| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/27/2006 | US20060167197 Photosensitive compositions based on polycyclic polymers |
| 07/27/2006 | US20060167168 Curable resin composition and flexographic plate material using the same |
| 07/27/2006 | US20060166846 Remover solution |
| 07/27/2006 | US20060166453 Method and apparatus for forming patterned photosensitive material layer |
| 07/27/2006 | US20060166146 Developer regenerators |
| 07/27/2006 | US20060166145 Method providing an improved bi-layer photoresist pattern |
| 07/27/2006 | US20060166143 Resist collapse prevention using immersed hardening |
| 07/27/2006 | US20060166142 Illuminant distribution evaluation method, optical member manufacturing method, illumination optical device, exposure apparatus, and exposure method |
| 07/27/2006 | US20060166141 Inkjet-imageable lithographic printing members and methods of preparing and imaging them |
| 07/27/2006 | US20060166139 applying mixtures of curing agents, light absorbers, acid generators, solvents and polydimethylsiloxane on the surfaces of a layer to be etched, then baking to form films, applying photosensitive materials, exposing to a light source and developing to form patterns |
| 07/27/2006 | US20060166131 sensitizer and an alkali-soluble novolak containing hydroxyalkyl ether structural units that can be substituted with 1,2-naphthoquinonediazidesulfonyl groups; excellent resolution and good suppression of crack generation during plating |
| 07/27/2006 | US20060166130 Photoresist composition and method for forming resist pattern using the same |
| 07/27/2006 | US20060166129 copolymer of ethylenically unsaturated monomer having one or more fluorine group and a polycyclic unsaturated monomer having one or more ester groups; coating, imagewise exposing the photoresist layer, developing |
| 07/27/2006 | US20060166128 Lithographic materials based on polymers containing polyhedral oligomeric silsesquioxanes |
| 07/27/2006 | US20060166112 Photomask for nearfield exposure, method for making pattern using the photomask, and apparatus for making pattern including the photomask |
| 07/27/2006 | US20060166111 Mask, mask forming method, pattern forming method, and wiring pattern forming method |
| 07/27/2006 | US20060165912 Micropatterning of molecular surfaces via selective irradiation |
| 07/27/2006 | US20060165362 Radiation curable composition, optical waveguide and method for formation thereof |
| 07/27/2006 | US20060164655 Method for determining wavefront aberrations |
| 07/27/2006 | US20060164622 Illumination apparatus, projection exposure apparatus, and device fabricating method |
| 07/27/2006 | US20060164620 Exposure apparatus and optical component for the same |
| 07/27/2006 | US20060164619 Imaging device in a projection exposure machine |
| 07/27/2006 | US20060164617 Projection exposure apparatus, projection exposure method, and method for producing device |
| 07/27/2006 | US20060164616 Liquid immersion type lens system, projection exposure apparatus, and device fabricating method |
| 07/27/2006 | US20060164615 Exposure apparatus and device manufacturing method |
| 07/27/2006 | US20060164011 Photosensitive paste composition, PDP electrode manufactured using the composition, and PDP including the PDP electrode |
| 07/27/2006 | US20060163573 Method for preparing ball grid array substrates via use of a laser |
| 07/27/2006 | US20060163205 Substrate processing method and substrate processing apparatus |
| 07/27/2006 | DE60114517T2 Infrarot-empfindliche beschichtungsflüssigkeit The infrared-sensitive coating liquid |
| 07/27/2006 | DE10340436B4 Verfahren zur Kalibrierung von Modellparametern in der Lithographie-Simulation Methods for the calibration of model parameters in lithography simulation |
| 07/27/2006 | DE102005056702A1 TFT-Arraysubstrat und zugehöriges Herstellverfahren TFT array substrate manufacturing process and related |
| 07/27/2006 | DE102005003185A1 Mask transformation system for manufacturing of semiconductor circuit, has connection mask structure transversely aligned in sections to dipole axis and formed on mask, where structure connects main mask structures with each other |
| 07/27/2006 | DE102005003183A1 Semiconductor structures manufacturing method, involves aligning main semiconductor structures perpendicular to dipole axis and manufacturing compound semiconductor structure by interconnecting two of main semiconductor structures |
| 07/27/2006 | DE102005002550A1 Material structure e.g. wafer processing involves applying coating material on surface of wafer and to remaining photoresist, and removing photoresist such that material remains only in one region of surface of photoresist |
| 07/27/2006 | DE102005001671A1 Photolithographic arrangement for use in semiconductor industry, has metal mask with transparent mask carrier and adjusted to transmit modulated radiation by surface plasmon through metal mask |
| 07/26/2006 | EP1684337A1 Cleaning composition for semiconductor containing unsaturated dicarboxylic acid and ethylene urea and cleaning method |
| 07/26/2006 | EP1684312A2 Apparatus and method for fabricating, sorting, and integrating materials with holographic optical traps |
| 07/26/2006 | EP1684120A1 Photresist compositions comprising resin blends |
| 07/26/2006 | EP1684119A2 Positive resist composition for immersion exposure and pattern-forming method using the same |
| 07/26/2006 | EP1684118A1 Negative resist composition and patterning process |
| 07/26/2006 | EP1684117A2 Photosensitive lithographic printing plate |
| 07/26/2006 | EP1684116A2 Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition |
| 07/26/2006 | EP1684099A2 Wire grid polarization film, method for manufacturing wire grid polarization film, liquid crystal display using wire grid polarization film, and method for manufacturing mold for forming wire grids thereof |
| 07/26/2006 | EP1683192A1 Minimizing the loss of barrier materials during photoresist stripping |
| 07/26/2006 | EP1682944A2 Process for the use of bis-choline and tris-choline in the cleaning of quartz-coated polysilicon and other materials |
| 07/26/2006 | EP1682943A2 Improvements in and relating to printing plate ovens |
| 07/26/2006 | EP1682942A2 Apparatus for and method of forming optical images |
| 07/26/2006 | EP1682941A2 Varying feature size in resist |
| 07/26/2006 | EP1682934A1 Method and device for correcting slm stamp image imperfections |
| 07/26/2006 | EP1682599A1 Tougher cycloaliphatic epoxide resins |
| 07/26/2006 | EP1682589A1 Curable polymer compound |
| 07/26/2006 | EP1570316B1 Device and method for producing flexographic plates using digital imaging, for newspaper printing |
| 07/26/2006 | EP1466216B1 Process for producing an image using a first minimum bottom antireflective coating composition |
| 07/26/2006 | EP1153127B1 Method for producing polymers |
| 07/26/2006 | CN1809791A Developer composition for resists and method for formation of resist pattern |
| 07/26/2006 | CN1809790A Adhesion method using gray-scale photolithography |
| 07/26/2006 | CN1809789A Photoresist composition for deep ultraviolet lithography |
| 07/26/2006 | CN1809788A Use of spin-on, photopatternable, interplayer dielectric materials and intermediate semiconductor device structure utilizing the same |
| 07/26/2006 | CN1809787A Aqueous developable photoimageable thick film compositions |
| 07/26/2006 | CN1809580A Compound used to form a self-assembled monolayer, layer structure, semiconductor component having a layer structure, and method for producing a layer structure |
| 07/26/2006 | CN1809468A Method, system and holder for transferring templates during imprint lithography processes |
| 07/26/2006 | CN1808287A Position aligning system for projection exposure apparatus and position aligning method thereof |
| 07/26/2006 | CN1808286A Process, treatment fluid and apparatus for removing sticky material from basal body surface |
| 07/26/2006 | CN1808285A High-precision analog-to-digital converter based on PGA and control method thereof |
| 07/26/2006 | CN1808284A Serial data transmission system with multiple acquisition channels and control method thereof |
| 07/26/2006 | CN1808283A Maintenance method for low pressure processing machine and conveying device thereof |
| 07/26/2006 | CN1808282A Exposure apparatus and device manufacturing method |
| 07/26/2006 | CN1808281A Projection exposure apparatus and method |
| 07/26/2006 | CN1808280A Method for removing static on substrate, apparatus and base thereof |
| 07/26/2006 | CN1808279A Lithographic apparatus and device manufacturing method |
| 07/26/2006 | CN1808278A Lithographic apparatus, radiation system and filter system |
| 07/26/2006 | CN1808277A Control method for coaxial alignment signal acquisition and processing, and key subsystem thereof |
| 07/26/2006 | CN1808276A Coating and developing system and coating and developing method |
| 07/26/2006 | CN1808275A Coating and developing apparatus and coating and developing method |
| 07/26/2006 | CN1808274A Coating and developing system and coating and developing method |
| 07/26/2006 | CN1808273A Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel |
| 07/26/2006 | CN1808272A Photosensitive polymers containing adamantylalkyl vinyl ether, and resist compositions including the same |
| 07/26/2006 | CN1808271A Pattern-forming method, color filter manufacturing method, color filter, and electro-optical apparatus |
| 07/26/2006 | CN1808270A Exposure method and exposure processing unit |
| 07/26/2006 | CN1808269A Process control method and semiconductor manufacture method |
| 07/26/2006 | CN1808268A Metal hard mask method and structure for strained silicon MOS transistor |
| 07/26/2006 | CN1808267A Mask, manufacturing method and application thereof |
| 07/26/2006 | CN1808266A Optical mask and manufacturing method of thin film transistor array panel using the optical mask |
| 07/26/2006 | CN1808198A Optical filter element and wavelength division multiplexing optical coupler |
| 07/26/2006 | CN1808194A Method of forming optical devices |
| 07/26/2006 | CN1808191A Color filter substrate and making method of substrate for liquid crystal display |
| 07/26/2006 | CN1807115A A printing plate |
| 07/26/2006 | CN1807112A Laser labeling method on valuable billing |
| 07/26/2006 | CN1806883A Preparation of dedicated defoamer for printed circuit board |
| 07/26/2006 | CN1266775C Solar battery, and its manufacturing method and apparatus |
| 07/26/2006 | CN1266741C Coating device and coating method |
| 07/26/2006 | CN1266738C Substrate board processing apparatus |
| 07/26/2006 | CN1266551C Method for removing colour light resistance in exposure positioning producing technology |
| 07/26/2006 | CN1266550C Plasma reaction chamber |
| 07/26/2006 | CN1266549C Substrate processing method and device, developing method and method for mfg. semiconductor device |
| 07/26/2006 | CN1266548C Method of determining range of exposure dose in mask aligner image quality detection technology |
| 07/26/2006 | CN1266547C Baking system |
| 07/26/2006 | CN1266546C Device for exposing printed circuit board |
| 07/26/2006 | CN1266545C Negative image recording material and image forming method |
| 07/26/2006 | CN1266544C Photosnesitive resin composition comprising quinonediazide sulfate ester compound |