 | US7057702 Lithographic apparatus and device manufacturing method |
| 06/06/2006 | US7057701 Exposure apparatus |
| 06/06/2006 | US7057313 Cooling of voice coil motors |
| 06/06/2006 | US7057263 Semiconductor wafer assemblies comprising photoresist over silicon nitride materials |
| 06/06/2006 | US7057261 Mixed LVR and HVR reticle set design for the processing of gate arrays, embedded arrays and rapid chip products |
| 06/06/2006 | US7057193 Exposure apparatus |
| 06/06/2006 | US7057190 Lithographic projection apparatus, particle barrier for use therein, integrated structure manufacturing method, and device manufactured thereby |
| 06/06/2006 | US7056959 Comprises alkali soluble resin, phthalocyanine dye, and photosensitive compound; for photopolymerization; for use in liquid crystal displays; heat/light resistance |
| 06/06/2006 | US7056872 Cleaning solution comprising water and amine compounds such as ammonium hydroxide or triethanolamine; environmentally friendly as water is the solvent |
| 06/06/2006 | US7056840 reducing dielectric constant; mixture of polysilsesquioxane and porogen; exposure to power source ; adjust solubility |
| 06/06/2006 | US7056834 Forming a plurality of thin-film devices using imprint lithography |
| 06/06/2006 | US7056824 Electronic device manufacture |
| 06/06/2006 | US7056805 Substrate provided with an alignment mark in a substantially transmissive process layer, mask for exposing said mark, device manufacturing method, and device manufactured thereby |
| 06/06/2006 | US7056666 Labeling a terminal monomer and scanning to determine the position; can analyze hundreds of macromolecules simultaneously |
| 06/06/2006 | US7056648 Method for isotropic etching of copper |
| 06/06/2006 | US7056647 Semiconductors |
| 06/06/2006 | US7056646 Use of base developers as immersion lithography fluid |
| 06/06/2006 | US7056645 Use of chromeless phase shift features to pattern large area line/space geometries |
| 06/06/2006 | US7056644 electrolysis of aluminum supports to form roughened surfaces, then coating with layers containing monomer having an ethylenic double bond which is also polymerizable, photoinitiators and polymer binders, then drying; lithographic plates having high sensitivity and printing durability |
| 06/06/2006 | US7056643 forming images using water soluble and insoluble phenolic resins and surfactants; lithography |
| 06/06/2006 | US7056642 Method of graft polymerization and variety of materials utilizing the same as well as producing method thereof |
| 06/06/2006 | US7056641 photoresists comprising mixtures of polybenzoxazole precursor polymers, sensitizers and solvents, used to form relief images or patterns on substrates; electronics; lithography |
| 06/06/2006 | US7056640 Improved resolution, improved focus latitude, and minimized line width variation or shape degradation even on long-term PED. |
| 06/06/2006 | US7056639 Imageable composition containing an infrared absorber with counter anion derived from a non-volatile acid |
| 06/06/2006 | US7056631 Exposure system and method with group compensation |
| 06/06/2006 | US7056630 Color wheel fabrication method |
| 06/06/2006 | US7056625 Focus detection structure |
| 06/06/2006 | US7056624 Single side engraving type which comprises a shifter part and a non- shifter part on a substrate; shading layer pattern formed with a shading film which covers continuously including the sidewall part of the recess |
| 06/06/2006 | US7056447 Semiconductor processing methods |
| 06/06/2006 | US7056416 Atmospheric pressure plasma processing method and apparatus |
| 06/06/2006 | US7055432 Apparatus and method for conveying material to an imaging drum |
| 06/06/2006 | US7055431 Apparatus for loading and unloading a supply of plates in an automated plate handler |
| 06/06/2006 | CA2347945C Multilayered photosensitive material for flexographic printing plate |
| 06/01/2006 | WO2006058150A2 Multilevel fabrication processing by functional regrouping of material deposition, lithography, and etching |
| 06/01/2006 | WO2006057659A1 Growth of carbon nanotubes at low temperature on a transition metal layer |
| 06/01/2006 | WO2006057385A1 Photosensitive resin composition, photosensitive film for permanent resist, method for forming resist pattern, printed wiring board, and semiconductor device |
| 06/01/2006 | WO2006057345A1 Photoresist coating liquid supplying apparatus, and photoresist coating liquid supplying method and photoresist coating apparatus using such photoresist coating liquid supplying apparatus |
| 06/01/2006 | WO2006056730A2 Protection of surfaces exposed to charged particles |
| 06/01/2006 | WO2006056298A1 Resist stripper and residue remover for cleaning copper surfaces in semiconductor processing |
| 06/01/2006 | WO2006041544A3 Solid immersion lens lithography |
| 06/01/2006 | WO2005106592A3 High resolution in-situ illumination source measurement in projection imaging systems |