| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/13/2006 | US20060154183 Exposure apparatus and method for producing device |
| 07/13/2006 | US20060154182 By an endpoint timed etch, chemical mechanical polishing, or a diffusion driven reaction; removing portions of the initial overcoat layer and chemically binding to the sidewalls; improved diffusion around sharp corners |
| 07/13/2006 | US20060154181 Applying resin that displays increased alkali solubility under the action of acid, and an acid generator that generates acid on exposure to substrate; prebaking; selective exposure, post exposure baking; alkali development; heat treatment |
| 07/13/2006 | US20060154178 Method for the production of photoresist structures |
| 07/13/2006 | US20060154177 reducing space width of holes and simultaneously removing unwanted holes to change pattern density; coating patterned resist layer with a water soluble negative resist layer, patternwise exposure, forming crosslinked plugs, removing uncrosslinked sections, pattern transfer to substrate; microelectronics |
| 07/13/2006 | US20060154175 Solid imaging compositions for preparing polypropylene-like articles |
| 07/13/2006 | US20060154174 (meth)acrylate ester copolymer change alkali solubility under action of acid, and acid generator; miniaturization the resist layer by using a water soluble acrylic acid-vinylpyrrolidone copolymer overcoatings; first heat the laminates, narrowing the spacing of the resist pattern; fine resolution |
| 07/13/2006 | US20060154171 Photoresist composition and method of forming resist pattern |
| 07/13/2006 | US20060154170 Both an unexposed and an exposed coating film formed using the resist composition individually have the maximum increase in thickness equal to or less than 3.0 nm |
| 07/13/2006 | US20060154158 quaternaryammonium having a lower alkyl or a lower hydroxyalkyl groups as main component; anionic surfactant containing biphenyl ether having one or more metal sulfonate group and an alkyl or alkoxy group; prebaking resist layer, exposing to light, alkali developing; improved dimensional controllability |
| 07/13/2006 | US20060154155 Photoresists; photomasks |
| 07/13/2006 | US20060154091 Liquid-repellent, alkali-resistant coating composition and coating suitable for pattern forming |
| 07/13/2006 | US20060153987 Organic bottom anti-feflective composition and patterning method using the same |
| 07/13/2006 | US20060153263 Method of producing fluorite crystal, fluorite and optical system incorporating the same |
| 07/13/2006 | US20060152723 Complementary division mask having alignment mark, method for forming alignment mark of the complementary division mask, semiconductor device manufactured by using the complementary division mask, and its manufacturing method |
| 07/13/2006 | US20060152703 Method of detecting relative position of exposure mask and object to be exposed, alignment method, and exposure method using the same |
| 07/13/2006 | US20060152701 Optically polarizing retardation arrangement, and a microlithography projection exposure machine |
| 07/13/2006 | US20060152699 Exposure apparatus and method for producing device |
| 07/13/2006 | US20060152698 Exposure apparatus and device manufacturing method |
| 07/13/2006 | US20060152697 Apparatus and method for providing fluid for immersion lithography |
| 07/13/2006 | US20060151724 Temperature adjustment apparatus, exposure apparatus having the same, and device fabricating method |
| 07/13/2006 | US20060151717 Apparatus including a radiation source, a filter system for filtering particles out of radiation emitted by the source, and a processing system for processing the radiation, a lithographic apparatus including such an apparatus, and a method of filtering particles o |
| 07/13/2006 | US20060151710 Exposure device, exposure method, and semiconductor device manufacturing method |
| 07/13/2006 | US20060151435 Surface processing method |
| 07/13/2006 | DE4107762B4 Verfahren zum Herstellen von Master- und Arbeitsmusterplatten für den Ätzprozess A method for producing master and work pattern plates for the etching process |
| 07/13/2006 | DE19838847B4 Verfahren zum Vermindern der Intensität von während des Prozesses der Photolithographie auftretenden reflektierten Strahlen A method of reducing the intensity of occurring during the process of photolithography reflected rays |
| 07/13/2006 | DE10324866B4 Verfahren zum Herstellen eines magnetischen Direktzugriffsspeichers A method of manufacturing a magnetic random access memory |
| 07/13/2006 | DE102004063314A1 Filtereinrichtung für die Kompensation einer asymmetrischen Pupillenausleuchtung Filter means for compensating an asymmetric pupil illumination |
| 07/13/2006 | DE102004062582A1 Optical focussing device for projection exposure system for semiconductor manufacture, has phase change materials for temperature regulation |
| 07/13/2006 | DE102004041609B3 Interlayer für Lithographie-Druckplatten Interlayer for lithographic printing plates |
| 07/13/2006 | DE10050047B4 Trockenreinigungsverfahren statt der herkömmlichen Nassreinigung nach der Ätzung von Metallen Dry cleaning process instead of the conventional wet cleaning after etching of metals |
| 07/13/2006 | CA2594331A1 A system capable of determining applied and anodized coating thickness of a coated-anodized product |
| 07/12/2006 | EP1679738A1 Exposure apparatus, exposure method, and device producing method |
| 07/12/2006 | EP1679737A1 Exposure apparatus and device producing method |
| 07/12/2006 | EP1679551A1 Lithographic apparatus and device manufacturing method |
| 07/12/2006 | EP1679550A1 Lithographic apparatus and device manufacturing method |
| 07/12/2006 | EP1679549A2 Imaging element for use as a recording element and process of using the imaging element |
| 07/12/2006 | EP1679537A1 Apparatus for compensating transients heat loads in a lithography mirror |
| 07/12/2006 | EP1679328A1 Photocuring resin composition containing organic polymer having epoxy group and/or oxethane group-containing silicon group at end, and method for producing same |
| 07/12/2006 | EP1679314A1 Silane compound, polysiloxane and radiation-sensitive resin composition |
| 07/12/2006 | EP1679297A1 Fluorine compound, fluoropolymer, and process for producing the same |
| 07/12/2006 | EP1678747A1 A processing liquid coating apparatus and a processing liquid coating method |
| 07/12/2006 | EP1678559A1 Optical assembly for photolithography |
| 07/12/2006 | EP1678558A1 Diaphragm changing device |
| 07/12/2006 | EP1678557A2 Photosensitive resin compositions and photosensitive dry films using the same |
| 07/12/2006 | EP1678556A2 Low-activation energy silicon-containing resist system |
| 07/12/2006 | EP1678467A1 A method for calibration of metrology stage |
| 07/12/2006 | EP1678466A2 Line profile asymmetry measurement |
| 07/12/2006 | EP1677985A1 Pattern generating apparatus and an apparatus for measuring the physical properties of the surface |
| 07/12/2006 | EP1677699A1 Novel photopolymers and use in dental restorative materials |
| 07/12/2006 | EP1576419A4 Programmable photolithographic mask and reversible photo-bleachable materials based on nano-sized semiconductor particles and their applications |
| 07/12/2006 | EP1269259A4 Solventless, resistless direct dielectric patterning |
| 07/12/2006 | EP1051665B1 Photopolymerization compositions including maleimides and processes for using the same |
| 07/12/2006 | CN2796094Y False distributing system for control liquid |
| 07/12/2006 | CN2795900Y Self control liquid crystal light valve group photo etching shutter mechanism |
| 07/12/2006 | CN1802726A Exposure apparatus, and device manufacturing method |
| 07/12/2006 | CN1802722A Plasma ashing apparatus and endpoint detection process |
| 07/12/2006 | CN1802711A Lithographic systems and methods with extended depth of focus |
| 07/12/2006 | CN1802609A Developer composition for resists and method for formation of resist pattern |
| 07/12/2006 | CN1802608A Adhesion improver for photosensitive resin composition and photosensitive resin composition containing same |
| 07/12/2006 | CN1802607A Photoacid generators with perfluorinated multifunctional anions |
| 07/12/2006 | CN1802606A Resist pattern swelling material, and method for patterning using same |
| 07/12/2006 | CN1802265A Positive tone bi-layer imprint lithography method and compositions therefor |
| 07/12/2006 | CN1801471A Method for detecting silicon chip state in chip case and repositioning its circle center |
| 07/12/2006 | CN1801458A High depth-width ratio deep sub-micrometer, nanometer metal structure making process based on self-supporting thin film |
| 07/12/2006 | CN1800991A Scanning exposure apparatus and method |
| 07/12/2006 | CN1800990A Elimination method of carbonate in resists development liquid, elimination apparatus and concentration control method of resists development liquid |
| 07/12/2006 | CN1800989A Apparatus and process for forming a printing form having a cylindrical support |
| 07/12/2006 | CN1800988A Photoresist cleaning agent |
| 07/12/2006 | CN1800987A A method of generating a mask having optical proximity correction features and parts manufacturing method |
| 07/12/2006 | CN1800986A Lithographic apparatus and device manufacturing method |
| 07/12/2006 | CN1800985A Method for correcting mask pattern, photomask, method for fabricating photomask, semiconductor device, and method for fabricating semiconductor device |
| 07/12/2006 | CN1800984A Negative nano-imprinting method |
| 07/12/2006 | CN1800983A Anti-stripping photolithography method for integrated circuit |
| 07/12/2006 | CN1800982A CTP plate making method and apparatus by using ink jet imaging principle |
| 07/12/2006 | CN1800981A Photosensitive resin composition, thin film panel made with photosensitive composition, and method for manufacturing thin film panel |
| 07/12/2006 | CN1800980A Sandblast resistant durable emulsion type photosensitive resin |
| 07/12/2006 | CN1800979A Solder resist composition of light-curing single liquid style and printing circuit board use same |
| 07/12/2006 | CN1800978A Photo-sensitive composition, photo-sensitive paste composition for barrier ribs comprising the same, and method for preparing barrier ribs for plasma display panel |
| 07/12/2006 | CN1800977A Chemically amplified positive resist composition |
| 07/12/2006 | CN1800976A Method for manufacturing thermal sensitive CTP plate |
| 07/12/2006 | CN1800975A Stepped and repeated illuminating and nano-imprinting device |
| 07/12/2006 | CN1800974A 压印光刻 Imprint Lithography |
| 07/12/2006 | CN1800973A Flexible optical mask for lithographic and method producing same and patterning method |
| 07/12/2006 | CN1800971A Method for performing full-chip manufacturing reliability checking and correction |
| 07/12/2006 | CN1800970A Forming method of mask pattern |
| 07/12/2006 | CN1800917A Array substrate and display panel having the same |
| 07/12/2006 | CN1800893A Substrate surface protection method for ion exchange process |
| 07/12/2006 | CN1800847A Evaluation method of resist composition using immersion solvent |
| 07/12/2006 | CN1800846A Evaluation method of resist composition using immersion solvent |
| 07/12/2006 | CN1799852A Nanometer stamping inclination alignment mechanism with arc guide rail |
| 07/12/2006 | CN1799705A Coated device and method |
| 07/12/2006 | CN1264394C Method for forming conductive pattern and preparing multi-layer ceramic substrates |
| 07/12/2006 | CN1264198C Optical masks, manufacture method thereof and manufacture method of electronic elements |
| 07/12/2006 | CN1264197C Environment control device of display device and its environment control method |
| 07/12/2006 | CN1264066C Stripping liquid for photoresist and photoresist stripping method using the same stripping liquid |
| 07/12/2006 | CN1264065C Lithographic apparatus and device manufacturing method |
| 07/12/2006 | CN1264064C Method for managing photochemical light intensity transient change and its equipment |
| 07/12/2006 | CN1264063C Method for forming photoresist layer without side vanes |
| 07/12/2006 | CN1264045C System and method for laser beam gathering |