| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/16/2006 | CN1820229A Method and apparatus for monitoring and controlling imaging in immersion lithography systems |
| 08/16/2006 | CN1820228A Positive photosensitive resin composition |
| 08/16/2006 | CN1820227A Printing platemaking method and printing plate thereof |
| 08/16/2006 | CN1819920A Method and device for manufacturing relief printing plate terminal for seamless printing |
| 08/16/2006 | CN1818799A Surface processing and forming method of photoresist layer |
| 08/16/2006 | CN1818798A Method and device for producing photon crystal mask layer on LED |
| 08/16/2006 | CN1818797A Light-intensity data bus system and method |
| 08/16/2006 | CN1818796A Light-intensity data bus system and bus controller |
| 08/16/2006 | CN1818795A Washing apparatus, coating and developing apparatus and washing method |
| 08/16/2006 | CN1818794A Exposure apparatus |
| 08/16/2006 | CN1818793A Stage control apparatus and method, stage apparatus and exposure apparatus |
| 08/16/2006 | CN1818792A Method and apparatus for a reticle with purged pellicle-to-reticle gap |
| 08/16/2006 | CN1818791A System and method for photolithography in semiconductor manufacturing and light shield for same |
| 08/16/2006 | CN1818790A Optical adjacent correction for mask pattern during photoetching process |
| 08/16/2006 | CN1818789A Production of X-ray mask by primary exposure with electron beam current mixed |
| 08/16/2006 | CN1818788A Sub-50nm graph exposuring method by negative chemical amplifying resist |
| 08/16/2006 | CN1818787A Coating and developing system and coating and developing method |
| 08/16/2006 | CN1818786A Direct platemaking offset plate of ink-jetting computer |
| 08/16/2006 | CN1818785A Positive type resist composition and resist pattern formation method using same |
| 08/16/2006 | CN1818784A Positive type resist composition and resist pattern formation method using same |
| 08/16/2006 | CN1818783A Photoresist for enhanced patterning performance |
| 08/16/2006 | CN1818782A Dark ultraviolet negative photoresist and filming resin |
| 08/16/2006 | CN1818781A Dark ultraviolet negative photoresist and filming resin |
| 08/16/2006 | CN1818780A Photosensitive resin composition, its condensate and display panel used interval element formed therewith |
| 08/16/2006 | CN1818779A Photosensitive resin composition, its condensate and display panel used interval element formed therewith |
| 08/16/2006 | CN1818778A Photosensitive resin composition, thin film panel and method for manufacturing thin film panel |
| 08/16/2006 | CN1818767A Transmission type liquid crystal display and its manufacturing method |
| 08/16/2006 | CN1818758A Liquid-crystal device and production thereof |
| 08/16/2006 | CN1818744A Method for printing by printed pattern and production equipment for printing printed pattern |
| 08/16/2006 | CN1817484A Coating film drying method, coating film forming method, and coating film forming apparatus |
| 08/16/2006 | CN1270351C Dynamic cellular automaton method for simulation of photoresist three dimensional etching process |
| 08/16/2006 | CN1270216C Method for preparing nano dot array of controllable unit size using nano ball template |
| 08/16/2006 | CN1270215C Photopolymerible composition and polymerization method therefor |
| 08/16/2006 | CN1269991C Method for depositing metal and metal oxide films and patterned films |
| 08/16/2006 | CN1269921C Settability resin combination and use thereof |
| 08/16/2006 | CN1269812C Slfonium salts, methods for their preparation and use thereof as photoinitiators for radiation curable systems |
| 08/16/2006 | CN1269640C Litho-printing panel for infrared laser |
| 08/15/2006 | US7093228 Method and system for classifying an integrated circuit for optical proximity correction |
| 08/15/2006 | US7093226 Method and apparatus of wafer print simulation using hybrid model with mask optical images |
| 08/15/2006 | US7092231 Chuck, lithographic apparatus and device manufacturing method |
| 08/15/2006 | US7092168 Projection optical system and projection exposure apparatus |
| 08/15/2006 | US7092134 Method and apparatus for recording a hologram from a mask pattern by the use of total internal reflection holography and hologram manufactured by the method |
| 08/15/2006 | US7092073 Semiconductor lithography |
| 08/15/2006 | US7092071 Exposure apparatus and method, and device fabricating method using the same |
| 08/15/2006 | US7092070 Illumination system with spatially controllable partial coherence compensating for line width variances |
| 08/15/2006 | US7092069 Projection exposure method and projection exposure system |
| 08/15/2006 | US7092068 Reticle, exposure monitoring method, exposure method and manufacturing method for semiconductor device |
| 08/15/2006 | US7092000 Pulse light pattern writer |
| 08/15/2006 | US7091507 Light generator and exposure apparatus |
| 08/15/2006 | US7091505 Collector with fastening devices for fastening mirror shells |
| 08/15/2006 | US7091502 Apparatus and method for immersion lithography |
| 08/15/2006 | US7091476 Scanning probe microscope assembly |
| 08/15/2006 | US7091295 Amorphous perfluorinated polymers |
| 08/15/2006 | US7091294 Fluoropolymer and resist composition |
| 08/15/2006 | US7091256 acrylated diisocyanates derived from isocynaurate trimers; automobile paint |
| 08/15/2006 | US7091255 Multiphoton photosensitization system |
| 08/15/2006 | US7091165 Composition and method for removing copper-compatible resist |
| 08/15/2006 | US7091131 Method of forming integrated circuit structures in silicone ladder polymer |
| 08/15/2006 | US7091127 Methods and apparatus for patterning a surface |
| 08/15/2006 | US7091105 Method of forming isolation films in semiconductor devices |
| 08/15/2006 | US7091054 Manufacturing method for emitter for electron-beam projection lithography |
| 08/15/2006 | US7090968 Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same |
| 08/15/2006 | US7090967 Coating substrate with photoresist; selectively exposure, development, and removal; coating to smoothen roughness; crosslinking; integrated circuits |
| 08/15/2006 | US7090966 Variations in the accumulated illumination intensity of radiation on the surface of the plate are controlled to 20% or less, thus alleviating unevenness of distribution of energy to be irradiated on the plate; forming a conductive film by discharging a liquid material using an ink-jet |
| 08/15/2006 | US7090965 Method for enhancing adhesion between reworked photoresist and underlying oxynitride film |
| 08/15/2006 | US7090964 custom polarization, such as a combination of radial and tangential polarization; Forbidden pitch is avoided |
| 08/15/2006 | US7090963 Process for forming features of 50 nm or less half-pitch with chemically amplified resist imaging |
| 08/15/2006 | US7090962 Alkali-soluble resin with polyaromatic group and photosensitive composition comprising the resin |
| 08/15/2006 | US7090961 Photo acid generator, chemical amplification resist material and pattern formation method |
| 08/15/2006 | US7090960 Photoresists comprising mixtures of alkali soluble copolymers, curing agents and acid generators, having high sensitivity and resolution, for use in microstructure lithography |
| 08/15/2006 | US7090959 Multicolor image forming material and method of multicolor image forming method |
| 08/15/2006 | US7090958 Positive photoresist compositions having enhanced processing time |
| 08/15/2006 | US7090957 Polymerizable compound on support; absorbers of infrared radiation |
| 08/15/2006 | US7090949 Method of manufacturing a photo mask and method of manufacturing a semiconductor device |
| 08/15/2006 | US7090716 Single phase fluid imprint lithography method |
| 08/15/2006 | US7090362 Facet mirror having a number of mirror facets |
| 08/15/2006 | US7089856 On-press development of thermosensitive lithographic printing member |
| 08/15/2006 | US7089766 Method of forming optical fiber preforms |
| 08/15/2006 | US7089651 Process of manufacturing coil layers using a novel combination of photoexposure and thermal curing to achieve shape control of a photoresist material |
| 08/15/2006 | CA2242634C Three-dimensional etching process |
| 08/15/2006 | CA2121865C Laser imaged printing plate |
| 08/10/2006 | WO2006084230A2 Phase-shift masked zone plate array lithography |
| 08/10/2006 | WO2006084136A2 Computer to plate curing system |
| 08/10/2006 | WO2006083103A1 Positive dry film photoresist and composition for preparing the same |
| 08/10/2006 | WO2006082856A1 Negative resist composition and method of forming resist pattern |
| 08/10/2006 | WO2006082855A1 Positive resist composition for thin-film implantation process and method for forming resist pattern |
| 08/10/2006 | WO2006082796A1 Compound for resist and radiation-sensitive composition |
| 08/10/2006 | WO2006082776A1 Reactive polyurethane compound, method for producing same, resin composition and cured product thereof |
| 08/10/2006 | WO2006082762A1 Photosensitive laminate film for forming top plate portion of precision fine space and method of forming precision fine space |
| 08/10/2006 | WO2006082740A1 Positive-working resist composition and method for resist pattern formation |
| 08/10/2006 | WO2006082738A1 Optical integrator, illumination optical device, exposure device, and exposure method |
| 08/10/2006 | WO2006082688A1 Process for producing aluminum support for material for lithographic printing plate, aluminum support for material for lithographic printing plate, and material for lithographic printing plate |
| 08/10/2006 | WO2006081991A1 Catadioptric projection objective with intermediate image |
| 08/10/2006 | WO2006081918A2 Control system for the control of software modules |
| 08/10/2006 | WO2006081798A1 Method for producing a structured elastomer and elastomer |
| 08/10/2006 | WO2006055310A3 Article with patterned layer on surface |
| 08/10/2006 | WO2006037444A3 Microlithographic projection exposure apparatus |
| 08/10/2006 | WO2006036433A3 Imprint lithography apparatus and method employing an effective pressure |
| 08/10/2006 | WO2005109095A3 Method for imprint lithography at constant temperature |
| 08/10/2006 | WO2005104214A3 Composition useful for removal of bottom anti-reflection coatings from patterned ion-implanted photoresist wafers |