| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/15/2006 | WO2006047079A3 Polymeric conductor donor and transfer method |
| 06/15/2006 | WO2006019581B1 Apparatus and method for thermally developing flexographic printing elements |
| 06/15/2006 | WO2005111722A3 Apparatus and method for providing fluid for immersion lithography |
| 06/15/2006 | WO2005038523A3 Imprint lithography templates having alignment marks |
| 06/15/2006 | US20060129967 System, method and program for generating mask data, exposure mask and semiconductor device in consideration of optical proximity effects |
| 06/15/2006 | US20060128914 Monomers selected from1-trifluoro-2-trifluoromethyl-2-hydroxy-(4 or 5)-pentyl (meth)acrylate or 2-{[5-(1',1',1'-trifluoro-2'-trifluoromethyl-2'-hydroxy)propyl]norbornyl]}(meth)acrylate |
| 06/15/2006 | US20060128835 Capsule type hardener and composition |
| 06/15/2006 | US20060128822 Composition for holography, method of curing the same, and cured article |
| 06/15/2006 | US20060128129 Nanometer-scale memory device utilizing self-aligned rectifying elements and method of making |
| 06/15/2006 | US20060128041 Misalignment test structure and method thereof |
| 06/15/2006 | US20060127898 Holographic sensor based on a volume hologram in a porous medium |
| 06/15/2006 | US20060127825 Developer composition for resists and method for formation of resist pattern |
| 06/15/2006 | US20060127823 Multi reticle exposures |
| 06/15/2006 | US20060127821 Method of forming a photoresist pattern |
| 06/15/2006 | US20060127820 Method for forming photoresist pattern and method for triming photoresist pattern |
| 06/15/2006 | US20060127818 Method for manufacturing high-transmittance optical filter for image display devices |
| 06/15/2006 | US20060127817 In-line fabrication of curved surface transistors |
| 06/15/2006 | US20060127816 Double photolithography methods with reduced intermixing of solvents |
| 06/15/2006 | US20060127815 Pattern forming method and method of manufacturing semiconductor device |
| 06/15/2006 | US20060127811 Lithographic apparatus and device manufacturing method |
| 06/15/2006 | US20060127810 Lithographic printing plate precursor and method of producing printing plate |
| 06/15/2006 | US20060127809 Unsaturated compound (dipentaerythritol hexaacrylate) and macromolecular compound having units of sulfonium, iodonium, diazonium or azinium salts of carboxylic acid, ketocarboxylic acid, sulfonic acids or sulfonamides; superior in recording sensitivity and printing durability |
| 06/15/2006 | US20060127808 Positive type resist composition and resist pattern formation method using same |
| 06/15/2006 | US20060127807 Smooth surface photresist pattern; using acrylated ester and acid generator; for use with a wavelength of no more than 200 nm, and particularly an ArF excimer laser |
| 06/15/2006 | US20060127806 Copolymers of (meth)acrylic esters containing an adamantyl, 1,4-methanonaphthyl, 1,4:5,8-dimethanonaphthyl, 4,7-methanoindanyl, or 4,7-methanoisobenzofuranyl moiety as a dissolution inhibitor, an acid generator and a polar solvent; improved edge and surface smoothness, resolution and depth of focus range |
| 06/15/2006 | US20060127801 Resist polymer and resist composition |
| 06/15/2006 | US20060127799 Method for forming resist pattern and resist pattern |
| 06/15/2006 | US20060127798 Resist and method of forming resist pattern |
| 06/15/2006 | US20060127595 Methods and apparatus for selective, oxidative patterning of a surface |
| 06/15/2006 | US20060127575 Substrate coating unit and substrate coating method |
| 06/15/2006 | US20060127522 Lithographic apparatus for molding ultrafine features |
| 06/15/2006 | US20060126916 Template generating method and apparatus of the same, pattern detecting method, position detecting method and apparatus of the same, exposure apparatus and method of the same, device manufacturing method and template generating program |
| 06/15/2006 | US20060126697 Very narrow band, two chamber, high rep-rate gas discharge laser system |
| 06/15/2006 | US20060126195 Device for receiving an optical module in an imaging unit |
| 06/15/2006 | US20060126146 Light beam deflector |
| 06/15/2006 | US20060126053 Apparatus for characterization of photoresist resolution, and method of use |
| 06/15/2006 | US20060126051 Exposure apparatus |
| 06/15/2006 | US20060126049 Illumination system for a microlithography projection exposure apparatus |
| 06/15/2006 | US20060126046 Lithographic apparatus and method for optimizing illumination using a photolithographic simulation |
| 06/15/2006 | US20060126045 Coupling apparatus, exposure apparatus, and device fabricating method |
| 06/15/2006 | US20060126044 Exposure apparatus and method for producing device |
| 06/15/2006 | US20060126043 Exposure apparatus and method for producing device |
| 06/15/2006 | US20060126042 Reticle-processing system |
| 06/15/2006 | US20060125913 Writing of photo-induced structures |
| 06/15/2006 | US20060125154 Method to improve the flow rate of imprinting material employing an absorption layer |
| 06/15/2006 | US20060125120 Method of fabricating polycrystalline silicon |
| 06/15/2006 | US20060124866 Electron beam exposure method and system therefor |
| 06/15/2006 | US20060124834 Near-field light generating method, near-field exposure mask, and near-field exposure method and apparatus |
| 06/15/2006 | US20060124586 Rinse liquid for lithography and method for forming resist pattern using same |
| 06/15/2006 | US20060124552 Process for the recovery of surfactants |
| 06/15/2006 | US20060124009 Apparatus and method for thermally developing flexographic printing elements |
| 06/15/2006 | US20060124008 Device and method for producing flexographic plates using digital imaging, for newspaper printing |
| 06/15/2006 | CA2591483A1 Non-aqueous, non-corrosive microelectronic cleaning compositions |
| 06/15/2006 | CA2589067A1 Photoactive film, its preparation and use, and preparation of surface relief and optically anisotropic structures by irradiating said film |
| 06/14/2006 | EP1670043A2 Exposure apparatus, exposure method, and device manufacturing method |
| 06/14/2006 | EP1670042A1 Liquid immersion type lens system and projection aligner, device production method |
| 06/14/2006 | EP1670041A1 Exposure method and apparatus, and device manufacturing method |
| 06/14/2006 | EP1670040A1 Projection exposure device, projection exposure method, and device manufacturing method |
| 06/14/2006 | EP1670039A1 Exposure apparatus and device producing method |
| 06/14/2006 | EP1670038A1 Optical element and exposure device |
| 06/14/2006 | EP1669809A2 Radiation exposure apparatus comprising a gas flushing system |
| 06/14/2006 | EP1669808A2 Substrate placement in immersion lithography |
| 06/14/2006 | EP1669807A1 Lithographic apparatus and device manufacturing method |
| 06/14/2006 | EP1669806A2 Lithographic apparatus, reticle exchange unit and device manufacturing method |
| 06/14/2006 | EP1669805A2 Lithographic projection apparatus and actuator |
| 06/14/2006 | EP1669804A2 Barrier film material and pattern formation method using the same |
| 06/14/2006 | EP1669803A2 Novel copolymers and photoresist compositions comprising copolymer resin binder component |
| 06/14/2006 | EP1669802A2 Imprinting machine and device manufacturing method |
| 06/14/2006 | EP1669791A1 Light beam deflector |
| 06/14/2006 | EP1669782A2 Producing method of stamper for light guide plate |
| 06/14/2006 | EP1669194A1 Lithographic printing plate precursor and method of producing printing plate |
| 06/14/2006 | EP1668679A1 Illumination optical system and exposure apparatus using the same |
| 06/14/2006 | EP1668423A2 Method and device for immersion lithography |
| 06/14/2006 | EP1668422A2 Lithography illumination device |
| 06/14/2006 | EP1668421A2 Illumination system for a microlithography projection exposure installation |
| 06/14/2006 | EP1668420A2 Microlithographic illumination method as well as a projection illumination system for carrying out the method |
| 06/14/2006 | EP1668419A2 Optical subassembly and projection objective for semiconductor lithography |
| 06/14/2006 | EP1668418A1 Photopolymer printing plate precursor |
| 06/14/2006 | EP1668417A1 Photopolymerizable composition. |
| 06/14/2006 | EP1668416A2 Method and apparatus for protecting a reticle used in chip production from contamination |
| 06/14/2006 | EP1668415A2 Method and apparatus for protecting a reticle used in chip production from contamination |
| 06/14/2006 | EP1668414A2 Method and apparatus for compensating for the effects of gravity on a pellicle used for protecting a reticle from contamination |
| 06/14/2006 | EP1668039A1 Arylsulfinate salts in photoinitiator systems for polymerization reactions |
| 06/14/2006 | EP1668038A1 Arylsulfinate salts in initiator systems for polymeric reactions |
| 06/14/2006 | EP1667836A1 Tool for the production of a microstructured surface |
| 06/14/2006 | EP1667778A2 Single phase fluid imprint lithography method |
| 06/14/2006 | EP1506456A4 Radiation filter element and manufacturing processes therefore |
| 06/14/2006 | EP1438628B1 Method and device for reducing speckle in an optical system |
| 06/14/2006 | EP1163553B1 Oxime derivatives and the use thereof as photoinitiators |
| 06/14/2006 | EP1141444B1 Novel composition for selective etching of oxides over metals |
| 06/14/2006 | EP1135668A4 Dynamic beam steering interferometer |
| 06/14/2006 | EP1024965B1 Process for removing residues from a semiconductor substrate |
| 06/14/2006 | EP1019992B1 Pulse energy control for excimer laser |
| 06/14/2006 | EP0988116A4 High efficiency photoresist coating |
| 06/14/2006 | DE202006003924U1 Illumination device for mask aligner, has solid state device ultra violet light sources that emit light with wavelength between specified nanometers, where sources are individually controllable and repeatedly activated and switched off |
| 06/14/2006 | DE10317268B4 Verfahren zur fehlerfreien Medieneingabe in Halbleiterherstellungsprozessen A method for error-free media input in semiconductor manufacturing processes |
| 06/14/2006 | DE102005021341A1 Imaging system for producing micro structured element e.g. integrated circuit has optical element whose optical crystal axis is parallel to optical axis of imaging system whereby one component of optical element is reflected more strongly |
| 06/14/2006 | DE102004058967A1 Verfahren zur Belichtung eines Substrats mit einem Strahl A method for exposing a substrate with a beam |
| 06/14/2006 | DE102004040534B4 Diffraktives polarisationstrennendes Element für unpolarisierte elektromagnetische Strahlung im UV-Bereich, System mit zwei solchen Elementen und Verfahren zur Herstellung eines solchen Elementes Diffractive polarization-separating element for unpolarized electromagnetic radiation in the UV region, the system having two such elements and methods for manufacturing such element |
| 06/14/2006 | DE102004031688B4 Verfahren zur Anpassung von Strukturabmessungen bei der photolithographischen Projektion eines Musters von Strukturelementen auf einen Halbleiterwafer A method for adjustment of the structural dimensions in photolithographic projection of a pattern of structural elements on a semiconductor wafer |