| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/24/2006 | WO2006066638A8 A filter device for the compensation of an asymmetric pupil illumination |
| 08/24/2006 | WO2006050891A3 A high-precision optical surface prepared by sagging from a masterpiece |
| 08/24/2006 | WO2006036253A3 Improved slip film compositions containing layered silicates |
| 08/24/2006 | WO2006026665A3 Increasing adhesion in an imprinting procedure |
| 08/24/2006 | WO2005114329A3 Fabrication of polymeric structures |
| 08/24/2006 | WO2005060321A8 Method and device for generating in particular euv radiation and/or soft x-ray radiation |
| 08/24/2006 | WO2005060321A2 Method and device for generating in particular euv radiation and/or soft x-ray radiation |
| 08/24/2006 | US20060190921 Manufacturing Method of Semiconductor Device |
| 08/24/2006 | US20060189160 Method for producing a pattern formation mold |
| 08/24/2006 | US20060189028 Wafer having alternating design structure and method for manufacturing semiconductor package using the same |
| 08/24/2006 | US20060189006 Method and apparatus for detecting end point |
| 08/24/2006 | US20060188828 Media for laser imaging |
| 08/24/2006 | US20060188827 Selective surface exposure, cleans and conditioning of the germanium film in a Ge photodetector |
| 08/24/2006 | US20060188826 Method for utilizing dry film |
| 08/24/2006 | US20060188825 Laser irradiation device and laser induced thermal imaging method |
| 08/24/2006 | US20060188824 Method for improving design window |
| 08/24/2006 | US20060188823 Method for forming an electronic device |
| 08/24/2006 | US20060188820 Photosensitive resin composition and method of forming a pattern using the composition |
| 08/24/2006 | US20060188816 Fluorinated compound, fluoropolymer and process for its production |
| 08/24/2006 | US20060188793 Adjustable Transmission Phase Shift Mask |
| 08/24/2006 | US20060188598 Apparatus for embossing a flexible substrate with a pattern carried by an optically transparent compliant media |
| 08/24/2006 | US20060187549 Methods for reducing polarization aberration in optical systems |
| 08/24/2006 | US20060187524 Pattern generator diffractive mirror methods and systems |
| 08/24/2006 | US20060187511 Device for mounting an optical element, particularly a lens in an objective |
| 08/24/2006 | US20060187464 Interferometry systems and methods of using interferometry systems |
| 08/24/2006 | US20060187440 Apparatus and method for mounting a hard pellicle |
| 08/24/2006 | US20060187439 Stage system including fine-motion cable unit, exposure apparatus, and method of manufacturing device |
| 08/24/2006 | US20060187438 Temperature adjustment apparatus, exposure apparatus having the temperature adjustment apparatus, and semiconductor device manufacturing method |
| 08/24/2006 | US20060187437 Alignment apparatus and exposure apparatus |
| 08/24/2006 | US20060187436 Method and system for improving focus accuracy in a lithography system |
| 08/24/2006 | US20060187433 Exposure apparatus, exposure method, method for manufacturing device |
| 08/24/2006 | US20060187432 Exposure apparatus, exposure method, and method for producing device |
| 08/24/2006 | US20060187431 Exposure method and exposure apparatus, stage unit, and device manufacturing method |
| 08/24/2006 | US20060187383 Method of manufacturing a reflector and liquid crystal display device including such a reflector |
| 08/24/2006 | US20060185542 Lithographic printing plate original form and plate making method |
| 08/24/2006 | DE10349764B4 Hartmaske zur Strukturierung einer Schicht und Verfahren zur Generierung einer Hartmaske für die Strukturierung einer Schicht Hard mask for patterning a layer and method for generating a hard mask for patterning a layer |
| 08/24/2006 | DE10315086B4 Verfahren und Vorrichtung zum Ausrichten von Halbleiterwafern bei der Halbleiterherstellung Method and apparatus for aligning the semiconductor wafers in the semiconductor manufacturing |
| 08/24/2006 | DE10218512B4 Lichtempfindliches Polymer und Resist-Zusammensetzungen The light-sensitive polymer and resist compositions |
| 08/24/2006 | DE102006003434A1 Verfahren zur automatischen Datenbereitstellung zur Fokusüberwachung eines lithografischen Prozesses A method of automatic data provision to focus monitoring of a lithographic process |
| 08/24/2006 | CA2597866A1 Photolithographic patterning of polymeric materials |
| 08/23/2006 | EP1693886A1 Substrate treatment device control method and substrate treatment device |
| 08/23/2006 | EP1693885A1 Light flux conversion element, lighting optical device, exposure system, and exposure method |
| 08/23/2006 | EP1693709A1 Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same |
| 08/23/2006 | EP1693708A2 Lithographic projection apparatus and device manufacturing method |
| 08/23/2006 | EP1693707A1 Positive resist composition, and patterning process using the same |
| 08/23/2006 | EP1693706A2 Photosensitive lithographic printing plate containing a mercapto compound |
| 08/23/2006 | EP1693705A2 Resist composition, compound for use in the resist composition and pattern forming method using the resist composition |
| 08/23/2006 | EP1693704A2 Resist composition and pattern forming method using the same |
| 08/23/2006 | EP1693703A1 Method of fixing organic molecule and micro/nano-article |
| 08/23/2006 | EP1693338A1 Method of fabrication of a microstructure in titanium. |
| 08/23/2006 | EP1692572A2 Alkaline, post plasma etch/ash residue removers and photoresist stripping compositions containing metal-halide corrosion inhibitors |
| 08/23/2006 | EP1692571A2 Utilities transfer system in a lithography system |
| 08/23/2006 | EP1692570A1 Improved lithographic process |
| 08/23/2006 | EP1692094A2 Bottom antireflective coatings |
| 08/23/2006 | EP1692088A1 White solid photoinitiator in the form of powder and preparation thereof |
| 08/23/2006 | EP1356476B1 Narrow-band spectral filter and the use thereof |
| 08/23/2006 | EP1252024B1 Device for exposing thermosensitive media |
| 08/23/2006 | EP1228264A4 Improved aperture plate and methods for its construction and use |
| 08/23/2006 | EP1218796A4 Extreme ultraviolet soft x-ray projection lithographic method and mask devices |
| 08/23/2006 | EP1214718A4 Extreme ultraviolet soft x-ray projection lithographic method system and lithography elements |
| 08/23/2006 | EP1157057B1 Accelerators useful for energy polymerizable compositions |
| 08/23/2006 | EP1153336B1 Chemical filtering for optimising the light transmittance of a gas |
| 08/23/2006 | EP1042381B1 Fractionated novolak resin and photoresist composition therefrom |
| 08/23/2006 | EP0958255B1 Silica with low compaction under high energy irradiation |
| 08/23/2006 | CN1823304A Material for forming fine pattern and method for forming fine pattern using the same |
| 08/23/2006 | CN1823303A Developing solution for photosensitive composition and method for forming patterned resist film |
| 08/23/2006 | CN1823302A Negative photosensitive resin composition and negative photosensitive element |
| 08/23/2006 | CN1823295A Method of manufacturing a reflector, and liquid crystal display device including such a reflector |
| 08/23/2006 | CN1823108A Positive photoresist composition and method of forming resist pattern |
| 08/23/2006 | CN1823107A Positive photoresist composition and method of forming resist pattern |
| 08/23/2006 | CN1822935A A method of manufacturing a mould for producing an optical surface, a method of producing a contact lens and a device for use with these methods |
| 08/23/2006 | CN1822286A Plasma display screen barrier wall slurry |
| 08/23/2006 | CN1822281A Method of patterning catalyst layer for synthesis of carbon nanotubes and method of fabricating field emission device using the method |
| 08/23/2006 | CN1821886A Aqueous based residue removers comprising fluoride |
| 08/23/2006 | CN1821885A Organt solvent regeneration system |
| 08/23/2006 | CN1821884A Lithographic apparatus and device manufacturing method |
| 08/23/2006 | CN1821883A Method and device for light etching micrometer structure of smooth surface |
| 08/23/2006 | CN1821882A Exposure method and apparatus |
| 08/23/2006 | CN1821881A Lithographic apparatus and device manufacturing method |
| 08/23/2006 | CN1821880A Exposure method for making isolation wall |
| 08/23/2006 | CN1821879A Positive resist composition, manufacture method and application of the same |
| 08/23/2006 | CN1821878A Photresist compositions comprising resin blends |
| 08/23/2006 | CN1821877A Radiation sensitive resin composition for forming spacer, spacer, method for forming same and liquid crystal display element |
| 08/23/2006 | CN1821876A Solder resist ink composition |
| 08/23/2006 | CN1821875A Salt suitable for an acid generator and a chemically amplified resist composition containing the same |
| 08/23/2006 | CN1821874A Alkaline soluble photosensitive resin and its preparing method |
| 08/23/2006 | CN1821873A Photosensitive resin compound |
| 08/23/2006 | CN1821872A Etchant composition and manufacturing method for thin film transistor array panel |
| 08/23/2006 | CN1821871A Resist pattern thickening material and process for forming resist pattern, and process for manufacturing the same |
| 08/23/2006 | CN1821870A Photosensitive paste composition and plasma display panel manufactured using the same |
| 08/23/2006 | CN1821869A Photoresist compositions |
| 08/23/2006 | CN1821867A Method of manufacture grey mask and grey mask |
| 08/23/2006 | CN1821830A Micro-oscillating element and method of making the same |
| 08/23/2006 | CN1821820A A numerical aperture controlling filter and a method for manufacturing the same |
| 08/23/2006 | CN1271686C Method for cleaning hole material and apparatus thereof |
| 08/23/2006 | CN1271621C Method for prodn. of optical disk matrix |
| 08/23/2006 | CN1271475C Resist remover composition |
| 08/23/2006 | CN1271474C Method and device of transferring optical enclosure picture and method of manufacturing optical enclosure |
| 08/23/2006 | CN1271473C Method for optimizing the imaging characteristics of at least two optical elements and photolithographic production process |
| 08/23/2006 | CN1271472C Method of forming photoresist pattern |