| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/12/2006 | US7105268 One monomer unit represented by following Formula (I): wherein R1, R2, R3, R4 and R5 are the same or different and are each a hydrogen atom or a methyl group; m, p and q each denote an integer of from 0 to 2; and n denotes 0 or 1, where the |
| 09/12/2006 | US7105267 Resist compositions and patterning process |
| 09/12/2006 | US7105266 Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same |
| 09/12/2006 | US7105265 Method for removing resist pattern |
| 09/12/2006 | US7105264 Method for forming patterned conductive film, electrooptical device, and electronic appliance |
| 09/12/2006 | US7105256 Silver powder, an organic binder, a photopolymerizable monomer,a photopolymerization initiator and a lead-free glass; |
| 09/12/2006 | US7104535 Methods and apparatus for positioning a substrate relative to a support stage |
| 09/12/2006 | CA2228530C Photopolymerizable composition for the production of flexographic printing forms for corrugated board printing |
| 09/08/2006 | WO2006093770A1 Method to remove resist, etch residue, and copper oxide from substrates having copper and low-k dielectric material |
| 09/08/2006 | WO2006093355A1 Carboxyl group-containing polyurethane and thermosetting resin composition using the same |
| 09/08/2006 | WO2006093340A1 Exposure apparatus |
| 09/08/2006 | WO2006093245A1 Resin compositon for recording material |
| 09/08/2006 | WO2006093057A1 Composition for underlayer film of resist and process for producing the same |
| 09/08/2006 | WO2006093040A1 Pattern forming material, pattern forming apparatus and pattern forming method |
| 09/08/2006 | WO2006093018A1 Two-light flux interference exposure device, two-light flux interference exposure method, semiconductor light emitting element manufacturing method, and semiconductor light emitting element |
| 09/08/2006 | WO2006029824A3 Monitoring element for lithographic projection systems |
| 09/08/2006 | WO2005086223A3 Multi-layer overlay measurement and correction technique for ic manufacturing |
| 09/08/2006 | WO2004114024A3 Exposure method and exposure apparatus |
| 09/07/2006 | US20060199920 Photosensitive resin composition capable of being developed with aqueous developer and photosensitive dry film resist, and use thereof |
| 09/07/2006 | US20060199915 Modified cycloolefin copolymer, process for producing the same, and use of the polymer |
| 09/07/2006 | US20060199397 Fabrication of semiconductor devices using anti-reflective coatings |
| 09/07/2006 | US20060199393 H20 plasma and h20 vapor methods for releasing charges |
| 09/07/2006 | US20060199112 Method for forming photoresist pattern and method for manufacturing semiconductor device |
| 09/07/2006 | US20060199111 Method for manufacturing semiconductor devices using a photo acid generator |
| 09/07/2006 | US20060199110 Method of making an address plate |
| 09/07/2006 | US20060199104 Resist material and nanofabrication method |
| 09/07/2006 | US20060199103 Process for producing an image using a first minimum bottom antireflective coating composition |
| 09/07/2006 | US20060199096 Process for thick film circuit patterning |
| 09/07/2006 | US20060199091 Printing a mask with maximum possible process window through adjustment of the source distribution |
| 09/07/2006 | US20060199087 Method of making an integrated circuit by modifying a design layout by accounting for a parameter that varies based on a location within an exposure field |
| 09/07/2006 | US20060199039 Inorganic nanocrystals surface-coordinated with a compound containing a photosensitive carbon to carbon double bond functional group is used for photolithographic process to form a pattern; curable with a curing agents; photomasking; simple method; organic-inorganic hybrid electroluminescent devices |
| 09/07/2006 | US20060197935 Processing unit, exposure apparatus having the processing unit, and protection unit |
| 09/07/2006 | US20060197934 Exposure method and apparatus |
| 09/07/2006 | US20060197931 Printer and a method for recording a multi-level image |
| 09/07/2006 | DE4414808B4 Verwendung einer Antireflexbeschichtungszusammensetzung und Herstellungsverfahren für eine Antireflexschicht und ein Halbleiterbauelement Use of an anti-reflective coating composition and manufacturing method for an anti-reflection layer and a semiconductor device |
| 09/07/2006 | DE10204985B4 Verfahren und Vorrichtung zum Herstellen eines dreidimensionalen Objektes Method and apparatus for producing a three-dimensional object |
| 09/07/2006 | DE102006008710A1 Lauf-zu-Lauf-Steuerung für Linsenaberrationen Run-to-run control for lens aberrations |
| 09/07/2006 | DE102005009071A1 Verfahren zur Prozesssteuerung Method for Process Control |
| 09/07/2006 | DE102005009018A1 Testing a photolithographic imaging mechanism relating to generation of scattered light used in manufacture of microelectronic circuits, involves using measuring and neighboring structures formed on photomask to evaluate scattered light |
| 09/07/2006 | DE102004041610B4 Verfahren zur Herstellung einer Lithographie-Druckplatte A method for preparing a lithographic printing plate |
| 09/07/2006 | DE102004008241B4 Enzymgestützte Nanolithografie Enzyme-assisted nanolithography |
| 09/06/2006 | EP1699073A1 Stage system, exposure apparatus and exposure method |
| 09/06/2006 | EP1699072A1 Exposure apparatus, exposure method, device producing method, and optical component |
| 09/06/2006 | EP1698942A1 Water-developable photopolymer plate for letterpress printing |
| 09/06/2006 | EP1698941A2 Optical apparatus and method of manufacturing a device |
| 09/06/2006 | EP1698940A2 Exposure method and apparatus |
| 09/06/2006 | EP1698939A2 Exposure apparatus and method, measuring apparatus, and device manufacturing method |
| 09/06/2006 | EP1698938A2 Atmosphere conditioning method, exposure apparatus, and device manufacturing method |
| 09/06/2006 | EP1698937A2 Positive resist composition and pattern-forming method using the same |
| 09/06/2006 | EP1698936A2 Negative-type photosensitive resin compositions |
| 09/06/2006 | EP1698935A2 Negative-type photosensitive resin composition |
| 09/06/2006 | EP1698934A1 Lithographic printing plate precursor |
| 09/06/2006 | EP1698651A1 Polyamide acid resin having unsaturated group, photosensitive resin composition using same, and cured product thereof |
| 09/06/2006 | EP1698645A1 Hyperbranched polymer, process for producing the same and resist composition containing the hyperbranched polymer |
| 09/06/2006 | EP1698481A1 Lithographic printing original plate and lithographic printing plate |
| 09/06/2006 | EP1698462A1 System and method to prevent movement of a prinitng plate during clamping |
| 09/06/2006 | EP1698218A1 Metal pattern forming method, metal pattern obtained by the same, printed wiring board, conductive film forming method, and conductive film obtained by the same |
| 09/06/2006 | EP1697974A1 Exposure apparatus and device manufacturing method |
| 09/06/2006 | EP1697936A1 Novel optical storage materials based on narrowband optical properties |
| 09/06/2006 | EP1697800A2 Method for joining at least two members |
| 09/06/2006 | EP1697799A2 Lithographic apparatus and device manufacturing method |
| 09/06/2006 | EP1697798A2 Projection objective having a high aperture and a planar end surface |
| 09/06/2006 | EP1697797A2 Polarization optically effective delay system for a microlithographic projection illumination device |
| 09/06/2006 | EP1697771A2 A process for the fabrication of optical microstructures |
| 09/06/2006 | EP1697682A2 Irradiation systems |
| 09/06/2006 | EP1697681A2 Irradiation apparatuses |
| 09/06/2006 | EP1421447A4 Imageable composition containing infrared absorber with counter anion derived from a non-volatile acid |
| 09/06/2006 | EP1330679A4 Photolithography methods and systems |
| 09/06/2006 | EP1311563A4 Photosensitive resin compositions for color filter applications |
| 09/06/2006 | EP1200878B1 Multi-mirror system for an illumination system |
| 09/06/2006 | EP1000425B1 Method for nano-structuring amorphous carbon layers |
| 09/06/2006 | EP0984053B1 Photochromic polymerizable composition |
| 09/06/2006 | CN1830064A Exposure apparatus, method for producing device, and method for controlling exposure apparatus |
| 09/06/2006 | CN1830052A Master mold for duplicating fine structure and production method thereof |
| 09/06/2006 | CN1830039A Method and system for drying a substrate |
| 09/06/2006 | CN1829948A Lorentz motor control system for a payload |
| 09/06/2006 | CN1829945A Modulator circuitry |
| 09/06/2006 | CN1829762A Silicon-containing polymer, process for rpoducing the same, heat-resistant resin composition, and heat-resistant film |
| 09/06/2006 | CN1828857A Method for detecting optical mask fault |
| 09/06/2006 | CN1828731A Magnetic recording medium, recording/reproducing apparatus, and stamper |
| 09/06/2006 | CN1828431A Automatic position aligning device and method for projection exposure device |
| 09/06/2006 | CN1828430A Photoresist diluent production method |
| 09/06/2006 | CN1828429A Developer solution constituent |
| 09/06/2006 | CN1828428A Method for manufacturing semiconductor element |
| 09/06/2006 | CN1828427A Step scan photo-etching machine double-platform exchanging and positioning system |
| 09/06/2006 | CN1828426A Method for constructing micrometre, submicrometre structural surface |
| 09/06/2006 | CN1828425A Pattern formation method |
| 09/06/2006 | CN1828424A Method for manufacturing semiconductor devices using a photo acid generator |
| 09/06/2006 | CN1828423A Exposure mask plate fixing method |
| 09/06/2006 | CN1828422A Minute pattern photoetching method |
| 09/06/2006 | CN1828421A Photolithograpic craft product identification method |
| 09/06/2006 | CN1828420A Coating compositions for use with an overcoated photoresist |
| 09/06/2006 | CN1828419A 抗反射膜和曝光方法 Anti-reflection film and exposure method |
| 09/06/2006 | CN1828418A 193nm photoresist containing silicon coupling agent and its filming resin |
| 09/06/2006 | CN1828417A Toning promoter for preparing diazo positive image bromide paper |
| 09/06/2006 | CN1828416A Photosensitive resin composition |
| 09/06/2006 | CN1828415A Polymer for forming anti-reflective coating layer |
| 09/06/2006 | CN1828414A Polymer for forming anti-reflective coating layer |
| 09/06/2006 | CN1828413A Light sensitive paste, roast pattern formed by using same |
| 09/06/2006 | CN1828412A Corrosion resistant composition and method for forming pattern on substrate |