Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
05/2014
05/14/2014CN103792797A 一种光刻投影物镜功能性调节的控制系统结构 Control system structure of a lithographic projection objective functional regulation
05/14/2014CN103792796A 一种光罩支架调平机构 One kind of mask holder leveling mechanism
05/14/2014CN103792795A 以光纤作为空间滤波器与扩束器的激光干涉微影设备 Optical fiber as a spatial filter and beam expander laser interferometer lithography equipment
05/14/2014CN103792794A 一种接近式光刻机 A near-lithography machine
05/14/2014CN103792793A 同一光刻工艺中不同光刻机的匹配方法 Method of matching the same photolithography process different lithography
05/14/2014CN103792792A 一种提高光刻机工件台定位精度的方法 A way to improve the positioning accuracy of the workpiece stage lithography method
05/14/2014CN103792791A 集装式弧型热酸分排盘体框架结构 Cartridge hot acid points behind the arc plate frame structure
05/14/2014CN103792790A 光刻胶与显影液的恒温控制系统 Photoresist with the developer temperature control system
05/14/2014CN103792789A 一种光刻胶组合物 A photoresist composition
05/14/2014CN103792788A 感光性树脂组合物、感光性元件、抗蚀图形的形成方法及印刷电路板的制造方法 Method for producing a photosensitive resin composition, a photosensitive element, resist pattern forming method and a printed circuit board
05/14/2014CN103792787A 用于光刻胶的热致酸生成剂 Heat for photoresist-acid generating agent
05/14/2014CN103792671A 一种3d眼镜的镜片及制作方法、3d眼镜 One kind of 3d glasses lens and production methods, 3d glasses
05/14/2014CN103792637A 一种补偿镜片调整装置 A compensation for lens adjustment device
05/14/2014CN103791053A 将横向运动转换成为上下运动的装置 The lateral movement of the device up and down movement is converted into
05/14/2014CN103789257A 一种间充质干细胞的定向分化诱导方法 A method for inducing directed differentiation between mesenchymal stem cells
05/14/2014CN103787923A 光致生酸化合物和包含它的光致抗蚀剂组合物,包含光致抗蚀剂的涂覆制品及其制造方法 Photo-acid generator comprising the compound and its photoresist composition comprising a photoresist and method for manufacturing a coated article
05/14/2014CN103048728B 多芯带状光纤中多波长光栅同时刻写的装置及方法 Apparatus and method for multi-core ribbon fiber simultaneous multi-wavelength grating inscribed in
05/14/2014CN102890426B 一种直写式光刻系统中倾斜扫描显示方法 A direct-write lithography system tilt scan display method
05/14/2014CN102786631B 光敏性碱可溶性树脂、其制备方法及彩色光刻胶 An alkali-soluble photosensitive resin, a method for their preparation and color photoresists
05/14/2014CN102707353B 彩色滤光片及其制造方法 A color filter and manufacturing method thereof
05/14/2014CN102656517B 感光性组合物、间隔壁、彩色滤光片及有机el元件 The photosensitive composition, partition walls, a color filter and an organic el element
05/14/2014CN102388344B 具有冷却布置的检测器模块、包括所述检测器模块的光刻设备 Cooling arrangement having a detector module, said lithographic apparatus comprising a detector module
05/14/2014CN102341888B 形成图案的方法 The method of forming a pattern
05/14/2014CN102253596B 浸渍平版印刷用组合物和浸渍平版印刷方法 The composition for immersion lithography and immersion lithography method
05/14/2014CN102193318B 一种处理含硅的底部抗反射涂层的方法 A method of processing a silicon-containing bottom antireflective coating method
05/14/2014CN102086171B 肟酯化合物及含有该化合物的光聚合引发剂 The oxime ester compound and a photopolymerization initiator containing the compound
05/14/2014CN101930173B 光致酸产生剂和其光致抗蚀剂 Photoacid generator, and its photoresist
05/14/2014CN101806999B 着色感光性树脂组合物和滤色器 The colored photosensitive resin composition and a color filter
05/14/2014CN101735690B 油墨组合物以及使用该油墨组合物制造液晶显示器件的方法 Ink compositions and methods of using the ink composition of manufacturing a liquid crystal display device
05/14/2014CN101727516B 基于对聚焦敏感的成本协方差场的辅助特征布置 Based on the cost of a focus sensitive assist features disposed covariance Field
05/14/2014CN101726999B 着色组合物、着色剂分散液、滤色器及彩色液晶显示元件 The coloring composition, a coloring agent dispersion, a color filter and a color liquid crystal display device
05/14/2014CN101681117B 照明光学装置、曝光装置及元件制造方法 The illumination optical apparatus, exposure apparatus and device manufacturing method
05/14/2014CN101661228B 基板处理方法 The substrate processing method
05/14/2014CN101598897B 着色固化性组合物、使用其的图案固化着色层、滤色器和液晶显示装置 The colored curable composition, using the same pattern of the curable colored layer, a color filter and a liquid crystal display device
05/14/2014CN101154569B 等离子体处理方法 The plasma processing method
05/13/2014US8724085 Exposure apparatus, and device manufacturing method
05/13/2014US8724084 Lithographic apparatus and device manufacturing method
05/13/2014US8724083 Lithographic apparatus and device manufacturing method
05/13/2014US8724079 Stage drive method and stage unit, exposure apparatus, and device manufacturing method
05/13/2014US8724077 Exposure apparatus, exposure method, and device manufacturing method
05/13/2014US8724076 Projection exposure apparatus, cleaning and maintenance methods of a projection exposure apparatus, and device manufacturing method
05/13/2014US8722840 Resist underlayer film forming composition, and method for forming resist pattern using the same
05/13/2014US8722322 Photonic heating of silver grids
05/13/2014US8722321 Patterning process
05/13/2014US8722319 Pattern forming method, chemical amplification resist composition and resist film
05/13/2014US8722318 Methods of photochemical hydrolysis-polycondensation of cross-linkable chromophores with steric hindrance, catalysed by a photogenerated acid, and the applications thereof
05/13/2014US8722317 Transparent member having an image and method for forming the image on the transparent member
05/13/2014US8722314 Method for producing conductive sheet and method for producing touch panel
05/13/2014US8722313 Touch screen panel and method of manufacturing the same
05/13/2014US8722312 Method for fabricating semiconductor nano circular ring
05/13/2014US8722311 Positive resist composition and method for producing microlens
05/13/2014US8722310 Lithographic printing plate precursor and method of preparing lithographic printing plate using the same
05/13/2014US8722309 Infrared sensitive photosensitive composition and lithographic plate fabricated by using same
05/13/2014US8722308 Aluminum substrates and lithographic printing plate precursors
05/13/2014US8722307 Near-infrared absorptive layer-forming composition and multilayer film comprising near-infrared absorptive layer
05/13/2014US8722306 Radiation-sensitive resin composition
05/13/2014US8721778 Foil trap device with improved heat resistance
05/13/2014CA2597028C Multi-layer body and process for the production of a multi-layer body
05/08/2014WO2014070444A1 Heat actuated and projected lithography systems and methods
05/08/2014WO2014070079A1 Method for manufacturing of printed product micro features and arrangement for continuous production of such a product.
05/08/2014WO2014069718A1 Composition for resist underlayer film, and method for forming pattern using said composition for resist underlayer film
05/08/2014WO2014069544A1 Photosensitive composition, grey cured film using same, grey pixel, and solid state imaging element
05/08/2014WO2014069478A1 Negative photosensitive resin composition, resin cured film, partition wall and optical element
05/08/2014WO2014069436A1 Photosensitive conductive paste and method for producing conductive pattern
05/08/2014WO2014069415A1 Pattern formation method, actinic-ray- or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device
05/08/2014WO2014069329A1 Ester-group-containing composition for forming silicon-containing resist underlayer film
05/08/2014WO2014069314A1 Laminate and color filter therewith, process for producing same and application of color filter
05/08/2014WO2014069282A1 Foil trap and light-source device having foil trap
05/08/2014WO2014069245A1 Organic treatment solution for patterning of chemically amplified resist film, container for organic treatment solution for patterning of chemically amplified resist film, and pattern formation method, electronic device manufacturing method, and electronic device using same
05/08/2014WO2014069202A1 Photosensitive resin composition, method for producing patterned cured film, semiconductor element and electronic device
05/08/2014WO2014069197A1 Alkali developable photosensitive composition
05/08/2014WO2014069091A1 Photosensitive resin composition, cured film, protective film, insulating film, and electronic device
05/08/2014WO2014068801A1 Photoresist stripping solution composition
05/08/2014WO2014067812A1 Euv light source for generating a usable output beam for a projection exposure apparatus
05/08/2014WO2014067802A1 Patterning device support, lithographic apparatus, and method of controlling patterning device temperature
05/08/2014WO2014067754A2 Sensor and lithographic apparatus
05/08/2014WO2014067741A1 Method and apparatus for generating radiation
05/08/2014WO2014067707A1 Pressure fluctuations in a projection exposure apparatus
05/08/2014WO2014040866A3 Mirror
05/08/2014US20140127629 Method of forming pattern
05/08/2014US20140127628 Method and system for improving critical dimension uniformity using shaped beam lithography
05/08/2014US20140127627 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the same
05/08/2014US20140127626 Resist composition for negative development which is used for formation of guide pattern, guide pattern formation method, and method for forming pattern on layer containing block copolymer
05/08/2014US20140127625 Orthogonal solvents and compatible photoresists for the photolithographic patterning of organic electronic devices
05/08/2014US20140127612 Photomask for exposure and method of manufacturing pattern using the same
05/08/2014US20140127478 Composition for forming fine pattern and method for forming fined pattern using same
05/08/2014US20140125963 Exposure apparatus recovery method and exposure apparatus
05/08/2014US20140125961 Movable body apparatus, exposure apparatus and device manufacturing method
05/08/2014US20140125960 Exposure apparatus and device fabrication method
05/08/2014US20140125930 Dye dispersion liquid, photosensitive resin composition for color filters, color filter, liquid crystal display device and organic light emitting display device
05/08/2014DE102013221950A1 Mehrfach-Ladungsträgerteilchenstrahl-Schreibverfahren und Mehrfach-Ladungsträgerteilchenstrahl-Schreibvorrichtung Multiple charged particle beam writing method and multiple charged particle recording device
05/08/2014DE102013209042A1 Optical system for use in micro lithographic projection exposure system, has periodic grating structures made from material, where intensity of electromagnetic radiation in beam path amounts to maximum percentages of intensity of radiation
05/08/2014DE102013206531A1 Device for displacing micromirror in optical module of illumination system, has compensating unit compensating linear displacement of micromirror or predetermined pivot axis during pivoting of micromirror
05/08/2014DE102013202949A1 Illumination device for projection exposure system i.e. EUV projection exposure system, has light source passing light to field mirror and pupil mirror, and field mirror formed in different positions and light regions of pupil mirror
05/07/2014EP2728408A1 Deep-ultraviolet chemically-amplified positive photoresist
05/07/2014EP2728407A1 High resistivity compositions
05/07/2014EP2728406A2 Rectangular mold-forming substrate
05/07/2014EP2728219A1 Method for positioning an actively oscillation-isolated mounted component and vibration insulation system
05/07/2014EP2727977A1 Etching solution and etching process using same
05/07/2014EP2726939A1 Optical imaging arrangement with individually actively supported components
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