| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/12/2006 | CN1264029C A process for making color filter |
| 07/12/2006 | CN1263997C Distortion measurement method and exposure equipment |
| 07/12/2006 | CN1263834C Cleaning solution for photoresist agent and method for forming pattern by it |
| 07/12/2006 | CN1263610C Supporting body for lithographic printing plate and original lithographic printing plate and treatment method of lithographic printing plate |
| 07/11/2006 | US7076761 Method for creating charged-particle-beam exposure data, method for manufacturing semiconductor device, and program |
| 07/11/2006 | US7075726 Projection optical system and projection exposure apparatus |
| 07/11/2006 | US7075721 Compensator for radially symmetric birefringence |
| 07/11/2006 | US7075720 Structures and methods for reducing polarization aberration in optical systems |
| 07/11/2006 | US7075713 High efficiency collector for laser plasma EUV source |
| 07/11/2006 | US7075705 Method for wavelength-selective mixing and/or distribution of polychromatic light |
| 07/11/2006 | US7075696 Correction of birefringence in cubic crystalline optical systems |
| 07/11/2006 | US7075651 Image forming characteristics measuring method, image forming characteristics adjusting method, exposure method and apparatus, program and storage medium, and device manufacturing method |
| 07/11/2006 | US7075639 Method and mark for metrology of phase errors on phase shift masks |
| 07/11/2006 | US7075623 Flexure-supported split reaction mass |
| 07/11/2006 | US7075620 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 07/11/2006 | US7075619 In-process correction of stage mirror deformations during a photolithography exposure cycle |
| 07/11/2006 | US7075618 Apparatus control system, apparatus control method, semiconductor exposure apparatus, semiconductor exposure apparatus control method and semiconductor device manufacturing method |
| 07/11/2006 | US7075617 Device manufacturing method and a lithographic apparatus |
| 07/11/2006 | US7075616 Lithographic apparatus and device manufacturing method |
| 07/11/2006 | US7075614 Method of making active matrix substrate with pixel electrodes of photosensitive conductive material |
| 07/11/2006 | US7075198 Alignment apparatus and exposure apparatus using the same |
| 07/11/2006 | US7075197 Aligning apparatus, exposure apparatus, and device manufacturing method |
| 07/11/2006 | US7074640 Method of making barrier layers |
| 07/11/2006 | US7074546 Precursor comprising a hydrophilic support and provided thereon, a photopolymerizable light sensitive layer containing an (meth)acrylic ester compound with tert-amine group |
| 07/11/2006 | US7074545 Of aluminum is subjected to electrolytic surface roughening and etching treatment in an aqueous alkali solution, improves initial printability and anti-staining properties |
| 07/11/2006 | US7074544 a support, a photosensitive/heat sensitive layer on the support, exhibiting increased solubility to an alkaline developer following exposure with an infrared laser, contains an alkali-soluble resin, a photothermal conversion dye, and a sulfonium compound |
| 07/11/2006 | US7074543 Positive resist composition and method of forming resist pattern from the same |
| 07/11/2006 | US7074542 A substrate; a photosensitive layer on the substrate, including a light-to-heat conversion agent and a compound, which is at least one of crosslinkable and polymerizable; an overcoat layer including a polymer, which is hydrophobic and soluble in an aqueous alkali solution. |
| 07/11/2006 | US7074530 Continuous gray levels, the change in light intensity between each gray level is both finite and linear, produces a smoother and more linear profile on the object being made, meets the sub-resolution requirements of most optical tools |
| 07/11/2006 | US7074529 Phase-shift mask |
| 07/11/2006 | US7074527 Method for fabricating a mask using a hardmask and method for making a semiconductor device using the same |
| 07/11/2006 | US7074525 Projecting light through a photomask using an optical projection system, sub-resolution features in clear areas adjacent to lines and spaces reduce transparency of the clear areas reduce light scattering and flare, greater degree of defocus in the pattern, less resist stripping |
| 07/11/2006 | US7074358 Selectively exposing a photosensitive film containing a layer of photosensitive material and removing the layer which form a relief surface in the film, applying casting material to the relief surface |
| 07/11/2006 | US7073924 Projection exposure apparatus with line width calculator controlled diaphragm unit |
| 07/11/2006 | US7073542 Liquid quantity determination unit, photolithography apparatus, and liquid quantity determination method |
| 07/11/2006 | US7073438 Image forming apparatus including rotary drum and detachably mounted chuck |
| 07/11/2006 | CA2156471C Process for imaging of liquid photopolymer printing plates |
| 07/06/2006 | WO2006071907A1 Multi-photon polymerizable pre-ceramic polymeric compositions |
| 07/06/2006 | WO2006071108A1 Curable composition cured product and laminate |
| 07/06/2006 | WO2006070748A1 Maintenance method, exposure device, and maintenance member |
| 07/06/2006 | WO2006070709A1 Cleaning liquid for lithography and method of cleaning therewith |
| 07/06/2006 | WO2006070695A1 Material for forming resist protection films and method for resist pattern formation with the same |
| 07/06/2006 | WO2006070694A1 Acrylic copolymer |
| 07/06/2006 | WO2006070621A1 Method of development processing and development processing apparatus |
| 07/06/2006 | WO2006070580A1 Optical integrator, illumination optical device, photolithograph, photolithography, and method for fabricating device |
| 07/06/2006 | WO2006070555A1 Beam recording method and device |
| 07/06/2006 | WO2006069795A2 Projection optical system |
| 07/06/2006 | WO2006069785A1 Apparatus for mounting two or more optical elements and method for processing the surface of an optical element |
| 07/06/2006 | WO2006069755A2 Lens module comprising at least one replaceable optical element |
| 07/06/2006 | WO2006030240A3 Novel resist material |
| 07/06/2006 | WO2006019633A3 Formation of a self-assembled release monolayer in the vapor phase |
| 07/06/2006 | WO2006013100A3 Projection objective for microlithography |
| 07/06/2006 | WO2005119802A3 Adaptive shape substrate support system and method |
| 07/06/2006 | WO2005101121A3 Optical element unit for exposure processes |
| 07/06/2006 | WO2005096098A3 Projection objective, projection exposure apparatus and reflective reticle for microlithography |
| 07/06/2006 | WO2005006076A3 Systems for magnification and distortion correction for imprint lithography processes |
| 07/06/2006 | US20060149403 System and method for processing a substrate and program therefor |
| 07/06/2006 | US20060149073 Adamantane derivative and process for producing the same |
| 07/06/2006 | US20060148925 Novel photosensitive resin based on saponified polyvinyl acetate photosensitive resin composition, method of forming aqueous gel from the same, and compound |
| 07/06/2006 | US20060147850 Plane waves to control critical dimension |
| 07/06/2006 | US20060147849 Method of preventing pinhole defects through co-polymerization |
| 07/06/2006 | US20060147848 Method of patterning catalyst layer for synthesis of carbon nanotubes and method of fabricating field emission device using the method |
| 07/06/2006 | US20060147846 Method of forming photoresist pattern and semiconductor device employing the same |
| 07/06/2006 | US20060147844 Since the light transmissive or non-transmissive portions are randomly arranged, the substrate provided with the light reflective film exhibits excellent light scattering effect and effectively prevents the occurrence of the interference fringe |
| 07/06/2006 | US20060147841 Pattern plotting device and pattern plotting method |
| 07/06/2006 | US20060147840 Photopolymerizable composition, light sensitive planographic printing plate material and manufacturing method of planographic printing plate |
| 07/06/2006 | US20060147839 Photosensitive coating material for a substrate |
| 07/06/2006 | US20060147838 Negative-working photosensitive resin composition and photosensitive resin plate using the same |
| 07/06/2006 | US20060147837 Resist composition |
| 07/06/2006 | US20060147834 Water-soluble composition for coating photoresist pattern and method for forming fine patterns using the same |
| 07/06/2006 | US20060147832 Polymer and positive type resist composition |
| 07/06/2006 | US20060147822 Appartus and method for forming pattern |
| 07/06/2006 | US20060146427 Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method |
| 07/06/2006 | US20060146312 Holding apparatus, holding method, exposure apparatus and device manufacturing method |
| 07/06/2006 | US20060146311 Exposure apparatus |
| 07/06/2006 | US20060146306 Exposure apparatus, exposure method, and method for producing device |
| 07/06/2006 | US20060146305 Exposure apparatus, method for producing device, and method for controlling exposure apparatus |
| 07/06/2006 | US20060145229 Cylinder-type capacitor and storage device, and method(s) for fabricating the same |
| 07/06/2006 | US20060145094 Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby |
| 07/06/2006 | US20060144812 for producing a functional structure like a magnetic recording medium having holes filled with a functional material like a magnetic material |
| 07/06/2006 | US20060144272 Process for producing water-development printing plate for relief printing |
| 07/06/2006 | DE19929716B4 Verfahren zur Vorbereitung eines Aluminiumsubstrats für eine lithographische Druckplatte sowie für die Herstellung einer vorsensibilisierten lithographischen Druckplatte A method of preparing an aluminum substrate for a lithographic printing plate and for the production of a presensitized lithographic printing plate |
| 07/06/2006 | DE10318681B4 Verfahren und Vorrichtung zum Entfernen eines Randbereichs einer Substratschicht und zur Substratbeschichtung sowie Substrat Method and apparatus for removing an edge portion of a substrate layer and the substrate coating and substrate |
| 07/06/2006 | DE102005055937A1 Method for imaging printing form in number of imaging steps involves occurring of further imaging step after number of imaging steps, in which at least part of pixels of first subset is set on the position |
| 07/06/2006 | DE102005047059A1 New photoacid generating polymer useful in top anti-reflective coating composition for forming pattern of semiconductor device |
| 07/06/2006 | DE102005042005A1 Objective lens esp. as micro-lithography projection objective, has objective divided into first part-objective with single mirror and second part-objective with primary and secondary mirror |
| 07/06/2006 | DE102004063416A1 Verfahren zur Herstellung einer Photoresistlösung A process for producing a photoresist solution |
| 07/06/2006 | DE102004063091A1 Optisches Element An optical element |
| 07/06/2006 | DE102004062289A1 Thermisch stabiler Multilayer-Spiegel für den EUV-Spektralbereich Thermally stable multilayer mirrors for the EUV spectral range |
| 07/06/2006 | DE102004061054A1 Method for fastening substrate at substrate holder involves laying of first side of substrate on substrate holder, setting of first fluid pressure at first sub range of first side of substrate and setting of second fluid pressure |
| 07/06/2006 | DE102004060223A1 Method for determining distribution of component e.g. soluble component in volume of photoresist involves post baking process which is followed on lithographic exposure whereby lower parts of photoresist volume in cells |
| 07/06/2006 | DE102004060184A1 Extreme ultraviolet mirror arrangement used in the semiconductor industry comprises a mirror substrate supporting dielectric layers and an electrically insulating heat transfer layer and a substrate support |
| 07/06/2006 | DE102004044669B4 Verfahren zur Überwachung des Lichtdosiergeräts eines Photolithographie-Systems Method for monitoring the Lichtdosiergeräts a photolithography system |
| 07/06/2006 | DE10145469B4 Poly-o-hydroxyamid und Verfahren zu seiner Weiterverarbeitung zu Polybenzoxazol Poly-o-hydroxyamide and method for processing into Polybenzoxazole |
| 07/05/2006 | EP1677341A1 Exposure apparatus, exposure method, and method for manufacturing device |
| 07/05/2006 | EP1677158A2 Method for measuring information about a substrate, and a substrate for use in a lithographic apparatus |
| 07/05/2006 | EP1677156A1 Lithographic apparatus and device manufacturing method |
| 07/05/2006 | EP1677155A1 System and method for fault indication on a substrate in maskless applications |
| 07/05/2006 | EP1677154A2 Lithographic apparatus and device manufacturing method |
| 07/05/2006 | EP1677153A1 Lithographic apparatus and device manufacturing method |