| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/04/2006 | US7072025 Lithographic apparatus and device manufacturing method |
| 07/04/2006 | US7072024 Lithographic projection method and apparatus |
| 07/04/2006 | US7072023 Position detection apparatus having a plurality of detection sections, and exposure apparatus |
| 07/04/2006 | US7072021 Lithographic apparatus and device manufacturing method |
| 07/04/2006 | US7071548 Semiconductor coated with a mixture containing an adhesion promoter |
| 07/04/2006 | US7071476 Illumination system with a plurality of light sources |
| 07/04/2006 | US7071255 Radiation-sensitive composition capable of having refractive index distribution |
| 07/04/2006 | US7071243 Heat resistance; waterproofing; adhesives; electrical properties |
| 07/04/2006 | US7071121 Patterned ceramic films and method for producing the same |
| 07/04/2006 | US7071088 Method for fabricating bulbous-shaped vias |
| 07/04/2006 | US7070915 Method and system for drying a substrate |
| 07/04/2006 | US7070914 Process for producing an image using a first minimum bottom antireflective coating composition |
| 07/04/2006 | US7070911 Semiconductors; reducing vibration during lithography; depositing a multilayer antireflectivity coating |
| 07/04/2006 | US7070910 Silazane compound amd methods for using the same |
| 07/04/2006 | US7070908 Feature formation in thick-film inks |
| 07/04/2006 | US7070906 Photosensitive resin laminate |
| 07/04/2006 | US7070905 Pattern forming process |
| 07/04/2006 | US7070904 High-temperature-stable polybenzoxazoles are formed from novel poly-o-hydroxyamides. The novel poly-o-hydroxyamides have low dielectric constants, are suitable for exposure at 248 nm or shorter wavelengths, and have hydroxyl groups at |
| 07/04/2006 | US7070903 Coating formulation for printing plate precursor, printing plate precursor, printing press, fabrication process of printing plate, and regeneration process of printing plate |
| 07/04/2006 | US7070902 Imageable elements containing cyanoacrylate polymer particles |
| 07/04/2006 | US7070891 Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operation |
| 07/04/2006 | US7070890 Color filter and manufacturing method therefor |
| 07/04/2006 | US7070889 Method for repairing a photomask, method for inspecting a photomask, method for manufacturing a photomask, and method for manufacturing a semiconductor device |
| 07/04/2006 | US7070886 epoxides in the monomer or oligomer is linked by group comprising a siloxane to a silicon atom, a binder, an acid generator capable of producing an acid upon exposure to actinic radiation; decreased shrinkage, cracking and brittleness |
| 07/04/2006 | US7070832 Sublimating process for cleaning and protecting lithography masks |
| 07/04/2006 | US7070657 Method and apparatus for depositing antireflective coating |
| 07/04/2006 | US7070406 Apparatus for embossing a flexible substrate with a pattern carried by an optically transparent compliant media |
| 07/04/2006 | US7070289 Catoptric projection optical system |
| 07/04/2006 | US7069859 Planographic printing plate packaging structure and method for packaging planographic printing plate |
| 06/29/2006 | WO2006068852A1 Solvent resistant imageable element |
| 06/29/2006 | WO2006068737A1 Process for forming microstructures |
| 06/29/2006 | WO2006068708A2 Lensed fiber array for sub-micron optical lithography patterning |
| 06/29/2006 | WO2006068461A1 Support structure and lithographic apparatus |
| 06/29/2006 | WO2006068288A1 Method for measuring position of mask surface in height direction, exposure apparatus and exposure method |
| 06/29/2006 | WO2006068267A1 Compound for resist and radiation-sensitive composition |
| 06/29/2006 | WO2006068233A1 Magnetic guiding apparatus, stage apparatus, exposure apparatus and device manufacturing method |
| 06/29/2006 | WO2006068048A1 Material for pattern formation, apparatus for pattern formation, and method for pattern formation |
| 06/29/2006 | WO2006067944A1 Resist composition for liquid immersion exposure and method for resist pattern formation |
| 06/29/2006 | WO2006067814A1 Tridimensional structures for an ink jet printhead and relevant manufacturing process |
| 06/29/2006 | WO2006067730A2 Device and method for holding a substrate |
| 06/29/2006 | WO2006067694A2 Nanofabrication based on sam growth |
| 06/29/2006 | WO2006067668A1 Surface patterning and via manufacturing employing controlled precipitative growth |
| 06/29/2006 | WO2006066638A1 A filter device for the compensation of an asymmetric pupil illumination |
| 06/29/2006 | WO2006039204A3 A method and apparatus for polarizing electromagnetic radiation |
| 06/29/2006 | WO2006026765A3 Plasma ashing process for increasing photoresist removal rate and plasma apparatus wuth cooling means |
| 06/29/2006 | WO2005103828A3 System and method for fabricating contact holes |
| 06/29/2006 | WO2005088397A3 A process of imaging a deep ultraviolet photoresist with a top coating and materials thereof |
| 06/29/2006 | US20060143172 Mask processing device, mask processing method, program and mask |
| 06/29/2006 | US20060142890 Substrate processing apparatus, method of controlling substrate, and exposure apparatus |
| 06/29/2006 | US20060142542 Phosphazene compound, photosensitive resin composition and use thereof |
| 06/29/2006 | US20060142533 Process for preparing poly(arylene ethers) with pendant crosslinkable groups |
| 06/29/2006 | US20060142409 Actinic ray curable ink-jet ink and printed matter |
| 06/29/2006 | US20060142173 Solvent compositions containing chlorofluoroolefins or fluoroolefins |
| 06/29/2006 | US20060141774 Pattern transfer mask related to formation of dual damascene structure and method of forming dual damascene structure |
| 06/29/2006 | US20060141400 Immersion exposure process-use resist protection film forming material, composite film, and resist pattern forming method |
| 06/29/2006 | US20060141399 Exposing a photoresist layer on a semiconductor and developing it using a first fluid including supercritical CO2 and a base such as tetramethylammonium hydroxide; cleaning using a second fluid including supercritical CO2 and a solvent such as methanol, ethanol, isopropanol, or xylene |
| 06/29/2006 | US20060141398 Method of producing semiconductor device |
| 06/29/2006 | US20060141397 Exposing to a patterned light source a mixture a first photoresist having a glass transition point higher than and an operational absorption in the vicinity of a wavelength longer than those of a second photoresist; light source emits radiation at the wavelength absorbed by the first photoresist |
| 06/29/2006 | US20060141394 Radiating material of octafunctional epoxidized novolac resin, solvent, photopolymerization initiator; dialkyl phthalate, malonate, sebacate, and/or adipate plasticizer; and adhesion promoter of glycidoxypropanetrimethoxysilane, mercaptopropyltrimethoxysilane, and/or aminopropyltrimethoxysilane |
| 06/29/2006 | US20060141392 Photosensitive resin composition, method for preparing the same, and dry film resist comprising the same |
| 06/29/2006 | US20060141385 Coating a substrate with a first photoresist, exposing the first photoresist with radiation, developing the first photoresist;applying a second photoresist layer onto the substrate, exposing the second photoresist with radiation in the second image area;developing the second photoresist |
| 06/29/2006 | US20060141384 Process for refining crude resin for electronic material |
| 06/29/2006 | US20060141383 Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions |
| 06/29/2006 | US20060141382 Resist composition and method of forming resist pattern using same |
| 06/29/2006 | US20060141381 Photosensitive resin composition, and photosensitive element, method for forming resist pattern and printed wiring board using the composition |
| 06/29/2006 | US20060141372 Mask pattern and method for forming resist pattern using mask pattern thereof |
| 06/29/2006 | US20060141368 Designing the database patterns of the photo mask according to a design rule of a semiconductor element; performing optical proximity correction of the designed database patterns; detecting failure of the database patterns by obtaining a plurality of bias values based on at least two space width |
| 06/29/2006 | US20060141209 Pellicle for photolithography and pellicle frame |
| 06/29/2006 | US20060141000 Porous biodegradable polymeric materials for cell transplantation |
| 06/29/2006 | US20060140624 Method of developing a resist film and a resist development processor |
| 06/29/2006 | US20060139775 Optical element holding device, lens barrel, exposing device, and device producing method |
| 06/29/2006 | US20060139614 Exposure method, substrate stage, exposure apparatus, and device manufacturing method |
| 06/29/2006 | US20060139605 Lithographic apparatus and device manufacturing method that limits a portion of a patterning device used to pattern a beam |
| 06/29/2006 | US20060139594 Exposure apparatus and device fabricating method |
| 06/29/2006 | US20060139593 Exposure apparatus, exposure method and device manufacturing method |
| 06/29/2006 | US20060139584 Holding mechanism in exposure apparatus, and device manufacturing method |
| 06/29/2006 | US20060138682 Substrate provided with an alignment mark in a substantially transmissive process layer, mask for exposing said mark, device manufacturing method, and device manufactured thereby |
| 06/29/2006 | US20060138422 Thin film transistor substrate of horizontal electric field type liquid crystal display device and fabricating method thereof |
| 06/29/2006 | US20060138400 Novel compounds capable of forming photoconvertible organic thin film and articles having organic thin film |
| 06/29/2006 | US20060138399 resist-removing solution for low-k film and a cleaning solution for via holes or capacitors; solutions comprising hydrogen fluoride (HF) and at least one member selected from organic acids and organic solvents (e.g. acetic acid, hexanol, lauryl alcohol, propylene glcol, glycerin, diethylene glycol) |
| 06/29/2006 | US20060138366 Methods and systems for lithography process control |
| 06/29/2006 | US20060138350 Lithographic apparatus, illumination system and method for mitigating debris particles |
| 06/29/2006 | US20060138349 Lithographic apparatus and device manufacturing method |
| 06/29/2006 | US20060138338 Mask blanks inspection tool |
| 06/29/2006 | US20060138311 Irradiation device for testing objects coated with light-sensitive paint |
| 06/29/2006 | US20060138080 Stamper, lithographic method of using the stamper and method of forming a structure by a lithographic pattern |
| 06/29/2006 | US20060138078 Semiconductor device fabrication method |
| 06/29/2006 | US20060137720 Method for the removal of organic residues from finely structured surfaces |
| 06/29/2006 | US20060137430 Liquid flow proximity sensor for use in immersion lithography |
| 06/29/2006 | DE112004001662T5 Laminierte fotoempfindliche Reliefdruckoriginalplatte und Verfahren zur Erzeugung der Reliefdruckplatte Laminated photosensitive relief printing original plate and method for producing the relief printing plate |
| 06/29/2006 | DE10312204B4 Verwendung von N-Iminen in wärmeempfindlichen positiv arbeitenden Beschichtungen Use of N-imines in the heat-sensitive positive working coatings |
| 06/29/2006 | DE10261035B4 Fotomasken-Reparaturverfahren und Vorrichtung Photomask repair method and apparatus |
| 06/29/2006 | DE10256808B4 Projektionsbelichtungsanlage Projection exposure apparatus |
| 06/29/2006 | DE102005045967A1 New top anti-reflective coating polymer compounds useful to fabricate a semiconductor device |
| 06/29/2006 | DE102004059147A1 Rough and fine structures transferring method for dynamic random access memory substrate, involves mapping structures with different lithography techniques in resist using positive lacquer and providing negative lacquer based on epoxy resin |
| 06/28/2006 | EP1675164A1 Multilayer film reflection mirror, production method for multilayer film reflection mirror, and exposure system |
| 06/28/2006 | EP1674939A1 Level sensor, lithographic apparatus and device manufacturing method |
| 06/28/2006 | EP1674936A2 Method and apparatus for thermal development of an imaging element having a textured support surface |
| 06/28/2006 | EP1674935A2 Lithographic apparatus and device manufacturing method |
| 06/28/2006 | EP1674934A1 Lithographic apparatus and device manufacturing method |