| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/07/2014 | EP2726453A2 Holographic recording medium |
| 05/07/2014 | CN203587965U 抗蚀剂层的薄膜化装置 Thinning of the resist layer means |
| 05/07/2014 | CN203587964U 风箱散热装置 Bellows heat sink |
| 05/07/2014 | CN103782662A 辐射源 Emitter |
| 05/07/2014 | CN103782241A 制版处理废液的再循环方法 Plate processing method for recycling waste |
| 05/07/2014 | CN103782240A 用于存储目标的位置数据的光刻系统和方法 Lithography system and method for storing target position data |
| 05/07/2014 | CN103782239A 基板处理装置及基板处理方法、曝光方法及曝光装置、以及元件制造方法、及平板显示器的制造方法 Substrate processing apparatus and substrate processing method, exposure method and exposure apparatus and device manufacturing method, and the method of manufacturing flat panel displays |
| 05/07/2014 | CN103782238A 确定聚焦位置修正的方法、光刻处理元和器件制造方法 To determine the focus position correction method, a photolithography process metadata and device manufacturing method |
| 05/07/2014 | CN103782237A 负型感光性树脂组合物、分隔壁、黑色矩阵以及光学元件 A negative-type photosensitive resin composition, partition walls, a black matrix and an optical element |
| 05/07/2014 | CN103782236A 柔版印刷原版及水显影性感光性树脂层积板 Flexographic printing original plate and the water-developable photosensitive resin laminates |
| 05/07/2014 | CN103781854A 用于平版印刷应用的来自小分子的金属氧化物膜 A metal oxide film for lithography applications from small molecules |
| 05/07/2014 | CN103781816A 酚系自交联高分子及包含其的抗蚀剂下层膜组合物 Phenol-based self-crosslinking polymer, and which contains a resist underlayer film forming composition |
| 05/07/2014 | CN103779189A 定向自组装制程/邻近校正的方法 Directed self-assembly process / proximity correction methods |
| 05/07/2014 | CN103779188A 覆盖预测的方法 Prediction methods covering |
| 05/07/2014 | CN103779187A 一种基于双图案的半导体器件的制造方法 A semiconductor device manufacturing method based on the pattern of the dual |
| 05/07/2014 | CN103777478A 一种非接触式光刻机的晶圆校准水平装置及其应用 A non-contact wafer lithography machine calibration device and application level |
| 05/07/2014 | CN103777476A 一种离轴对准系统及对准方法 One kind of off-axis alignment system and alignment method |
| 05/07/2014 | CN103777475A 清洁制剂 Cleaning agents |
| 05/07/2014 | CN103777474A 一种并行激光直写系统及光刻方法 A parallel laser direct-write lithography system and method |
| 05/07/2014 | CN103777473A 基于受激光发射损耗的激光直写曝光装置 Emitted by the laser-based laser direct writing exposure means loss |
| 05/07/2014 | CN103777472A 用于准分子激光光束整形的衍射光学元件设计方法 A method for designing a diffractive optical element is an excimer laser beam shaping |
| 05/07/2014 | CN103777471A 照明光学设备、曝光设备、照明方法、曝光方法和装置制造方法 The illumination optical apparatus, exposure apparatus, the illumination method, exposure method and device manufacturing method |
| 05/07/2014 | CN103777470A 用于减少除气作用的紫外线（uv）图案化的方法和装置 Method and apparatus for reducing the outgassing ultraviolet (uv) patterned |
| 05/07/2014 | CN103777469A 一种光刻机传感器校准方法 A lithographic machine sensor calibration method |
| 05/07/2014 | CN103777468A 基于高台阶斜坡的光刻方法及系统 Lithography based on high-level slope method and system |
| 05/07/2014 | CN103777467A 一种套刻误差测量装置及方法 An overlay error measurement apparatus and method |
| 05/07/2014 | CN103777466A 降低线条粗糙度的光刻方法 Reduce the roughness of the line lithography method |
| 05/07/2014 | CN103777465A 固化性树脂组合物、固化涂膜以及印刷电路板 The curable resin composition, the cured coating film and a printed circuit board |
| 05/07/2014 | CN103777464A 固化性组合物、固化膜、显示元件以及干膜 The curable composition, cured film, a display device and a dry film |
| 05/07/2014 | CN103777462A 显示装置制造用光掩模和图案转印方法 An apparatus for manufacturing a photomask and pattern transfer method shows |
| 05/07/2014 | CN103777407A 一种显示器装置及其制作方法 A display device and manufacturing method thereof |
| 05/07/2014 | CN103777363A 照明光学设备、曝光设备、照明方法、曝光方法和装置制造方法 The illumination optical apparatus, exposure apparatus, the illumination method, exposure method and device manufacturing method |
| 05/07/2014 | CN103777345A 照明光学设备、曝光设备、照明方法、曝光方法和装置制造方法 The illumination optical apparatus, exposure apparatus, the illumination method, exposure method and device manufacturing method |
| 05/07/2014 | CN103777308A 光刻机双频激光干涉仪垂向测量光路反射镜调整装置 Lithography frequency laser interferometer to measure the optical path of vertical mirror adjustment device |
| 05/07/2014 | CN103777303A 长条镜安装装置 Long mirror mounting device |
| 05/07/2014 | CN103777268A 一种提高导光板网版耐印率及透过性的方法 Method for improving the light guide plate screen printing rate and permeability resistance method |
| 05/07/2014 | CN103777256A 一种柔性曲面微透镜阵列的制作方法及应用 A method of making a flexible surface of the microlens array and application |
| 05/07/2014 | CN103773626A 一种低蚀刻的去除光阻蚀刻残留物的清洗液 A low etch photoresist etch to remove the cleaning solution of the residue |
| 05/07/2014 | CN103772872A 量子点/丙烯酸酯聚合物纳米晶体复合物及制备方法和彩色转化膜 Quantum dots / acrylate polymer nanocrystal composite preparation method and color conversion film |
| 05/07/2014 | CN103772705A 一种光敏性聚酰亚胺树脂及其制备方法和应用 A photosensitive polyimide resin and preparation method and application |
| 05/07/2014 | CN103772341A 新的丙烯酸类单体、聚合物以及包含该聚合物的抗蚀剂组合物 The new acrylic monomers, polymers, and a resist composition comprising the polymer, |
| 05/07/2014 | CN103772252A 新型鎓盐化合物、由它衍生出的酸增强剂及含有它的抗蚀剂组合物 Novel onium salt compound, the acid which is derived from it and containing the same enhancer resist composition |
| 05/07/2014 | CN102890418B 光刻胶成膜树脂及其制备方法 Photoresist film-forming resin and preparation method |
| 05/07/2014 | CN102768473B 一种极紫外光刻投影物镜的优化设计方法 An extreme ultraviolet lithography projection objective optimization design method |
| 05/07/2014 | CN102706785B 一种测试光刻胶层对离子注入阻挡能力的方法 An ion implantation blocking ability of the photoresist layer test method |
| 05/07/2014 | CN102621609B 任意切趾光纤光栅刻写装置和刻写方法 Apparatus and method for inscribing any apodized fiber grating inscribed |
| 05/07/2014 | CN102566283B 一种直接激光成像的水洗柔性树脂版 A direct laser imaging washing flexible resin version |
| 05/07/2014 | CN102566274B 正型光敏树脂组合物，利用其制备的光敏树脂膜，和包括该光敏树脂膜的半导体器件 The positive-type photosensitive resin composition prepared using the photosensitive resin film, and a semiconductor device including a photosensitive resin film, |
| 05/07/2014 | CN102566273B 正型感光性树脂组成物及其形成图案的方法 The method of the positive-type photosensitive resin composition for forming a pattern and |
| 05/07/2014 | CN102540709B 红外线敏感的免化学处理感光组成物和用其制作的平印版 Infrared-sensitive photographic chemistry-free composition and with its production of flat plate |
| 05/07/2014 | CN102520584B 光敏苯并环丁烯树脂组合物及制备方法以及其图案化方法 The photosensitive benzocyclobutene resin composition and its preparation method, and a patterning method thereof |
| 05/07/2014 | CN102520583B 包含缩醛和缩酮作为溶剂的光刻胶组合物 The photoresist composition comprising acetals and ketals, as a solvent |
| 05/07/2014 | CN102472974B 微光刻投射曝光设备以及测量有关包含在其中的光学表面的参数的方法 The method of microlithography projection exposure apparatus and a measurement of which contains parameters related to the optical surface in the |
| 05/07/2014 | CN102471150B D1492液体双酰基氧化膦光引发剂及其在可辐射固化组合物中的用途 D1492 liquid bisacylphosphine oxide photoinitiators and their use in radiation curable compositions |
| 05/07/2014 | CN102466988B 高温水蒸气和水混合射流清洗系统及方法 High-temperature steam and water jet cleaning system and method |
| 05/07/2014 | CN102466972B 用于彩色滤光片的光敏树脂组合物和应用其的彩色滤光片 The photosensitive resin composition for a color filter and a color filter applications thereof |
| 05/07/2014 | CN102449526B 成像光学部件以及具有此类型的成像光学部件的用于微光刻的投射曝光设备 Imaging optics and the imaging optics of this type having means for microlithography projection exposure apparatus |
| 05/07/2014 | CN102395923B 借助傅里叶滤光和图像比较的掩模检查 With the mask inspection and image comparison of the Fourier filter |
| 05/07/2014 | CN102375238B 均匀照明的微柱面镜阵列及其设计方法 Uniform illumination of the micro-cylindrical lens array and its design method |
| 05/07/2014 | CN102360092B 光学元件及其制造方法 An optical element and its manufacturing method |
| 05/07/2014 | CN102326234B 基板的处理装置以及处理方法 Processing apparatus and a substrate processing method |
| 05/07/2014 | CN102317075B 阴图制版可成像元件 Negative working imageable element |
| 05/07/2014 | CN102307909B 感光性树脂组合物 The photosensitive resin composition |
| 05/07/2014 | CN102305990B 衬底和使用该衬底的方法 Substrate and a method using the substrate |
| 05/07/2014 | CN102187276B 热反应型抗蚀剂材料、使用它的热光刻用层压体以及使用它们的模具的制造方法 The heat-reactive resist material, its thermal lithography using the layered manufacturing method thereof and the use of a mold |
| 05/07/2014 | CN102141737B 光刻设备和器件制造方法 A lithographic apparatus and device manufacturing method |
| 05/07/2014 | CN102104113B 有机场效应晶体管阈值电压的调制方法 A modulation method of an organic field effect transistor threshold voltage |
| 05/07/2014 | CN101840161B 光刻设备和器件制造方法 A lithographic apparatus and device manufacturing method |
| 05/07/2014 | CN101807537B 位置对准机构、加工装置以及位置对准方法 The positioning mechanism, the processing device and positioning method |
| 05/07/2014 | CN101713923B 具有低交联密度的光聚合物配制剂 Light having a low crosslink density of the polymer formulation |
| 05/07/2014 | CN101664731B 实现半导体圆片连续涂胶的方法及其净化系统 Way to achieve a continuous coating of semiconductor wafers and purification system |
| 05/07/2014 | CN101585794B 用于化学放大型抗蚀剂组合物的酸生成剂 Acid-generating agents for chemically amplified resist compositions |
| 05/07/2014 | CN101477309B 正性光敏性聚酰胺酸酯树脂组合物及其制备方法与应用 Positive photosensitive polyamic ester resin composition and preparation method and application |
| 05/07/2014 | CN101387754B 投影机曝光装置、曝光方法以及元件制造方法 Projector exposure apparatus, exposure method and device manufacturing method |
| 05/06/2014 | US8717544 Alignment method, alignment apparatus, and exposure apparatus |
| 05/06/2014 | US8717537 Exposure apparatus, and device manufacturing method |
| 05/06/2014 | US8717536 Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product |
| 05/06/2014 | US8716139 Method of patterning a semiconductor device |
| 05/06/2014 | US8715919 Surface switchable photoresist |
| 05/06/2014 | US8715918 Thick film resists |
| 05/06/2014 | US8715917 Simultaneous photoresist development and neutral polymer layer formation |
| 05/06/2014 | US8715916 Pattern forming method and resist underlayer film-forming composition |
| 05/06/2014 | US8715915 High-resolution photolithographic method for forming nanostructures, in particular in the manufacture of integrated electronic devices |
| 05/06/2014 | US8715914 Organometallic composition for forming a metal alloy pattern and a method of forming such a pattern using the composition |
| 05/06/2014 | US8715913 Silicon-containing resist underlayer film-forming composition and patterning process |
| 05/06/2014 | US8715912 Method for producing a high resolution resist pattern on a semiconductor wafer |
| 05/06/2014 | US8715910 Method for exposing an area on a substrate to a beam and photolithographic system |
| 05/06/2014 | US8715909 Lithography systems and methods of manufacturing using thereof |
| 05/06/2014 | US8715908 Process of using an imaging element having a photoluminescent tag |
| 05/06/2014 | US8715907 Developable bottom antireflective coating compositions for negative resists |
| 05/06/2014 | US8715906 High resolution, solvent resistant, thin elastomeric printing plates |
| 05/06/2014 | US8715905 Silphenylene-containing photocurable composition, pattern formation method using same, and optical semiconductor element obtained using the method |
| 05/06/2014 | US8715904 Photocurable composition |
| 05/06/2014 | US8715903 Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same |
| 05/06/2014 | US8715902 Compositions and processes for immersion lithography |
| 05/06/2014 | US8715901 Resin composition for forming fine pattern and method for forming fine pattern |
| 05/06/2014 | US8715900 Self-imageable layer forming polymer and compositions thereof |
| 05/06/2014 | US8715895 Photosensitive resin composition for color filter and color filter using the same |
| 05/06/2014 | US8715888 Method for producing holographic photopolymers on polymer films |
| 05/06/2014 | US8714082 Method for patterning a substrate surface |