| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/08/2006 | US7088426 Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method and exposure apparatus, program, and device manufacturing method |
| 08/08/2006 | US7088425 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus |
| 08/08/2006 | US7088424 Lithographic projection apparatus, reflector assembly for use therein, and device manufacturing method |
| 08/08/2006 | US7088423 Edge exposing apparatus |
| 08/08/2006 | US7088422 Moving lens for immersion optical lithography |
| 08/08/2006 | US7088421 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 08/08/2006 | US7088419 Lithographic systems and methods with extended depth of focus |
| 08/08/2006 | US7088384 Image recorder for punching hole by movable punching element |
| 08/08/2006 | US7087983 Manufacturing methods of semiconductor devices and a solid state image pickup device |
| 08/08/2006 | US7087943 Direct alignment scheme between multiple lithography layers |
| 08/08/2006 | US7087914 High repetition rate laser produced plasma EUV light source |
| 08/08/2006 | US7087911 Method for recycling gases used in a lithography tool |
| 08/08/2006 | US7087799 Such as 2,2'-methylenebis(4-methyl-6-hydroxymethylphenol) for production of photosensitive polyimides |
| 08/08/2006 | US7087732 Nucleotides and analogs having photoremovable protecting groups |
| 08/08/2006 | US7087701 Using diphenol compound containing reactive groups |
| 08/08/2006 | US7087563 Nonmetallic salt of hydrofluoric acid (especially NH4OH), an organic solvent, a sugar alcohol, and water and having a hydrogen ion concentration of not less than 8. |
| 08/08/2006 | US7087562 Post-CMP washing liquid composition |
| 08/08/2006 | US7087363 Method of forming a top gate thin film transistor |
| 08/08/2006 | US7087362 photosensitive layer whose solubility in an aqueous alkali solution increases upon heat-mode exposure; especially an addition polymer having optionally carbonylated sulfonamide groups, e.g., from N-(p-aminosulfonyl phenyl)methacrylamide |
| 08/08/2006 | US7087361 Support for lithographic printing plate, method of preparing the support and presensitized plate |
| 08/08/2006 | US7087360 Package structure of planographic printing plates and interleaf paper for packaging the same |
| 08/08/2006 | US7087359 Heat-sensitive lithographic printing plate precursor |
| 08/08/2006 | US7087358 Image-formation material and infrared absorber |
| 08/08/2006 | US7087357 Photoreactive resin composition, method for making circuit substrate using same, and method for making ceramic multilayer substrate using same |
| 08/08/2006 | US7087356 193nm resist with improved post-exposure properties |
| 08/08/2006 | US7087352 Measurement by adjustment lithography exposure of light; detection of interference pattern; spectral curves stored in library |
| 08/08/2006 | US7087118 Coating film forming apparatus and coating unit |
| 08/08/2006 | US7086333 Printing plate material, process of folding the same, and printing process |
| 08/03/2006 | WO2006080786A1 Thermally curable resin composition with extended storage stability and good adhesive property |
| 08/03/2006 | WO2006080534A2 Illumination optical apparatus and optical apparatus |
| 08/03/2006 | WO2006080516A1 Exposure apparatus and method for manufacturing device |
| 08/03/2006 | WO2006080513A1 Laser light source control method, laser light source device, and exposure apparatus |
| 08/03/2006 | WO2006080474A1 Exposure system and device |
| 08/03/2006 | WO2006080429A1 Method for forming resist pattern, supercritical processing liquid for lithography process and method for forming antireflection film |
| 08/03/2006 | WO2006080428A1 Method of forming resist pattern |
| 08/03/2006 | WO2006080427A1 Exposure method, exposure apparatus and method for manufacturing device |
| 08/03/2006 | WO2006080285A1 Exposure device, exposure method, and micro device manufacturing method |
| 08/03/2006 | WO2006080250A1 Immersion exposure system, and recycle method and supply method of liquid for immersion exposure |
| 08/03/2006 | WO2006080244A1 Lithographic printing plate material, method of printing therewith and method of recovering plastic support |
| 08/03/2006 | WO2006080212A1 Projection optical system, exposure system, and exposure method |
| 08/03/2006 | WO2006080196A1 Exposure visible image forming method of lithographic printing plate material, aluminum support and lithographic printing plate material |
| 08/03/2006 | WO2006080178A1 Material for metallic-pattern formation, crosslinking monomer, and method of forming metallic pattern |
| 08/03/2006 | WO2006080151A1 Method for forming resist pattern |
| 08/03/2006 | WO2006080107A1 Lithographic printing plate original plate and lithographic printing method |
| 08/03/2006 | WO2006079838A1 Exposure method and tool |
| 08/03/2006 | WO2006079788A2 Method of making a photopolymer plate |
| 08/03/2006 | WO2006079486A2 Illumination system, in particular for a projection exposure machine in semiconductor lithography |
| 08/03/2006 | WO2006070037A3 Aperture diffraction interferometer (adi) for the inspection and measurement of ophthalmic optical components |
| 08/03/2006 | WO2006063268A3 Computer-implemented methods for detecting and/or sorting defects in a design pattern of a reticle |
| 08/03/2006 | WO2006029796A3 Microlithographic projection exposure apparatus |
| 08/03/2006 | WO2005111726A3 A vibration damper or isolator |
| 08/03/2006 | WO2005109971A3 Atomic beam to protect a reticle |
| 08/03/2006 | WO2005106594A3 Device and method for determining an illumination intensity profile of an illuminator for a lithography system |
| 08/03/2006 | WO2005079498A3 Continuously varying offset mark and methods of determining overlay |
| 08/03/2006 | US20060172441 Resist application method and device |
| 08/03/2006 | US20060172327 Sequencing of surface immobilized polymers utilizing microflourescence detection |
| 08/03/2006 | US20060172231 Use of an oxidizer to improve trace metals removal from photoresist and photoresist components |
| 08/03/2006 | US20060172222 Polyol-initiated resin containing ethylene oxide-substituted 1,2-cyclohexanedioxy units; radiation-sensitive cationic polymerization initiator; high pattern precision, a great thickness, and a high aspect ratio |
| 08/03/2006 | US20060172206 Mixture containing acid generator, crosslinking agent and dye; reproduction, photostability, heat resistance |
| 08/03/2006 | US20060172205 Etching, photoresists; latent imaging |
| 08/03/2006 | US20060172203 silicon oxide matrix and photopolymerizable compound; high refractive index change, high sensitivity, low scattering, environment resistance, durability, low dimensional change and high multiplicity |
| 08/03/2006 | US20060172079 Methods of forming intermediate semiconductor device structures using spin-on, photopatternable, interlayer dielectric materials |
| 08/03/2006 | US20060171138 Illuminating optical system, exposure system and exposure method |
| 08/03/2006 | US20060171101 Electric double layer capacitor |
| 08/03/2006 | US20060171040 Projection objectives including a plurality of mirrors with lenses ahead of mirror M3 |
| 08/03/2006 | US20060171020 Objective with fluoride crystal lenses |
| 08/03/2006 | US20060170901 Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
| 08/03/2006 | US20060170897 Projection exposure system |
| 08/03/2006 | US20060170893 Lithography exposure device |
| 08/03/2006 | US20060170891 Exposure apparatus, exposure method, and method for producing device |
| 08/03/2006 | DE112004001868T5 Verfahren zur Herstellung einer lichtempfindlichen, wässrigen, entwickelbaren Beschichtungszusammensetzung A process for preparing a photosensitive aqueous developable coating composition |
| 08/03/2006 | DE102005004216A1 Illumination system for projection exposure machine, supports homogenizing elements rotatably about optical axis, to set one rotational angle symmetrically in relation to axis of newly formed co-ordinate system |
| 08/03/2006 | DE102005003001A1 Optical proximity effect correcting method, involves applying simulation models for correction of optical proximity effect on structural units and storing sample with structural units for transmission of sample on substrate |
| 08/03/2006 | DE102005002754A1 Material für die Behandlung von lithographischen Trägern und Lithographie-Druckplatten Material for the treatment of lithographic supports and lithographic printing plates |
| 08/03/2006 | DE102004052626B3 Verfahren zum Bestimmen einer Kantenabdeckung bei Beschichtungsprozessen und Vorrichtung zur Durchführung des Verfahrens A method for determining an edge cover in coating processes and apparatus for carrying out the method |
| 08/03/2006 | DE10048646B4 Element zur Bestrahlung in einer Bearbeitungsvorrichtung mit geladenem Strahl und Elektronenstrahl-Belichtungsvorrichtung Element in a processing apparatus for irradiating with a charged beam, and electron beam exposure apparatus |
| 08/02/2006 | EP1686425A1 Method for forming multilayer resist |
| 08/02/2006 | EP1686424A2 Radiation-sensitive resin composition |
| 08/02/2006 | EP1686423A2 Alignment system used in nano-imprint lithography and nano imprint lithography method using the alignment system |
| 08/02/2006 | EP1686405A1 Microlithographic reduction lens with five lens groups |
| 08/02/2006 | EP1686171A1 Method of constructing artificial cell tissue and base material therefor |
| 08/02/2006 | EP1685958A1 Lithographic printing plate precursor and polymerizable composition |
| 08/02/2006 | EP1685957A2 Lithographic printing plate precursor, lithographic printing method and packaged body of lithographic printing plate precursors |
| 08/02/2006 | EP1685587A1 Method and apparatus for printing patterns with improved cd uniformity |
| 08/02/2006 | EP1685447A1 Method for producing flexographic printing forms by thermal development |
| 08/02/2006 | EP1685446A2 A method and apparatus for producing microchips |
| 08/02/2006 | EP1685445A2 Methods and systems for controlling radiation beam characteristics for microlithographic processing |
| 08/02/2006 | EP1685444A2 Polarized reticle, photolithography system, and method of forming a pattern using a polarized reticle in conjunction with polarized light |
| 08/02/2006 | EP1685178A1 Curable polyester having an oxetanyl group at end and process for preparing the same, resist composition, jet printing ink composition, curing methods and uses thereof |
| 08/02/2006 | EP1684698A1 Photoinitiators having triarylsulfonium and arylsulfinate ions |
| 08/02/2006 | EP1614009B1 Masking arrangement and method for producing integrated circuit arrangements |
| 08/02/2006 | EP1584089B1 Method and device for irradiating spots on a layer |
| 08/02/2006 | EP1558977B1 Probability constrained optimization for electrical fabrication control |
| 08/02/2006 | EP1368413A4 Two-layer imageable element comprising thermally reversible polymers |
| 08/02/2006 | EP1368140B1 Method and apparatus for texturing a metal sheet or strip |
| 08/02/2006 | EP1279071A4 Multi depth substrate fabrication processes |
| 08/02/2006 | EP1244939B1 Device and method in connection with the production of structures |
| 08/02/2006 | EP1238312B1 Use of polyimide for adhesive layers, lithographic method for producing microcomponents and method for producing composite material |
| 08/02/2006 | EP1238311B1 Flat coil and lithographic method for producing microcomponents |
| 08/02/2006 | EP1203265A4 Lithography using quantum entangled particles |