| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/13/2006 | EP1701202A1 Method of producing micro-lens-carrying display panel and display unit and exposure system |
| 09/13/2006 | EP1701194A1 Projection optical system and exposure apparatus with the same |
| 09/13/2006 | EP1701179A1 Method for producing optical elements for microlithography, lens systems obtainable therewith and their use |
| 09/13/2006 | EP1700710A1 Printing method, sheet material and mounting method of printing plate |
| 09/13/2006 | EP1700680A1 Easy release fluoropolymer molds for micro- and nano-pattern replication |
| 09/13/2006 | EP1700341A1 Wafer with optical control modules in ic fields |
| 09/13/2006 | EP1700340A1 Wafer with optical control modules in dicing paths |
| 09/13/2006 | EP1700168A2 Lithographic projection device, method and substrate for manufacturing electronic devices, and obtained electronic device |
| 09/13/2006 | EP1700167A1 Replacement apparatus for an optical element |
| 09/13/2006 | EP1700166A1 Method of forming a depression in a surface of a layer of photoresist |
| 09/13/2006 | EP1700165A2 Lithographic apparatus and method of calibration |
| 09/13/2006 | EP1700164A2 Removable pellicle for immersion lithography |
| 09/13/2006 | EP1700163A1 Objective as a microlithography projection objective with at least one liquid lens |
| 09/13/2006 | EP1700162A2 Wafer with optical control modules in exposure fields |
| 09/13/2006 | EP1700161A2 Methods and devices for fabricating three-dimensional nanoscale structures |
| 09/13/2006 | EP1700160A2 Lithography system using a programmable electro-wetting mask |
| 09/13/2006 | EP1699946A2 Method of improving post-develop photoresist profile on a deposited dielectric film |
| 09/13/2006 | EP1597631A4 Multiple exposure method for circuit performance improvement |
| 09/13/2006 | EP1545878B1 Thermally sensitive multilayer imageable element |
| 09/13/2006 | EP1485758A4 A method for fabricating a structure for a microelectromechanical systems (mems) device |
| 09/13/2006 | EP1483628A4 Full phase shifting mask in damascene process |
| 09/13/2006 | EP1480968B1 Thioxanthone derivatives, and their use as cationic photoinitiators |
| 09/13/2006 | EP1448654B1 Radiation curable resin composition for making colored three dimensional objects |
| 09/13/2006 | EP1324883B1 Direct laser imaging system |
| 09/13/2006 | EP1208399A4 Simultaneously achieving circular symmetry and diminishing effects of optical defects and deviations during real time use of optical devices |
| 09/13/2006 | CN1833309A Exposure method and exposure apparatus, stage unit, and device manufacturing method |
| 09/13/2006 | CN1833205A Measuring the effect of flare on line width |
| 09/13/2006 | CN1833204A Photosensitive resin composition, and electronic component and display using same |
| 09/13/2006 | CN1832982A Photosensitive silsesquioxane resin |
| 09/13/2006 | CN1832973A Fluorocopolymer, process for producing the same, and resist composition containing the same |
| 09/13/2006 | CN1832971A Resin for resist, positive resist composition, and method of forming resist pattern |
| 09/13/2006 | CN1832912A Clear photopolymerizable systems for the preparation of high thickness coatings |
| 09/13/2006 | CN1832109A Manufacturing method of mask and manufacturing method of pattern |
| 09/13/2006 | CN1831654A Composition for photoresist stripping solution and process of photoresist stripping |
| 09/13/2006 | CN1831653A Method for correcting plane defect optical projector |
| 09/13/2006 | CN1831652A Projection exposure apparatus |
| 09/13/2006 | CN1831651A Method for providing layout design and photomask |
| 09/13/2006 | CN1831650A Immersion medium for immersion photoetching technology |
| 09/13/2006 | CN1831649A Coating and developing apparatus and coating and developing method |
| 09/13/2006 | CN1831648A 正型感光性树脂组合物 The positive photosensitive resin composition |
| 09/13/2006 | CN1831647A Black matrix composition for plasma display panel and plasma display panel |
| 09/13/2006 | CN1831646A Light-shielding image-carrying substrate, method of forming light-shielding image, transfer material, color filter, and display device |
| 09/13/2006 | CN1831645A Apparatus for forming fine pattern on substrate |
| 09/13/2006 | CN1831644A Micronano transfer device |
| 09/13/2006 | CN1831618A Manufacturing method for common electrode of liquid crystal display device |
| 09/13/2006 | CN1831609A Color light fictering substrate and manufacturing method thereof |
| 09/13/2006 | CN1831601A Manufacturing method of liquid crystal display |
| 09/13/2006 | CN1831588A Apparatus using for manufacturing panel display |
| 09/13/2006 | CN1831579A Manufacturing method of making comb-teeth electrode pair |
| 09/13/2006 | CN1830678A Antifalse seal and its manufacturing method |
| 09/13/2006 | CN1275198C Graphic identification method and system for process endpoint curve |
| 09/13/2006 | CN1275171C Device manufacturing method, mask set for use in the method, data set for controlling a programmable patterning device, method of generating a mask pattern and a computer program |
| 09/13/2006 | CN1275100C Photoresist stripping liquid composition and stripping method for photoresist using photoresist stripping liquid composition |
| 09/13/2006 | CN1275099C Method and device for recovering gas used in offset tool |
| 09/13/2006 | CN1275098C Deposited mask of display device and its manufacturing method |
| 09/13/2006 | CN1275097C Projection exposure equipment |
| 09/13/2006 | CN1275096C Slushing compound pattern shaping method and system |
| 09/13/2006 | CN1275095C Novel process for preparing resists |
| 09/13/2006 | CN1275094C Positive-type photosensitive polyimide precursor composition |
| 09/13/2006 | CN1275093C Thermosensitive compoistion and offset printing board |
| 09/13/2006 | CN1275092C Method for making patterns of phase shift transformation light shield used in semiconductor chips manufacturing and structure thereof |
| 09/13/2006 | CN1275091C Photolithographic critical dimension control using reticle measurements |
| 09/13/2006 | CN1275075C Thin film transistor array substrate and manufacturing method thereof |
| 09/13/2006 | CN1275073C Memory capacitor for thin film transistor LCD and process for making same |
| 09/13/2006 | CN1274494C Method for mfg. of screen plate and screen plate |
| 09/13/2006 | CN1274395C Method of producing a sheet comprising through pores and the application thereof in the production of micronic and submicronic filters |
| 09/12/2006 | US7107573 Method for setting mask pattern and illumination condition |
| 09/12/2006 | US7107571 Visual analysis and verification system using advanced tools |
| 09/12/2006 | US7107477 Programmable logic devices with skewed clocking signals |
| 09/12/2006 | US7106964 Light amount adjustment method for use in image exposure apparatus |
| 09/12/2006 | US7106493 MEMS-based valve device |
| 09/12/2006 | US7106490 Methods and systems for improved boundary contrast |
| 09/12/2006 | US7106459 CD metrology analysis using a finite difference method |
| 09/12/2006 | US7106419 Exposure method and apparatus |
| 09/12/2006 | US7106418 Scanning exposure method and an apparatus thereof |
| 09/12/2006 | US7106416 Lithographic apparatus and device manufacturing method |
| 09/12/2006 | US7106415 Illumination compensator for curved surface lithography |
| 09/12/2006 | US7106414 Exposure system and method for manufacturing device |
| 09/12/2006 | US7106413 Cooling mechanism |
| 09/12/2006 | US7106412 Lithographic apparatus comprising a gas flushing system |
| 09/12/2006 | US7105955 Lithographic apparatus, coil assembly, positioning device including a coil assembly, and device manufacturing method |
| 09/12/2006 | US7105873 Semiconductor device and method for patterning |
| 09/12/2006 | US7105842 Method of charged particle beam lithography and equipment for charged particle beam lithography |
| 09/12/2006 | US7105841 Photolithographic techniques for producing angled lines |
| 09/12/2006 | US7105837 Lithographic apparatus, device manufacturing method and radiation system |
| 09/12/2006 | US7105836 Method and apparatus for cooling a reticle during lithographic exposure |
| 09/12/2006 | US7105618 For producing polymer having transparency and low refractive index in a wide wavelength region from vacuum ultraviolet region to optical communication wavelength region, adhesion to the substrate, film forming property, etching resistance |
| 09/12/2006 | US7105442 Ashable layers for reducing critical dimensions of integrated circuit features |
| 09/12/2006 | US7105281 Forming a resin mold, interposing a photosensitive polymer forming layers, exposing the layered structure with an electron beam, ultraviolet radiation or visible radiaton, removing an exposed photosensitive polymer, and filling the vacant portion with a metal |
| 09/12/2006 | US7105279 Method for fabricating a patterned layer on a semiconductor substrate |
| 09/12/2006 | US7105278 Exposing a photosensitive surface to light through a mask with a transmissivity to light and a plurality of features in a dense nonuniform repetitive pattern for forming structures in a semiconductor pattern; symmetry is broken without altering the semiconductor features that are formed |
| 09/12/2006 | US7105277 patterning and filling through holes in a two-sided, multilayered or the like printed board with a paste; filled by squeegeeing |
| 09/12/2006 | US7105276 Acrylic polymer insoluble in water, a photothermal conversion agent and a compound forming radicals by heat mode exposure with light that is capable of being absorbed by the photothermal conversion agent, and an onium salt compound forming radicals by heat mode exposure with light |
| 09/12/2006 | US7105275 Positive resist composition and method of forming pattern using the same |
| 09/12/2006 | US7105274 Photoluminescent ethylene sensors |
| 09/12/2006 | US7105273 Positive resist composition |
| 09/12/2006 | US7105272 Polymer from a hydroxy substituted carboxylic acid and acid or acid generator in response to an external stimulus; photoresist for a semiconductor element; high sensitivity, high resolution |
| 09/12/2006 | US7105271 For forming fine patterns having a high aspect ratio |
| 09/12/2006 | US7105270 Fluoroaliphatic group-containing copolymer |
| 09/12/2006 | US7105269 For use as chemically-amplified resist useful for microfabrication utilizing integrated circuit devices; photolithography |