| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/08/2006 | WO2006059720A1 Exposure apparatus, exposure method and device manufacturing method |
| 06/08/2006 | WO2006059693A1 Method for manufacturing display and display |
| 06/08/2006 | WO2006059636A1 Exposure device and device manufacturing method |
| 06/08/2006 | WO2006059634A1 Stage device and exposure apparatus |
| 06/08/2006 | WO2006059625A1 Device processing system, information display method, program, and recording medium |
| 06/08/2006 | WO2006059569A1 Positive resist composition and method of forming resist pattern |
| 06/08/2006 | WO2006059555A1 Composition for forming antireflection film, layered product, and method of forming resist pattern |
| 06/08/2006 | WO2006059549A1 Illumination optical device, manufacturing method thereof, exposure device, and exposure method |
| 06/08/2006 | WO2006059534A1 Pattern forming material and pattern forming method |
| 06/08/2006 | WO2006059532A1 Material for pattern formation, apparatus for pattern formation, and method for pattern formation |
| 06/08/2006 | WO2006059484A1 Lithographic printing plate material and lithographic printing method |
| 06/08/2006 | WO2006059477A1 Lithographic printing plate-use correcting fluid and image correcting method for lithographic printing plate |
| 06/08/2006 | WO2006059458A1 Oxime ester compound and photopolymerization initiator comprising the compound |
| 06/08/2006 | WO2006059452A1 Method for forming photoresist pattern using double layer antireflection film |
| 06/08/2006 | WO2006059435A1 Positive photosensitive composition |
| 06/08/2006 | WO2006059392A1 Chemical amplification photoresist composition, photoresist layer laminate, method for producing photoresist composition, method for producing photoresist pattern and method for producing connecting terminal |
| 06/08/2006 | WO2006059377A1 Semiconductor device, manufacturing method thereof and photomask |
| 06/08/2006 | WO2006059275A2 Method and apparatus for operating an electrical discharge device |
| 06/08/2006 | WO2006058754A2 Beam delivery system and projection exposure system |
| 06/08/2006 | WO2006058731A2 Radiation-curable coating substances |
| 06/08/2006 | WO2005124464A3 Vacuum system for immersion photolithography |
| 06/08/2006 | WO2005116771A3 Wavelength selector for the soft x-ray range and the extreme ultraviolet range |
| 06/08/2006 | WO2005111717A3 Image recording method |
| 06/08/2006 | WO2005111689A3 Catadioptric projection objective with intermediate images |
| 06/08/2006 | WO2005109104A3 Optical component having an improved thermal behavior |
| 06/08/2006 | WO2005089131A3 Lpp euv light source |
| 06/08/2006 | WO2005081069A8 Method to determine the value of process parameters based on scatterometry data |
| 06/08/2006 | WO2005059645A9 Microlithography projection objective with crystal elements |
| 06/08/2006 | WO2005052016B1 Bottom antireflective coatings |
| 06/08/2006 | US20060123380 Computer automated method for designing an integrated circuit, a computer automated system for designing an integrated circuit, and a method of manufacturing an integrated circuit |
| 06/08/2006 | US20060122348 claimed monomer is fluorinated alpha,omega-diene having pendant ether or ester groups; cyclopolymerization produces fluoropolymer having alicyclic structure in the main chain with pendant functional groups; high transparency in a wide wavelength region; chemical stability, heat resistance; photoresist |
| 06/08/2006 | US20060122346 Synthesis of photoresist polymers |
| 06/08/2006 | US20060122085 Compositions and methods for high-efficiency cleaning of semiconductor wafers |
| 06/08/2006 | US20060121649 Methods for fabricating stiffeners for flexible substrates |
| 06/08/2006 | US20060121396 Method for exposing a substrate with a beam |
| 06/08/2006 | US20060121395 photoselective metal deposition; create 2-D and 3-D patterns on objects using etching and deposition techniques; ease of use, reasonable cost, eliminates the need for the use of physical masks |
| 06/08/2006 | US20060121394 Shallow trench filled with two or more dielectrics for isolation and coupling for stress control |
| 06/08/2006 | US20060121374 Method for determining pattern misalignment over a substrate |
| 06/08/2006 | US20060121368 Photomask structure and method of reducing lens aberration and pattern displacement |
| 06/08/2006 | US20060121366 Semiconductors, liquid crystal displays; patterning any size or shape by exposure using only one photomask; the mask pattern has a light-shielding film and a phase shifter; light shield zones; chromium film and phase shifting mask on radiation transparent substrate; design masking pattern |
| 06/08/2006 | US20060121357 Large pattern printing |
| 06/08/2006 | US20060120717 Developing method and apparatus for performing development processing properly and a solution processing method enabling enhanced uniformity in the processing |
| 06/08/2006 | US20060120429 Collector optical system, light source unit, illumination optical apparatus, and exposure apparatus |
| 06/08/2006 | US20060119947 Efficiently illuminating a modulating device |
| 06/08/2006 | US20060119932 Manufacture of shaped structures in lcd cells, and masks therefor |
| 06/08/2006 | US20060119838 Optical measuring apparatus and operating method for an optical imaging system |
| 06/08/2006 | US20060119827 Maskless optical writer |
| 06/08/2006 | US20060119826 Polarization rotator and a crystalline-quartz plate for use in an optical imaging system |
| 06/08/2006 | US20060119823 Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method and exposure apparatus, program, and device manufacturing method |
| 06/08/2006 | US20060119822 Projection exposure apparatus and projection optical system |
| 06/08/2006 | US20060119820 Exposure apparatus and device manufacturing method |
| 06/08/2006 | US20060119819 Projection exposure mask, projection exposure apparatus, and projection exposure method |
| 06/08/2006 | US20060119818 Exposure apparatus and method for manufacturing device |
| 06/08/2006 | US20060118922 Selectively growing a polymeric material on a semiconductor substrate |
| 06/08/2006 | US20060118522 Etching composition and use thereof with feedback control of HF in BEOL clean |
| 06/08/2006 | US20060118266 Method and apparatus for production of a cast component |
| 06/08/2006 | US20060118231 Manufacture of organically developable, photopolymerizable flexo-graphic elements on flexible matallic supports |
| 06/08/2006 | DE102005054000A1 Process and installation to expose light-sensitive material of screen, flat, embossed, flexo or offset printing block using overlapping columned or lined micro-mechanical mirror system |
| 06/08/2006 | DE102005038087A1 New high antireflection-coating polymers useful for forming samples for semiconductor devices and in immersion lithography |
| 06/08/2006 | DE102004058813A1 Maske und Belichtungseinrichtung Mask and exposure apparatus |
| 06/08/2006 | DE102004058584A1 Strahlungshärtbare Beschichtungsmassen Radiation-curable coating compositions |
| 06/08/2006 | DE102004057759A1 Reducing critical dimension variations caused by scattered light in functional structures formed by photolithographic imaging comprises using two masks, one with a reduced bright-field content |
| 06/08/2006 | DE102004031398B4 Verfahren zur photolithographischen Projektion eines Musters auf einen Halbleiterwafer mit einer alternierenden Phasenmaske Photolithographic process for projecting a pattern on a semiconductor wafer with an alternating phase mask |
| 06/08/2006 | DE102004024649A1 Justiereinrichtung und Vorrichtung zum Justieren eines Wafers And adjusting device for adjusting a wafer |
| 06/08/2006 | DE10164306B4 Doppelbelichtung mit abbildenden Hilfstrukturen und verschiedenen Belichtungstools Double exposure with imaging auxiliary structures and different exposure tools |
| 06/07/2006 | EP1667211A1 Projection exposure apparatus, cleaning and maintenance methods of projection exposure apparatus, and method of producing device |
| 06/07/2006 | EP1667210A1 Exposure apparatus and device producing method |
| 06/07/2006 | EP1667130A1 Disk master producing method, disk master producing device,method for detecting difference in disk master travel distance, and device for detecting difference in disk master travel distance |
| 06/07/2006 | EP1666988A1 Holographic recording medium, holographic recording method, and holographic information medium |
| 06/07/2006 | EP1666973A1 Lithographic apparatus and device manufacturing method |
| 06/07/2006 | EP1666972A1 Polyamide acid-containing composition for forming antireflective film |
| 06/07/2006 | EP1666971A1 Positive resist composition and resist laminate for low-acceleration electron beam and method of pattern formation |
| 06/07/2006 | EP1666970A1 Compound for resist and radiation-sensitive composition |
| 06/07/2006 | EP1666969A1 Photosensitive insulating resin composition and cured product thereof |
| 06/07/2006 | EP1666968A1 Photoresist compositions |
| 06/07/2006 | EP1666957A1 Multi-face substrate for color filter and method for producing the same |
| 06/07/2006 | EP1666865A1 Illuminant distribution evaluating method, optical member manufacturing method, illumination optical device, exposure apparatus, and exposure method |
| 06/07/2006 | EP1666187A1 Apparatus and method for producing flexographic printing plates by means of laser light |
| 06/07/2006 | EP1666186A1 Apparatus and method for producing printing plates for intaglio printing by means of laser light |
| 06/07/2006 | EP1664935A1 Stripping and cleaning compositions for microelectronics |
| 06/07/2006 | EP1664934A2 Immersion lithography method and device for illuminating a substrate |
| 06/07/2006 | EP1664933A1 Euv projection lens with mirrors made from materials with differing signs for the rise in temperature dependence of the thermal expansion coefficient around the zero transition temperature |
| 06/07/2006 | EP1664932A2 Interferometric analysis of surfaces |
| 06/07/2006 | EP1664931A2 Surface triangulation and profiling through a thin film coating |
| 06/07/2006 | EP1664930A2 Optically addressed extreme ultraviolet modulator and lithography system incorporating modulator |
| 06/07/2006 | EP1664929A2 Systems and methods for fabricating microstructures by imaging a radiation sensitive layer sandwiched between outer layers, and microstructures fabricated thereby |
| 06/07/2006 | EP1664928A2 Positive photoresist composition and resist pattern formation |
| 06/07/2006 | EP1664927A1 Low-polydispersity photoimageable acrylic polymers, photoresists and processes for microlithography |
| 06/07/2006 | EP1664926A2 Microlithography method using a mask with curved surface |
| 06/07/2006 | EP1664925A2 Imprint lithography templates having alignment marks |
| 06/07/2006 | EP1664923A1 Negative resist composition with fluorosulfonamide-containing polymer |
| 06/07/2006 | EP1664894A1 Programmable optical component for spatially controlling the intensity of beam of radiation |
| 06/07/2006 | EP1664885A2 Catadioptric imaging system for broad band microscopy |
| 06/07/2006 | EP1664880A2 Apparatus for manipulation of an optical element |
| 06/07/2006 | EP1664858A1 Method for production of micro-optics structures |
| 06/07/2006 | EP1663851A2 Systems and methods for mastering microstructures through a substrate using negative photoresist and microstructure masters so produced |
| 06/07/2006 | EP1590101B1 Methods and device for removing cross-linked polymers from metal structures |
| 06/07/2006 | EP1567288A4 ANTI-REFLECTIVE COATING COMPOSITIONS FOR USE WITH LOW k DIELECTRIC MATERIALS |
| 06/07/2006 | EP1485944A4 Laser assisted direct imprint lithography |
| 06/07/2006 | EP1459132B1 Multiphoton photosensitization system |