| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/10/2006 | WO2005004199A3 Compositions and methods for high-efficiency cleaning/polishing of semiconductor wafers |
| 08/10/2006 | US20060177777 Pattern forming method and method of manufacturing semiconductor device |
| 08/10/2006 | US20060177776 Immersion exposure method and apparatus, and manufacturing method of a semiconductor device |
| 08/10/2006 | US20060177775 Method for manufacturing plate having electrode with gaps |
| 08/10/2006 | US20060177773 Method for producing semiconductor patterns on a wafer |
| 08/10/2006 | US20060177771 Laminated photosensitive relief printing original plate and method for producing the relief printing plate |
| 08/10/2006 | US20060177763 Method for producing compound having acid-labile group |
| 08/10/2006 | US20060177762 Negative photosensitive resin composition and negative photosensitive element |
| 08/10/2006 | US20060177747 Semiconductors, liquid crystal displays; patterning any size or shape by exposure using only one photomask; the mask pattern has a light-shielding film and a phase shifter |
| 08/10/2006 | US20060177746 Half-tone stacked film, photomask-blank, photomask and fabrication method thereof |
| 08/10/2006 | US20060177120 Overlay marks, methods of overlay mark design and methods of overlay measurements |
| 08/10/2006 | US20060176588 Optical element holder, exposure apparatus, and device fabricating method |
| 08/10/2006 | US20060176585 Optical unit, exposure unit and optical devices |
| 08/10/2006 | US20060176573 Lithographic objective having a first lens group including only lenses having a positive refractive power |
| 08/10/2006 | US20060176466 Chucking system for modulating shapes of substrates |
| 08/10/2006 | US20060176463 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 08/10/2006 | US20060176462 Methods and systems for controlling radiation beam characteristics for microlithographic processing |
| 08/10/2006 | US20060176459 Off-axis levelling in lithographic projection apparatus |
| 08/10/2006 | US20060176458 Lithographic apparatus and device manufacturing method |
| 08/10/2006 | US20060176457 Projection optical system inspecting method and inspection apparatus, and a projection optical system manufacturing method |
| 08/10/2006 | US20060176456 Exposure apparatus and device manufacturing method |
| 08/10/2006 | US20060176454 Exposure apparatus for liquid crystal panel and exposure apparatus |
| 08/10/2006 | US20060175736 coating a surface of the mold with a volume of surfactant containing solution which includes a fluorinated hydrophobic component providing a contact angle with a magnitude that is less than about 20 degrees with respect to the polymerizable monomers ( vinyl ethers); imprint lithography |
| 08/10/2006 | US20060175603 Compound used to form a self-assembled monolayer, layer structure, semiconductor component having a layer structure, and method for producing a layer structure |
| 08/10/2006 | US20060174789 Stamp device for use in soft lithography and method for producing the same |
| 08/10/2006 | DE112004001942T5 Kombinierte Musterung mit Gräben Combined screening with trenches |
| 08/10/2006 | DE10344178B4 Halte- und Positioniervorrichtung für ein optisches Element Holding and positioning device for an optical element |
| 08/10/2006 | DE10329865B4 Verfahren zur Steuerung einer Abfolge von Meßschritten für die Justage eines Halbleiterwafers in einem Belichtungsapparat A method of controlling a sequence of measurement steps for the adjustment of a semiconductor wafer in an exposure apparatus |
| 08/10/2006 | DE10228546B4 Verfahren zur Strukturierung einer Lithographiemaske Method for structuring a lithography mask |
| 08/10/2006 | DE102006004835A1 Elemente für Excimerlaser mit höherer Lebensdauer Elements for excimer lasers with higher lifetime |
| 08/10/2006 | DE102006003422A1 Muster-Festlegungsverfahren und Muster-Festlegungsvorrichtung Pattern determination method and pattern-setting device |
| 08/10/2006 | DE102005005124A1 Light exposure mask device, has adjustment frame with vacuum channel for aligning and fixing work piece carrier and frame together, and another vacuum channel for aligning and fixing mask and frame together |
| 08/10/2006 | DE102005004460A1 Local irradiance regulation method for optical system in projection exposure arrangement, involves forming optical path between optical units and determining temperature distribution of irradiated upper surface of object |
| 08/10/2006 | DE102005004410A1 Verfahren zum Bemustern einer Schicht aus einem Material A method for patterning a layer of a material |
| 08/09/2006 | EP1688988A1 Stage drive method, stage apparatus, and exposure apparatus |
| 08/09/2006 | EP1688798A2 Aqueous based residue removers comprising fluoride |
| 08/09/2006 | EP1688797A2 Pattern formation method |
| 08/09/2006 | EP1688796A2 Method and apparatus to clamp and release flexible plates onto an imaging cylinder |
| 08/09/2006 | EP1688795A2 Method, computer program and apparatus for improving calibration of resist models used in critical dimension calculation |
| 08/09/2006 | EP1688794A2 Method of manufacturing a photolithography pattern and method of determining the position of an image of an alignment mark |
| 08/09/2006 | EP1688793A1 Thick film or ultrathick film responsive chemical amplification type photosensitive resin composition |
| 08/09/2006 | EP1688792A1 Light sensitive planographic printing plate material and planographic printing plate manufacturing method therefrom |
| 08/09/2006 | EP1688791A2 Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition |
| 08/09/2006 | EP1688790A2 Imprint lithography |
| 08/09/2006 | EP1688789A2 Half-tone stacked film, photomask-blank, photomask and fabrication method thereof |
| 08/09/2006 | EP1687829A1 Lithographic systems and methods with extended depth of focus |
| 08/09/2006 | EP1687678A2 Chemically amplified positive photosensitive thermosetting resin composition method of forming cured article and method of producing functional device |
| 08/09/2006 | EP1687677A1 Image forming device with brush type processing member |
| 08/09/2006 | EP1687406A2 Nucleic acid detection method having increased sensitivity |
| 08/09/2006 | EP1687381A1 Formation of self-assembled monolayers |
| 08/09/2006 | EP1599762A4 Optical lithography using both photomask surfaces |
| 08/09/2006 | EP1576420B1 Nano-imprint lithography method involving substrate pressing |
| 08/09/2006 | EP1393131A4 Thick film photoresists and methods for use thereof |
| 08/09/2006 | EP1295177B1 Strongly water-soluble photoacid generator resist compositions |
| 08/09/2006 | EP0982320B1 Light-absorbing polymers and application thereof to antireflection film |
| 08/09/2006 | CN1816895A Wafer inspection device |
| 08/09/2006 | CN1816777A Method providing an improved bi-layer photoresist pattern |
| 08/09/2006 | CN1816776A Resist composition, multilayer body, and method for forming resist pattern |
| 08/09/2006 | CN1816775A Photosensitive resin composition |
| 08/09/2006 | CN1816774A Positive type photosensitive resin composition |
| 08/09/2006 | CN1816773A Methods of etching photoresist on substrates |
| 08/09/2006 | CN1816771A Exposure station for film webs |
| 08/09/2006 | CN1815749A Substrate for organic el and method for manufacturing the same |
| 08/09/2006 | CN1815691A Pattern formation method |
| 08/09/2006 | CN1815372A Pattern formation method |
| 08/09/2006 | CN1815371A Semiconductor element and method of manufacture the same |
| 08/09/2006 | CN1815370A Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 08/09/2006 | CN1815369A Method for avoiding ZEP520 electronic resist to generate cracks |
| 08/09/2006 | CN1815368A Coating and developing apparatus |
| 08/09/2006 | CN1815367A Positive photoresistive agent composition and its use |
| 08/09/2006 | CN1815366A Photoresist composition, method for forming film pattern using the same, and method for manufacturing thin film transistor array panel using the same |
| 08/09/2006 | CN1815365A Photocurable resin composition, and its preparing method and use |
| 08/09/2006 | CN1815364A Light-sensitive composition for chemical amplitude type negative PS plate and chemical amplitude type negative PS plate thereof |
| 08/09/2006 | CN1815363A Wet-method etching liquid for making phase change storage and its wet-method etching process |
| 08/09/2006 | CN1815362A Method and apparatus for patterning, method for manufacturing electroluminescent element, and method for manufacturing color filter |
| 08/09/2006 | CN1815361A Half-tone stacked film, photomask-blank, photomask and fabrication method thereof |
| 08/09/2006 | CN1815337A Factory production working system and its operating method |
| 08/09/2006 | CN1815321A Method for manufacturing down base plate for liquid crystal display device |
| 08/09/2006 | CN1815276A 800 nano waveband quartz transmission-polarizing beam-splitting grating |
| 08/09/2006 | CN1815275A Back-incidence quartz reflective polarizing beam-splitting grating and its preparing method |
| 08/09/2006 | CN1815274A Method for making high dencity grating utilizing laser scanning cofocal microscope |
| 08/09/2006 | CN1814360A Process equipment and method for optical manufacture with substrate cleaning device |
| 08/09/2006 | CN1269187C Electronic projection photoetching device using secondary electronic |
| 08/09/2006 | CN1268984C Solid state image pickup element manufacturing method |
| 08/09/2006 | CN1268983C Imaging device, method for generating multiple image, printing plate exposure equipment, printing device and printing machine |
| 08/09/2006 | CN1268982C Coated liquid composition for forming antireflection film, photorsist laminated body and photoresist pattern forming method |
| 08/09/2006 | CN1268981C Attenuated phase shifting mask having embedded bi-layer structure for and method for making same |
| 08/09/2006 | CN1268974C Resin insulating layer manufacturing method, base board for electrooptical device, electrooptical device manufacturing method and electrooptical device |
| 08/09/2006 | CN1268942C Substrate and its mfg. method, microlens, substrate, transmitting panel and rear projector |
| 08/09/2006 | CN1268664C Resin composition, composition for solder resist, and cured article obtained therefrom |
| 08/09/2006 | CN1268491C Method for making microstructure body, method for making liquid spray nozzle and liquid spray nozzle |
| 08/08/2006 | US7089528 Methods and systems for estimating reticle bias states |
| 08/08/2006 | US7089164 Control of overlay registration |
| 08/08/2006 | US7088758 Relax gas discharge laser lithography light source |
| 08/08/2006 | US7088468 Data-conversion method for a multibeam laser writer for very complex microlithographic patterns |
| 08/08/2006 | US7088432 forming a three-dimensional structure; fabricate 3D complex micro/nano structures by digital light processing using a dynamic mask |
| 08/08/2006 | US7088431 Lithographic apparatus and device manufacturing method |
| 08/08/2006 | US7088429 Stage device for positioning an object, in which a static pressure bearing and a pressurizing magnet suspend a slider |
| 08/08/2006 | US7088428 Lithographic actuator mechanism, lithographic apparatus, and device manufacturing method |
| 08/08/2006 | US7088427 Apparatus and method for high resolution in-situ illumination source measurement in projection imaging systems |