G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2006
10/18/2006	CN1847984A Method of realizing 100nm patterns with transparent no-chromium phase shift mask
10/18/2006	CN1847983A Prepn process of exposure registering mark for mixing and matching between electron beam and optical device
10/18/2006	CN1847982A Coating compositions for use with an overcoated photoresist
10/18/2006	CN1847981A Negative photoresist composition
10/18/2006	CN1847980A Low voltage treating device
10/18/2006	CN1847962A Making process of electric crystal array film substrate
10/18/2006	CN1847940A Method for forming pad electrode, method for manufacturing liquid crystal display device
10/18/2006	CN1847286A Polymer type hexaryl diimidazole photoinitiator and its prepn process
10/18/2006	CN1847274A Filming copolymer resin containing silicon coupler and its organic antiflecting coating
10/18/2006	CN1280896C Micro image technique in use for encoding and arranging mask type ROM
10/18/2006	CN1280679C Resist releasing composition
10/18/2006	CN1280678C Method for adding developer to automatic developing device for photosensitive lithographic printing plate
10/18/2006	CN1280677C A method of substrate processing and photoresist exposure
10/18/2006	CN1280676C Positive photoresistive agent composition and method for forming photoresistive pattern
10/18/2006	CN1280675C Hybrid negative typed photoresistive agent in multiple reaction modes and method for forming photoesistive patterns
10/18/2006	CN1280674C Photosensitive film for circuit formation and process for producing printed wiring board
10/18/2006	CN1280673C Positive photoresist composition for liquid crystal device
10/18/2006	CN1280672C Photosensitive compound, resin and composition
10/18/2006	CN1280671C Resist compositions with polymors having 2-cyano acrylic monomer
10/18/2006	CN1280321C Photoetch resist copolymer
10/18/2006	CN1280316C Organic polymer for anti-reflection coating and its preparation method thereof
10/17/2006	USRE39349 Masks for use in optical lithography below 180 nm
10/17/2006	US7124395 Automatic optical proximity correction (OPC) rule generation
10/17/2006	US7124379 Method for communicating a measuring position of a structural element that is to be formed on a mask
10/17/2006	US7123997 Gap adjustment apparatus and gap adjustment method for adjusting gap between two objects
10/17/2006	US7123427 Objective, particularly a projection objective for use in semiconductor lithography
10/17/2006	US7123417 Method of forming an image
10/17/2006	US7123414 Method for producing library
10/17/2006	US7123362 Method for aligning wafer
10/17/2006	US7123350 Substrate holding device, substrate processing apparatus using the same, and method for aligning and holding substrate
10/17/2006	US7123349 Lithographic projection assembly, substrate handling apparatus and substrate handling method
10/17/2006	US7123348 Lithographic apparatus and method utilizing dose control
10/17/2006	US7123347 Image formation characteristics adjustment method for projection optical system
10/17/2006	US7123346 Projection exposure apparatus with line width calculator controlled diaphragm unit
10/17/2006	US7123345 Automatic focusing apparatus
10/17/2006	US7123344 Lithographic apparatus and device manufacturing method
10/17/2006	US7123343 Exposure apparatus and device manufacturing method
10/17/2006	US7123340 Lithograph with moving lens and method of producing digital holograms in a storage medium
10/17/2006	US7123327 Substrate for reflective-transmissive electro-optical device having opening in base layer varying in size along a first direction
10/17/2006	US7122809 Charged beam writing method and writing tool
10/17/2006	US7122780 Exposure apparatus with efficient uniform light output
10/17/2006	US7122589 Resin having alicyclic hydrocarbon groups in side chains, containing acid; specified two types of repeating units, which increases the solubility in an alkali developing solution by the action of an acid; and (B) a particular
10/17/2006	US7122484 Process for removing organic materials during formation of a metal interconnect
10/17/2006	US7122482 Methods for fabricating patterned features utilizing imprint lithography
10/17/2006	US7122297 Applying a resist to a substrate,exposing the resist, developing the exposed resist, etching the substrate
10/17/2006	US7122296 Providing a substrate having a surface which includes topography formed therein; forming a thin, conformal layer on substrate surface, removing substantially all of the layer from bottomwalls so as to yield holes, trenches
10/17/2006	US7122295 Photopolymerizable elastomers; relief images
10/17/2006	US7122294 generates a free perfluorinated sulfonic acid moiety upon irradiation; photoresists for microlithography and photopolymerization
10/17/2006	US7122293 Alkali-soluble polymer and polymerizable composition thereof
10/17/2006	US7122292 Acid labile, photoresists, semiconductors
10/17/2006	US7122291 Photoresist compositions
10/17/2006	US7122290 Holographic storage medium
10/17/2006	US7122289 A binder free from carbon-carbon double bonds activatable with actinic radiation, containing a meth(acrylate) copolymer having an isocyanate reactive functional group, a polyisocyante, and an unsaturated polyfunctional urethane
10/17/2006	US7122288 Containing an alkaline-soluble resin as a base material which includes an oxetane structure
10/17/2006	US7122282 Mask pattern forming method and patterning method using the mask pattern
10/17/2006	US7122281 Defining critical edge portions of the features with a full phase shifting mask (FPSM) includes a first set of cuts between adjacent phase shifters to resolve phase conflicts; a computer software
10/17/2006	US7121496 Method and system for correcting web deformation during a roll-to-roll process
10/17/2006	US7121204 Method of lithographic printing without dampening liquid
10/17/2006	US7121202 Imaging apparatus and imaging method to increase efficiency of mounting/demounting of a recording material to/from a recording drum
10/17/2006	US7121014 Positioning aid and method for assisting in aligning heavy machines
10/17/2006	CA2217018C Method and apparatus for step and repeat exposures
10/17/2006	CA2189459C Low-volatility, substituted 2-phenyl-4,6-bis (halomethyl)-1,3,5-triazine for lithographic printing plates
10/17/2006	CA2148240C On-demand production of lat imaging films
10/12/2006	WO2006107517A2 Composition for cleaning ion implanted photoresist in front end of line applications
10/12/2006	WO2006107169A1 Remover composition for photoresist of semiconductor device
10/12/2006	WO2006107056A1 Method of forming pattern
10/12/2006	WO2006106911A1 Dye-containing hardenable composition, and color filter and process for producing the same
10/12/2006	WO2006106907A1 Exposure apparatus, exposure method, and device production method
10/12/2006	WO2006106892A1 Flame-retardant composition for solder resist and cured product thereof
10/12/2006	WO2006106851A1 Exposure apparatus, exposure method, and device production method
10/12/2006	WO2006106836A1 Exposure method, exposure apparatus and device manufacturing method
10/12/2006	WO2006106833A1 Exposure apparatus, exposure method, and device producing method
10/12/2006	WO2006106832A1 Method for determining exposure conditions, exposure method, exposure device, and apparatus for producing device
10/12/2006	WO2006106629A1 Photosensitive resin, photosensitive composition and photocrosslinked item
10/12/2006	WO2006105911A2 Exposure device for press plates
10/12/2006	WO2006074106A3 A system capable of determining applied and anodized coating thickness of a coated-anodized product
10/12/2006	WO2006053751A3 Projection lens system of a microlithographic projection exposure installation
10/12/2006	WO2006040184A3 Illumination system for a microlithographic projection exposure apparatus
10/12/2006	WO2006011105A3 Optical system having a cleaning arrangement
10/12/2006	US20060229376 Curable resin composition, photosensitive pattern-forming curable resin composition,color filter, substrate for liquid crystalline panel, and liquid crystalline panel
10/12/2006	US20060228652 Method of fabricating flash memory device
10/12/2006	US20060228651 Method of writing identifying information on wafer
10/12/2006	US20060228643 Heat-sensitive positive working lithographic printing plate precursor
10/12/2006	US20060227334 Aberration measuring method for projection optical system with a variable numerical aperture in an exposure apparatus
10/12/2006	US20060227313 Exposure apparatus
10/12/2006	US20060227312 Exposure method, substrate stage, exposure apparatus, and device manufacturing method
10/12/2006	US20060227310 Lithographic apparatus and device manufacturing method
10/12/2006	US20060227306 Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method and exposure apparatus, program, and device manufacturing method
10/12/2006	US20060226578 Processes for facilitating removel of fabricated objects from platens of programmed material consolidation equipment, and fabrication processes employing the object release elements
10/12/2006	DE102005015627A1 Optische Abbildungsvorrichtung Optical imaging device
10/12/2006	DE102005003905A1 Anordnung zur Projektion eines Musters in eine Bildebene Arrangement for projecting a pattern in an image plane
10/12/2006	DE102004052146A9 Verfahren und Anordnung zur Fokussierung elektromagnetischer Strahlung unterhalb der Beugungsgrenze Method and apparatus for focusing electromagnetic radiation below the diffraction limit
10/12/2006	DE102004028943B4 Vorrichtung zur zeitlich stabilen Erzeugung von EUV-Strahlung mittels eines laserinduzierten Plasmas Apparatus for time-stable generation of EUV radiation by means of a laser-induced plasma
10/12/2006	DE10160458B4 Maske mit programmierten Defekten und Verfahren zu deren Herstellung Mask programmed with defects and process for their preparation
10/12/2006	CA2603393A1 Compositions for cleaning ion implanted photoresist in front end of line applications
10/12/2006	CA2603170A1 Exposure device for press plates
10/11/2006	EP1710630A2 Lithographic apparatus and device manufacturing method
10/11/2006	EP1710629A2 Dual stage lithographic apparatus and device manufacturing method
10/11/2006	EP1710628A1 Positive resist composition and method of forming resist pattern
10/11/2006	EP1710627A1 Photosensitive lithographic printing plate

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