| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/19/2006 | EP1680712A1 Photocurable composition for producing cured articles having high clarity and improved mechanical properties |
| 07/19/2006 | EP1680711A2 Novel photosensitive resin compositions |
| 07/19/2006 | EP1680699A1 Diaphragm array and/or filter array for optical devices, especially microscopes, the position, shape, and/or optical properties of which can be modified |
| 07/19/2006 | EP1395428A4 Chemical imaging of a lithographic printing plate |
| 07/19/2006 | EP1368711A4 Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass |
| 07/19/2006 | EP1368412A4 Imageable element and composition comprising thermally reversible polymers |
| 07/19/2006 | EP1297022B1 Novel photoinitiators |
| 07/19/2006 | EP1252551B1 Photoinitiator system with acylphosphine oxide initiators |
| 07/19/2006 | EP1192505B1 Methods for patterning polymer films, and use of the methods |
| 07/19/2006 | CN2798147Y Apparatus for liquid delivering and air-tight sealing in immersed photoetching system |
| 07/19/2006 | CN1806208A Photocurable resin composition |
| 07/19/2006 | CN1806207A Photocurable compositions and flexographic printing plates comprising the same |
| 07/19/2006 | CN1806206A Photosensitive resin composition |
| 07/19/2006 | CN1806205A Highly reflective substrates for the digital processing of photopolymer printing plates |
| 07/19/2006 | CN1806015A Bisazoquinolone pigments, processes for their preparation and their use |
| 07/19/2006 | CN1805838A Method to reduce adhesion between a conformable region and a pattern of a mold |
| 07/19/2006 | CN1805099A Photosensitive paste composition, PDP electrode manufactured using the composition, and PDP including the PDP electrode |
| 07/19/2006 | CN1805014A Method of manufacturing a magnetic head |
| 07/19/2006 | CN1804727A Lithographic apparatus, illumination system and filter system |
| 07/19/2006 | CN1804726A Method for measuring information about a substrate, and a substrate for use in a lithographic apparatus |
| 07/19/2006 | CN1804725A Apparatus and method for supporting and thermally conditioning a substrate, a support table, a chuck and a lithographic apparatus comprising said support table |
| 07/19/2006 | CN1804724A Oil-immersed exposure method for chip photolithography process |
| 07/19/2006 | CN1804723A Making method of through printing forme for screen printing |
| 07/19/2006 | CN1804722A Coloring composite for color filter and color filter |
| 07/19/2006 | CN1804721A Printing plate material and its developing process |
| 07/19/2006 | CN1804670A Optical dry-films and methods of forming optical devices with dry films |
| 07/19/2006 | CN1265443C Method for removing etch residue resulting from a process for forming a via |
| 07/19/2006 | CN1265437C Drawing device with charged particle beam and its detecting method and control method for minification and rack phase position |
| 07/19/2006 | CN1265248C Photoetching with micro trace photoresist detecting pattern and its detecting method |
| 07/19/2006 | CN1265247C Exposure method and exposure device |
| 07/19/2006 | CN1265246C Photoresist coating device |
| 07/19/2006 | CN1265245C Method for uniformly coating substrate |
| 07/19/2006 | CN1265244C Photosensitive element, method for forming resist pattern, and method for mfg. printed wiring board |
| 07/19/2006 | CN1265239C Wide viewing angle planar LCD |
| 07/19/2006 | CN1264887C Method for mfg. water alkaline-soluble resin, photosensitive resin composition, optical mask and electronic device |
| 07/19/2006 | CN1264676C Composition of forme produced with polymer materials having imide group and composition elimination |
| 07/19/2006 | CN1264673C Method for pressing heat lamination of dry photoresist film onto printed circuit board |
| 07/18/2006 | US7079994 Method and system for producing semiconductor devices |
| 07/18/2006 | US7079730 Integrated hybrid optoelectronic devices |
| 07/18/2006 | US7079556 Bandwidth control technique for a laser |
| 07/18/2006 | US7079331 Device for holding a beam splitter element |
| 07/18/2006 | US7079321 Illumination system and method allowing for varying of both field height and pupil |
| 07/18/2006 | US7079314 Catadioptric optical system and exposure apparatus equipped with the same |
| 07/18/2006 | US7079306 Optically addressed extreme ultraviolet modulator and lithography system incorporating modulator |
| 07/18/2006 | US7079235 Reticle design inspection system |
| 07/18/2006 | US7079226 Lithographic actuator mechanism, lithographic apparatus, and device manufacturing method |
| 07/18/2006 | US7079224 Arrangement for debris reduction in a radiation source based on a plasma |
| 07/18/2006 | US7079223 Fast model-based optical proximity correction |
| 07/18/2006 | US7079222 Exposure apparatus |
| 07/18/2006 | US7079221 Exposure apparatus and exposure method |
| 07/18/2006 | US7079220 Illumination optical system and method, and exposure apparatus |
| 07/18/2006 | US7079219 Method for manufacturing semiconductor device and exposure system |
| 07/18/2006 | US7079169 Exposure head, exposure apparatus, and application thereof |
| 07/18/2006 | US7078760 Intermediate semiconductor device structure including multiple photoresist layers |
| 07/18/2006 | US7078717 Light source device and exposure equipment using the same |
| 07/18/2006 | US7078715 Lithographic apparatus and apparatus adjustment method |
| 07/18/2006 | US7078709 Apparatus and method for proof of outgassing products |
| 07/18/2006 | US7078706 Chamber, exposure apparatus, and device manufacturing method |
| 07/18/2006 | US7078700 Optics for extreme ultraviolet lithography |
| 07/18/2006 | US7078687 Thin film analyzing method |
| 07/18/2006 | US7078562 Adamantane derivatives and resin compositions using the same as raw material |
| 07/18/2006 | US7078444 Photoactive cation contains at least one of (i) a transition metal containing organometallic cation, (ii) an organic onium cation, such as an iodonium or sulfonium cation, or (iii) a mixture, and (2) a segmented hydrocarbon-fluorocarbon-sulfonate anion; used in photoinitiated acid-catalyzed processes |
| 07/18/2006 | US7078371 For cleaning a substrate of semiconductor integrated circuits or liquid crystal display devices |
| 07/18/2006 | US7078355 Semiconductor wafer; dispensing using pump; connecting to buffer tank; releasing, detection bubbles; rotating substrate |
| 07/18/2006 | US7078162 Developer regenerators |
| 07/18/2006 | US7078161 Plasma ashing the photoresist and residues at a temperature of about room temperature to about 140 degrees C., wherein the plasma is generated from a gas mixture consisting essentially of hydrogen and an inert gas |
| 07/18/2006 | US7078160 Selective surface exposure, cleans, and conditioning of the germanium film in a Ge photodetector |
| 07/18/2006 | US7078159 Method for the preparation of a printing plate |
| 07/18/2006 | US7078158 Copolymer of unsaturated ether and unsaturated ester crosslinked with phenolic compound |
| 07/18/2006 | US7078157 Photosensitive composition and use thereof |
| 07/18/2006 | US7078156 Negative resist composition comprising base polymer having epoxy ring and Si-containing crosslinker and patterning method for semiconductor device using the same |
| 07/18/2006 | US7078155 Presensitized plate for making lithographic printing plate |
| 07/18/2006 | US7078154 Lithography printing plates comprising aluminum supports having thermosensitive layer containing infrared radiation absorbers, heat generators and water insoluble/alkali soluble novolak resins; antisoilants; wear resistance; durability |
| 07/18/2006 | US7078153 Writable by infrared laser beam exposure; support formed with an anodic oxidation coating having a predetermined density and/or vacancy ratio on a roughened surface of an aluminum substrate. |
| 07/18/2006 | US7078152 Preferential removal of imaging layer; using low power laser; pressing; plasma polymerization |
| 07/18/2006 | US7078151 Multilayer support with photopolymer resin; photoinitiator |
| 07/18/2006 | US7078150 Photosensitive resin print plate material and production method for photosensitive resin print plate |
| 07/18/2006 | US7078148 Photoresist with improved sensitivity and resolution to deep ultraviolet rays/excimer lasers; semiconductors; integrated circuits |
| 07/18/2006 | US7078147 For excellent adherence to substrates while maintaining transparency, for microlithography |
| 07/18/2006 | US7078146 Planographic printing plate material, printing plate and printing method |
| 07/18/2006 | US7078145 Hydrophilic support with image forming hydrophobic polymer |
| 07/18/2006 | US7077974 Fine-dimension masks and related processes |
| 07/18/2006 | US7077972 Exposure head, exposure apparatus, and application thereof |
| 07/18/2006 | US7077585 Developing method and apparatus for performing development processing properly and a solution processing method enabling enhanced uniformity in the processing |
| 07/18/2006 | US7077533 Reflecting device for electromagnetic waves |
| 07/18/2006 | CA2273050C Optical structures for diffusing light |
| 07/13/2006 | WO2006074316A1 Composition useful for removal of post-etch photoresist and bottom anti-reflection coatings |
| 07/13/2006 | WO2006074106A2 A system capable of determining applied and anodized coating thickness of a coated-anodized product |
| 07/13/2006 | WO2006073871A1 Line edge roughness reduction compatible with trimming |
| 07/13/2006 | WO2006073115A1 Silicon-containing photosensitive composition, method for forming thin film pattern using same, protective film for electronic device, gate insulating film and thin film transistor |
| 07/13/2006 | WO2006072824A2 Process for relief printing |
| 07/13/2006 | WO2006026593A3 Monolithic polarization controlled angle diffusers and associated methods |
| 07/13/2006 | WO2005098544A3 Device and method for producing resist profiled elements |
| 07/13/2006 | WO2005067567A3 Photoresist compositions and processess of use |
| 07/13/2006 | US20060155414 Semiconductor manufacturing apparatus |
| 07/13/2006 | US20060155140 Blends of quinone alkide and nitroxyl compounds as polymerization inhibitors |
| 07/13/2006 | US20060154839 Stripping and cleaning compositions for microelectronics |
| 07/13/2006 | US20060154188 Immersion fluid for use in liquid immersion lithography and method of forming resist pattern using the immersion fluid |
| 07/13/2006 | US20060154185 Exposing resist on stubstrate an activating light source; baking resist followed by developing the resist to form a first resist pattern; baking the first resist pattern and developing the first resist pattern; dry trimming the second resist pattern to form a final resist pattern with reduced dimensions |
| 07/13/2006 | US20060154184 Method for reducing feature line edge roughness |