Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
05/2014
05/06/2014CA2714627C Method and apparatus for provisioning dual mode wireless client devices in a telecommunications system
05/01/2014WO2014065500A1 Hard mask composition and method for forming pattern using same
05/01/2014WO2014065398A1 Positive photosensitive resin composition, method for forming polyimide resin patterns, and patterned polyimide resin film
05/01/2014WO2014065394A1 Photosensitive resin composition, resist laminate, and cured product (2) thereof
05/01/2014WO2014065393A1 Photosensitive resin composition, resist laminate, and cured product (1) thereof
05/01/2014WO2014065352A1 Photosensitive resin composition, cured product and manufacturing method thereof, resin pattern production method, cured film, organic el display device, liquid crystal display device, and touch panel display device
05/01/2014WO2014065351A1 Photosensitive resin composition, cured product and method for producing same, method for producing resin pattern, cured film, organic el display device, liquid crystal display device, and touch panel display device
05/01/2014WO2014065220A1 Photosensitive transfer material, pattern formation method, and etching method
05/01/2014WO2014065090A1 Coloring composition, color filter and method for producing same, image display device, solid-state imaging element, and novel compound
05/01/2014WO2014064742A1 Exposure apparatus, mask, and optical film
05/01/2014WO2014064224A1 Projection exposure system for euv lithography and method for operating the projection exposure system
05/01/2014WO2014063995A1 Substrate positioning system, lithographic apparatus and device manufacturing method
05/01/2014WO2014063878A2 Lithographic apparatus
05/01/2014WO2014063874A1 Patterning device support and lithographic apparatus
05/01/2014WO2014063871A1 Patterning device manipulating system and lithographic apparatuses
05/01/2014WO2014063719A1 Illumination system of a microliteographic projection exposure apparatus
05/01/2014WO2014063532A1 Photolithography method and system based on high step slope
05/01/2014WO2014026662A3 Method for optical transmission of a structure into a recording medium
05/01/2014WO2012138463A3 Microfrabication of tunnels
05/01/2014US20140120478 Techniques for patterning resist
05/01/2014US20140120477 Substrate processing apparatus
05/01/2014US20140120476 Method of forming a photoresist pattern
05/01/2014US20140120475 Electron beam exposure method
05/01/2014US20140120474 Deep-Ultraviolet Chemically-Amplified Positive Photoresist
05/01/2014US20140120472 Resist composition, method of forming resist pattern, novel compound, and acid generator
05/01/2014US20140120471 Photoacid generating compound and photoresist composition comprising same, coated article comprising the photoresist and method of making an article
05/01/2014US20140120470 Photoresists comprising ionic compound
05/01/2014US20140120469 Thermal acid generators for use in photoresist
05/01/2014US20140120462 Photosensitive resin composition, method for forming pattern-cured film using photosensitive resin composition, and electronic component
05/01/2014US20140120345 Backing Sheet for Flexographic Printing Plate and Method for Manufacturing the Same
05/01/2014US20140118715 Laser Interference Lithography Apparatus Using Fiber as Spatial Filter and Beam Expander
05/01/2014US20140118714 Projection optics for microlithography
05/01/2014US20140118713 Catadioptric Projection Objective With Intermediate Images
05/01/2014US20140118710 Stage apparatus, lithography apparatus, and article manufacturing method
05/01/2014US20140118709 Holding apparatus, lithography apparatus, and method of manufacturing article
05/01/2014US20140118656 Liquid crystal display and manufacturing method thereof
05/01/2014US20140117488 Pattern decomposition lithography techniques
05/01/2014US20140116981 Method for Forming a Device Having Nanopillar and Cap Structures
05/01/2014US20140116980 Method for providing a template for a self-assemblable polymer for use in device lithography
04/2014
04/30/2014EP2725423A1 Negative-type photosensitive resin composition, pattern forming method, cured film, insulating film, color filter, and display device
04/30/2014EP2725422A1 Photosensitive composition, master plate for planographic printing plate, polyurethane, and method for producing polyurethane
04/30/2014EP2725011A1 Novel compound
04/30/2014EP2724346A1 Method for producing a reflective optical element for euv lithography
04/30/2014EP2723809A1 An underlayer composition and process thereof
04/30/2014DE102013211269A1 Illumination optics for illuminating structured object such as lithographic mask or wafer, mounted in metrology system, has an energy sensor designed for monitoring the lighting total light dose which hits on the facet mirrors
04/30/2014DE102013205957A1 Optical system for microlithographic projection exposure system that is utilized for manufacturing of e.g. integrated switching circuits, has light sources for illuminating reflecting surfaces with light of different polarization states
04/30/2014DE102013111744A1 Elektronenstrahl-Belichtungsverfahren Electron beam exposure method
04/30/2014DE102012223217B3 Optical system for use in illuminating device illuminating reticle in microlithographic projection exposure system to manufacture e.g. LCDs, has deflection device including reflection surfaces upstream and downstream of mirror arrangement
04/30/2014DE102012219936A1 EUV-Lichtquelle zur Erzeugung eines Nutz-Ausgabestrahls für eine Projektionsbelichtungsanlage EUV light source for producing a useful output beam for a projection exposure apparatus
04/30/2014DE102012219806A1 Projektionsbelichtungsanlage mit mindestens einem Mittel zur Reduktion des Einflusses von Druckschwankungen Projection exposure apparatus with at least one agent for reducing the influence of pressure fluctuations
04/30/2014DE102012219545A1 Projektionsbelichtungssystem für EUV-Lithographie und Verfahren zum Betreiben des Projektionsbelichtungssystems Projection exposure system for EUV lithography and method for operating the projection exposure system
04/30/2014DE102012021284A1 Device for layer-wise generative manufacturing of three dimensional components by photopolymerization, has exposure units forming exposure stations along direction, where radiation is directed into material in stations through disk
04/30/2014CN203573084U CTP (computer-to-plate) focal length setting system
04/30/2014CN203573083U Front section frame structure of exposure machine
04/30/2014CN203573082U Rack structure of parallel light exposure machine
04/30/2014CN203573081U Pressing strip tool of exposure frame
04/30/2014CN103765998A Radiation source and lithographic apparatus
04/30/2014CN103765997A Radiation source and method for lithographic apparatus for device manufacture
04/30/2014CN103765555A Exposure device, exposure method, method for manufacturing device, program and recording medium
04/30/2014CN103765316A Lithographic apparatus and device manufacturing method
04/30/2014CN103765315A Optical imaging arrangement with individually actively supported components
04/30/2014CN103765314A Negative photosensitive resin composition, partition wall and optical element
04/30/2014CN103765313A Photosensitive alkali-soluble silicone resin composition
04/30/2014CN103765254A Colored resin composition and resin black matrix substrate
04/30/2014CN103764625A Novel compound
04/30/2014CN103762199A Method for manufacturing array base plate of liquid crystal display
04/30/2014CN103762195A Double-workpiece table macro and micro fast connecting mechanism
04/30/2014CN103762159A Method for graphing conductive polymer film by using metal protecting layer
04/30/2014CN103760753A Substrate roasting device and temperature adjustment method thereof
04/30/2014CN103760752A Stereolithography resin compositions and three-dimensional objects made therefrom
04/30/2014CN103760751A High-temperature-yellowing resistant and high-temperature and high-humidity resistant OC negative type photoresist and process procedure method thereof in manufacture of touch screen devices
04/30/2014CN103760750A Preparation method and application method of light-cured silk-screen printing photosensitive glue
04/30/2014CN103760749A Manufacturing method of film patterns and display substrate
04/30/2014CN103760748A Mask plate and through hole forming method
04/30/2014CN103760747A Mask plate, method for carrying out exposure on the mask plate and liquid crystal panel comprising mask plate
04/30/2014CN103760681A Method for manufacturing micro-polarizer array based on metal nanometer grating
04/30/2014CN103760627A Manufacturing method of multi-channel light filtering micro lens array
04/30/2014CN103755847A Polyacrylic ester dispersing agent, pigment dispersion liquid, color photoresist, color membrane substrate and display device
04/30/2014CN102722091B Two-beam interference photoetching method and system
04/30/2014CN102691970B Method and device for making light emitting diode (LED) illumination light diffusion film curve surface lampshade
04/30/2014CN102621824B Optical processing system and method
04/30/2014CN102549500B Dry film photoresist
04/30/2014CN102543620B Preparation method of zinc oxide and carbon nano-tube field emission composite cathode structure
04/30/2014CN102414617B Photo-curable and heat-curable resin composition
04/30/2014CN102304068B Photoacid generators and photoresists comprising the same
04/30/2014CN102201333B Photoresists and methods for use thereof
04/30/2014CN102132215B Optimization of focused spots for maskless lithography
04/30/2014CN102105837B Mirror, lithographic apparatus and device manufacturing method
04/30/2014CN102077142B Method for removing a deposition on an uncapped multilayer mirror of a lithographic apparatus, lithographic apparatus and device manufacturing method
04/30/2014CN102024680B Substrate processing system
04/30/2014CN101983427B Inductor with patterned ground plane
04/30/2014CN101930177B Coloring composition, color filter and color liquid crystal display device
04/30/2014CN101872033B Shading sheet array, manufacturing method thereof and lens module array
04/30/2014CN101809709B Mask case, transfer apparatus, exposure apparatus, mask transfer method and device manufacturing method
04/29/2014US8713484 Aware manufacturing of integrated circuits
04/29/2014US8711479 Illumination apparatus for microlithography projection system including polarization-modulating optical element
04/29/2014US8711333 Lithographic apparatus and device manufacturing method
04/29/2014US8711331 Optical module for a microlithography objective including holding and supporting devices
04/29/2014US8711330 Lithographic apparatus and device manufacturing method
04/29/2014US8711329 Lithographic apparatus and device manufacturing method
1 ... 39 40 41 42 43 44 45 46 47 48 49 50 51 52 53 54 55 56 57 58 59 ... 1272