| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/19/2006 | US7110085 Lithographic apparatus, substrate holder and method of manufacturing |
| 09/19/2006 | US7110084 Illumination optical system and exposure apparatus |
| 09/19/2006 | US7110083 Lithographic apparatus and device manufacturing method |
| 09/19/2006 | US7110082 Optical system for maskless lithography |
| 09/19/2006 | US7110081 Lithographic apparatus and device manufacturing method |
| 09/19/2006 | US7109501 Charged particle beam lithography system, pattern drawing method, and method of manufacturing semiconductor device |
| 09/19/2006 | US7109500 Mask pattern correction method, semiconductor device manufacturing method, mask manufacturing method and mask |
| 09/19/2006 | US7109498 Radiation source, lithographic apparatus, and device manufacturing method |
| 09/19/2006 | US7109497 Illumination system particularly for microlithography |
| 09/19/2006 | US7109494 Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus using deflector |
| 09/19/2006 | US7109383 Photoresist film |
| 09/19/2006 | US7109311 Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process |
| 09/19/2006 | US7109250 contain less volatile decomposition products and by products than known acyl- and bis-acylphosphine oxides; photoinitiators |
| 09/19/2006 | US7109037 Water-based resist stripping liquid management apparatus and water-based resist stripping liquid management method |
| 09/19/2006 | US7108960 detector to detection intensity of luminescence radiation from reflector |
| 09/19/2006 | US7108959 Printing plate material in roll form of the on-press development type |
| 09/19/2006 | US7108958 Photosensitive bottom anti-reflective coatings |
| 09/19/2006 | US7108957 Organic anti-reflective coating composition and method for forming photoresist patterns using the same |
| 09/19/2006 | US7108956 Thermosensitive lithographic printing plate |
| 09/19/2006 | US7108955 having fluoro- and/or fluoroalkyl- substituted aromatic or alicyclic groups, especially phenyl, naphthyl, cycloalkyl, norbornyl, or adamantanyl groups; photocuring with photoacid generator; high transparency; dry etching resistance |
| 09/19/2006 | US7108954 Non-decomposable compound with a > refractive index than a decomposable compound, a radiation sensitive decomposer and a stabilizer |
| 09/19/2006 | US7108953 Dissolution inhibitors in photoresist compositions for microlithography |
| 09/19/2006 | US7108952 Photopolymerizable composition |
| 09/19/2006 | US7108951 Photosensitive resin composition |
| 09/19/2006 | US7108949 A base layer, light to heat conversion layer, a conductive, grounded antistatic layer, and a patterned transfer layer; lamination, irradiation, delamination |
| 09/19/2006 | US7108945 Photomask having a focus monitor pattern |
| 09/19/2006 | US7108898 Multicolor image forming material and method of multicolor image formation |
| 09/19/2006 | US7107905 Printing plate material and printing process |
| 09/14/2006 | WO2006096528A2 Stabilized photoresist structure for etching process |
| 09/14/2006 | WO2006096476A2 Infrared dye compositions |
| 09/14/2006 | WO2006096437A1 Holographic storage medium, article and method |
| 09/14/2006 | WO2006096232A2 Method of making an integrated circuit by modifying a design layout |
| 09/14/2006 | WO2006096171A1 Optical pulse duration extender |
| 09/14/2006 | WO2006096123A1 Micro and nano structures in an elastomeric material |
| 09/14/2006 | WO2006095892A1 Image processing method, image processor, drawing system, and program |
| 09/14/2006 | WO2006095705A1 Method of forming pattern |
| 09/14/2006 | WO2006095670A1 Base multiplying agents and base-reactive curable compositions |
| 09/14/2006 | WO2006095554A1 Alkali-developable photosensitive resin composition |
| 09/14/2006 | WO2006095540A1 Positive resist composition and method for forming resist pattern |
| 09/14/2006 | WO2006095535A1 Photosensitive planographic printing plate material |
| 09/14/2006 | WO2006095534A1 Material of lithographic printing plate, process for producing material of lithographic printing plate, and method of printing |
| 09/14/2006 | WO2006095533A1 Material of lithographic printing plate and method of printing |
| 09/14/2006 | WO2006095494A1 Photosensitive solder resist composition, photosensitive solder resist film, permanent pattern and method for forming same |
| 09/14/2006 | WO2006095478A1 Photosensitive resin composition and color filters |
| 09/14/2006 | WO2006095472A1 Photosensitive laminated original printing plate for letterpress printing and process for producing letterpress printing plate using the photosensitive laminated original printing plate |
| 09/14/2006 | WO2006094729A2 Microlithography projection system with an accessible diaphragm or aperture stop |
| 09/14/2006 | WO2006064431A3 Porous holographic film |
| 09/14/2006 | WO2006045439A3 A system and a method for generating periodic and/or quasi-periodic pattern on a sample |
| 09/14/2006 | WO2006042514A3 Low-viscosity, radiation-curable formulation for producing adaptive ear pieces |
| 09/14/2006 | WO2006030234A3 Use of methanofullerene derivatives as resist materials and method for forming a resist layer |
| 09/14/2006 | WO2006025760A3 Method for producing an image on a material sensitive to a used radiation, method for obtaining a binary hologram (variants) and methods for producing an image by using said hologram |
| 09/14/2006 | WO2005105662A3 Method for producing two-dimensional periodic structures in a polymeric medium |
| 09/14/2006 | WO2005088393A8 Use of mixed bases to enhance patterned resist profiles on chrome or sensitive substrates |
| 09/14/2006 | WO2005029178A3 A system and method for the direct imaging of color filters |
| 09/14/2006 | US20060206851 Determning lithographic parameters to optimise a process window |
| 09/14/2006 | US20060205622 For selectively removing photoresist residues from a microstructure |
| 09/14/2006 | US20060205236 Intermediate semiconductor device structures using photopatternable, dielectric materials |
| 09/14/2006 | US20060205206 Method of eliminating photoresist poisoning in damascene applications |
| 09/14/2006 | US20060204904 Metal mask and manufacturing method thereof |
| 09/14/2006 | US20060204899 Fine pattern forming method |
| 09/14/2006 | US20060204898 Process for producing sublithographic structures |
| 09/14/2006 | US20060204897 Negative resist composition comprising base polymer having epoxy ring and si-containing crosslinker and patterning method for semiconductor device using the same |
| 09/14/2006 | US20060204895 Photocrosslinkable polyurethanes |
| 09/14/2006 | US20060204893 Novel fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer |
| 09/14/2006 | US20060204892 Dyed photoresists and methods and articles of manufacture comprising same |
| 09/14/2006 | US20060204868 Material deposition method and/or system |
| 09/14/2006 | US20060204867 Material deposition method and/or system for layers including repetitive features |
| 09/14/2006 | US20060204864 Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operation |
| 09/14/2006 | US20060204863 photoresists; liquid crystal display panels |
| 09/14/2006 | US20060204073 Overlay marks, methods of overlay mark design and methods of overlay measurements |
| 09/14/2006 | US20060203341 Polarization-optimized illumination system |
| 09/14/2006 | US20060203223 Stage device for positioning an object, in which a static pressure bearing and a pressurizing magnet suspend a slider |
| 09/14/2006 | US20060203219 Exposure method |
| 09/14/2006 | US20060203216 Balanced positioning system for use in lithographic apparatus |
| 09/14/2006 | US20060203214 Illumination optical apparatus and projection exposure apparatus |
| 09/14/2006 | US20060202568 Aligning apparatus, exposure apparatus, and device manufacturing method |
| 09/14/2006 | US20060202298 Device produced by method for etching a layered substrate |
| 09/14/2006 | US20060201911 Methods of etching photoresist on substrates |
| 09/14/2006 | US20060201540 Photolithographic stepper and/or scanner machines including cleaning devices and methods of cleaning photolithographic stepper and/or scanner machines |
| 09/14/2006 | US20060201535 Photolithographic stepper and/or scanner machines including cleaning devices and methods of cleaning photolithographic stepper and/or scanner machines |
| 09/14/2006 | DE4324325B4 Verfahren zur Herstellung eines Bauelementes, optisches Bauelement, Verwendung desselben und Vakuumbehandlungsanlage zu seiner Herstellung A method for producing a component, an optical component, using the same and vacuum treatment plant for its production |
| 09/14/2006 | DE20122617U1 Projection system with array of rectangular micro-mirror elements for providing images at angles depending on mirror tilt angle in light ray steering system |
| 09/14/2006 | DE20122616U1 Projection system with array of rectangular micro-mirror elements for providing images at angles depending on mirror tilt angle in light ray steering system |
| 09/14/2006 | DE20122614U1 Projection system with array of rectangular micro-mirror elements for providing images at angles depending on mirror tilt angle in light ray steering system |
| 09/14/2006 | DE10334434B4 Verfahren und Gerät zum Reinigen eines Halbleitersubstrats Method and apparatus for cleaning a semiconductor substrate |
| 09/14/2006 | DE102006008707A1 Optimierende Brennpunktebenen-Anpassungsfunktionen für ein Bildfeld auf einem Substrat Optimizing end focal plane fitting functions for an image field on a substrate |
| 09/14/2006 | DE102006008705A1 Optimierung von Brennpunktebenen-Anpassungsfunktionen für ein Bildfeld auf einem Substrat Optimization of focal plane fitting functions for an image field on a substrate |
| 09/14/2006 | DE102005011455A1 Device for regulating the pupil illumination and intensity in microscope e.g. for mask inspection has optical component which is available for injection and extraction of condenser from beam path |
| 09/14/2006 | DE102005010655A1 Method to produce optical parts for microlithography, associated lens systems and its application uses optical garnets, cubic spinels, cubic perovskites, and cubic M (II) - M (Iv) oxides |
| 09/14/2006 | DE102004006262B4 Abbildungseinrichtung und Verfahren zum Entwerfen einer Abbildungseinrichtung Imaging device and method for designing an imaging device |
| 09/13/2006 | EP1701592A1 A method of making an electroluminescent device |
| 09/13/2006 | EP1701218A2 Polymer remover |
| 09/13/2006 | EP1701217A2 Composition for photoresist stripping solution and process of photoresist stripping |
| 09/13/2006 | EP1701216A2 Metrology stage for lithography applications |
| 09/13/2006 | EP1701215A2 Coating and developing system |
| 09/13/2006 | EP1701214A1 Positive photosensitive composition and pattern-forming method using the same |
| 09/13/2006 | EP1701213A2 Photosensitive composition |
| 09/13/2006 | EP1701212A2 Black conductive compositions, black electrodes, and methods of forming thereof |
| 09/13/2006 | EP1701211A2 Black conductive thick film compositons, electrodes, and methods of forming thereof |
| 09/13/2006 | EP1701210A1 Positive photosensitive resin composition |