| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/28/2006 | EP1674933A2 Lithographic apparatus and device manufacturing method |
| 06/28/2006 | EP1674932A1 Lithographic apparatus, illumination system and debris trapping system |
| 06/28/2006 | EP1674931A2 Beam illumination system and method for producing printing plates |
| 06/28/2006 | EP1674930A2 Stitching prevention in multibeam imaging for exposing printing plates |
| 06/28/2006 | EP1674929A1 Method for producing a photoresist solution |
| 06/28/2006 | EP1674928A2 Lithographic printing plate precursor |
| 06/28/2006 | EP1674473A1 Photoacid generator |
| 06/28/2006 | EP1673806A2 Amorphous carbon layer to improve photoresist adhesion |
| 06/28/2006 | EP1673801A2 Developer-soluble materials and methods of using the same in via-first dual damascene applications |
| 06/28/2006 | EP1673785A2 Plasma source of directed beams and application thereof to microlithography |
| 06/28/2006 | EP1673663A1 Light sensitive coating compositions useful for lithographic elements |
| 06/28/2006 | EP1673662A1 Low-polydispersity photoimageable polymers and photoresists and processes for microlithography |
| 06/28/2006 | EP1673661A2 Multistep process for creating irregularities in a repating array of pattern elements |
| 06/28/2006 | EP1673480A2 Use of photopolymerization for amplification and detection of a molecular recognition event |
| 06/28/2006 | EP1535115B1 Method and device for producing exposed structures |
| 06/28/2006 | EP1470448B1 Mixture of substances which can be hardened by heat and by actinic radiation, method for the production and use thereof |
| 06/28/2006 | EP1417492B1 "lab on chip" from photoresist material for medical diagnostic applications |
| 06/28/2006 | EP1414878B1 Process and composition for rapid mass production of holographic recording article |
| 06/28/2006 | EP1412182A4 Laser spectral engineering for lithographic process |
| 06/28/2006 | EP1405139A4 Photosensitive polyimide precursor compositions |
| 06/28/2006 | EP1386376A4 Laser spectral engineering for lithographic process |
| 06/28/2006 | EP1339519A4 FOUR KHz GAS DISCHARGE LASER |
| 06/28/2006 | EP1330364B1 Use of electronically active primer layers in thermal patterning of materials |
| 06/28/2006 | EP1303894A4 Extreme repetition rate gas discharge laser with improved blower motor |
| 06/28/2006 | EP1301829A4 Radiation sensitive compositions containing image quality and profile enhancement additives |
| 06/28/2006 | EP1192410A4 Helium-neon laser light source generating two harmonically related, single-frequency wavelengths for use in displacement and dispersion measuring interferometry |
| 06/28/2006 | EP0991960B1 Optical system with anti-reflection coating |
| 06/28/2006 | EP0983320B9 Curable sealant composition |
| 06/28/2006 | CN2791702Y Exposuring machine structure of printed circuit board |
| 06/28/2006 | CN2791701Y Peltier moudle |
| 06/28/2006 | CN1795536A Position information measuring method and device, and exposure method and system |
| 06/28/2006 | CN1795535A Exposure method, exposure apparatus, and method for producing device |
| 06/28/2006 | CN1795418A Photosensitive composition and process for production of printed wiring boards with the same |
| 06/28/2006 | CN1795239A Curable polymer compound |
| 06/28/2006 | CN1794440A Detection of silicon chip state in box and its center relocation method |
| 06/28/2006 | CN1794099A Solvent removal apparatus and method |
| 06/28/2006 | CN1794098A Electromagnetic focusing method for electron-beam lithography system |
| 06/28/2006 | CN1794097A Off-axis position aligning system and aligning method in projection exposure device |
| 06/28/2006 | CN1794096A Automatic aligning device |
| 06/28/2006 | CN1794095A Coaxial position aligning system and aligning method in projection exposure device |
| 06/28/2006 | CN1794094A Equipment for manufacturing liquid crystal display |
| 06/28/2006 | CN1794093A Method of making nanometer periodic structure by masking film displacement angle changing deposition |
| 06/28/2006 | CN1794092A Electromagnetic focusing apparatus and electron-beam lithography system using the same |
| 06/28/2006 | CN1794091A Precision positioning and regulating tool |
| 06/28/2006 | CN1794090A Off-axis signal treatment method based on linear model |
| 06/28/2006 | CN1794089A Lithographic apparatus with two-dimensional alignment measurement arrangement and two-dimensional alignment measurement method |
| 06/28/2006 | CN1794088A Water base developing organic silicon modified light-sensitive polyimide material and its preparation method |
| 06/28/2006 | CN1794087A Self-sensitizing negative polyimide light-sensitive material and its preparation method |
| 06/28/2006 | CN1794086A Method of covering and patterning nanometer structure on sensitive material surface |
| 06/28/2006 | CN1794085A Multi-transmission phase mask and exposure method using the same |
| 06/28/2006 | CN1794076A Liquid crystal display device and fabricating method thereof |
| 06/28/2006 | CN1794074A Manufacturing method of film transistor matrix substrate |
| 06/28/2006 | CN1794066A 薄膜晶体管阵列面板及其制造方法 The thin film transistor array panel and manufacturing method thereof |
| 06/28/2006 | CN1794051A Conductive substrate of liquid crystal display and its manufacturing method |
| 06/28/2006 | CN1794024A Manufacturing method of large dynamic micromachine variable light attenuator |
| 06/28/2006 | CN1794023A Method of preparing long period bar wave guide optical grating on optical glass surface |
| 06/28/2006 | CN1794021A Preparation method of silicon nanometer film on polymer used for nanometer photon technology |
| 06/28/2006 | CN1793201A Water radical developing copolymerized type photosensitive polyimide material and preparation process thereof |
| 06/28/2006 | CN1261994C Optical mask testing, optical spot evaluating method and optical spot compensation |
| 06/28/2006 | CN1261977C Technology for forming resist pattern, semiconductor production thereof |
| 06/28/2006 | CN1261976C Film forming method |
| 06/28/2006 | CN1261975C Integrated circuit producing method for eliminating side pattern |
| 06/28/2006 | CN1261828C Optical mask with alignment measuring mark and its detecting method |
| 06/28/2006 | CN1261827C Photoresist stripping liquid composition and stripping method for photoresist using photoresist stripping liquid composition |
| 06/28/2006 | CN1261826C A cleaning agent composition for a positive or a negative photoresist |
| 06/28/2006 | CN1261825C Exposure system and method with group compensation function |
| 06/28/2006 | CN1261824C Exposure system and method |
| 06/28/2006 | CN1261823C Method of checking exposure device, correcting focus position and manufacturing semiconductor device |
| 06/28/2006 | CN1261822C Photosensitive resin composition for photoresist |
| 06/28/2006 | CN1261821C 三维立体掩膜 Three-dimensional mask |
| 06/28/2006 | CN1261820C Photoetching equipment having vacuum mask plate store connected with vacuum chamber |
| 06/28/2006 | CN1261815C Sandwich back-up paper, laminated body, cutting method and lamination method for planographic printing plate |
| 06/28/2006 | CN1261786C Method for protecting adhesive un-effected by UV used for fixed optical element |
| 06/28/2006 | CN1261780C Cubic MgZnO crystal thin film optical waveguide device and preparation process thereof |
| 06/28/2006 | CN1261736C Line Profile asymmetry measurement using scatter-metering |
| 06/28/2006 | CN1261334C Graticule chip transfer system and method for photoetching, chip transfer box and method |
| 06/27/2006 | US7068833 Overlay marks, methods of overlay mark design and methods of overlay measurements |
| 06/27/2006 | US7068436 Projection lens for a microlithographic projection exposure apparatus |
| 06/27/2006 | US7068433 Focusing screen master and manufacturing method thereof |
| 06/27/2006 | US7068414 Exposure head and exposure apparatus |
| 06/27/2006 | US7068353 Exposure apparatus and method |
| 06/27/2006 | US7068352 Exposure apparatus |
| 06/27/2006 | US7068350 Exposure apparatus and stage device, and device manufacturing method |
| 06/27/2006 | US7068348 Holding mechanism in exposure apparatus, and device manufacturing method |
| 06/27/2006 | US7068347 Apparatus for reducing pellicle darkening |
| 06/27/2006 | US7067942 Linear motor, moving stage system, exposure apparatus, and device manufacturing method |
| 06/27/2006 | US7067894 Semiconductor devices using anti-reflective coatings |
| 06/27/2006 | US7067832 Extreme ultraviolet light source |
| 06/27/2006 | US7067830 Multi-electron beam exposure method and apparatus |
| 06/27/2006 | US7067826 Position detection method and apparatus |
| 06/27/2006 | US7067764 Mask for light exposure and method for manufacturing liquid crystal display apparatus employing same |
| 06/27/2006 | US7067593 Poly(arylene ethers) with pendant crosslinkable groups, and devices incorporating same |
| 06/27/2006 | US7067566 Lyotropic polymers comprising polyamideimide copolymers, having heat resistance, bonding strength and photostability, for use as coatings in displays; optics |
| 06/27/2006 | US7067441 Damage-free resist removal process for ultra-low-k processing |
| 06/27/2006 | US7067426 Semiconductor processing methods |
| 06/27/2006 | US7067346 Titanium carboxylate films for use in semiconductor processing |
| 06/27/2006 | US7067241 Method for producing a unit having a three-dimensional surface patterning, and use of this method |
| 06/27/2006 | US7067237 Method for forming pattern of one-dimensional nanostructure |
| 06/27/2006 | US7067236 Exposure to light source; development; plasma display panel; liquid crystals; screen printing electroconductive and dielectric paste |
| 06/27/2006 | US7067235 Semiconductor device feature development using a bi- layer photoresist including providing a non-silicon containing photoresist layer over a substrate; providing a silicon containing photoresist layer over the non-silicon containing |