G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2006
10/05/2006	WO2006069755A3 Lens module comprising at least one replaceable optical element
10/05/2006	WO2006067694A3 Nanofabrication based on sam growth
10/05/2006	WO2006065670A3 Kit for making relief images
10/05/2006	WO2006065474A3 Method for patterning by surface modification
10/05/2006	WO2006058731A3 Radiation-curable coating substances
10/05/2006	WO2006039090A3 Solutions for cleaning silicon semiconductors or silicon oxides
10/05/2006	WO2006021419A3 Illumination system of a microlithographic exposure apparatus
10/05/2006	WO2005122245A3 Formation of metal-insulator metal capacitor using a hardmask
10/05/2006	WO2005074606A3 Method of photolithography using a fluid and a system thereof
10/05/2006	US20060224269 Exposure apparatus and parameter editing method
10/05/2006	US20060223011 Method for manufacturing optical semiconductor element, and optical semiconductor element
10/05/2006	US20060223008 Composition for forming antireflection film, laminate, and method for forming resist pattern
10/05/2006	US20060223007 Positioning a reticle relative to a substrate; directing electromagnetic radiation onto the reticle, the electromagnetic radiation having a first portion propagating onto reticle in first direction and being incident on the reticle at a first angle and a second portion propagating in a second direction
10/05/2006	US20060223006 Method of producing a planographic printing plate
10/05/2006	US20060223005 Lithographic printing plate support and presensitized plate
10/05/2006	US20060222998 Positive photosensitive composition
10/05/2006	US20060222997 Adhesion improver for photosensitive resin composition and photosensitive resin composition containing same
10/05/2006	US20060222968 For semiconductors, microelectronic and microelectromechanical devices, and microfluidic and photonic devices; eliminating image distorting charging effects during electron beam patterning of the template and charging effects during scanning electron microscope inspection
10/05/2006	US20060222967 Reticle, method for manufacturing magnetic disk medium using reticle, and magnetic disk medium
10/05/2006	US20060222866 Silsesquioxane resin, positive resist composition,layered product including resist and method of forming resist pattern
10/05/2006	US20060222865 O-nitrobenzyloxy- (or other hetero)-substituted ligand having a hydrolyzable group in which the phenyl ring substituted by a polyfluoroalkyl group: 4-(trimethoxysilyl)butyl 5-methoxy-2-nitro-4-(1H,1H-perfluoroalkoxy)benzyl ether; hydrophobic/hydrophilic pattern formed by photolithography
10/05/2006	US20060222839 Photosensitive material for non-substrate liquid crystal display
10/05/2006	US20060221456 Objectives as a microlithography projection objective with at least one liquid lens
10/05/2006	US20060221453 Fly's eye condenser and illumination system therewith
10/05/2006	US20060221317 Immersion lithography method and device for illuminating a substrate
10/05/2006	US20060220186 Semiconductor constructions
10/05/2006	US20060219950 Lithographic apparatus and device manufacturing method
10/05/2006	US20060219931 Lithographic apparatus, device manufacturing method, and device manufactured thereby
10/05/2006	DE10246546B4 Verwendung eines Resistsystems und Lithographieverfahren zur Herstellung von Halbleiterbauelementen Using a resist lithography system and method for the production of semiconductor devices
10/05/2006	DE102006010125A1 Image formation method for use in printing machine, involves adjusting distance between recording point and recording material, while producing thermal length variations in substrate in direction of lines
10/05/2006	DE102005063118A1 Capacitor fabricating method for dynamic random access memory, comprises forming capacitor lower electrode by patterning conductive layer using pattern as mask such that lower electrode includes cylindrical or donut-shaped pattern
10/05/2006	DE102005015271A1 Device for production of groove structure on cylindrical sliding surfaces in multicylinder engine block by photochemical etching useful for restructuring of the walls of cylinder combustion chambers
10/05/2006	DE102005015193A1 Light sensitive material e.g. offset printing plate, exposure device, has inactivating device to inactivate predetermined number of cells of light modulator, where modulator is operated by loading data pattern on only activated cells
10/05/2006	DE102005015192A1 Illumination device for e.g. violet offset-printing plates, has laser diodes whose radiated light is limited to narrow frequency interval and strongly bundled by resonator, where diode`s fluxes are superimposed in light coupling device
10/05/2006	DE102005014595A1 Visual inspection method for processed boundary edges of e.g. semiconductor wafers, involves taking picture of boundary area of disk-shaped object and showing image, enlarged view and total view of object in different display windows
10/05/2006	DE102005014594A1 Imperfect edge beads detecting method for disk shaped object e.g. wafer, involves specifying markings in boundary region of reference object, where inspection of object is limited to position of markings specified in object
10/05/2006	DE102005014483A1 Device for manufacture of objects by layer-wise constructing from powder-form material has sub-systems of irradiating unit allocated to respective sections of building field on base arrangement
10/04/2006	EP1708252A1 Development device and development method
10/04/2006	EP1708251A1 Developing device and developing method
10/04/2006	EP1708250A2 Identification of a reference integrated circuit for a pick and place device
10/04/2006	EP1708033A2 Method of manufacturing a lithographic printing plate
10/04/2006	EP1708032A2 Lithographic device, device manufacturing method and device manufactured thereby
10/04/2006	EP1708031A2 Multi-layer spectral purity filter lithographic apparatus including such a spectral purity filter and device manufacturing method, and device manufactured thereby
10/04/2006	EP1708030A2 Lithographic apparatus and device manufacturing method utilizing data filtering
10/04/2006	EP1708029A1 Lithographic apparatus and device manufacturing method
10/04/2006	EP1708028A2 Optical element, exposure apparatus, and device manufacturing method
10/04/2006	EP1708027A1 Upper layer film forming composition for liquid immersion and method of forming photoresist pattern
10/04/2006	EP1708026A1 Photosensitive polymer composition, process for producing pattern, and electronic part
10/04/2006	EP1708025A1 Photosensitive lithographic printing plate
10/04/2006	EP1708024A2 Photosensitive thick-film dielectric paste composition and method for making an insulating layer using same
10/04/2006	EP1708023A1 Negative photosensitive composition and negative photosensitive lithographic printing plate
10/04/2006	EP1708022A1 Nanoimprint lithograph for fabricating nanopattern in a resist layer
10/04/2006	EP1707610A2 Photochromic polymerizable composition
10/04/2006	EP1707588A1 Resin and resin composition
10/04/2006	EP1706793A2 Exposure apparatus and measuring device for a projection lens
10/04/2006	EP1706792A1 Method and apparatus for patterning a workpiece and methods of manufacturing the same
10/04/2006	EP1706791A2 Photoresist compositions and processess of use
10/04/2006	EP1706790A1 Lithographic printing plate precursors with mercapto-functionalized free-radical polymerizable monomers
10/04/2006	EP1706763A2 Light-redirecting optical structure with linear prisms, and process for forming same
10/04/2006	EP1576420B8 Nano-imprint lithography method involving substrate pressing
10/04/2006	EP1488285B1 Processless digitally imaged printing plate using microspheres
10/04/2006	EP1483063B1 Method and device for the decontamination of optical surfaces
10/04/2006	EP1303736A4 Systems and methods for quantifying nonlinearities in interferometry systems
10/04/2006	EP1208349A4 Interferometers utilizing polarization preserving optical systems
10/04/2006	EP1012584A4 Object inspection and/or modification system and method
10/04/2006	CN1842893A Exposure apparatus and device producing method
10/04/2006	CN1842892A 光学元件和曝光装置 An optical element and an exposure apparatus
10/04/2006	CN1842887A Electron beam irradiation device and drawing device
10/04/2006	CN1842749A Method for reclaiming alkyl esters
10/04/2006	CN1842748A Optical image formation using a light valve array and a light converging array
10/04/2006	CN1842747A Method of forming optical images, apparatus for carrying out said method and process for manufacturing a device using said method
10/04/2006	CN1842746A A control circuit and method of forming optical images
10/04/2006	CN1842745A Thin film transistor, its manufacturing method and method of manufacturing display
10/04/2006	CN1842744A Polyamide acid-containing composition for forming antireflective film
10/04/2006	CN1842743A Photosensitive resin composition and LCD using the same
10/04/2006	CN1842742A Photosensitive resin composition, photosensitive element using same, method for forming resist pattern, method for producing printed wiring board, and method for removing photocured product
10/04/2006	CN1842741A Chemical amplification photoresist composition, photoresist layer laminate, method for producing photoresist composition, method for producing photoresist pattern and method for producing connecting t
10/04/2006	CN1842551A Acrylic polymers and radiation-sensitive resin compositions
10/04/2006	CN1842543A Photopatterning of conductive electrode layers containing electrically-conductive polymer particles
10/04/2006	CN1841661A Semiconductor manufacture method
10/04/2006	CN1841619A Adhesive sheet for removal of fluorescent substances
10/04/2006	CN1841214A Methods of removing resist from substrates in resist stripping chambers
10/04/2006	CN1841213A Developing method and method of manufacturing a semiconductor device
10/04/2006	CN1841212A Lithographic device, device manufacturing method and device manufactured thereby
10/04/2006	CN1841211A Lithographic apparatus and device manufacturing method utilizing data filtering
10/04/2006	CN1841210A Optical element and light irradiation apparatus
10/04/2006	CN1841209A Optical element, exposure apparatus, and device manufacturing method
10/04/2006	CN1841208A Lithographic apparatus, wet dipping type projection device and device manufacturing method
10/04/2006	CN1841207A Dedicated metrology stage for lithography applications
10/04/2006	CN1841206A Method for semiconductor manufacturing using a negative photoresist with thermal flow properties
10/04/2006	CN1841205A Integrated optical metrology and lithographic process system for dynamic critical dimension control
10/04/2006	CN1841204A External exposure device
10/04/2006	CN1841203A Exposure apparatus for flat panel display device and method of exposing using the same
10/04/2006	CN1841202A Exposure worktable and exposure device
10/04/2006	CN1841201A Salt suitable for acid generator and chemical amplifying type corrosion-resistant composition containing the same
10/04/2006	CN1841200A Salt suitable for acid generator and chemical amplifying type corrosion-resistant composition containing the same
10/04/2006	CN1841199A Positive type corrosion-resisting composition and corrosion-resisting pattern formation method using same
10/04/2006	CN1841198A Positive type corrosion-resisting composition and corrosion-resisting pattern formation method using same
10/04/2006	CN1841197A X-ray sensitive resin composition, protruded body and barrier body formed thereby, forming method thereof and liquid crystal display element
10/04/2006	CN1841196A X-ray sensitive resin composition, protruded body and barrier body formed thereby, forming method thereof and liquid crystal display element

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