| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/14/2006 | DE10120660B4 Verfahren zur Strukurierung einer Photolackschicht Method for Strukurierung a photoresist layer |
| 06/14/2006 | DE10054121B4 Verfahren zur Strukturierung einer Photolackschicht A method for patterning a photoresist layer |
| 06/14/2006 | CN1788333A Exposure apparatus and device manufacturing method |
| 06/14/2006 | CN1788239A Negative photoresist composition |
| 06/14/2006 | CN1788238A Composition for dielectric of plasma display panel, laminate for dielectric, and method for forming the dielectric |
| 06/14/2006 | CN1788237A Method for evaluating the effects of multiple exposure processes in lithography |
| 06/14/2006 | CN1787969A Filter cartridge for fluid for treating surface of electronic device substrate |
| 06/14/2006 | CN1787917A Development enhancement of radiation-sensitive elements |
| 06/14/2006 | CN1787200A Method for controlling pre-aligning of silicon wafer |
| 06/14/2006 | CN1787174A Method for protecting self aligncing silicon compound barrier layer |
| 06/14/2006 | CN1786834A Remover composition |
| 06/14/2006 | CN1786833A Substrate placement in immersion lithography |
| 06/14/2006 | CN1786832A Lithographic apparatus and device manufacturing method |
| 06/14/2006 | CN1786831A Lithographic projection apparatus and actuator |
| 06/14/2006 | CN1786830A Method of forming a photoresist pattern |
| 06/14/2006 | CN1786829A Substrate processing apparatus |
| 06/14/2006 | CN1786828A Substrate processing apparatus and substrate processing method |
| 06/14/2006 | CN1786827A Substrate processing apparatus |
| 06/14/2006 | CN1786826A Lithographic apparatus, reticle exchange unit and device manufacturing method |
| 06/14/2006 | CN1786825A Method for controlling multi bus time and sequence synchronization of advanced scanning projecting photoetching machine |
| 06/14/2006 | CN1786824A Method for mfg. surface pattern of panel |
| 06/14/2006 | CN1786823A Method for mfg. achromatic light variation image |
| 06/14/2006 | CN1786822A Method and system for imaging interference photoetching adopting white laser |
| 06/14/2006 | CN1786821A Laminated mark for shifting of photosensitive polyimide film and detecting method thereof |
| 06/14/2006 | CN1786820A Barrier film material and pattern formation method using the same |
| 06/14/2006 | CN1786800A Film crystal tube printing mfg. method |
| 06/14/2006 | CN1786752A Photosensitive resin composition for color filter and method for mfg. LCD color filter by same |
| 06/14/2006 | CN1786746A Producing method of stamper for light guide plate |
| 06/14/2006 | CN1786742A Process for mfg. unidimensional X ray refracted diffraction micro structural component of aluminium material |
| 06/14/2006 | CN1786741A Process for mfg. one-dimensional X ray refracted diffraction micro structural component of polymethyl methyl acrylate material |
| 06/14/2006 | CN1259691C Continuous scanning synchronous control method and system for step scanning photoetching machine |
| 06/14/2006 | CN1259599C Process for writing registration photoetching grating into crystals |
| 06/14/2006 | CN1259598C Quasi-molecule laser electrochemical microstructure manufacturing method and equipment |
| 06/14/2006 | CN1259597C Light cover combination and exposure method for forming threadlet pattern therewith |
| 06/14/2006 | CN1259596C Exposure method and device |
| 06/14/2006 | CN1259595C Chemical amplifying type positive photolithographic gelatin composition |
| 06/14/2006 | CN1259349C Resins curable with actinic radiation, process for production thereof, and photo- and thermo-setting resin composition |
| 06/14/2006 | CN1259189C Application type positive property thermal sensitive computer direct board and process for making same |
| 06/13/2006 | US7062747 Method and apparatus for prepareing patterns used for manufacture of semiconductor device |
| 06/13/2006 | US7062396 Apparatus for optical proximity correction, method for optical proximity correction, and computer program product for optical proximity correction |
| 06/13/2006 | US7062354 Multi-layer printed circuit board fabrication system and method |
| 06/13/2006 | US7062343 Remote maintenance system |
| 06/13/2006 | US7062010 Method for adjusting gap between two objects and exposure method using the same, gap adjusting apparatus, and exposure apparatus |
| 06/13/2006 | US7061961 Very narrow band, two chamber, high rep-rate gas discharge laser system |
| 06/13/2006 | US7061698 Lens system, in particular a projection lens system for semiconductor lithography |
| 06/13/2006 | US7061671 Method for evaluating image formation performance |
| 06/13/2006 | US7061627 Optical scatterometry of asymmetric lines and structures |
| 06/13/2006 | US7061623 Interferometric back focal plane scatterometry with Koehler illumination |
| 06/13/2006 | US7061603 Method for inspecting exposure apparatus |
| 06/13/2006 | US7061591 Maskless lithography systems and methods utilizing spatial light modulator arrays |
| 06/13/2006 | US7061589 Conduit for pumping light transmission into interior cavity between pellicle and masking structure |
| 06/13/2006 | US7061587 Control system, lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 06/13/2006 | US7061586 Lithographic apparatus and device manufacturing method |
| 06/13/2006 | US7061584 Multi-axis projection imaging system |
| 06/13/2006 | US7061583 Lithography apparatus |
| 06/13/2006 | US7061582 Exposure apparatus including micro mirror array and exposure method using the same |
| 06/13/2006 | US7061580 Exposure apparatus and device fabrication method |
| 06/13/2006 | US7061579 Lithographic apparatus and device manufacturing method |
| 06/13/2006 | US7061578 Method and apparatus for monitoring and controlling imaging in immersion lithography systems |
| 06/13/2006 | US7061577 Image adjustor including damping assembly |
| 06/13/2006 | US7061576 Exposure apparatus and method of cleaning optical element of the same |
| 06/13/2006 | US7061575 Projection exposure apparatus and method |
| 06/13/2006 | US7061574 Lithographic apparatus with contamination suppression, device manufacturing method, and device manufactured thereby |
| 06/13/2006 | US7061573 Contamination prevention in optical system |
| 06/13/2006 | US7061517 Exposure head |
| 06/13/2006 | US7061226 Method to detect a defective element |
| 06/13/2006 | US7061081 Resin composition, heat-resistant resin paste and semiconductor device using them and method for manufacture thereof |
| 06/13/2006 | US7061019 Semiconductor circuit array substrate with a photo-electric sensor portion |
| 06/13/2006 | US7060994 Exposure apparatus and method |
| 06/13/2006 | US7060993 Device, EUV-lithographic device and method for preventing and cleaning contamination on optical elements |
| 06/13/2006 | US7060990 Stage base, substrate processing apparatus, and maintenance method for stage |
| 06/13/2006 | US7060984 Multi-charged beam lens and charged beam exposure apparatus using the same |
| 06/13/2006 | US7060775 Polymer compound, resist material and pattern formation method |
| 06/13/2006 | US7060637 Methods of forming intermediate semiconductor device structures using spin-on, photopatternable, interlayer dielectric materials |
| 06/13/2006 | US7060635 Method of manufacturing semiconductor device and method of forming pattern |
| 06/13/2006 | US7060623 Method of deforming a pattern and semiconductor device formed by utilizing deformed pattern |
| 06/13/2006 | US7060519 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server |
| 06/13/2006 | US7060422 Method of supercritical processing of a workpiece |
| 06/13/2006 | US7060421 Conductor track structures and method for production thereof |
| 06/13/2006 | US7060419 Photopolymers; exposure to light; three-dimensional pattern |
| 06/13/2006 | US7060418 Method for the manufacture of a printed circuit and planar antenna manufactured with this printed circuit |
| 06/13/2006 | US7060417 removing the edges of the coversheet of photosensitive printing elements, applying cure prevention composition, then removing the remainder of the coversheet from the photosensitive printing element;edge cure prevention composition is applied only to edges; automatic |
| 06/13/2006 | US7060416 a copolymer of N-phenylmaleimide, N-cyclohexylmaleimide, or N-benzylmaleimide, an acrylamide, an acrylonitrile, and an olefin with a pendant urea and aromatic groups; lithographic printing plates |
| 06/13/2006 | US7060415 Printing plate precursor comprising solvent-resistant copolymer |
| 06/13/2006 | US7060414 2,4,6-trimethylphenyldiphenylsulfonium 2,4-difluorobenzenesulfonate; a photoacid generator, sensitive to far ultraviolet radiation; excellant resolution |
| 06/13/2006 | US7060413 Radiation sensitive compositions and methods |
| 06/13/2006 | US7060412 During exposure to heat does not involve the ablation of exposed regions by vaporization and which after the stage of exposure to heat does not involve removal of the unexposed regions with a developer bath |
| 06/13/2006 | US7060410 Novolak resin solution, positive photoresist composition and preparation method thereof |
| 06/13/2006 | US7060409 Imageable elements with improved dot stability |
| 06/13/2006 | US7060402 rotating a template about a first and a second axis to with respect to the substrate, maintaining the orientation in response to a force being exerted upon said template; photolithograghy for semiconductor wafers |
| 06/13/2006 | US7060400 Method to improve photomask critical dimension uniformity and photomask fabrication process |
| 06/13/2006 | US7060399 a multilayer optical mirror of a substrate and reflective layers, and a capping layer on which an artificial oxide layer forms in air and is doped to improve optical properties during a lithographic exposure of semiconductor products |
| 06/13/2006 | US7060395 Light shield zones; chromium film and phase shifting mask on radiation transparent substrate; design masking pattern |
| 06/13/2006 | US7060324 Moving a liquid between a substrate and a template, forming an oblique angle in a plane reducing the distance between substrate and plane and forming a dispersion |
| 06/13/2006 | US7059778 Optical fiber bundle, light source device using the optical fiber bundle, and method for manufacturing the light source device |
| 06/13/2006 | US7059607 Positioning apparatus |
| 06/13/2006 | US7059246 Process for obtaining image information of an illustrated printing form, device for this and printing press |
| 06/08/2006 | WO2006060218A2 Coextruded toner receiver layer for electrophotography |
| 06/08/2006 | WO2006059760A1 Method for treating development waste liquid |
| 06/08/2006 | WO2006059747A1 Process for producing resist pattern and conductor pattern |