| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/21/2006 | US20060210928 To minimize relief variation in the floor layer of photosensitive printing sleeves |
| 09/21/2006 | US20060210927 scrubbing an aluminum plate with rotating brushes, while supplying an aqueous solutions of nitric acid and hydrochloric acid and abrasive particles containing silica, and etching using an aqueous alkaline solutions; antisoilant plates having wear resistance |
| 09/21/2006 | US20060210926 Aluminum alloy blank for lithographic printing plate and support for lithographic printing plate |
| 09/21/2006 | US20060210916 Positive photoresist composition and method of forming resist pattern |
| 09/21/2006 | US20060210915 Having a high dry etching rate compared with photoresist, and causing no intermixing with the photoresist, manufacture of semiconductor device |
| 09/21/2006 | US20060210914 dissolution promoter(s) of given formula such as 1,1-bis(4-hydroxyphenyl)cyclohexane and an alkali-soluble novolak containing hydroxyalkyl ether units that can be substituted with 1,2-naphthoquinonediazidesulfonyl groups; excellent resolution and good suppression of crack generation during plating |
| 09/21/2006 | US20060210913 Photoresist composition and, used in the photoresist composition, low-molecular compound and high-molecular compound |
| 09/21/2006 | US20060210912 Alkali-soluble copolymer of p-isopropenylphenol, unsaturated carboxy acid, acrylic ester, and unsaturated aliphatic polycyclic compound, especially isobornyl (meth)acrylate and tricyclo[5.2.1.02,6]decanyl (meth)acrylate; unsaturated compound; and radical polymerization initiator; used for forming bumps |
| 09/21/2006 | US20060210891 Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same |
| 09/21/2006 | US20060210890 Overcoming conventional disadvantage, so that dimension correction for gate structures with different conductivity types can be incorporated into optical simulation in generating mask data for semiconductor integrated circuit device including dual gate structures different in conductivity types |
| 09/21/2006 | US20060210889 Reduces the optical proximity effect by the light interference, and reduce the aberration of a projection lens such as the coma aberration; enhances the resolution limit |
| 09/21/2006 | US20060210885 In photolithography process on a photoresist coated substrate, determining the effect of flare on line shortening; measure misalignments; measuring the degree of flare distortion; semiconductor processing |
| 09/21/2006 | US20060210452 Very large scale immobilized polymer synthesis |
| 09/21/2006 | US20060209414 Method and device for irradiating spots on a layer |
| 09/21/2006 | US20060209287 Positioning apparatus, exposure apparatus, and device manufacturing method |
| 09/21/2006 | US20060209286 Immersion exposure technique |
| 09/21/2006 | US20060209285 Optical element and projection exposure apparatus based on use of the optical element |
| 09/21/2006 | US20060209279 Exposure apparatus and device fabricating method |
| 09/21/2006 | US20060209278 Exposure apparatus and device manufacturing method |
| 09/21/2006 | US20060209277 Roll printer with decomposed raster scan and X-Y distortion correction |
| 09/21/2006 | US20060208844 Iron core, iron core manufacturing method, alignment apparatus, and exposure apparatus |
| 09/21/2006 | US20060208630 Deposition of permanent polymer structures for OLED fabrication |
| 09/21/2006 | DE19940320B4 Nicht reflektierende Beschichtungspolymere und Verfahren zu deren Herstellung Non-reflective coating polymers and methods for their preparation |
| 09/21/2006 | DE19617643B4 Verfahren zum Konvertieren von 2D- in 3D-Filme A method for converting 2D into 3D Movies |
| 09/21/2006 | DE102006006793A1 Device for irradiation with rays of charged particles has irradiation module for irradiation of photoresist films on which antistatic film adheres through radiation of rays of charged particles |
| 09/21/2006 | DE102005012403A1 Arrangement, useful for activating a polymerizable liquid, comprises a radiation source and a ray plate, a transportation groove in the irradiation side |
| 09/21/2006 | DE102005009554A1 Exposure device`s e.g. projector, focus correcting method for semiconductor manufacturing system, involves executing focus correction of illuminating devices based on focus values of devices for correcting dimensional accuracy of image |
| 09/20/2006 | EP1703778A1 A method of making an electroluminescent device |
| 09/20/2006 | EP1703548A1 Exposure apparatus, exposure method, and device producing method |
| 09/20/2006 | EP1703330A1 Plate-making method of negative-working lithographic printing plate precursor |
| 09/20/2006 | EP1703329A1 Immersion exposure apparatus, immersion exposure method, and device manufacturing method |
| 09/20/2006 | EP1703328A1 Composition for forming nitride coating film for hard mask |
| 09/20/2006 | EP1703327A2 Composition for forming antireflection film, laminate, and method for forming resist pattern |
| 09/20/2006 | EP1703326A2 Photosensitive composition and pattern-forming method using the same |
| 09/20/2006 | EP1703325A1 Negative working light sensitive planographic printing plate material and planographic printing plate manufacturing process |
| 09/20/2006 | EP1703324A1 Photosensitive composition and lithographic printing plate precursor |
| 09/20/2006 | EP1703323A1 Photosensitive composition, image-recording material and image-recording method |
| 09/20/2006 | EP1703322A2 Positive resist composition and pattern forming method using the resist composition |
| 09/20/2006 | EP1703321A1 Method for making a processless lithographic printing plate |
| 09/20/2006 | EP1702359A1 Fabrication method |
| 09/20/2006 | EP1702242A2 Method and device for data integrity checking |
| 09/20/2006 | EP1702241A2 Chuck system, lithographic apparatus using the same and device manufacturing method |
| 09/20/2006 | EP1701849A1 Method and apparatus for micro-contact printing |
| 09/20/2006 | EP1454112A4 Interferometry system having a dynamic beam-steering assembly for measuring angle and distance |
| 09/20/2006 | EP1449014A4 Processes using gray scale exposure processes to make microoptical elements and corresponding molds |
| 09/20/2006 | EP1405141A4 Thermally sensitive coating compositions containing mixed diazo novolaks useful for lithographic elements |
| 09/20/2006 | EP1272903B1 Apparatus for generating a laser pattern on a photomask and associated methods |
| 09/20/2006 | EP1230334B1 Non-corrosive cleaning composition for removing plasma etching residues |
| 09/20/2006 | EP1127294B1 Apparatus for extreme UV lithography comprising a wafer chamber and gas curtain |
| 09/20/2006 | EP0975731B1 Ethylenediaminetetraacetic acid or its ammonium salt semiconductor process residue removal composition and process |
| 09/20/2006 | CN1836312A Exposure apparatus, exposure method and device manufacturing method |
| 09/20/2006 | CN1836304A Plasma display panel manufacturing method |
| 09/20/2006 | CN1836191A High sensitivity resist compsns for electron based lithography |
| 09/20/2006 | CN1836190A A method and an apparatus for manufacturing an electronic thin-film component and an electronic thin-film component |
| 09/20/2006 | CN1835981A Photocrosslinkable polyurethanes |
| 09/20/2006 | CN1835842A Heat-sensitive positive working lithographic printing plate precursor |
| 09/20/2006 | CN1835794A Process for the recovery of surfactants |
| 09/20/2006 | CN1834791A Decompression dry device |
| 09/20/2006 | CN1834790A Method of mfg. lower substrate of LCD device by using three masks |
| 09/20/2006 | CN1834789A Exposal device and method |
| 09/20/2006 | CN1834788A Method of realizing continuous scanning to explore two patterns by using two mask plates |
| 09/20/2006 | CN1834787A Proximity type exposure apparatus |
| 09/20/2006 | CN1834786A Method of coating photoresist by sprayer head |
| 09/20/2006 | CN1834785A Silicon contg. 193nm negative photo resist and membrane forming resin |
| 09/20/2006 | CN1834784A Photosensitive composition and lithographic printing plate precursor |
| 09/20/2006 | CN1834783A Negative-type photosensitive resin composition |
| 09/20/2006 | CN1834782A Mask data generation method |
| 09/20/2006 | CN1834746A Method of mfg low substrate of LCD device |
| 09/20/2006 | CN1834744A Radiation sensitive resin composition, protuberance and partition formed by same, its forming method and liquid crystal display device |
| 09/20/2006 | CN1834737A Color cholesterol type LCD device and its mfg. method |
| 09/20/2006 | CN1834736A Color cholesterol type LCD device and its mfg. method |
| 09/20/2006 | CN1834704A Coloring composition for color filter and color filter |
| 09/20/2006 | CN1834703A Color filter substrate for liquid crystal display device and method for fabricating the same |
| 09/20/2006 | CN1834700A Method of mfg. optical component |
| 09/20/2006 | CN1834164A Pigmentation combination |
| 09/20/2006 | CN1276500C Semiconductor device and manufacturing method thereof |
| 09/20/2006 | CN1276495C Laser system and method for processing memory link with burst of laser pulses having ultra-short pulse widths |
| 09/20/2006 | CN1276477C Integrated shallow trench isolation process |
| 09/20/2006 | CN1276469C Method and apparatus for coating anti-corrosion liquid |
| 09/20/2006 | CN1276307C Stripping agent, stripping method, thereof, stripping agent circulator and stripping agent controller |
| 09/20/2006 | CN1276306C Processing method, and mfg. method for semiconductor |
| 09/20/2006 | CN1276305C Exposure method and exposure apparatus |
| 09/20/2006 | CN1276304C Positive resist composition and method of forming resist pattern |
| 09/20/2006 | CN1276303C Acid generating agent, and radiation-sensitive resin composition |
| 09/20/2006 | CN1276291C Photoelectric device, electronic device, and method for manufacturing photo electric device |
| 09/20/2006 | CN1276289C Producing method for base plate of display plate |
| 09/19/2006 | US7111277 System and method for lithography simulation |
| 09/19/2006 | US7111256 Use of overlay diagnostics for enhanced automatic process control |
| 09/19/2006 | US7110504 Radiation generating apparatus, radiation generating method, exposure apparatus, and exposure method |
| 09/19/2006 | US7110503 X-ray measuring and testing system |
| 09/19/2006 | US7110195 Monolithic hard pellicle |
| 09/19/2006 | US7110159 Method and apparatus for patterning a workpiece and methods of manufacturing the same |
| 09/19/2006 | US7110116 Alignment apparatus, exposure apparatus using same, and method of manufacturing devices |
| 09/19/2006 | US7110099 Determination of center of focus by cross-section analysis |
| 09/19/2006 | US7110091 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 09/19/2006 | US7110090 Lithographic apparatus and method to detect correct clamping of an object |
| 09/19/2006 | US7110089 Drive mechanism, exposure device, optical equipment, and device manufacturing method |
| 09/19/2006 | US7110088 Exposure apparatus and device manufacturing method |
| 09/19/2006 | US7110087 Lithographic apparatus and device manufacturing method |
| 09/19/2006 | US7110086 Movable stage system, lithographic apparatus, and device manufacturing method |