| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/06/2006 | CN1828411A 感光性树脂组合物 The photosensitive resin composition |
| 09/06/2006 | CN1828409A Lithography mask and methods for producing a lithography mask |
| 09/06/2006 | CN1828393A Method of fabricating alignment film of liquid crystal display and etching apparatus used therein |
| 09/06/2006 | CN1827659A Polymer for forming anti-reflective coating layer |
| 09/06/2006 | CN1827234A Jetting method of liquid, jetting apparatus of liquid, production method of substrate for electro-optical apparatus and production method of electro-optical apparatus |
| 09/06/2006 | CN1273873C Multi-tone photomask and method for manufacturing the same |
| 09/06/2006 | CN1273872C Hydrazine-free etching liquid |
| 09/06/2006 | CN1273871C Photoetching device and method for manufacturing photoetching device |
| 09/06/2006 | CN1273870C Composition for forming antireflection film for lithography |
| 09/06/2006 | CN1273869C Radiation-sensitive refraction-changeable composition and its optical article |
| 09/06/2006 | CN1273868C Liquid resin composition and method for producing cured article or tridimensional formed article |
| 09/06/2006 | CN1273867C Photosensitive resin composition and applications thereof |
| 09/06/2006 | CN1273866C Ethcing technique of anisotropic nitride by inlay etch method |
| 09/06/2006 | CN1273865C Pattern forming method |
| 09/06/2006 | CN1273858C Manufacturing method for liquid-crystal display |
| 09/06/2006 | CN1273291C Lithographic parts and imaging method for lithographic parts |
| 09/05/2006 | US7103497 Position detecting device and position detecting method |
| 09/05/2006 | US7102828 Optical element and manufacturing method thereof |
| 09/05/2006 | US7102749 Overlay alignment mark design |
| 09/05/2006 | US7102748 Lithographic apparatus, device manufacturing method, and computer program |
| 09/05/2006 | US7102735 Substrate holding device, semiconductor manufacturing apparatus and device manufacturing method |
| 09/05/2006 | US7102734 Exposure apparatus |
| 09/05/2006 | US7102732 Method of manufacturing a device by employing a lithographic apparatus including a sliding electron-optical element |
| 09/05/2006 | US7102731 Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method and exposure apparatus, program, and device manufacturing method |
| 09/05/2006 | US7102730 Exposure device |
| 09/05/2006 | US7102729 Lithographic apparatus, measurement system, and device manufacturing method |
| 09/05/2006 | US7102728 Imaging optical system evaluation method, imaging optical system adjustment method, exposure apparatus and exposure method |
| 09/05/2006 | US7102727 Optical system for use in exposure apparatus and device manufacturing method using the same |
| 09/05/2006 | US7102243 Mask-making member and its production method, mask and its making method, exposure process, and fabrication method of semiconductor device |
| 09/05/2006 | US7102147 Charged particle beam exposure method and method for producing charged particle beam exposure data |
| 09/05/2006 | US7102127 Mechanized retractable pellicles and methods of use |
| 09/05/2006 | US7101957 Crosslinked compositions comprising a poly(arylene ether) and a nonlinear optical chromophore, and devices incorporating same |
| 09/05/2006 | US7101918 Bis{4-[4-(diphenylsulfonio)phenylthio]phenyl}iodonium tris(hexafluorophosphate), iodonium salt and a sulfonium salt in the molecule; cationic type photopolymerization initiator, an acid generator for a chemically amplified resist |
| 09/05/2006 | US7101657 Image-forming method and developer |
| 09/05/2006 | US7101654 Ring opening metathesis of substituted norbornene copolymers; photoresists, photolithography |
| 09/05/2006 | US7101653 Photochemical crosslinking; flexible, dimensional stability |
| 09/05/2006 | US7101652 Polybenzoxazole precursor polymer; polyamides from 2,2-bis(3-amino-4-hydroxyphenyl)-hexafluoropropane, dicarboxylic aromatic compounds, dicarboxyphenylethers, and bishydroxy, aminophenyl compounds with N2 substituted cyclic sulfonates; insulating layers, relief structures of heat-resistant polymers |
| 09/05/2006 | US7101651 containing long-chain alkoxyl groups; improved resolution and focus latitude; minimized line width variation or shape degradation and debris left after coating, development and peeling; improved pattern profile; suited for microfabrication. |
| 09/05/2006 | US7101650 Photosensitive resin composition for photoresist |
| 09/05/2006 | US7101649 Heat-sensitive lithographic printing plate |
| 09/05/2006 | US7101646 Developing method and apparatus |
| 09/05/2006 | US7101588 Apparatus and method for applying liquid material to form a resin layer |
| 09/05/2006 | US7101517 Processing solution preparation and supply method and apparatus |
| 09/05/2006 | US7101416 Gas flow through body of decontaminant comprising electropositive metal component; high silica zeolite; and transition metal compound; durability, service life |
| 09/05/2006 | CA2321394C Infrared laser-imageable lithographic printing members and methods of preparing and imaging such printing members |
| 08/31/2006 | WO2006091802A2 Norbornene-type polymers, compositions thereof and lithographic processes using such compositions |
| 08/31/2006 | WO2006091523A2 Norbornene-type polymers, compositions thereof and lithographic processes using such compositions |
| 08/31/2006 | WO2006091375A1 Anhydrous, liquid phase process for preparing hydroxyl containing polymers of enhanced purity |
| 08/31/2006 | WO2006090807A1 Exposure method and apparatus, and electronic device manufacturing method |
| 08/31/2006 | WO2006090737A1 Image data storing method, controller, and program, frame data creating method, device, and program, data acquiring method and device, and drawing method and device |
| 08/31/2006 | WO2006090712A1 Material of lithographic printing plate and method of printing |
| 08/31/2006 | WO2006090667A1 Positive resist composition, method for forming resist pattern and compound |
| 08/31/2006 | WO2006090623A1 Photosensitive lithographic printing plate material |
| 08/31/2006 | WO2006090591A1 Positive-working resist composition, method for resist pattern formation and compound |
| 08/31/2006 | WO2006090590A1 Photosensitive resin composition for forming light shielding layer, light shielding layer and color filter |
| 08/31/2006 | WO2006090580A1 Method and mechanism for positioning and holding sheet body and drawing device using the method and the mechanism |
| 08/31/2006 | WO2006090575A1 Exposing method and aligner |
| 08/31/2006 | WO2006090570A1 Lithographic printing plate material and printing method |
| 08/31/2006 | WO2006090559A1 Resist composition |
| 08/31/2006 | WO2006089919A1 Optical system, in particular objective or illumination system for a microlithographic projection exposure apparatus |
| 08/31/2006 | WO2006089724A1 Spatially resolving radiation detector and fabricating and operating methods |
| 08/31/2006 | WO2006089630A1 Method for mask inspection for mask design and mask production |
| 08/31/2006 | WO2006059275A3 Method and apparatus for operating an electrical discharge device |
| 08/31/2006 | WO2006027246A3 Healing algorithm |
| 08/31/2006 | WO2005043246A3 Patterned ceramic films and method for producing the same |
| 08/31/2006 | WO2004102621A3 Supercritical fluid-based cleaning compositions and methods |
| 08/31/2006 | US20060194923 Curable composition |
| 08/31/2006 | US20060194258 Polypeptide array synthesis |
| 08/31/2006 | US20060194251 Method of fixing low-molecular compound to solid-phase support |
| 08/31/2006 | US20060194156 Method for forming patterned insulating elements and methods for making electron source and image display device |
| 08/31/2006 | US20060194155 Resist pattern forming method and semiconductor device manufacturing method |
| 08/31/2006 | US20060194141 Positive resist composition and method for forming resist pattern using same |
| 08/31/2006 | US20060194140 Taper shape with good depth width of focus; hydroxystyrene-styrene-(meth)acrylate polymer; absorber derivative of benzene, biphenyl, naphthalene, anthracene; fluorinated alkylsulfonate onium salt acid generator and solvent; suppressed transmittance; fine pattern; tapered shape |
| 08/31/2006 | US20060194139 Heat-sensitive lithographic printing plate |
| 08/31/2006 | US20060194128 Dye-containing curable composition, color filter prepared using the same, and process of preparing color filter |
| 08/31/2006 | US20060194127 Method and apparatus for producing color filter with a line-scan exposure technology by high-speed shutter control |
| 08/31/2006 | US20060193986 Heat processing apparatus and heat processing method |
| 08/31/2006 | US20060193630 Monitoring apparatus and method particularly useful in photolithographically |
| 08/31/2006 | US20060193432 Method for adjusting gap between two objects and exposure method using the same, gap adjusting apparatus, and exposure apparatus |
| 08/31/2006 | US20060193052 Blazed diffractive optical element and projection objective for a microlithographic projection exposure apparatus |
| 08/31/2006 | US20060192934 Exposure apparatus and device fabrication method |
| 08/31/2006 | US20060192504 Apparatus for generating focused electromagnetic radiation |
| 08/31/2006 | US20060192283 Semiconductor wafer assemblies |
| 08/31/2006 | US20060192238 Intermediate semiconductor device structure including multiple photoresist layers |
| 08/31/2006 | US20060192158 Device, EUV lithographic device and method for preventing and cleaning contamination on optical elements |
| 08/31/2006 | US20060192156 Light source apparatus and exposure apparatus having the same |
| 08/31/2006 | US20060192147 Multilayer mirror, method for manufacturing the same, and exposure equipment |
| 08/31/2006 | US20060191475 Apparatus for spin coating semiconductor substrates |
| 08/31/2006 | DE102006008706A1 Analyzing system for blazed phase grating sample image has processor that converts image data to intensity values by pixel and determines best focus by azimuth such that parameters can be calculated from a blazed phase grating sample |
| 08/31/2006 | DE102006003021A1 Printing form imaging device for use in press, has optical correction unit changing a course of light beam emitted by laser diodes so that courses of beam from diodes follow courses of two beams from adjacent virtual diodes |
| 08/31/2006 | DE102006002971A1 Printing form blank producing method, involves deriving indexing feed of array of laser diodes from number of image dots and number of laser diodes per rotation of printing form blank |
| 08/31/2006 | DE102005033408A1 Rinse method for use in the interior of the projection objective casing of a microlithography unit in which sensors are provided in the rinse gas circuit for the detection of harmful impurities in the rinse gas |
| 08/31/2006 | DE102004052267B3 Verfahren zum Ausbilden einer Lithografiemaske A method of forming a lithographic mask |
| 08/31/2006 | DE10056845B4 Verfahren zur Entwicklung von lichtempfindlichen Materialien A process for developing light-sensitive materials |
| 08/30/2006 | EP1696476A2 Method of surface processing substrate, method of cleaning substrate, and programs for implementing the methods |
| 08/30/2006 | EP1696471A1 Pattern-forming process utilizing nanoimprint and apparatus for performing such process |
| 08/30/2006 | EP1696275A2 Method for replenishing development replenisher in automatic developing machine for photosensitive lithographic printing plate precursor and automatic photosensitive lithographic printing plate precursor developing machine |
| 08/30/2006 | EP1696274A2 Method for controlling development in automatic developing machine for photosensitive lithographic printing plate precursor and automatic developing machine therefor |
| 08/30/2006 | EP1696273A2 Method and apparatus for optimising illumination for full-chip layer |
| 08/30/2006 | EP1696272A2 A sensor for use in a lithographic apparatus |