| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/02/2006 | CN2802550Y Plate punching machine structure |
| 08/02/2006 | CN1813341A Method and apparatus for removing a target layer from a substrate using reactive gases |
| 08/02/2006 | CN1813338A Focus test mask, focus measureing method, and exposure device |
| 08/02/2006 | CN1813223A Compositions suitable for removing photoresist, photoresist byproducts and etching residue, and use thereof |
| 08/02/2006 | CN1813222A Positive type resist composition and method of forming resist pattern from the same |
| 08/02/2006 | CN1813221A Resist composition |
| 08/02/2006 | CN1813220A Low-viscous,radiation curable formulation,particularly for the stereolithographical production of earpieces |
| 08/02/2006 | CN1813003A Photocurable resin composition |
| 08/02/2006 | CN1812302A Efficient thermal tuning resonant cavity enhanced detector and producing method thereof |
| 08/02/2006 | CN1812050A Substrate processing apparatus |
| 08/02/2006 | CN1812049A Substrate processing apparatus and substrate processing method |
| 08/02/2006 | CN1812039A Green sheet and method of manufacturing the same, and a method of manufacturing a plasma display panel |
| 08/02/2006 | CN1811861A Tin printing hidden antifake mark and producing method |
| 08/02/2006 | CN1811604A Method for removing composing layer from lower layer via recirculation |
| 08/02/2006 | CN1811603A Alkaline solution and manufacturing method, and alkaline solution application, solution applying device and application thereof |
| 08/02/2006 | CN1811602A Developer solution composition |
| 08/02/2006 | CN1811601A Lithographic apparatus and device manufacturing method |
| 08/02/2006 | CN1811600A Pattern forming method |
| 08/02/2006 | CN1811599A High resolution lithography system and method |
| 08/02/2006 | CN1811598A Method for controlling flexibly electron beam photoetching developing time through layout |
| 08/02/2006 | CN1811597A Light-sensitive resin composite |
| 08/02/2006 | CN1811596A Light-sensitive resin composite |
| 08/02/2006 | CN1811595A Photoresist compositions |
| 08/02/2006 | CN1811594A Mask, mask forming method, pattern forming method, and wiring pattern forming method |
| 08/02/2006 | CN1811593A Mask for electromagnetic radiation and method of fabricating the same |
| 08/02/2006 | CN1811589A Holographic projecting screen, producing method, system and application thereof |
| 08/02/2006 | CN1811547A Colour light filter base plate and producing method thereof |
| 08/02/2006 | CN1811499A Thermo-optic waveguide device and manufacturing method thereof |
| 08/02/2006 | CN1811495A Colour optical filtering substrate and producing method thereof |
| 08/02/2006 | CN1811378A Method of determining physical properties of an optical layer or layer system |
| 08/02/2006 | CN1268177C Method of making electronic materials |
| 08/02/2006 | CN1268145C Mobile terminal for managing time table and mobile communication system using the mobile terminal |
| 08/02/2006 | CN1267974C Organic film forming method |
| 08/02/2006 | CN1267968C Method for forming semiconductor element fine figure |
| 08/02/2006 | CN1267790C Automatic developing device and method for supplementing developing liquid |
| 08/02/2006 | CN1267789C Light shield for defining protection ring and method thereof |
| 08/02/2006 | CN1267788C Exposure device detecting mask, exposure device detecting method and exposure device |
| 08/02/2006 | CN1267787C Binary optica device grey scale changing mask method and device for making |
| 08/02/2006 | CN1267501C Light sensitivity resin precursor compsn. |
| 08/02/2006 | CN1267478C Heat-curable resin composition |
| 08/02/2006 | CN1267290C Equipment and method for manufacturing lithographic printing plate |
| 08/02/2006 | CN1267289C Front body of flat printing plate |
| 08/01/2006 | US7085793 Method and system for efficient and accurate processing of a discrete time input signal |
| 08/01/2006 | US7085676 Feed forward critical dimension control |
| 08/01/2006 | US7085080 Low-deformation support device of an optical element |
| 08/01/2006 | US7085076 Aperture stop assembly for high power laser beams |
| 08/01/2006 | US7085075 Projection objectives including a plurality of mirrors with lenses ahead of mirror M3 |
| 08/01/2006 | US7084987 Method and system to interferometrically detect an alignment mark |
| 08/01/2006 | US7084977 Exposure apparatus and method of measuring Mueller Matrix of optical system of exposure apparatus |
| 08/01/2006 | US7084961 Safety mechanism for a lithographic patterning device |
| 08/01/2006 | US7084960 Lithography using controlled polarization |
| 08/01/2006 | US7084959 Compact pulse stretcher |
| 08/01/2006 | US7084958 Lithographic apparatus, control system and device manufacturing method |
| 08/01/2006 | US7084957 Scanning exposure technique |
| 08/01/2006 | US7084956 Supporting device, lithographic apparatus, and device manufacturing method employing a supporting device, and a position control system arranged for use in a supporting device |
| 08/01/2006 | US7084955 Lithographic apparatus |
| 08/01/2006 | US7084953 Lithographic apparatus, device manufacturing method and device manufactured thereby |
| 08/01/2006 | US7084952 Lithographic apparatus, device manufacturing method, and computer-readable storage medium |
| 08/01/2006 | US7084731 Iron core, iron core manufacturing method, alignment apparatus, and exposure apparatus |
| 08/01/2006 | US7084534 Alignment stage apparatus |
| 08/01/2006 | US7084413 Compact design; rotating adjustment of optics; forming image; calibration |
| 08/01/2006 | US7084412 Collector unit with a reflective element for illumination systems with a wavelength of smaller than 193 nm |
| 08/01/2006 | US7084303 For use as additives in chemical amplification photolithography, photoresists |
| 08/01/2006 | US7084227 with units from norbornenes substituted with hydroxy, carboxy or anhydride groups; maleic anhydride; and norbornene esters; improved etching resistance and adhesion; storage stability |
| 08/01/2006 | US7084184 Comprises polyoxetanes; for high resolution and quality imaging with no color contamination |
| 08/01/2006 | US7084183 A crystalline isomeric mixture of bis[4-(2-methyl-3-hydroxy-propionyl)-phenyl]-methane and [3-(2-methyl-3-hydroxy-propionyl)-phenyl]-[4-(2-methyl-3-hydroxy-propionyl)-phenyl]methane; chemical synthesis; electromagnetic radiation curable coatings containing unsaturated aminoacrylate monomer; odorless |
| 08/01/2006 | US7083903 Methods of etching photoresist on substrates |
| 08/01/2006 | US7083899 Method for manufacturing a semiconductor device |
| 08/01/2006 | US7083898 Method for performing chemical shrink process over BARC (bottom anti-reflective coating) |
| 08/01/2006 | US7083897 Method of fabricating a poly fuse |
| 08/01/2006 | US7083896 Highly reflective substrates for the digital processing of photopolymer printing plates |
| 08/01/2006 | US7083895 Adhesion promoting ingredients for on-press developable lithographic printing plate precursors |
| 08/01/2006 | US7083893 Photoresist polymer and photoresist composition containing the same |
| 08/01/2006 | US7083892 The resist composition of the present invention, ensuring excellent pattern profile and excellent isolation performance for use in the pattern formation by the irradiation of actinic rays or radiation, particularly, electron beam, X ray or EUV |
| 08/01/2006 | US7083891 Irradiation with laser radiation ; controlling shrinkage |
| 08/01/2006 | US7083885 Antistatic layer on support; coverage pattern |
| 08/01/2006 | US7083882 Coating method for a color filter and aligning-assembling method by using the same |
| 08/01/2006 | US7083880 Forming semiconductor devices, microelectronic devices, microelectromechanical devices, microfluidic devices, and photonic devices |
| 08/01/2006 | US7083879 Phase conflict resolution for photolithographic masks |
| 08/01/2006 | US7083338 Lithography equipment |
| 08/01/2006 | US7083290 Adjustment method and apparatus of optical system, and exposure apparatus |
| 08/01/2006 | US7082876 Method for transferring a pattern |
| 07/27/2006 | WO2006079093A2 A system and a method for synthesizing nanoparticle arrays in-situ |
| 07/27/2006 | WO2006078843A1 Method and apparatus for determination of source polarization matrix |
| 07/27/2006 | WO2006078333A1 Imprint reference template for multilayer or multipattern registration and method therefor |
| 07/27/2006 | WO2006078073A1 Exposure method, method for forming projecting and recessed pattern, and method for manufacturing optical element |
| 07/27/2006 | WO2006078025A1 Measurement method, measurement system, inspection method, inspection system, exposure method, and exposure system |
| 07/27/2006 | WO2006077958A1 Linear motor, stage apparatus, and exposure apparatus |
| 07/27/2006 | WO2006077859A1 Liquid removing apparatus, exposure apparatus and device manufacturing method |
| 07/27/2006 | WO2006077849A1 Method of adjusting lighting optical device, lighting optical device, exposure system, and exposure method |
| 07/27/2006 | WO2006077804A1 Clamping apparatus and image forming apparatus |
| 07/27/2006 | WO2006077748A1 Composition for forming of underlayer film for lithography that contains compound having protected carboxyl |
| 07/27/2006 | WO2006077732A1 Printing plate material, plate making method, printing method, planographic printing plate material assembly-use package, planographic printing plate material assembly and plate printing method |
| 07/27/2006 | WO2006077705A1 Positive resist composition and method for forming resist pattern |
| 07/27/2006 | WO2006077684A1 Silylphenylene polymer composition for the formation of interlayers and process for the formation of patterns by using the same |
| 07/27/2006 | WO2006077140A1 Composite composition for micropatterned layers having high relaxation ability, high chemical resistance and mechanical stability |
| 07/27/2006 | WO2006025969A3 Organic solvents having ozone dissolved therein for semiconductor processing utilizing sacrificial materials |
| 07/27/2006 | WO2005059598A3 Spatial light modulator and method for performing dynamic photolithography |
| 07/27/2006 | US20060167302 Adamantane derivative and production process for the same |
| 07/27/2006 | US20060167284 Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography |