Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2006
10/04/2006CN1841195A X-ray sensitive resin composition, protruded body and barrier body formed thereby, forming method thereof, and liquid crystal display element
10/04/2006CN1841194A X-ray sensitive resin composition, protruded body and barrier body formed thereby and liquid crystal display element
10/04/2006CN1841193A X-ray sensitive resin composition, protruded body and barrier body formed thereby and liquid crystal display member containing the same
10/04/2006CN1841192A X-ray sensitive resin composition, protruded body and barrier body formed thereby and liquid crystal display member containing the same
10/04/2006CN1841191A Photosensitive thick-film dielectric paste composition and method for making an insulating layer using same
10/04/2006CN1841190A Colored light-sensitive resin composition and hardening element thereof
10/04/2006CN1841189A Mask blank glass substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, mask blank glass substrate, mask blank, and mask
10/04/2006CN1841169A Liquid crystal display device and method of fabricating the same
10/04/2006CN1841165A System and method for manufacturing press die for printing LCD oriented film
10/04/2006CN1841149A Passivation protection method for silicon-based liquid crystal aluminium reflection electrode
10/04/2006CN1841098A Multi-layer spectral purity filter and lithographic apparatus, device manufacturing method, and device
10/04/2006CN1840332A Method for producing image on recording material
10/04/2006CN1278383C Pottern forming method
10/04/2006CN1278382C Manufacturing method of semiconductor device and semiconductor device
10/04/2006CN1278190C Projection exposure device, position alignment device and position alignment method
10/04/2006CN1278189C Exposure apparatus
10/04/2006CN1278188C 曝光机构和曝光方法 Exposure institutions and exposure method
10/04/2006CN1278187C Method and apparatus for image formation
10/04/2006CN1278186C UV-absorbing support layers and flexographic printing elements comprising same
10/04/2006CN1278185C Positive photoresist composition and method for forming etching-resistant pattern
10/04/2006CN1278184C Photosensitive resin composition for image forming
10/04/2006CN1278183C Image forming material
10/04/2006CN1278182C Mask graphics producing method and mask graphics producing device
10/04/2006CN1278142C Electromagnetic radiation diffusion body and its mfg. method
10/04/2006CN1277965C Length-measuring staying device for weft
10/04/2006CN1277886C Waveguide tube and composition
10/03/2006US7117478 System and method for lithography simulation
10/03/2006US7117477 System and method for lithography simulation
10/03/2006US7117140 Method of evaluating the exposure property of data to wafer
10/03/2006US7116501 Optical element holder, exposure apparatus, and device fabricating method
10/03/2006US7116405 Maskless, microlens EUV lithography system with grazing-incidence illumination optics
10/03/2006US7116403 Lithographic apparatus and device manufacturing method
10/03/2006US7116402 Lithographic apparatus and device manufacturing method
10/03/2006US7116400 Illumination assembly, method for providing a radiation beam, lithographic projection apparatus and device manufacturing method
10/03/2006US7116399 Lithographic apparatus, device manufacturing method, and device manufactured thereby
10/03/2006US7116398 Lithographic apparatus and device manufacturing method
10/03/2006US7116397 Exposure apparatus and device manufacturing method
10/03/2006US7116396 Exposure device, exposure method and device manufacturing method
10/03/2006US7116395 Liquid immersion type exposure apparatus
10/03/2006US7116394 Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system
10/03/2006US7116346 Device for setting the focus of exposure heads of a printing plate exposer
10/03/2006US7115913 Array substrate used for a display device and a method of making the same
10/03/2006US7115886 Lithographic projection apparatus, device manufacturing method and device manufactured thereby
10/03/2006US7115863 Probe for scanning probe lithography and making method thereof
10/03/2006US7115690 Fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer
10/03/2006US7115673 Photosensitive resin composition, porous resin, circuit board, and wireless suspension board
10/03/2006US7115532 Treating the outer surface with a basic fluid of tetramethyl ammonium hydroxide or ammonium fluoride; applying photoresist onto the treated outer surface, patterning and developing
10/03/2006US7115531 Organosilicate resins as hardmasks for organic polymer dielectrics in fabrication of microelectronic devices
10/03/2006US7115432 Base pattern forming material for electrode and wiring material absorption, electrode and wiring forming method, and method of manufacturing image forming apparatus
10/03/2006US7115355 Positioning deformable photoresist on substrate; masking; using hydrophilic stamp to print waveguides; polydimethylsiloxane
10/03/2006US7115354 Microfabrication of pattern imprinting
10/03/2006US7115353 Computer screen imaging system for the preparation of print screens
10/03/2006US7115352 Exposing photopolymerizable image-forming material comprising substrate with image-recording layer comprising photopolymerization initiator sensitive to light of wavelength within visible to ultraviolet ranges, polymerizable compound with ethylenically unsaturated group, binder, developing with carbonate
10/03/2006US7115344 Photomask and pattern forming method employing the same
10/03/2006US7115342 Preparation of photomasks
10/03/2006US7115207 For an integrated circuit chip interconnect solder bump; simultaneously etching both sides of a very thick molybdenum foil coated on each side by a photoresist using a very low etchant spray pressure, and undercutting said photoresist adjacent to opening to form an unsupported edge
10/03/2006US7114938 Lithographic apparatus for molding ultrafine features
10/03/2006US7114448 Method for large-area patterning dissolved polymers by making use of an active stamp
10/03/2006US7114399 Shaped non-contact capacitive displacement sensors for measuring shaped targets
10/03/2006CA2328322C Slatted collimator
09/2006
09/29/2006CA2518642A1 Nanoimprint lithograph for fabricating nanoadhesive
09/28/2006WO2006102649A2 A method for manufacturing a device using imprint lithography and direct write technology
09/28/2006WO2006101458A1 Method for patterning ferrelectric/piezoelectric films
09/28/2006WO2006101250A1 Positive-working photoresist composition for thick film formation
09/28/2006WO2006101211A1 Pyridone azo compounds and tautomers thereof, colorant -containing curable compositions, color filteres and process for production thereof
09/28/2006WO2006101207A1 Production method and handling method of original plate of planographic printing plate
09/28/2006WO2006101147A1 Method of and apparatus for laminated substrate assembly
09/28/2006WO2006101120A1 Exposure apparatus, exposure method and method for manufacturing device
09/28/2006WO2006101110A1 Drawing image data creating method and device, and drawing image data creating/drawing device
09/28/2006WO2006101086A1 Exposure apparatus, exposure method and method for manufacturing microdevice
09/28/2006WO2006101003A1 Photosensitive composition containing organic fine particles
09/28/2006WO2006100942A1 Photosensitive resin composition and color filter
09/28/2006WO2006100842A1 Sheet body holding mechanism and lithography apparatus using same
09/28/2006WO2006100825A1 Photocurable resin composition for forming black matrix, photosensitive film using the same, method for forming black matrix, black matrix and plasma display panel having the black matrix
09/28/2006WO2006100817A1 Pattern forming material, pattern forming apparatus, and pattern forming method
09/28/2006WO2006100076A2 Lithographic apparatus and device manufacturing method
09/28/2006WO2006100013A2 Method for producing three-dimensional fine structures
09/28/2006WO2006085681A9 Photosensitive composition removing liquid
09/28/2006WO2006076151A3 Lithography and associated methods, devices, and systems
09/28/2006WO2006069340A3 Lithography and associated methods, devices, and systems
09/28/2006WO2005048283A3 Surface and site-specific polymerization by direct-write lithography
09/28/2006US20060217570 Novel Tertiary Amine Compounds Having An Ester Structure And Processes For Preparing The Same
09/28/2006US20060217519 Photoresist polymers
09/28/2006US20060217278 A mixture of solvents with no corrosion of copper properties and a corrosion inhibitor; during the photolithographic process, removing photoresist remaining after forming copper line
09/28/2006US20060216844 Optimized optical lithography illumination source for use during the manufacture of a semiconductor device
09/28/2006US20060216654 Method for Etching Microchannel Networks within Liquid Crystal Polymer Substrates
09/28/2006US20060216653 to enhance image resolution in a lithographic cluster using multiple projections, and a lithographic cluster used to project multiple patterns to form images that are combined to form an image having enhanced resolution
09/28/2006US20060216652 Composition for forming anti-reflective coating for use in lithography
09/28/2006US20060216651 Method and system for drying a substrate
09/28/2006US20060216650 Exposure apparatus and method, and device manufacturing method
09/28/2006US20060216649 Reduced pitch multiple exposure process
09/28/2006US20060216648 Nanopastes for use as patterning compositions
09/28/2006US20060216647 Photopolymerizable composition, light sensitive planographic printing plate material and manufacturing method of planographic printing plate
09/28/2006US20060216646 Plate-making method of lithographic printing plate precursor
09/28/2006US20060216645 Photoresist coatings for copper clad stainless steel printing plates
09/28/2006US20060216644 Method for preparing photosensitive aqueous developable coating composition
09/28/2006US20060216643 Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use
09/28/2006US20060216617 Demarcating and forming a metal film on a substrate; forming photosensitive organic thin film layers on the metal film;applying inks and drying; forming a protective film; liquid crystal display devices, electro-optical devices, and electronics
09/28/2006US20060215272 Objective in a microlithographic projection exposure apparatus
09/28/2006US20060215146 Exposure process and apparatus using glass photomasks