| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 08/23/2006 | CN1271471C Heat-sensitive lithographic plate |
| 08/23/2006 | CN1271470C Foam-removing agent composition for photoresist solution |
| 08/23/2006 | CN1271458C Method for making substrate of microlens and exposure optical system of microlens |
| 08/23/2006 | CN1271424C Method for mfg optical element having resin film with micro concave-convex pattern |
| 08/23/2006 | CN1271069C Diepoxy group containing thioxanthone photoinitiator and preparation method therefor |
| 08/22/2006 | US7095884 Method and apparatus for circuit pattern inspection |
| 08/22/2006 | US7095699 Detection apparatus, detection method and electron beam irradiation apparatus |
| 08/22/2006 | US7095560 Diffractive optical device, refractive optical device, illumination optical system, exposure apparatus and exposure method |
| 08/22/2006 | US7095511 Method and apparatus for high-speed thickness mapping of patterned thin films |
| 08/22/2006 | US7095509 Aberration measuring method for projection optical system with a variable numerical aperture in an exposure apparatus |
| 08/22/2006 | US7095499 Method of measuring alignment of a substrate with respect to a reference alignment mark |
| 08/22/2006 | US7095497 Beam splitting apparatus, transmittance measurement apparatus, and exposure apparatus |
| 08/22/2006 | US7095485 Lithographic linear motor, lithographic apparatus, and device manufacturing method |
| 08/22/2006 | US7095481 The aberration correction mechanism mounted on the exposure apparatus is able to correct merely wave front aberration of a low order in the residual aberration of the projection optical system |
| 08/22/2006 | US7095480 Cooling apparatus |
| 08/22/2006 | US7095479 Lithographic apparatus, device manufacturing method and device manufactured thereby |
| 08/22/2006 | US7095038 EUV source |
| 08/22/2006 | US7095037 Electron beam lithography system having improved electron gun |
| 08/22/2006 | US7095036 Electron beam lithography apparatus using a patterned emitter and method of fabricating the patterned emitter |
| 08/22/2006 | US7095035 Demagnification measurement method for charged particle beam exposure apparatus, stage phase measurement method for charged particle beam exposure apparatus, control method for charged particle beam exposure apparatus, and charged particle beam exposure apparatus |
| 08/22/2006 | US7094924 Method for decreasing surface defects of patterned resist layer |
| 08/22/2006 | US7094850 Fluorine-containing polymerizable monomer and polymer prepared by using same |
| 08/22/2006 | US7094686 Contact hole printing by packing and unpacking |
| 08/22/2006 | US7094613 Method for controlling accuracy and repeatability of an etch process |
| 08/22/2006 | US7094612 Method of controlling a potential difference between a stencil mask and a substrate of semiconductor device |
| 08/22/2006 | US7094523 Developer solution and process for use |
| 08/22/2006 | US7094522 Developing method, substrate treating method, and substrate treating apparatus |
| 08/22/2006 | US7094521 irradiating photoresist film with exposing light while supplying, between projection lens and resist film, a circulating solution of water including antifoaming agent (silicone oil), baking, then developing; for production of semiconductors |
| 08/22/2006 | US7094520 Die for molding optical panel, process for production thereof, and use thereof |
| 08/22/2006 | US7094518 stain resistance in non-image part; intermediate layer which contains a low-molecular weight compound having a quaternary ammonium group and an acid anion group |
| 08/22/2006 | US7094515 Stimulus sensitive compound and stimulus sensitive composition containing the same |
| 08/22/2006 | US7094506 Lithographic apparatus and device manufacturing method |
| 08/22/2006 | US7094505 Photomask assembly and method for protecting the same from contaminants generated during a lithography process |
| 08/22/2006 | US7094504 Faster, lower cost production of phase shift device |
| 08/22/2006 | US7094503 Nanopastes for use as patterning compositions |
| 08/22/2006 | US7094273 melting a low aluminum content alloy, adding calcium prior to the addition of the remaining aluminum then casting; calcium additions deoxidize the melt; by product inhibition |
| 08/21/2006 | WO2006088209A1 Production method for 3-d mold, production method for finely machined product, production method for fine-pattern molded product, 3-d mold, finely machined product, fine-pattern molded product and optical component |
| 08/17/2006 | WO2006086486A2 Apparatus for projecting a reduced image of a photomask using a schwarzschild objective |
| 08/17/2006 | WO2006086441A2 Improved flexo processor |
| 08/17/2006 | WO2006085741A1 Process for preparing a polymeric relief structure |
| 08/17/2006 | WO2006085681A1 Photosensitive composition removing liquid |
| 08/17/2006 | WO2006085678A1 Photosensitive composition removing liquid |
| 08/17/2006 | WO2006085663A1 Mask blanks |
| 08/17/2006 | WO2006085660A1 Image exposing apparatus |
| 08/17/2006 | WO2006085626A1 Exposure method and system, and method for fabricating device |
| 08/17/2006 | WO2006085527A1 Temperature setting method for heat treating plate, temperature setting device for heat treating plate, program and computer-readable recording medium recording program |
| 08/17/2006 | WO2006085524A1 Exposure equipment |
| 08/17/2006 | WO2006085422A1 Material for forming pattern, and apparatus and method for forming pattern |
| 08/17/2006 | WO2006085419A1 Positive resist composition and method of forming resist pattern |
| 08/17/2006 | WO2006084657A1 Vibration damping for photolithographic lens mount |
| 08/17/2006 | WO2006084641A2 Immersion liquid, exposure apparatus, and exposure process |
| 08/17/2006 | WO2006084479A1 Microlithographic projection exposure apparatus |
| 08/17/2006 | WO2006084476A1 Illumination system for a microlithographic projection exposure apparatus |
| 08/17/2006 | WO2006069795A3 Projection optical system |
| 08/17/2006 | WO2006058150A3 Multilevel fabrication processing by functional regrouping of material deposition, lithography, and etching |
| 08/17/2006 | WO2006046058A3 Optical microstructures and methods manufacturing the same |
| 08/17/2006 | WO2006021406A3 Pupil improvement of incoherent imaging systems for enhanced cd linearity |
| 08/17/2006 | WO2006006854A3 Microstructuring of mesogens using contact printing |
| 08/17/2006 | US20060183876 Resin for resist positive resist composition and method of forming resist pattern |
| 08/17/2006 | US20060183336 Method of optimized stitching for digital micro-mirror device |
| 08/17/2006 | US20060183331 Methods for patterning dielectric material, and methods for aligning semiconductor fabrication molds and semiconductor substrates |
| 08/17/2006 | US20060183310 Process for fabricating semiconductor device and method for generating mask pattern data |
| 08/17/2006 | US20060183309 Method for manufacturing a patterned structure |
| 08/17/2006 | US20060183218 Material for forming fine pattern and method for forming fine pattern using the same |
| 08/17/2006 | US20060183062 Method to create region specific exposure in a layer |
| 08/17/2006 | US20060183061 Method for forming positive metal pattern and EMI filter using the same |
| 08/17/2006 | US20060183060 Nano-imprint lithography method involving substrate pressing |
| 08/17/2006 | US20060183059 System and method for absorbance modulation lithography |
| 08/17/2006 | US20060183058 System and method for contrast enhanced zone plate array lithography |
| 08/17/2006 | US20060183057 Patterning method |
| 08/17/2006 | US20060183056 Method for isotropic etching of copper |
| 08/17/2006 | US20060183054 Resulting from shading of the surface layer during exposure by the clamps holding the plate; shaded area are identified prior to development and the surface layer is scored in those areas to a depth and density to remove the scored layer during development but not deep enough to damage the underlayer |
| 08/17/2006 | US20060183050 Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator |
| 08/17/2006 | US20060183048 Positive photoresist composition and resist pattern formation |
| 08/17/2006 | US20060182605 Method for transferring and loading a reticle |
| 08/17/2006 | US20060181692 Method and apparatus for controlling radiation beam intensity directed to microlithograhic substrates |
| 08/17/2006 | US20060181690 Exposure apparatus, exposure method, and method for producing device |
| 08/17/2006 | US20060180908 Resin composition, heat-resistant resin paste and semiconductor device using these and method of preparing the same |
| 08/17/2006 | US20060180173 System and method for removal of materials from an article |
| 08/17/2006 | DE10230891B4 Photolithographisches System und photolithographes Verfahren zur Erfassung von Verunreinigungen aufder Oberfläche von Wafern Photolithography system and method for detecting photolithographes of impurities on the surface of wafers |
| 08/17/2006 | DE102005056703A1 TFT-Arraysubstrat und zugehöriges Herstellverfahren TFT array substrate manufacturing process and related |
| 08/17/2006 | DE102005005937A1 Verfahren zum Herstellen einer Maskenanordnung sowie Verwendung der Maskenanordnung A method for producing a mask arrangement and use of the mask assembly |
| 08/17/2006 | DE102005003557A1 Optical unit, for microlithography device, has pair of reflecting surfaces that are concavely arranged with respect to each other and having half ellipsoids with focus points, collinear semi-major axes and partial surfaces |
| 08/16/2006 | EP1691410A2 Method for defining a feature on a substrate |
| 08/16/2006 | EP1691362A1 Process for producing original disc for optical disc and original disc for optical disc |
| 08/16/2006 | EP1691238A2 Coating compositions for use with an overcoated photoresist |
| 08/16/2006 | EP1690883A1 Pellicle and novel fluorinated polymer |
| 08/16/2006 | EP1690302A2 Irradiation apparatuses |
| 08/16/2006 | EP1690139A2 Projection optical system |
| 08/16/2006 | EP1690138A1 Radiation-sensitive compositions and imageable elements based thereon |
| 08/16/2006 | EP1690137A1 A process for the manufacture of flexographic printing plates |
| 08/16/2006 | EP1690136A2 A method of forming a patterned layer on a substrate |
| 08/16/2006 | EP1690135A2 Resist, barc and gap fill material stripping chemical and method |
| 08/16/2006 | EP1690133A1 Fluorinated photoresists prepared, deposited, developed and removed in carbon dioxide |
| 08/16/2006 | EP1689817A1 Pigment compositions consisting of a yellow disazo pigment and an organic pigment |
| 08/16/2006 | EP1689800A1 Flame retardant radiation curable compositions |
| 08/16/2006 | EP1301827B1 Photolithographically-patterned out-of-plane coil structures and method of making |
| 08/16/2006 | EP1252689A4 Deep ultraviolet catadioptric anamorphic telescope |
| 08/16/2006 | EP0968445B1 Method for creating a color filter layer on a flat panel display screen structure |
| 08/16/2006 | CN1820230A Method for etching patterned silicone layer |