| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/27/2006 | US7067234 Amplifying agent containing at least one bicyclic or polycyclic aliphatic group and at least one reactive group capable of coordinating to the anchor groups of the polymer, such as bis(aminoalkyl) adamantanes and norbornanes |
| 06/27/2006 | US7067233 a photoresist composition of a polyether; a diphenyl propenol polymerized with epichlorhydrin, an acrylate resin, a curing agent, and an organic solvent; a high curing efficiency, brightness; prevents the formation of remnant in photoresist patterns |
| 06/27/2006 | US7067231 Polymers, resist compositions and patterning process |
| 06/27/2006 | US7067230 Photorefractive composite |
| 06/27/2006 | US7067229 e.g., a polyaniline or polypyrrole protected with tert-butyloxycarbonyl or tetrahydropyranyl; higher solubility, improved transparency, sensitivity, and adhesion; contain a soluble self-orienting monomer or polymer |
| 06/27/2006 | US7067228 Photosensitive resin composition, photosensitive element employing it, resist pattern forming method, and printed wiring board fabrication method |
| 06/27/2006 | US7067227 Sensitized chemically amplified photoresist for use in photomask fabrication and semiconductor processing |
| 06/27/2006 | US7067226 Multilayer; acrylated ester resin |
| 06/27/2006 | US7067224 forming layers of red, green and blue photosensitive layers on substrates, then positioning photomasks comprising light shielding patterns on the layers, exposing and developing to form panels having color reproducibility, light transmissivity and response speeds |
| 06/27/2006 | US7067223 coating masking layers comprising inorganic phosphates having a nonlinear refractive index, to radiation transparent substrates, then applying photoresist, developing, etching to form miniature patterns and stripping the photoresists; integrated circuits; photolithography |
| 06/27/2006 | US7067222 Pellicle for lithography |
| 06/27/2006 | US7067074 Mixture of aromatic chlorinated phosphate compound with copper compound and polymer |
| 06/27/2006 | US7066398 Aperture plate and methods for its construction and use |
| 06/27/2006 | US7065894 Apparatus for kinematic registration of a reticle |
| 06/22/2006 | WO2006066100A2 Method and apparatus for laser dicing |
| 06/22/2006 | WO2006065542A1 Compositions for articles comprising replicated microstructures |
| 06/22/2006 | WO2006065320A1 Method for forming anti-reflective coating |
| 06/22/2006 | WO2006065316A1 Method for forming anti-reflective coating |
| 06/22/2006 | WO2006065261A1 Improved positive working thermal plates |
| 06/22/2006 | WO2006065256A1 Non-aqueous, non-corrosive microelectronic cleaning compositions containing polymeric corrosion inhibitors |
| 06/22/2006 | WO2006064900A1 Exposure method and apparatus, and device manufacturing method |
| 06/22/2006 | WO2006064884A1 Actinic energy ray curable resion composition and use thereof |
| 06/22/2006 | WO2006064867A1 Unsaturated group-containing polyimide resin, photosensitive resin composition containing same, and cured product thereof |
| 06/22/2006 | WO2006064851A1 Substrate holding apparatus, exposure apparatus and device manufacturing method |
| 06/22/2006 | WO2006064728A1 Projection optical system, exposure apparatus, exposure system, and exposure method |
| 06/22/2006 | WO2006064626A1 Polymer compound, positive resist composition and method for forming resist pattern |
| 06/22/2006 | WO2006064622A1 Positive-working resist composition and method for resist pattern formation |
| 06/22/2006 | WO2006064592A1 Target for extreme ultraviolet light and x-ray source and process for producing the same |
| 06/22/2006 | WO2006064363A1 Process and apparatus for the production of collimated uv rays for photolithographic transfer |
| 06/22/2006 | WO2006063626A2 Stable high ph developer |
| 06/22/2006 | WO2006026941A3 Method and device for structuring a substrate |
| 06/22/2006 | WO2006017014A3 Energy harvesting molecules and photoresist technology |
| 06/22/2006 | WO2006003594A3 Soft lithographic stamp with a chemically patterned surface |
| 06/22/2006 | WO2006002859A3 Illumination source, wavefront measuring device and microlithography projection illumination device |
| 06/22/2006 | WO2005109105A3 Apparatus and process for determination of dynamic scan field curvature |
| 06/22/2006 | WO2005038524A3 Novel photosensitive resin compositions |
| 06/22/2006 | US20060135745 Process for refining crude resin for resist |
| 06/22/2006 | US20060135744 Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same |
| 06/22/2006 | US20060135742 macromolecular monomers which can generate radicals by the action of light or heat in a highly sensitive manner and can rapidly cause and develop a curing reaction, useful as recording layers, responsive to an infrared laser, has excellent image forming ability and printing durability |
| 06/22/2006 | US20060135663 Fluorinated copolymer process for its production and resist composition containing it |
| 06/22/2006 | US20060134909 Method for fabricating semiconductor device |
| 06/22/2006 | US20060134565 Method of exposure for lithography process and mask therefor |
| 06/22/2006 | US20060134564 Reflective display based on liquid crystal materials |
| 06/22/2006 | US20060134563 Method for manufacturing semiconductor device |
| 06/22/2006 | US20060134562 Method of forming micro-pattern |
| 06/22/2006 | US20060134560 Method for fabricating semiconductor device |
| 06/22/2006 | US20060134559 Method for forming patterns on a semiconductor device |
| 06/22/2006 | US20060134554 Radiationhardenable printing media, transfer pictures produced therewith, and method for producing ceramic decorations |
| 06/22/2006 | US20060134553 Photoresist pattern; smooth surface and edges; resolution; wide depth of focus range; acid generator upon exposure |
| 06/22/2006 | US20060134552 Smooth surface photresist pattern; using acrylated ester and acid generator |
| 06/22/2006 | US20060134551 Lithium salt of polyacetylene as radiation sensitive filaments and preparation and use thereof |
| 06/22/2006 | US20060134550 Precursor comprising a hydrophilic support and provided thereon, a photopolymerizable light sensitive layer containing an (meth)acrylic ester compound with tert-amine group; sensitivity, printing durability, stain elimination property, dot reproduction, and sludge restraining property |
| 06/22/2006 | US20060134545 Negative resist composition and process for formation of resist patterns |
| 06/22/2006 | US20060134532 lithography; photoresists; etching |
| 06/22/2006 | US20060134530 Multi-transmission phase mask and exposure method using the same |
| 06/22/2006 | US20060133660 Apparatus and method for detecting defect existing in pattern on object |
| 06/22/2006 | US20060133574 Extreme ultraviolet light source and extreme ultraviolet light source target |
| 06/22/2006 | US20060132931 Catadioptric projection objective |
| 06/22/2006 | US20060132920 Blazed diffractive optical element and projection objective for a microlithographic projection exposure apparatus |
| 06/22/2006 | US20060132807 Periodic patterns and technique to control misalignment between two layers |
| 06/22/2006 | US20060132747 Optical element for an illumination system |
| 06/22/2006 | US20060132741 Liquid immersion type exposure apparatus |
| 06/22/2006 | US20060132740 Exposure apparatus, and device manufacturing method |
| 06/22/2006 | US20060132739 Exposure apparatus, and device manufacturing method |
| 06/22/2006 | US20060132738 Exposure apparatus and device manufacturing method |
| 06/22/2006 | US20060132737 Exposure apparatus, method for producing device, and method for controlling exposure apparatus |
| 06/22/2006 | US20060132736 Exposure apparatus, exposure method, and method for producing device |
| 06/22/2006 | US20060132591 Mask making method, mask making device, and mask drawing device |
| 06/22/2006 | US20060132590 Scanner system |
| 06/22/2006 | US20060132046 Device for generating and/or influencing electromagnetic radiation from a plasma |
| 06/22/2006 | US20060131515 Collector for EUV light source |
| 06/22/2006 | US20060130688 Method and an apparatus for the drying of the printing plates for flexography |
| 06/22/2006 | DE10394275T5 Verfahren zur Ätzung einer Siliconschicht in Musterform A method for etching a silicon layer in a pattern |
| 06/22/2006 | DE102005059157A1 Printing plate production controlling/regulating method, involves deriving display signals or variables for servo units from compared printing plate signals and monitoring processing steps by one detector arrangement, during execution |
| 06/22/2006 | DE102004060672A1 Gitterbild zur Darstellung von Echtfarbenbildern und Verfahren zu seiner Herstellung Grating image for displaying real color images and process for its preparation |
| 06/22/2006 | DE102004052146A1 Assembly to focus e.g. a light bundle, for optical lithography and the like, has an evanescent wave generator and amplifier for the seed evanescent fields to give a focus spot |
| 06/22/2006 | CA2591477A1 Non-aqueous, non-corrosive microelectronic cleaning compositions containing polymeric corrosion inhibitors |
| 06/22/2006 | CA2590836A1 Compositions for articles comprising replicated microstructures |
| 06/21/2006 | EP1672682A1 Substrate transporting apparatus and method, exposure apparatus and method, and device producing method |
| 06/21/2006 | EP1672681A1 Substrate carrying apparatus, substrate carrying method, exposure apparatus, exposure method, and method for producing device |
| 06/21/2006 | EP1672680A1 Exposure apparatus, exposure method, and device producing method |
| 06/21/2006 | EP1672452A2 Remote maintenance system |
| 06/21/2006 | EP1672432A1 Lithographic apparatus and device manufacturing method |
| 06/21/2006 | EP1672431A1 Lithographic apparatus, a system and a device manufacturing method |
| 06/21/2006 | EP1672430A2 Lithographic apparatus, analyser plate, subassembly, method of measuring a parameter of a projection system and patterning means |
| 06/21/2006 | EP1672429A2 Reticle-processing system |
| 06/21/2006 | EP1672428A2 Reticle-carrying container |
| 06/21/2006 | EP1672427A1 Radiation-curing composition, method for storing same, method for forming cured film, method for forming pattern, method for using pattern, electronic component, and optical waveguide |
| 06/21/2006 | EP1672426A1 Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide |
| 06/21/2006 | EP1672425A2 Automatic supplying apparatus and method for supplying photosensitive printing plate |
| 06/21/2006 | EP1671925A1 Micromachining process for forming microstructures having arbitrarily sloped and/or profiled sidewalls or substructures |
| 06/21/2006 | EP1671353A2 Apparatus for multiple beam deflection and intensity stabilization |
| 06/21/2006 | EP1671188A2 Discharge lamp |
| 06/21/2006 | EP1671187A2 Composite optical lithography method for patterning lines of significantly different widths |
| 06/21/2006 | EP1671186A2 Photoresist coating process for microlithography |
| 06/21/2006 | EP1671185A1 Bottom antireflective coatings |
| 06/21/2006 | EP1671184A2 Photoresist compositions comprising diamondoid derivatives |
| 06/21/2006 | EP1671183A2 Photocurable compositions for articles having stable tensile properties |
| 06/21/2006 | EP1671182A2 Spin-printing of electronic and display components |
| 06/21/2006 | EP1670740A2 Clear photopolymerizable systems for the preparation of high thickness coatings |