| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/21/2006 | EP1552342A4 Compositions substrate for removing etching residue and use thereof |
| 06/21/2006 | EP1508144B1 Holographic data storage media comprising an aluminum salt compound and an asymmetric acrylate compound |
| 06/21/2006 | EP1299773A4 Silicon-containing acetal protected polymers and photoresists compositions thereof |
| 06/21/2006 | EP1226635A4 Gas discharge laser with gas temperature control |
| 06/21/2006 | EP1177275B1 Compositions for cleaning organic and plasma etched residues for semiconductor devices |
| 06/21/2006 | EP1137970B1 Method and device for aligning two photo masks with each other and an unexposed printed circuit board blank, and for subsequent simultaneous exposure in the production of double-sided printed circuit boards |
| 06/21/2006 | EP0861855B1 Light-absorbing polymer, method for synthesizing the same, and film-forming composition and antireflection film prepared using said polymer |
| 06/21/2006 | CN1791969A Removing agent composition and removing/cleaning method using same |
| 06/21/2006 | CN1791965A A structure for a semiconductor arrangement and a method of manufacturing a semiconductor arrangement |
| 06/21/2006 | CN1791964A Monolithic three-dimensional structures |
| 06/21/2006 | CN1791840A Method of manufacturing an electronic device |
| 06/21/2006 | CN1791839A Optical spot grid array printer |
| 06/21/2006 | CN1791838A Photoresist composition for deep UV and imaging process thereof |
| 06/21/2006 | CN1791837A Positive type photosensitive composition |
| 06/21/2006 | CN1791836A Process for fabricating semiconductor device and method for generating mask pattern data |
| 06/21/2006 | CN1791793A Method and device for cleaning at least one optical component |
| 06/21/2006 | CN1791573A Photoactive compounds |
| 06/21/2006 | CN1791561A Method for preparing photosensitive barrier rib paste composition for fabricating plasma display pannel |
| 06/21/2006 | CN1790660A Substrate placing stage |
| 06/21/2006 | CN1790655A Method for detecting new and old mask difference |
| 06/21/2006 | CN1790352A Method for generating pattern, method for manufacturing and control semiconductor device, and semiconductor device |
| 06/21/2006 | CN1790170A Lithographic apparatus, analyser plate, subassembly, method of measuring parameters and patterning device |
| 06/21/2006 | CN1790169A Lithographic apparatus and device manufacturing method |
| 06/21/2006 | CN1790168A Reticle-processing system |
| 06/21/2006 | CN1790167A Pattern forming method, semiconductor device manufacturing method and exposure mask set |
| 06/21/2006 | CN1790166A Adaptive optimization method for coaxial-aligning vertical-scanning length |
| 06/21/2006 | CN1790165A Immersion optical projection system and manufacturing method of ic wafer |
| 06/21/2006 | CN1790164A Thin film transistor and method for manufacturing the same |
| 06/21/2006 | CN1790163A Positive resist containing naphthol functionality |
| 06/21/2006 | CN1790162A Method of forming pattern having step difference and method of making thin film transistor and liquid crystal display using the same |
| 06/21/2006 | CN1790160A Mask and manufacturing method of a semiconductor device and a thin film transistor array panel using the mask |
| 06/21/2006 | CN1790141A Display device and thin film transistor array panel for display device and manufacturing method thereof |
| 06/21/2006 | CN1790116A Transflective liquid crystal display and manufacturing method thereof |
| 06/21/2006 | CN1790068A Mulitlayer film reflecting type high precision round metal grating and making method thereof |
| 06/21/2006 | CN1790067A Transmissive metal grating and preparation method thereof |
| 06/21/2006 | CN1790063A Micro-lens forming method by means of wet method side guide |
| 06/21/2006 | CN1789400A Compositions comprising tannic acid as corrosion inhibitor |
| 06/21/2006 | CN1789352A Water soluble liquid for repairing resin information recorded surface |
| 06/21/2006 | CN1789300A Polymeric compositions and uses therefor |
| 06/21/2006 | CN1789295A Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same |
| 06/21/2006 | CN1789294A Photoacid generating polymer, its preparation method and top anti-reflective coating composition comprising the same |
| 06/21/2006 | CN1789007A Printing plate and method for fabricating the same |
| 06/21/2006 | CN1260801C Fragile sheel transporting device and fragile sheet processing device |
| 06/21/2006 | CN1260773C Pattern-formation method of semiconductor device |
| 06/21/2006 | CN1260772C Stage device, method of driving stage, exposure device and exposure method |
| 06/21/2006 | CN1260621C Method for removing shading defects of light mask and semiconductor device manufacturing method thereof |
| 06/21/2006 | CN1260620C Exposure method and device for forming pattern on printed circuit board |
| 06/21/2006 | CN1260619C Photosensitive resin composition for black matrix |
| 06/21/2006 | CN1260618C Positive photoresist composition containing alicyclic dissolution inhibitor |
| 06/21/2006 | CN1260617C Photosensitive element, photosensitive element roller, process for producing resist pattern with the same, resist pattern, substrate with overlying resist pattern, process for producing wiring pattern |
| 06/21/2006 | CN1260616C Method for producing microstructure |
| 06/21/2006 | CN1260615C Device and method in connection with production of structures |
| 06/21/2006 | CN1260607C Method for making LCD device |
| 06/21/2006 | CN1260071C Lithographic printing carrier, original edition and its production method |
| 06/20/2006 | US7065739 Pattern correction method of semiconductor device |
| 06/20/2006 | US7065737 Multi-layer overlay measurement and correction technique for IC manufacturing |
| 06/20/2006 | US7065735 Method for making an OPC mask and an OPC mask manufactured using the same |
| 06/20/2006 | US7064901 Method of manufacturing microlens, microlens, microlens array plate, electrooptic device and electronic equipment |
| 06/20/2006 | US7064880 Projector and projection method |
| 06/20/2006 | US7064838 Apparatus and method for measurement of fields of backscattered and forward scattered/reflected beams by an object in interferometry |
| 06/20/2006 | US7064829 Generic interface for an optical metrology system |
| 06/20/2006 | US7064808 Substrate carrier and method for making a substrate carrier |
| 06/20/2006 | US7064807 Lithographic apparatus |
| 06/20/2006 | US7064806 Illumination optical system and exposure apparatus |
| 06/20/2006 | US7064805 Exposure apparatus |
| 06/20/2006 | US7064804 Temperature adjustment apparatus, exposure apparatus having the temperature adjustment apparatus, and semiconductor device manufacturing method |
| 06/20/2006 | US7064512 Positioning apparatus, exposure apparatus, and semiconductor device manufacturing method |
| 06/20/2006 | US7064152 phosphonium or N-heterocycle ammonium salt as an electron donor; sensitizer that is a ketone, xanthene, acridine, thiazole, thiazine, oxazine, azine, aminoketone, aromatic polycyclic hydrocarbon, p-substituted aminostyryl ketone, aminotriaryl methane, cyanine, pyridinium, or triarylmethane dye. |
| 06/20/2006 | US7064080 Semiconductor processing method using photoresist and an antireflective coating |
| 06/20/2006 | US7064075 Method for manufacturing semiconductor electronics devices |
| 06/20/2006 | US7063939 Nanoimprint lithography; pressing an embossed, transparent mold into a photoresist film applied to substrate to transfer the pattern of protrusions and recesses by deforming the resist; efficient development; nonseparating, dimensional stability if overexposed to developer and/or etchant; semiconductors |
| 06/20/2006 | US7063938 filling a monomer solution into interstices of colloidal crystals for photopolymerization inside them; masking; not only more simplified two-dimensional patterns but also complicated two- or three-dimensional patterns can be obtained |
| 06/20/2006 | US7063937 The positive image recording layer comprising a novolac resin with a xylenol as monomer and an infrared absorbing dye and using an alkaline developing solution containing an anionic and/or a amphoteric surfactants (phenoxy sulfates, aminecarboxylates); storage stability; antisoilants; sharp, clear image |
| 06/20/2006 | US7063936 A support and a recording layer comprising a polymerizable compound containing a dendrimer having unsaturated groups, a radical initiator and an alkali-soluble polymer; high sensitivity using a semiconductor laser; direct plate-making based on digital data of a computer; press life; storage stability |
| 06/20/2006 | US7063935 Support for lithographic printing plate and presensitized plate and method of producing lithographic printing plate |
| 06/20/2006 | US7063934 Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same |
| 06/20/2006 | US7063933 A crosslinked polyetheramide based on aromatic dicarboxylic acids and a bis/aminophenoxyphenylene/methane which provides improved adhesion between a substrate having a pressure generating element formed for ejecting ink and an ink flow-path forming member which constitutes the printing head |
| 06/20/2006 | US7063932 Photoresists based on polymers of adamantyl (meth)acrylates superior in photosensitivity and developmentability; high transparency against short-wavelength light and high dry-etching resistance; a fine pattern excellent in adhesion and resolution by means of alkali development; semiconductors |
| 06/20/2006 | US7063931 Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use |
| 06/20/2006 | US7063930 A thinner, resist-removing composition comprising an inorganic alkali compound, an organic amine, an organic solvent, anionic and nonionic surfactants and water; removes residue on edges and backs of substrates for thin film transistor-liquid crystal displays and semiconductors; corrosion resistance |
| 06/20/2006 | US7063920 Configuring an array of micro-mirrors in a deep ultraviolet maskless photolithography system by generating an ideal mask layout representative of image characteristics associated with a desired image; next, an equivalent mask is produced in accordance with an average intensity of the ideal mask layout |
| 06/20/2006 | US7063919 Lithographic template having a repaired gap defect method of repair and use |
| 06/20/2006 | US7063583 Multi-spectral uniform light source |
| 06/20/2006 | US7063478 Crystallization apparatus and crystallization method |
| 06/20/2006 | US7063192 Active vibration suppression apparatus, control method therefor, and exposure apparatus having active vibration suppression apparatus |
| 06/15/2006 | WO2006063268A2 Computer-implemented methods for detecting and/or sorting defects in a design pattern of a reticle |
| 06/15/2006 | WO2006063098A1 Lift-off patterning processes employing energetically-stimulated local removal of solid-condensed-gas layers |
| 06/15/2006 | WO2006062534A1 Non-aqueous, non-corrosive microelectronic cleaning compositions |
| 06/15/2006 | WO2006062348A1 Positive type dry film photoresist and composition for preparing the same |
| 06/15/2006 | WO2006062347A1 Positive type dry film photoresist |
| 06/15/2006 | WO2006062188A1 Exposure apparatus, exposure method and device manufacturing method |
| 06/15/2006 | WO2006062145A1 Image exposing method and apparatus |
| 06/15/2006 | WO2006062096A1 Exposure apparatus and method for manufacturing device |
| 06/15/2006 | WO2006062074A1 Substrate processing method, exposure method, exposure apparatus, and method for manufacturing device |
| 06/15/2006 | WO2006062065A1 Maintenance method, maintenance apparatus, exposure apparatus and device manufacturing method |
| 06/15/2006 | WO2006062005A1 Cleaning liquid for lithography and method for resist pattern formation |
| 06/15/2006 | WO2006061975A1 Method for forming resist pattern |
| 06/15/2006 | WO2006061600A1 Particles for use as a solid support and process for their preparation |
| 06/15/2006 | WO2006061419A2 Photoactive film, its preparation and use, and preparation of surface relief and optically anisotropic structures by irradiating said film |
| 06/15/2006 | WO2006061225A1 Transmitting optical element and objective for a microlithographic projection exposure apparatus |