| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 07/26/2006 | CN1266543C Apparatus and system for improving phase-shift mask image performance and its method |
| 07/26/2006 | CN1266542C Corrosion-proof film forming method and photomask making method |
| 07/26/2006 | CN1266527C Reflected light component and its manufacturing method and display device |
| 07/26/2006 | CN1266491C Method for manufacturing microlens array |
| 07/26/2006 | CN1266237C Organic polymer with anti-reflective coating layer and its preparing method |
| 07/26/2006 | CN1266177C Polymer suitable for photoresist compositions |
| 07/25/2006 | US7081992 Condenser optic with sacrificial reflective surface |
| 07/25/2006 | US7081961 Method and apparatus for characterization of optical systems |
| 07/25/2006 | US7081960 Interferometer, exposure apparatus, exposure method and interference length measurement method |
| 07/25/2006 | US7081950 Stage device and control method therefor, exposure apparatus, and device manufacturing method |
| 07/25/2006 | US7081949 Illumination apparatus, projection exposure apparatus, and device fabrication method |
| 07/25/2006 | US7081948 System for automated focus measuring of a lithography tool |
| 07/25/2006 | US7081947 Lithographic apparatus and device manufacturing method |
| 07/25/2006 | US7081946 Holding apparatus, holding method, exposure apparatus and device manufacturing method |
| 07/25/2006 | US7081945 Device manufacturing method, device manufactured thereby and lithographic apparatus therefor |
| 07/25/2006 | US7081944 Lithographic projection apparatus and device manufacturing method utilizing two arrays of focusing elements |
| 07/25/2006 | US7081943 Lithographic apparatus and device manufacturing method |
| 07/25/2006 | US7081941 Liquid-crystal display device and colored resin substrate |
| 07/25/2006 | US7081914 Image recorder |
| 07/25/2006 | US7081634 Variably shaped beam EB writing system |
| 07/25/2006 | US7081624 Scanning probe microscopy probes and methods |
| 07/25/2006 | US7081610 System for compensating for dark current in sensors |
| 07/25/2006 | US7081331 Method for thermally processing photosensitive printing sleeves |
| 07/25/2006 | US7081330 Exposing the heat-sensitive pre-sensitized plate to light, and developing the plate using an alkaline developing solution comprising compound selected from cationic surfactants and compound having ethylene oxide-terminal groups |
| 07/25/2006 | US7081329 Computer data direct recordable by infrared laser; high quality images; press life; support with layer containing carboxlyic acid functionalized acrylate or acrylamide binder, initiator, polyacrylated compound and infrared absorber |
| 07/25/2006 | US7081327 Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal |
| 07/25/2006 | US7081326 For patterning a substrate, fabrication of semiconductor devices |
| 07/25/2006 | US7081325 Photoresist polymer and photoresist composition including the same |
| 07/25/2006 | US7081323 Method of making gratings and phase masks for fiber grating fabrication |
| 07/25/2006 | US7081322 Nanopastes as ink-jet compositions for printing plates |
| 07/25/2006 | US7081269 Filling particles in a pattern provided to a polymer mold, to prepare an embossed stamp; coating a polymer impregnation-prevention layer on the pattern; placing the embossed stamp on a polymer film; allowing to stand at temperatures higher than a glass transfer temperature of the polymer film; removing |
| 07/20/2006 | WO2006076740A2 Synchronous raster scanning lithographic system |
| 07/20/2006 | WO2006075754A1 Compositions curable with actinic energy ray |
| 07/20/2006 | WO2006075720A1 Exposure method and apparatus, and electronic device manufacturing method |
| 07/20/2006 | WO2006075674A1 Image exposing apparatus and microlens array unit |
| 07/20/2006 | WO2006075633A1 Pattern forming material, pattern forming apparatus and permanent pattern forming method |
| 07/20/2006 | WO2006075625A1 Negative resist composition and method of forming resist pattern |
| 07/20/2006 | WO2006075575A1 Stage apparatus and exposure apparatus |
| 07/20/2006 | WO2006075535A1 Laser plasma euv light source, target member, production method for target member, target supplying method, and euv exposure system |
| 07/20/2006 | WO2006075291A2 Displacement device |
| 07/20/2006 | WO2006074812A2 Illumination sytsem for a microlithographic projection exposure apparatus |
| 07/20/2006 | WO2006074642A1 Method for producing a component comprising nanometric multilayers for optical uses and component produced according to said method |
| 07/20/2006 | WO2006074579A1 Oil immersion exposure method in chip photolithographic process |
| 07/20/2006 | WO2006063626A3 Stable high ph developer |
| 07/20/2006 | WO2006058754A3 Beam delivery system and projection exposure system |
| 07/20/2006 | WO2006044093A3 Compressible flexographic printing plate construction |
| 07/20/2006 | WO2006041645A3 Lithography processes using phase change compositions |
| 07/20/2006 | WO2006037494A3 Device for adjusting the temperature of elements |
| 07/20/2006 | WO2005096351A3 Fabrication and use of superlattice |
| 07/20/2006 | WO2004097528A3 System and method for characterizing lithography effects on a wafer |
| 07/20/2006 | US20060161452 Computer-implemented methods, processors, and systems for creating a wafer fabrication process |
| 07/20/2006 | US20060161254 Method and apparatus for personalization of semiconductor |
| 07/20/2006 | US20060160915 Photocurable compositions |
| 07/20/2006 | US20060160270 Method for producing an anisotropic conductive film on a substrate |
| 07/20/2006 | US20060160037 Automated sub-field blading for leveling optimization in lithography exposure tool |
| 07/20/2006 | US20060160036 Near-field exposure method and apparatus, near-field exposure mask, and device manufacturing method |
| 07/20/2006 | US20060160034 Methods of forming capping layers on reflective materials |
| 07/20/2006 | US20060160033 Method for printing by printed pattern and production equipment for printing printed pattern |
| 07/20/2006 | US20060160032 Pattern formation method and exposure system |
| 07/20/2006 | US20060160030 Single polisilicon emitter bipolar junction transistor processing technique using cumulative photo resist application and patterning |
| 07/20/2006 | US20060160029 Lithographic method of manufacturing a device |
| 07/20/2006 | US20060160028 Method of forming fine patterns of a semiconductor device |
| 07/20/2006 | US20060160027 Electroforming mold and method for manufacturing the same, and method for manufacturing electroformed component |
| 07/20/2006 | US20060160026 Device and method of forming film |
| 07/20/2006 | US20060160025 photosensitive element has photopolymerizable elastomeric layer that comprises a binder, a monomer, a photoinitiator, an onium salt, and a leuco dye; on exposure to actinic radiation, onium salt and leuco dye react resulting in change of color in polymerized portions of photopolymerizable layer |
| 07/20/2006 | US20060160023 Photo acid generator, chemical amplification resist material and pattern formation method |
| 07/20/2006 | US20060160018 Electrode-forming composition for field emission type of display device, and method using such a composition |
| 07/20/2006 | US20060160015 Water soluble resin composition, method of pattern formation and method of inspecting resist pattern |
| 07/20/2006 | US20060160014 Photosensitive composition for interlayer dielectric and method of forming patterned interlayer dielectric |
| 07/20/2006 | US20060159931 Mask blank providing system, mask blank providing method, mask blank transparent substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method |
| 07/20/2006 | US20060159849 Material with pattern surface for use as template and process for producing the same |
| 07/20/2006 | US20060159839 Photosensitive resin composition, electronic component using the same, and display using same |
| 07/20/2006 | US20060158749 Device for the low-deformation replaceable mounting of an optical element |
| 07/20/2006 | US20060158720 Small ultra-high NA catadioptric objective |
| 07/20/2006 | US20060158651 Scatterometry alignment for imprint lithography |
| 07/20/2006 | US20060158650 Substrate processing apparatus |
| 07/20/2006 | US20060158638 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 07/20/2006 | US20060158636 Exposure apparatus and optical component for the same |
| 07/20/2006 | US20060158635 Exposure device |
| 07/20/2006 | US20060158631 Method and apparatus for irradiating a microlithographic substrate |
| 07/20/2006 | US20060158630 Exposure apparatus, device manufacturing method, stage apparatus, and alignment method |
| 07/20/2006 | US20060158629 Exposure apparatus and method |
| 07/20/2006 | US20060158624 Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method |
| 07/20/2006 | US20060158126 Plasma radiation source and device for creating a gas curtain for plasma radiation sources |
| 07/20/2006 | US20060156941 Planographic printing method, original printing plate and printing press |
| 07/20/2006 | US20060156927 Filter apparatus, exposure apparatus, and device-producing method |
| 07/20/2006 | DE112004001611T5 Phthalocyanin-Vorläufer bei infrarotempfindlichen Zusammensetzungen Phthalocyanine precursor with infrared-sensitive compositions |
| 07/20/2006 | DE102005048107A1 Verfahren zum Bestimmen einer optimalen Absorber-Schichtenstapelgeometrie für eine lithographische Reflexionsmaske A method for determining an optimum absorber layer stack geometry for a lithographic reflection mask |
| 07/20/2006 | DE102005005591B3 Integrated circuit design pattern`s structural components geometry optimization method for producing photomask, involves optimizing geometries of structural components and inserting optimized base patterns into circuit design |
| 07/20/2006 | DE102005003218B4 Three-dimensional component is formed using a stereolithography unit, which comprises a container for material to be solidified and an irradiation unit |
| 07/20/2006 | DE102004063832A1 Anordnung zur Erzeugung eines gepulsten Laserstrahls hoher Durchschnittsleistung Arrangement for generating a pulsed laser beam of high average power |
| 07/19/2006 | EP1681710A1 Lighting optical device and projection aligner |
| 07/19/2006 | EP1681709A1 Optical characteristics measuring device and optical characteristics measuring method, exposure system and exposure method, and device production method |
| 07/19/2006 | EP1681597A2 Lithographic apparatus and device manufacturing method |
| 07/19/2006 | EP1681596A1 Lithographic apparatus and device manufacturing method |
| 07/19/2006 | EP1681595A2 Exposure apparatus |
| 07/19/2006 | EP1681594A1 Composition for forming underlying film containing dextrin ester compound |
| 07/19/2006 | EP1681307A1 Polymeric compound containing repeating unit having 2-oxatricyclo[4.2.1.04,8]nonan-3-one ring, and photoresist resin composition |
| 07/19/2006 | EP1680714A2 Patterned ceramic films and method for producing the same |
| 07/19/2006 | EP1680713A1 Curable compositions and rapid prototyping process using the same |