G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2006
10/11/2006	EP1710626A1 Photosensitive resin composition and cured product thereof
10/11/2006	EP1710625A2 Improved edge smoothness with low resolution projected images for use in solid imaging
10/11/2006	EP1710624A2 Methods of fabricating nano-scale and micro-scale mold for nano-imprint, and mold usage on nano-imprinting equipment
10/11/2006	EP1710623A1 Method of cleaning a substrate surface from a crystal nucleus
10/11/2006	EP1710230A1 Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
10/11/2006	EP1710094A1 Process for producing laser engravable printing substrate
10/11/2006	EP1710093A1 Photosensitive resin composition for printing substrate capable of laser sculpture
10/11/2006	EP1709490A1 Differential critical dimension and overlay metrology apparatus and measurement method
10/11/2006	EP1709489A2 Lithographic apparatus, device manufacturing method, and device manufactured thereby
10/11/2006	EP1709488A1 Photosensitive printing sleeves and method of forming the same
10/11/2006	EP1709487A2 Reticle fabrication using a removable hard mask
10/11/2006	EP1709486A2 Norbornene-type monomers and polymers containing pendent lactone or sultone groups
10/11/2006	EP1709485A2 Photoresist composition for deep uv and process thereof
10/11/2006	EP1709472A2 Catadioptric projection objective
10/11/2006	EP1709392A1 A method for measuring the position of a mark in a deflector system
10/11/2006	EP1709099A2 Thermally stable cationic photocurable compositions
10/11/2006	EP1709024A1 Piperazino sensitisers
10/11/2006	EP1478681A4 Spin-on-glass anti-reflective coatings for photolithography
10/11/2006	CN1846298A Exposure apparatus and device producing method
10/11/2006	CN1846257A Disk master producing method, disk master producing device,method for detecting difference in disk master travel distance, and device for detecting difference in disk master travel distance
10/11/2006	CN1846173A Liquid photoresist remover composition, process for producing pattern with the same, and display employing the same
10/11/2006	CN1846172A Developer for positive photosensitive composition
10/11/2006	CN1846170A Methods and systems for inspection of wafers and reticles using designer intent data
10/11/2006	CN1846169A Negative resist composition with fluorosulfonamide-containing polymer
10/11/2006	CN1846162A Programmable optical component for spatially controlling the intensity of beam of radiation
10/11/2006	CN1845941A Photoresist polymer compositions
10/11/2006	CN1845795A Sub-micron-scale patterning method and system
10/11/2006	CN1845009A System and method for photolithography in semiconductor manufacturing
10/11/2006	CN1845008A Method of exposure and attenuated type phase shift mask
10/11/2006	CN1844983A Semi-transmissive semi-reflective display and manufacturing method thereof, display manufacturing method
10/11/2006	CN1844974A Display connecting structure and method thereof
10/11/2006	CN1844087A Polymerisable benzophenone photoinitiator and its preparing method
10/11/2006	CN1279666C High-peak-power laser device and application to the generation of light in the extreme ultraviolet
10/11/2006	CN1279588C Method to restore hydrophobicity in dielectric films and materials
10/11/2006	CN1279584C Multiple alignment mark and method
10/11/2006	CN1279580C Substrate treating device and method thereof
10/11/2006	CN1279406C Corrosion-proof agent stripper
10/11/2006	CN1279405C Chemical-enlarging etchant material and patterning method using same
10/11/2006	CN1279404C Photoetching device, component manufacturing method and component therefrom
10/11/2006	CN1279403C Method for producing photoetching equipment and device
10/11/2006	CN1279402C Lithographic printing members and imaging method
10/11/2006	CN1279401C Paste composition, blank sheet and multilayer substrate materials
10/11/2006	CN1279400C Driving apparatus, exposuring apparatus and device producing method
10/11/2006	CN1279374C Colored composition, method of manufacturing color filter, and method of manufacturing black matrix substrate
10/11/2006	CN1278946C Waste slushing compound exfoliative liquid regenerating apparatus and method
10/11/2006	CN1278853C Negative image recording material and planographic plate precursor
10/11/2006	CN1278786C Liquid spraying method and device, producing method for electrooptical device and basilar plate
10/10/2006	US7120895 Evaluating design pattern on photolithographicmask; generating simulated image on wafer using a pixel-based bitmap; computers, data processing
10/10/2006	US7120285 Method for evaluation of reticle image using aerial image simulator
10/10/2006	US7119952 Optical instrument, exposure apparatus, and device manufacturing method
10/10/2006	US7119893 Determination of center of focus by parameter variability analysis
10/10/2006	US7119886 Lithographic apparatus, device manufacturing method, and angular encoder
10/10/2006	US7119885 Lithographic apparatus and device manufacturing method
10/10/2006	US7119884 Lithographic apparatus and device manufacturing method
10/10/2006	US7119882 Apparatus and method for projection exposure
10/10/2006	US7119881 Lithographic apparatus and device manufacturing method
10/10/2006	US7119880 Projection optical system, exposure apparatus, and device manufacturing method
10/10/2006	US7119879 Stage alignment apparatus and its control method, exposure apparatus, and semiconductor device manufacturing method
10/10/2006	US7119878 Exposure apparatus and method of cleaning optical element of the same
10/10/2006	US7119875 Apparatus for forming pattern
10/10/2006	US7119874 Lithographic apparatus and device manufacturing method
10/10/2006	US7119346 Lithographic apparatus and device manufacturing method
10/10/2006	US7119156 Resist resin
10/10/2006	US7119052 Mixture of supercritical fluid and adjuvant; removal of combustion residues
10/10/2006	US7119031 Methods of forming patterned photoresist layers over semiconductor substrates
10/10/2006	US7119025 Methods of eliminating pattern collapse on photoresist patterns
10/10/2006	US7119022 Manufacturing method of semiconductor device
10/10/2006	US7118900 Forming functionally organized, spatially patterned, alternating current mediated, self supporting, organic polymer-microparticle thin films/hydrogels
10/10/2006	US7118848 Support for lithographic printing plate and original forme for lithographic printing plate
10/10/2006	US7118847 Polymer and photoresist compositions
10/10/2006	US7118846 Positive resist composition and method of forming a resist pattern using the same
10/10/2006	US7118845 Photon absorption by an absorber in photoinitiator system, having maximum cross section of fluorescein, curing, photopolymerization
10/10/2006	US7118844 Storage stability and light fixation properties; synthesis intermediate for azo dye, an analytical reagent
10/10/2006	US7118837 Photoimaged dielectric polymer and film, and circuit package containing the same
10/10/2006	US7118834 Exposure method, exposure quantity calculating system using the exposure method and semiconductor device manufacturing method using the exposure method
10/10/2006	US7118832 Having antireflective coating on absorber layer
10/10/2006	US7118795 Process of producing optical element and optical element
10/10/2006	US7118681 Method for the fabrication of an optical disk master
10/10/2006	US7118647 Process for producing a fibrous structure having increased surface area
10/10/2006	US7117790 Microcontact printing
10/10/2006	CA2261126C Process for producing a screen printing form and screen printing fabric of a coated screen web
10/05/2006	WO2006105326A1 Masking of repeated overlay and alignment marks to allow reuse of photomasks in a vertical structure
10/05/2006	WO2006105122A2 Small ultra-high na catadioptric objective
10/05/2006	WO2006104340A1 Thinner composition for removing photoresist
10/05/2006	WO2006104276A1 Image drawing apparatus and method
10/05/2006	WO2006104262A1 Projection head focus position measurement method and exposure method
10/05/2006	WO2006104174A1 Recording element setting method, image recording method, and device
10/05/2006	WO2006104173A1 Light quantity adjustment method, image recording method, and device
10/05/2006	WO2006104171A1 Image recording method and device
10/05/2006	WO2006104170A1 Image recording method and device
10/05/2006	WO2006104168A1 Image recording method and device
10/05/2006	WO2006104139A1 Multi-column electron beam exposure device
10/05/2006	WO2006104127A1 Exposure apparatus, method for manufacturing exposure apparatus, and method for manufacturing microdevice
10/05/2006	WO2006104100A1 Water purge agent, and method for resist pattern formation using the same
10/05/2006	WO2006104011A1 Shot shape measuring method, mask
10/05/2006	WO2006103979A1 (meth)acryloyl group-containing aromatic isocyanate compound and production process thereof
10/05/2006	WO2006103908A1 Organic ligands for semiconductor nanocrystals
10/05/2006	WO2006102917A1 Method to fabricate a redirecting mirror in optical waveguide devices
10/05/2006	WO2006102916A1 Device for determining radiation power and an exposure device
10/05/2006	WO2006079486A3 Illumination system, in particular for a projection exposure machine in semiconductor lithography

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