| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/30/2006 | EP1696271A1 Lithography measurements using scatterometry |
| 08/30/2006 | EP1696270A2 Method and apparatus for determining an improved assist feature configuration in a mask layout |
| 08/30/2006 | EP1696269A2 Identifying a problem area in a layout using a process-sensitivity model |
| 08/30/2006 | EP1696268A2 Lithographic printing plate precursor, method for preparation of lithographic printing plate precursor, and lithographic printing method |
| 08/30/2006 | EP1696267A2 Positive resist composition and pattern forming method using the same |
| 08/30/2006 | EP1696266A2 Hologram recording material and optical recording medium |
| 08/30/2006 | EP1696265A2 Hologram recording material, hologram recording method, optical recording medium, and dye therefor |
| 08/30/2006 | EP1695931A1 Method and device for separating printing plates |
| 08/30/2006 | EP1695821A2 Planographic printing plate precursor |
| 08/30/2006 | EP1695393A1 Method for photo-embossing a monomer-containing layer |
| 08/30/2006 | EP1695149A2 Sensor for lithographic apparatus and method of obtaining measurements |
| 08/30/2006 | EP1695148A2 Holding device for an optical element in an objective |
| 08/30/2006 | EP1695147A2 Photosensitive composition remover |
| 08/30/2006 | EP1695146A1 COATING MATERIALS CONTAINING alpha-(1 -HYDROXYALKYL)ACRYLATES |
| 08/30/2006 | EP1695142A2 Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
| 08/30/2006 | EP1695140A2 Deffect mitigation in spatial light modulator used for dynamic photolithography |
| 08/30/2006 | EP1695139A2 Real time image resizing for dynamic digital photolithography |
| 08/30/2006 | EP1695138A2 Liquid crystal cell that resists degradation from exposure to radiation |
| 08/30/2006 | EP1695128A2 Optical waveguides and methods thereof |
| 08/30/2006 | EP1695122A2 Spatial light modulator and method for performing dynamic photolithography |
| 08/30/2006 | EP1694777A1 Use of a pigment preparation based on ci pigment yellow 74 |
| 08/30/2006 | EP1694506A1 Method and apparatus for printing a patterned layer on a flat substrate with a flat-type-bed |
| 08/30/2006 | EP1623276B1 Maskless lithographic system |
| 08/30/2006 | EP1556365B1 Improvement in the storage stability of photoinitiators |
| 08/30/2006 | EP1546813A4 Low silicon-outgassing resist for bilayer lithography |
| 08/30/2006 | EP1518151B1 Method and arrangement for the manipulation of reticles |
| 08/30/2006 | EP1441868A4 Patterned structure reproduction using nonsticking mold |
| 08/30/2006 | EP1102662A4 Ticket dispensing modules and method |
| 08/30/2006 | EP1018140A4 Electron sources having shielded cathodes |
| 08/30/2006 | EP0983533B1 Printing sleeve and method of making using digital imaging photopolymerization |
| 08/30/2006 | EP0835917B1 Ultraviolet-curing adhesive composition and article |
| 08/30/2006 | CN2812052Y Structure of photoresist coating developing equipment |
| 08/30/2006 | CN1826637A Process for producing magnetic recording medium, stamper for magnetic recording medium and intermediate body for magnetic recording medium |
| 08/30/2006 | CN1826560A Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system |
| 08/30/2006 | CN1826559A Method and apparatus for monitoring and controlling imaging in immersion lithography systems |
| 08/30/2006 | CN1826547A Optical element holding device, lens barrel, exposing device, and device producing method |
| 08/30/2006 | CN1826358A Fluorinated compound, and fluoropolymer, process for its production and resist composition containing it |
| 08/30/2006 | CN1826286A Method for fixing metal particle, and method for producing metal particle-containing substrate, method for producing carbon nanotube-containing substrate and method for producing semiconductor crystal |
| 08/30/2006 | CN1826216A Viscosity reducible radiation curable resin composition |
| 08/30/2006 | CN1825324A Distribution optimized method and optical shielding film, manufacture method of semiconductor device |
| 08/30/2006 | CN1825211A Lithographic apparatus and device manufacturing method |
| 08/30/2006 | CN1825210A Off-axis projection optics system and extreme ultraviolet lithography apparatus employing the same |
| 08/30/2006 | CN1825209A Resist pattern forming method and semiconductor device manufacturing method |
| 08/30/2006 | CN1825208A Lithographic apparatus and device manufacturing method |
| 08/30/2006 | CN1825207A Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus |
| 08/30/2006 | CN1825206A Negative resist composition and patterning process |
| 08/30/2006 | CN1825189A Method for making step contact window of two-dimensional display |
| 08/30/2006 | CN1825179A Liquid crystal display panel and mfg. method thereof |
| 08/30/2006 | CN1825145A Manufacturing method of color filter |
| 08/30/2006 | CN1272989C Method and apparatus for generating X-ray |
| 08/30/2006 | CN1272843C Method and system for phase/amplitude error detection of alternate phase shifting mask in photolithography |
| 08/30/2006 | CN1272840C Marked location detector |
| 08/30/2006 | CN1272831C Fine pattern forming method |
| 08/30/2006 | CN1272672C Method of removing conformation layer from lower layer via counterflow |
| 08/30/2006 | CN1272671C Three-dimensional microstructure processing method based on thick rubber photoetching |
| 08/30/2006 | CN1272670C Method for determining optical constant of reflection-prevention film and method for forming photoresist pattern |
| 08/30/2006 | CN1272669C Resin composition, method for forming insulating film, active matrix plate and panel display, and method for producing panel display device |
| 08/30/2006 | CN1272668C Photoresist compositions with polymers having pendant groups containing plural acid labile moieties |
| 08/30/2006 | CN1272365C Process for preparing water base developing photosensitive polyimide material |
| 08/30/2006 | CN1272186C Original plate of plane printing plate |
| 08/29/2006 | US7100145 Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs |
| 08/29/2006 | US7099733 Semiconductor production system |
| 08/29/2006 | US7099365 Oscillation method and device of fluorine molecular laser |
| 08/29/2006 | US7099259 Exposure apparatus, exposure method, recording and/or reproducing apparatus, and recording and/or reproducing method |
| 08/29/2006 | US7099087 Catadioptric projection objective |
| 08/29/2006 | US7099057 In-line holographic mask for micromachining |
| 08/29/2006 | US7099014 Apparatus and method for joint measurement of fields of scattered/reflected or transmitted orthogonally polarized beams by an object in interferometry |
| 08/29/2006 | US7099011 Method and apparatus for self-referenced projection lens distortion mapping |
| 08/29/2006 | US7099010 Due to the symmetry of the structure, the overlay accuracy in the first direction may be determined on the basis of the same reference data as used for the second, so that establishing libraries is simplified. |
| 08/29/2006 | US7098996 Optical error minimization in a semiconductor manufacturing apparatus |
| 08/29/2006 | US7098995 Apparatus and system for improving phase shift mask imaging performance and associated methods |
| 08/29/2006 | US7098994 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 08/29/2006 | US7098993 Exposure device for exposing a photosensitive material in accordance with image data |
| 08/29/2006 | US7098992 Light source unit and wavelength stabilizing control method, exposure apparatus and exposure method, method of making exposure apparatus, and device manufacturing method and device |
| 08/29/2006 | US7098991 Exposure method, exposure apparatus, and method for manufacturing device |
| 08/29/2006 | US7098990 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 08/29/2006 | US7098572 Apparatus to control displacement of a body spaced-apart from a surface |
| 08/29/2006 | US7098468 Raster frame beam system for electron beam lithography |
| 08/29/2006 | US7098467 Measuring method and apparatus, exposure method and apparatus, and device manufacturing method |
| 08/29/2006 | US7098464 Electron beam writing equipment and electron beam writing method |
| 08/29/2006 | US7098121 Method of forming a film of predetermined pattern on a surface as well as device manufactured by employing the same, and method of manufacturing device |
| 08/29/2006 | US7098046 Alignment method and exposure apparatus using the method |
| 08/29/2006 | US7097974 Parallel synthesis of oligomeric building blocks; detaching from the support and bringing them in contact to synthesize DNA; directly converting genetic information into nucleic acids without using nucleic acid fragments already present |
| 08/29/2006 | US7097960 Dissolving gaseous molecule having oxidizing properties or reducing properties in an aqueous alkaline solution; semiconductor manufacturing; reducing solution is an aqueous solution containing at least one of hydrogen, hydrogen sulfide, nitric acid, and sulfurous acid |
| 08/29/2006 | US7097958 Mixture of epoxy and phenolic resins, latent curing agents and photosensitive acid generator |
| 08/29/2006 | US7097956 Imageable element containing silicate-coated polymer particle |
| 08/29/2006 | US7097955 Multicolor image forming material and multicolor image forming method using the same |
| 08/29/2006 | US7097946 For use insemiconductor manufacturing; lithography |
| 08/29/2006 | US7097923 Method for forming thin film heads using a tri-layer anti-reflection coating for photolithographic applications and a structure thereof |
| 08/29/2006 | US7097779 Processing system and method for chemically treating a TERA layer |
| 08/29/2006 | US7097298 Ink receptor sheet and it's process of use |
| 08/29/2006 | CA2365948C Creating a mask for producing a printing plate |
| 08/24/2006 | WO2006088561A2 Method for treating a substrate with a high pressure fluid using a peroxide-based process chemistry |
| 08/24/2006 | WO2006088224A1 Radiation-sensitive resin composition and color filter |
| 08/24/2006 | WO2006087978A1 Projection optical system, exposure equipment and device manufacturing method |
| 08/24/2006 | WO2006087966A1 Method of removing organic coating and photolithographic process |
| 08/24/2006 | WO2006087955A1 Temperature setting method for heat treating plate, temperature setting device for heat treating plate, program and computer-readable recording medium recording program |
| 08/24/2006 | WO2006087938A1 Temperature setting method for heat treating plate, temperature setting device for heat treating plate, program and computer-readable recording medium recording program |
| 08/24/2006 | WO2006087865A1 Positive resist composition and method of forming resist pattern |
| 08/24/2006 | WO2006086841A1 Photolithographic patterning of polymeric materials |